| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 03/02/1999 | US5876573 High magnetic flux cathode apparatus and method for high productivity physical-vapor deposition |
| 03/02/1999 | US5876572 Multiple layer erosion resistant coating and a method for its production |
| 03/02/1999 | US5876082 Device for gripping and holding substrates |
| 03/02/1999 | US5875549 Method of forming internal passages within articles and articles formed by same |
| 02/25/1999 | WO1999009399A1 Apparatus and method for in-situ thickness and stoichiometry measurement of thin films |
| 02/25/1999 | WO1999008974A1 Glass-based copper-mirrors |
| 02/25/1999 | WO1999008972A1 Glass-based copper-mirrors |
| 02/25/1999 | WO1998053486A3 Aluminum deposition shield |
| 02/25/1999 | DE19736318A1 Installation for coating plate shaped substrates with thin layers by cathode sputtering |
| 02/25/1999 | DE19735803A1 Electrode-electrolyte unit e.g. for thin film battery or electrochromic device |
| 02/25/1999 | DE19735760A1 Soldering an optical component to a metal mounting |
| 02/25/1999 | DE19735734A1 Bismuth sputter target produced by powder metallurgy |
| 02/24/1999 | EP0898273A2 Optical information recording medium and method of manufacturing the same |
| 02/24/1999 | EP0897591A1 Magnet array |
| 02/24/1999 | CN2308608Y Metallized wooden products and special high vacuum evaporative film coating machine |
| 02/24/1999 | CN1209201A Ultrasonic sputtering target testing method |
| 02/24/1999 | CN1208954A Method of implanting low doses of ions into substrate |
| 02/24/1999 | CN1208953A Methods of forming barrier layer |
| 02/24/1999 | CN1208940A Metallized film prodn. method thereof capacitor using it |
| 02/24/1999 | CN1208778A Article having decorative and protective multi-layer coating |
| 02/23/1999 | US5874379 Barium-strontium-tantalum titanate layer coated onto storage electrode layer of semiconductor capacitor; low leakage current |
| 02/23/1999 | US5874364 Forming ruthenium or ruthenium oxide film by vapor deposition of ruthenium, 2,5-dimethyl-3,5-heptanedione complex |
| 02/23/1999 | US5874351 Sputtered metal silicide film stress control by grain boundary stuffing |
| 02/23/1999 | US5874127 Method and apparatus for gaseous treatment |
| 02/23/1999 | US5874124 Process for metallizing phosphor screens |
| 02/23/1999 | US5873989 Methods and apparatus for linear scan magnetron sputtering |
| 02/23/1999 | US5873985 Process of making squid device having tilt-boundary junction |
| 02/23/1999 | US5873984 Method of sputtering an amorphous carbon overcoat as a protective film on magnetic recording disk |
| 02/23/1999 | US5873983 Coating flowable material onto clamped substrate with some excess residue covering clamp, hot melting coating while clamped substrate is held face down to so that excess residue on clamp does not flow onto substrate coating layer |
| 02/23/1999 | US5873951 Diffusion coated ethylene furnace tubes |
| 02/18/1999 | WO1999008308A1 Plasma vapor deposition with coil sputtering |
| 02/18/1999 | WO1999007914A1 Multi-spectroscopic emission line control for thin film sputtering process |
| 02/18/1999 | WO1999007913A1 Modulated power for ionized metal plasma deposition |
| 02/18/1999 | WO1999007527A1 Coated manicure implement |
| 02/18/1999 | DE19739231A1 Aluminium@-germanium@-copper@ alloy sputter deposition |
| 02/18/1999 | DE19735469A1 Target for a sputter cathode |
| 02/17/1999 | EP0897022A1 Sputtering target and antiferromagnetic film and magneto-resistance effect element formed by using the same |
| 02/17/1999 | EP0897021A1 Process and device for marking gems and product obtained |
| 02/17/1999 | EP0896732A1 Sputtering installation with two longitudinally placed magnetrons |
| 02/17/1999 | EP0885451A4 Transparent contacts for organic devices |
| 02/17/1999 | EP0795190B1 Process of metallizing phosphor screens |
| 02/17/1999 | EP0759095A4 Silicon carbide sputtering target |
| 02/17/1999 | EP0609327B1 Processing system |
| 02/17/1999 | CN2307798Y Ion coated film equipment |
| 02/17/1999 | CN1208245A Dose control for use in ion implanter |
| 02/17/1999 | CN1208085A Coated article |
| 02/17/1999 | CN1208018A Process for making crystalline solid-solution powder with low electrical resistance |
| 02/17/1999 | CN1042149C Forming mould for ion beam auxiliary deposition platinum film |
| 02/16/1999 | US5872502 Magnetoresistance effect film and production process thereof |
| 02/16/1999 | US5872080 High temperature superconducting thick films |
| 02/16/1999 | US5871805 Chemical vapor deposition and electron beam physical vapor deposition processes, using optical imaging sensors and/or laser interferometers or infrared ellipsometers |
| 02/16/1999 | US5871622 Method for making a spin valve magnetoresistive sensor |
| 02/16/1999 | US5871579 Two-step dipping technique for the preparation of organic-inorganic perovskite thin films |
| 02/16/1999 | CA2133512C Heat-treatment convertible coated glass and method of converting same |
| 02/11/1999 | WO1999006610A1 Method and apparatus for detecting the endpoint of a chamber cleaning |
| 02/11/1999 | WO1999006608A1 Glancing angle deposition of thin films |
| 02/11/1999 | WO1999006110A1 Cluster tool method and apparatus using plasma immersion ion implantation |
| 02/11/1999 | WO1998052207A3 Central coil design for ionized metal plasma deposition |
| 02/11/1999 | DE19818868A1 Method and apparatus for filtering material vapours containing macro particles |
| 02/11/1999 | DE19734079A1 Cathode for a unit for target sputtering |
| 02/11/1999 | DE19733940A1 Installation for coating plate shaped substrates with thin layers by cathode sputtering |
| 02/10/1999 | EP0896372A2 Solar battery module |
| 02/10/1999 | CN1207420A Article having coating |
| 02/10/1999 | CN1207419A Aluminium alloy rim surface treatment method |
| 02/10/1999 | CN1042043C Electronic beam evaporator |
| 02/09/1999 | US5868914 Magnetron sputtering system |
| 02/09/1999 | US5868913 Coating by physical vapor deposition of a mixture of ruthenium oxide, and at least one non-noble metal oxide in a system charged with oxygen and heat treating the coated substrate; improved durability anode for electrolytic cell |
| 02/09/1999 | US5868910 Codepositing magnetic material and nonmagnetic metallic material to create homogeneous film comprising magnetic particles in nonmetallic matrix, annealing for time determined by desired particle size |
| 02/09/1999 | US5868897 Device and method for processing a plasma to alter the surface of a substrate using neutrals |
| 02/09/1999 | US5868847 Clamp ring for shielding a substrate during film layer deposition |
| 02/04/1999 | WO1999005546A1 Improved anti-reflective composite |
| 02/04/1999 | WO1999005417A1 Hall-current ion source apparatus and method for processing materials |
| 02/04/1999 | WO1999005341A1 Coating of filters |
| 02/04/1999 | WO1999004909A1 Method and apparatus for zone lubrication of magnetic media |
| 02/04/1999 | WO1999004866A1 Coated golf club component |
| 02/04/1999 | DE19834437A1 Manganese alloy with low oxygen and sulphur impurity content |
| 02/04/1999 | DE19743800C1 Continuously operating vacuum coating installation |
| 02/04/1999 | DE19733517A1 Physical plasma process for treating metal surfaces |
| 02/04/1999 | DE19732929A1 Pattern carrier for a vacuum coating installation |
| 02/03/1999 | EP0894153A1 Apparatus for matrix coating fibres with metal vapour |
| 02/03/1999 | EP0734459B1 Plasma-activated vapour-deposition process and device |
| 02/03/1999 | CN1206750A Cardiovascular system artificial organ surface modifying technology |
| 02/02/1999 | US5867128 Multicontact for antenna window |
| 02/02/1999 | US5866263 Hermetic enclosure cover |
| 02/02/1999 | US5866204 Rotation substrate in presence of vapor flux |
| 02/02/1999 | US5866067 Adding chromium oxide to melt; used for semiconductor wafer |
| 02/02/1999 | US5865970 Permanent magnet strucure for use in a sputtering magnetron |
| 02/02/1999 | US5865969 Apparatus for, and method of, providing a deposition on a substrate |
| 02/02/1999 | US5865961 Reverse polarity sputtering device |
| 02/02/1999 | US5865897 Method of producing film of nitrogen-doped II-VI group compound semiconductor |
| 02/02/1999 | US5865588 Chamber, at least for the transport of workpieces, a chamber combination, a vacuum treatment facility as well as a transport method |
| 02/02/1999 | CA2156992C Process for preparing high crystallinity oxide thin film and film deposition apparatus for the process |
| 02/02/1999 | CA2096593C Plasma vapor deposition apparatus |
| 02/02/1999 | CA2084230C Coating a substrate surface with a permeation barrier |
| 01/28/1999 | WO1999004418A1 Method for targeted production on n-type conductive areas in diamond layers by ion implantation |
| 01/28/1999 | WO1999004412A2 Target cathode assembly |
| 01/28/1999 | WO1999004410A1 Scanning wheel for ion implantation process chamber |
| 01/28/1999 | WO1999004058A1 Sheet-form magnetron sputtering device |
| 01/28/1999 | WO1999004057A1 Method and apparatus for forming thin functional film |
| 01/28/1999 | WO1999004054A2 Method of using hydrogen and oxygen gas in sputter deposition of aluminum-containing films and aluminum-containing films derived therefrom |