| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 04/21/1999 | EP0909834A2 Foil transporting device |
| 04/21/1999 | EP0909833A2 Metal coated polyolefin films |
| 04/21/1999 | EP0909445A1 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production |
| 04/21/1999 | EP0909342A1 Method and device for continuous coating of a moving substrate by means of a metallic vapour |
| 04/21/1999 | EP0909341A1 Process and device for production of metallic coatings on semiconductor structures |
| 04/21/1999 | EP0909340A1 Multilayered material, process and device for producing a multilayered material |
| 04/21/1999 | EP0833959B1 Coatings for corrosion protection |
| 04/21/1999 | EP0753081B1 An electron jet vapor deposition system |
| 04/21/1999 | CN1214375A Fe-W-Mo-Co type surface aged hardened alloy |
| 04/21/1999 | CN1214374A Surface metallurgical technology to precipitate hardened stainless steel |
| 04/20/1999 | US5896553 Single phase tungsten-titanium sputter targets and method of producing same |
| 04/20/1999 | US5896078 Soft magnetic alloy thin film and plane-type magnetic device |
| 04/20/1999 | US5896012 Metal ion plasma generator having magnetic field forming device located such that a triggering is between the magnetic field forming device and an anode |
| 04/20/1999 | US5895727 Magnetoresistive multilayer film |
| 04/20/1999 | US5895723 Composite films |
| 04/20/1999 | US5895720 High precision replication system |
| 04/20/1999 | US5895712 Magnetic recording medium with improved coercivity |
| 04/20/1999 | US5895596 Model based temperature controller for semiconductor thermal processors |
| 04/20/1999 | US5895563 Immersion mixture of iron, fluoride, and acid compounds; cyanide-free; uniformity; electroplating |
| 04/20/1999 | US5895559 To prevent arc jumping and cathode damage |
| 04/20/1999 | US5895531 Apparatus and polymerization gun for coating objects by vacuum deposit |
| 04/20/1999 | US5895266 Sputter depositing titanium layer,oxygenating, sputter depisiting titanium nitride layer oxygenating |
| 04/15/1999 | WO1999018252A1 Selected adjustment of dropwise condensation on ion implanted surfaces |
| 04/15/1999 | WO1999018251A1 Oxidation-resistant metal foil, its use and method for its production |
| 04/15/1999 | DE19756348C1 Laser sputter installation and method for seeding and/or implanting and/or structuring a surface |
| 04/15/1999 | DE19752202C1 Micromechanical device production involving ion deposition on substrate region |
| 04/15/1999 | DE19750909C1 Rotating unit for plasma immersion aided treatment of substrates |
| 04/15/1999 | DE19744953A1 Security element with an auxiliary inorganic layer |
| 04/15/1999 | DE19744080A1 Controlled dropwise condensation on ion-implanted metal surfaces |
| 04/15/1999 | CA2273934A1 Oxidation-resistant metal foil, its use and method for its production |
| 04/14/1999 | EP0909025A2 Diamond wafer, method of estimating a diamond wafer and diamond surface acoustic wave device |
| 04/14/1999 | EP0908924A1 Device for the condensation deposition of a film on a substrate |
| 04/14/1999 | EP0908535A1 Process for cleaning a substrate and apparatus for carrying out the process |
| 04/14/1999 | EP0908532A2 Ion beam sputtering system |
| 04/14/1999 | EP0908531A2 Apparatus and method for forming a thin film of a compound |
| 04/14/1999 | EP0908426A1 Method of making molybdenum disulfide having a high electrical conductivity |
| 04/14/1999 | EP0907764A1 Cutting tool and manufacturing method therefor |
| 04/14/1999 | CN1213997A Method employing UV laser pulses of varied energy density to form blind vias in multilayered targets |
| 04/14/1999 | CN1213644A Method of preparing antiseptic hydroxyl kietyoite cladding material |
| 04/13/1999 | US5894133 Sputter cathode for application of radioactive material |
| 04/13/1999 | US5894131 Implanting at least one of arsenic, boron, phosphorous into a substrate |
| 04/08/1999 | WO1999017336A1 Insulating ceramic coated metallic part in a plasma sputter reactor |
| 04/08/1999 | WO1999016927A1 Vacuum coating installation and coupling device |
| 04/08/1999 | WO1999016926A1 Two-stage sealing system for thermally conductive chuck |
| 04/08/1999 | WO1999016925A1 Improved methods and apparatus for physical vapor deposition |
| 04/08/1999 | WO1999016924A1 Ion plating apparatus |
| 04/08/1999 | WO1999016923A1 Method and device for coating substrates |
| 04/08/1999 | WO1999016922A1 Method and device for introducing powdery solids into a plasma |
| 04/08/1999 | WO1999016555A1 Protective overcoat for replicated diffraction gratings |
| 04/08/1999 | WO1999016390A2 Coated ophthalmic and implantable devices and methods for producing same |
| 04/08/1999 | WO1999004412A3 Target cathode assembly |
| 04/08/1999 | WO1999004054A3 Method of using hydrogen and oxygen gas in sputter deposition of aluminum-containing films and aluminum-containing films derived therefrom |
| 04/07/1999 | EP0906636A1 Highly tetrahedral amorphous carbon films and methods for their production |
| 04/07/1999 | EP0824398A4 Flexible plastic substrate with anti-reflection coating having low reflective color and method |
| 04/07/1999 | EP0590148B1 Method and apparatus for thin film formation, device, electro-magnetic apparatus, data recording/reproduction apparatus and signal processor |
| 04/07/1999 | CN2312945Y Multi-purpose column-like vacuum plasma film-plating source |
| 04/06/1999 | US5893050 Method for correcting thin-film formation program of semiconductor device and thickness measuring apparatus therefor |
| 04/06/1999 | US5892618 Low polarization sensitivity gold mirrors on silica |
| 04/06/1999 | US5892207 Heating and cooling apparatus for reaction chamber |
| 04/06/1999 | US5891803 Rapid reflow of conductive layers by directional sputtering for interconnections in integrated circuits |
| 04/06/1999 | US5891575 Growing and releasing diamonds |
| 04/06/1999 | US5891542 Optical recording material, and optical recording medium |
| 04/06/1999 | US5891312 Forming a thin metal coating on a substrate |
| 04/06/1999 | US5891311 Sputter coating system and method using substrate electrode |
| 04/06/1999 | US5890268 Method of forming closed cell metal composites |
| 04/06/1999 | CA2000076C Process for preparing superconductor of compound oxide of bi-sr-ca-cu system |
| 04/01/1999 | WO1999016137A1 Sputter-deposited fuel cell membranes and electrodes |
| 04/01/1999 | WO1999015710A1 Cell control method and apparatus |
| 04/01/1999 | DE19803132C1 Fuel cell especially a polymer membrane fuel cell |
| 04/01/1999 | DE19741708A1 Apparatus for coating a substrate with thin layers |
| 04/01/1999 | DE19739794A1 Verfahren zur Regelung eines Beschichtungsvorgangs Method for regulating a coating process |
| 03/31/1999 | EP0905717A1 Device for coating a solid lubricant on a cable |
| 03/31/1999 | EP0905420A2 Piston ring |
| 03/31/1999 | EP0905419A2 Piston ring |
| 03/31/1999 | EP0905275A2 Apparatus for coating an essentially flat, disc-shaped substrate |
| 03/31/1999 | EP0905274A1 Method and device for applying porous coatings and cathode film of an electrolytic condenser |
| 03/31/1999 | EP0905273A2 Method for producing films |
| 03/31/1999 | EP0905272A2 Cathodic arc vapor deposition apparatus (annular cathode) |
| 03/31/1999 | EP0904426A1 Article with a protective coating system comprising an improved anchoring layer and its manufacture |
| 03/31/1999 | EP0904424A1 Coating device and process for coating a component with a heat insulating layer |
| 03/31/1999 | EP0904423A1 Diffusion bonded sputtering target assembly with precipitation hardened backing plate and method of making same |
| 03/31/1999 | EP0904422A1 Reduction of scatter in thick sputtered coatings |
| 03/31/1999 | EP0904159A1 Process to modify work functions using ion implantation |
| 03/30/1999 | US5888907 Plasma processing method |
| 03/30/1999 | US5888305 Vacuum coating apparatus with a crucible in the vacuum chamber to hold material to be evaporated |
| 03/30/1999 | US5887481 Cathode sputtering targets with a low level of particle emission, precursors of these targets, and processes for obtaining them |
| 03/30/1999 | CA2059185C Process and apparatus for production of diamond like films |
| 03/25/1999 | WO1999014792A1 Adjustment of deposition uniformity in an inductively coupled plasma source |
| 03/25/1999 | WO1999014790A1 Resistive heating of power coil to reduce transient heating/start up effects |
| 03/25/1999 | WO1999014788A1 Shield or ring surrounding semiconductor workpiece in plasma chamber |
| 03/25/1999 | WO1999014786A1 Apparatus and method for improved scanning efficiency in an ion implanter |
| 03/25/1999 | WO1999014394A1 Device and method for detecting and preventing arcing in rf plasma systems |
| 03/25/1999 | WO1999014393A1 METHOD FOR COATING SUBSTRATES WITH ALUMINUM OXIDE (Al2O3) AND COATING A WORK PIECE USING SAID METHOD |
| 03/25/1999 | WO1999014392A1 Tool having a protective layer system |
| 03/25/1999 | WO1999014391A1 Tool with protective layer system |
| 03/25/1999 | WO1999014390A2 Method for sputter coating surfaces |
| 03/25/1999 | WO1998049371A9 Apparatus for producing titanium crystal and titanium |
| 03/25/1999 | WO1998049357A9 Titanium crystal and titanium |
| 03/25/1999 | DE19806282C1 Venting system for vacuum processing especially sputtering chamber |
| 03/25/1999 | DE19741725A1 Silicon carbide is p-doped with a low resistivity, high hole mobility layer |