| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 06/17/1999 | WO1999030347A1 Method and device for improving surfaces |
| 06/17/1999 | WO1999029923A1 Plasma reactor with a deposition shield |
| 06/17/1999 | WO1999029922A1 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 06/17/1999 | WO1999029921A1 Multilayered pvd coated cutting tool |
| 06/17/1999 | WO1999029920A1 Multilayered pvd coated cutting tool |
| 06/17/1999 | WO1999029498A1 Designer particles of micron and submicron dimension |
| 06/17/1999 | WO1999029435A2 Modification of surfaces in order to increase surface tension |
| 06/17/1999 | DE19755837A1 Sputtering unit employs an electrically isolated substrate edge mask |
| 06/17/1999 | DE19755448A1 Sputtering cathode for production of thin layers on substrates in a vacuum chamber |
| 06/17/1999 | CA2312777A1 Plasma reactor with a deposition shield |
| 06/16/1999 | EP0923121A1 Method for manufacturing thin film devices using the anisotropic reflectance technique |
| 06/16/1999 | EP0922014A1 Unibody crucible and effusion source employing such a crucible |
| 06/16/1999 | EP0874697A4 Permeable solar control film |
| 06/16/1999 | EP0848761B1 Device comprising a photoionic micro-head |
| 06/16/1999 | CN2324162Y Column shape magnetic control sputtering source clam shape double-chamber vacuum coating film machine |
| 06/16/1999 | CN2324161Y Multi-purpose clam shape double-chamber ion film-coating machine |
| 06/16/1999 | CN1219603A Treatment process of workpiece before ion-plating filming and its deoiling and decontaminating cleaning agents |
| 06/16/1999 | CN1043671C Ion plating apparatus |
| 06/15/1999 | US5913100 Mo-W material for formation of wiring, Mo-W target and method for production thereof, and Mo-W wiring thin film |
| 06/15/1999 | US5912486 Germanium |
| 06/15/1999 | US5912473 Oligothiophene compound and polytetrafluoroethylene oriented film, polyphenylene vinylene |
| 06/15/1999 | US5912117 Method for diagnosis of lyme disease |
| 06/15/1999 | US5912068 Epitaxial oxides on amorphous SiO2 on single crystal silicon |
| 06/15/1999 | US5911861 Coating station |
| 06/15/1999 | US5911858 Scanning the position of the substrate with respect to the sputter target during deposition |
| 06/15/1999 | US5911857 Method for forming metal wiring of semiconductor devices |
| 06/15/1999 | US5911856 Sputtering control based upon measurement of thickness setting values for layers of antireflective thin films deposited on optical substrate |
| 06/15/1999 | US5911852 Plasma processing apparatus |
| 06/15/1999 | US5911834 Gas delivery system |
| 06/15/1999 | US5911832 Plasma immersion implantation with pulsed anode |
| 06/15/1999 | US5911830 Method and fixture for laser bar facet coating |
| 06/15/1999 | US5911560 Getter pump module and system |
| 06/15/1999 | CA2173354C Diamond-coated tools and process for making |
| 06/15/1999 | CA2081341C Lead free mirrors and environmentally safe manufacture thereof |
| 06/10/1999 | WO1999028530A1 Plasma polymerization enhancement of surface of metal for use in refrigerating and air conditioning |
| 06/10/1999 | WO1999028523A1 Device for vacuum coating slide bearings |
| 06/10/1999 | WO1999028521A1 Sputter deposition |
| 06/10/1999 | WO1999028519A2 Method for producing a bc(n):h layer |
| 06/10/1999 | WO1999028049A1 Method for adhering precious metal to vitreous substances |
| 06/10/1999 | WO1999027893A2 Carbon coatings, method and apparatus for applying them, and articles bearing such coatings |
| 06/10/1999 | WO1998059088A9 Sputter coating system and method using substrate electrode |
| 06/10/1999 | DE19753848A1 Modifikation von Oberflächen zur Steigerung der Oberflächenspannung Modification of surfaces to increase the surface tension |
| 06/10/1999 | DE19753624A1 Verschleiß- und reibungsmindernde Schicht, mit Substrat mit dieser Schicht sowie Verfahren zum Herstellen einer solchen Schicht Wear- and friction reducing layer, with the substrate with this layer, as well as method of manufacturing such a layer |
| 06/09/1999 | EP0921714A1 Rfq accelerator and ion implanter |
| 06/09/1999 | EP0921556A2 Thin film forming apparatus |
| 06/09/1999 | EP0920435A1 Platinum source compositions for chemical vapor deposition of platinum |
| 06/09/1999 | EP0840676A4 Adhesiveless flexible laminate and process for making adhesiveless flexible laminate |
| 06/09/1999 | CN2322977Y Primary layer processing machine for vacuum electroplating |
| 06/09/1999 | CN1218984A Sputtering equipment and method for producing semiconductor device with it |
| 06/09/1999 | CN1218843A Indium oxide/tin oxide sputtering target material and its preparing method |
| 06/08/1999 | US5910220 Apparatus and method for selective area deposition of thin films on electrically biased substrates |
| 06/03/1999 | WO1999027758A1 Plasma processing apparatus having rotating magnets |
| 06/03/1999 | WO1999027600A1 Improved hspes membrane electrode assembly |
| 06/03/1999 | WO1999027153A1 Apparatus and method for inductively-coupled-plasma-enhanced ionized physical-vapor deposition |
| 06/03/1999 | WO1999027152A1 Substrate edge seal and clamp for low-pressure processing equipment |
| 06/03/1999 | WO1999027151A1 Pulsed mode deposition for low rate film deposition |
| 06/03/1999 | WO1999027150A1 Sputtering target |
| 06/03/1999 | WO1999027149A1 Electron beam deposition device and method of manufacturing thin film by using the deposition device |
| 06/03/1999 | WO1999027147A2 Wear-resistant, mechanically highly stressed and low-friction boundary coating construction for titanium or the alloys thereof and a method for producing the same |
| 06/02/1999 | EP0919644A1 Process for obtaining a metallic composite band |
| 06/02/1999 | EP0918886A1 Method for forming a carbon film |
| 06/02/1999 | EP0720530B1 Cathode for plasma sputtering |
| 06/02/1999 | DE19854645A1 Anti-reflection film for a CRT has a thick uppermost silicon oxide film above a thinner indium-tin oxide film |
| 06/01/1999 | US5909156 Surface acoustic wave device with multilayer electrodes and method for manufacturing the same |
| 06/01/1999 | US5908602 Apparatus for generation of a linear arc discharge for plasma processing |
| 06/01/1999 | CA2161288C Porous metal body, process for producing the same and battery plate formed therefrom |
| 06/01/1999 | CA2129403C Ion implanting apparatus and ion implanting method |
| 05/27/1999 | WO1999026281A1 Uhv-compatible in-situ pre-metallization clean and metallization of semiconductor wafers |
| 05/27/1999 | WO1999026274A1 Planar magnetron with moving magnet assembly |
| 05/27/1999 | WO1999026259A1 Laminate, capacitor, and method for producing laminate |
| 05/27/1999 | WO1999025908A1 Thin films having a rock-salt-like structure deposited on amorphous surfaces |
| 05/27/1999 | WO1999025893A1 Rotating device for plasma immersion supported treatment of substrates |
| 05/27/1999 | WO1999025892A1 METHOD FOR MAKING Ni-Si MAGNETRON SPUTTERING TARGETS AND TARGETS MADE THEREBY |
| 05/27/1999 | WO1999025651A1 Production of intercalates |
| 05/27/1999 | WO1999014390A3 Method for sputter coating surfaces |
| 05/27/1999 | WO1998047178A3 Method and apparatus for thin film aluminum planarization |
| 05/27/1999 | DE19751337A1 Surface layer structure for titanium and alloys |
| 05/27/1999 | CA2310678A1 Planar magnetron with moving magnet assembly |
| 05/26/1999 | EP0918351A1 Improved planar magnetron with moving magnet assembly |
| 05/26/1999 | EP0918043A1 Substrate coated with at least one MgO-layer |
| 05/26/1999 | EP0918042A1 Substrate coated with at least a MgO-layer |
| 05/26/1999 | EP0917494A1 Systems and methods for the combinatorial synthesis of novel materials |
| 05/26/1999 | EP0845050B1 Product used to guide a hot oxidizing gas |
| 05/26/1999 | EP0753201B1 A sputter method and a sputtering target |
| 05/26/1999 | CN1217735A Multilayer interference pigment with transparent central layer |
| 05/26/1999 | CN1217390A Sputting film-plating apparatus |
| 05/26/1999 | CN1217389A Surface alloyed aluminium-alloy section and producing method therefor |
| 05/25/1999 | US5907792 Nitriding by molecular beam of high purity elemental silicon and an atomic beam of high purity nitrogen in presence of reduced level of hydrogen |
| 05/25/1999 | US5907470 Dielectric thin film capacitor element |
| 05/25/1999 | US5907220 Magnetron for low pressure full face erosion |
| 05/25/1999 | US5906874 Stability; multilayer |
| 05/25/1999 | US5906857 Vapor deposition and emission |
| 05/25/1999 | US5906717 Sputtering target of single crystal aluminum alloy |
| 05/25/1999 | US5906688 Heating to oxidize stainless steel surface preteated by purging surface moisture using anhydrous inert gas |
| 05/20/1999 | WO1999024825A1 Production of the chalcogenide glass layer of a heavy metal electrode by means of laser ablation |
| 05/20/1999 | WO1999024634A1 PVD Al2O3 COATED CUTTING TOOL |
| 05/20/1999 | WO1999002195A3 Coronary stent with a radioactive, radiopaque coating |
| 05/20/1999 | DE19852764A1 High purity manganese is produced by vacuum distilling molten crude manganese |
| 05/19/1999 | EP0916635A2 Ceramic coatings containing layered porosity |
| 05/19/1999 | EP0762943A4 Radiation cured island coating system |