Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2003
07/09/2003CN1428625A Method for making parabolic reflector on general surface by using deposition method
07/09/2003CN1428613A Method for producing anti-reflective film-coated plastic, lens, and anti-reflective film-coated plastic lens
07/09/2003CN1428461A Wear-proof chromium nitride cladding material with gradient composition
07/09/2003CN1428455A Gas-phase deposition coating and vacuum heat-treatment on-line combined composite coating equipment
07/09/2003CN1114226C Vacuum treating apparatus
07/08/2003US6589887 Forming metal-derived layers by simultaneous deposition and evaporation of metal
07/08/2003US6589699 Transparent substrate with a light-shielding film and an antireflective film, both films made of a chromiun oxycarbide, a chromium oxycarbonitride or a combination
07/08/2003US6589676 Non-magnetic substrate; underlayer over substrate; first magnetic layer, comprising cobalt, chromium and a chromium oxide stabilizing element, over underlayer; chromium oxide film on magnetic layer; and protective overcoat
07/08/2003US6589669 Magnetic recording medium and manufacturing method for the same
07/08/2003US6589610 Deposition chamber and method for depositing low dielectric constant films
07/08/2003US6589599 Easily loaded and unloaded getter device for reducing evacuation time and contamination in a vacuum chamber and method for use of same
07/08/2003US6589453 Process for preparing a target for use in the production of a thin metal oxide film
07/08/2003US6589408 Non-planar copper alloy target for plasma vapor deposition systems
07/08/2003US6589407 Aluminum deposition shield
07/08/2003US6589398 Pasting method for eliminating flaking during nitride sputtering
07/08/2003US6589382 Aligning mask segments to provide a stitched mask for producing OLED devices
07/08/2003US6589351 Electron beam physical vapor deposition apparatus and crucible therefor
07/08/2003US6589311 Sputtering target, method of making same, and high-melting metal powder material
07/08/2003US6588934 Silver-containing copper alloys for journal bearings
07/08/2003US6588121 Vacuum processing apparatus
07/03/2003WO2003054912A1 Method and apparatus comprising a magnetic filter for plasma processing a workpiece
07/03/2003WO2003054910A1 Device for treating objects by plasma deposition
07/03/2003WO2003054867A1 Method and device for processing substrates for optical data media
07/03/2003WO2003053876A2 An improved coating for optical fibers and method therefor
07/03/2003WO2003053843A2 Metal alloy elements in micromachined devices
07/03/2003WO2003053686A1 Low pressure coated article with polymeric basecoat having the appearance of stainless steel
07/03/2003WO2003053685A1 Low pressure coated article with polymeric basecoat
07/03/2003WO2003053684A1 Low pressure coated article with polymeric basecoat
07/03/2003WO2003053683A1 Low pressure coated article
07/03/2003WO2003053682A1 Low pressure coated article having the appearance of stainless steel
07/03/2003WO2003053681A1 Low pressure coated article with polymeric basecoat having the appearance of stainless steel
07/03/2003WO2003053577A1 Member having photocatalytic function and method for manufacture thereof
07/03/2003WO2002088413B1 Sputter targets comprising ti and zr
07/03/2003US20030124846 Multi-step process for depositing copper seed layer in a via
07/03/2003US20030124764 Film formation apparatus and film formation method and cleaning method
07/03/2003US20030124717 Method of manufacturing carbon cylindrical structures and biopolymer detection device
07/03/2003US20030124394 Multilayer structure used especially as a material of high relative permittivity
07/03/2003US20030124391 Hard coating coated parts
07/03/2003US20030124363 Hard metal wearing part with mixed oxide coating
07/03/2003US20030123167 Cadmium-free optical steep edge filters
07/03/2003US20030122176 Ferroelectric capacitor with electrode formed in separate oxidizing conditions
07/03/2003US20030122090 Ion beam processing method and apparatus therefor
07/03/2003US20030121887 Multi-component substances and processes for preparation thereof
07/03/2003US20030121882 Method of manufacturing Er-doped silicon nano-dot array and laser ablation apparatus used therein
07/03/2003US20030121777 Components for vacuum deposition apparatus and vacuum deposition apparatus therewith , and target apparatus
07/03/2003US20030121776 Mobile plating system and method
07/03/2003US20030121772 Method of forming metal line
07/03/2003US20030121771 Analyzing substrate for various physical properties
07/03/2003CA2469863A1 Device for treating objects by plasma deposition
07/02/2003EP1324378A1 Mehrlagige Struktur, verwendet für Materialine mit hoher Permitivität
07/02/2003EP1324078A2 Hybrid film, antireflection film comprising it, optical product, and method for restoring the defogging property of hybrid film
07/02/2003EP1323845A1 Multilayer structure
07/02/2003EP1323844A1 Composite with a low emissivity in the medium and far infrared, and with a low reflectivity in the visible and in the near infrared
07/02/2003EP1323770A1 Method for producing antireflection film-coated plastic-lens, and antireflection film-coated plastic lens
07/02/2003EP1323337A1 Magnesium barium thioaluminate and related phosphor materials
07/02/2003EP1322799A1 Surface treatment for improved hardness and corrosion resistance
07/02/2003EP1322796A2 High purity sputter targets with target end-of-life indication and method of manufacture
07/02/2003EP1322795A1 Porous getter devices with reduced particle loss and method for their manufacture
07/02/2003EP1322567A1 Temporary protective covers
07/02/2003EP1322444A1 Method of manufacturing sputter targets with internal cooling channels
07/02/2003EP0822996B1 Sputtering system using cylindrical rotating magnetron electrically powered using alternating current
07/02/2003CN1427751A Scalpel blade having high sharpness and toughness
07/02/2003CN1427446A Ion injection device and method thereof
07/02/2003CN1427085A High-temp corrosion-resisting alloy, heat barrier coating material, turbine structural member and gas turbine
07/02/2003CN1426870A Silver base conductive cold preventive welding film
07/02/2003CN1113236C Ultrasonic cathode sputtering target testing method
07/01/2003US6586837 Sputtering target and method of manufacturing a semiconductor device
07/01/2003US6586370 Conductive material driven to superconductive state when in proximity of metal boride particles; high critical temperature, ductility, wires
07/01/2003US6586346 Method of forming an oxide film
07/01/2003US6586340 Wafer processing apparatus and wafer processing method using the same
07/01/2003US6586260 Integrated circuits
07/01/2003US6586122 Multilayer-coated cutting tool
07/01/2003US6586114 Metallic article, is coated with a multi-layer coating having the color or appearance of dark copper. The coating comprises a chromium, refractory metal or refractory metal alloy adhesion promoting layer, a titanium- zirconium alloy nitride
07/01/2003US6586069 Ultrathin protective overcoats comprising fullerene for magnetic materials
07/01/2003US6585871 Method of film deposition on substrate surface and substrate produced by the method
07/01/2003US6585870 Physical vapor deposition targets having crystallographic orientations
07/01/2003US6585866 High purity cobalt sputter target and process of manufacturing the same
06/2003
06/30/2003CA2415324A1 Multilayer structure, used in particular as a material with high relative permittivity
06/30/2003CA2415312A1 Multilayer structure, used in particular as a material with high relative permittivity
06/26/2003WO2003052468A1 Film forming device, and production method for optical member
06/26/2003WO2003052161A1 Method for connecting magnetic substance target to backing plate, and magnetic substance target
06/26/2003WO2003052159A1 Amorphous ferrosilicide film exhibiting semiconductor characteristics and method for producing the same
06/26/2003WO2003051787A2 Method for the production of locally functional photocatalytic areas and objects obtained therewith
06/26/2003WO2003018862A3 Method for producing a nanostructured coating
06/26/2003WO2002065547A3 METHOD OF OBTAINING LOW TEMPERATURE ALPHA-Ta THIN FILMS USING WAFER BIAS
06/26/2003WO2002061168B1 Methods of forming sputtering targets
06/26/2003WO2002003402A8 Device for orienting the direction of magnetization of magnetic layers
06/26/2003US20030119291 Low-temperature grown high-quality ultra-thin praseodymium gate dielectrics
06/26/2003US20030119273 Methods of preventing reduction of irox during pzt formation by metalorganic chemical vapor deposition or other processing
06/26/2003US20030119251 Methods of preventing reduction of IrOx during PZT formation by metalorganic chemical vapor deposition or other processing
06/26/2003US20030119246 Low-temperature grown high quality ultra-thin CoTiO3 gate dielectrics
06/26/2003US20030118924 Radiation transparent substrate; optical recording media
06/26/2003US20030118874 Evaporation electron beam vapor deposition; protective coating for nickel, cobalt alloy
06/26/2003US20030118873 Stabilized zirconia thermal barrier coating with hafnia
06/26/2003US20030118864 Sputter deposition process for electroluminescent phosphors
06/26/2003US20030118863 Nickel aluminide coating and coating systems formed therewith
06/26/2003US20030118859 Diffusion barrier; protective coating of alumina, chromium oxide
06/26/2003US20030118746 A mechanical cell for vacuum and vapor deposition; heater, injection pipes, a transparent window for applying laser beam to the substrate
06/26/2003US20030118731 Bead blasting component to provide surface roughness, dipping component into solution of hydrofluoric acid, hydrochloric acid, and nitric acid, forming aluminum coating by thermal spraying
06/26/2003US20030118726 For forming a thin film on a long film comprising aromatic polyamide in vacuum; film is not thermally damaged or broken by avoiding effects of heat and electrification of the film accompanied by the heating for melting
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