Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2003
07/17/2003WO2003057941A1 Production of a ceramic material for a heat-insulating layer and heat-insulating layer containing said material
07/17/2003WO2003057939A2 Cathode for vacuum arc evaporators
07/17/2003WO2003057647A1 Methods of roughening a ceramic surface
07/17/2003WO2003056966A1 Decorative article having white coating and method for manufacture thereof
07/17/2003WO2003031759A3 Device for reflecting electromagnetic waves to a regulable extent and method for the metallization of a film
07/17/2003US20030135020 Aliphatic polyester film and gas barrier film
07/17/2003US20030134558 Metallized fiber structure and its manufacturing method
07/17/2003US20030134149 Layer of indium tin oxide on a substrate formed by sputtering a target in 5-40% oxygen and 1-10% hydrogen of a sputtering gas to achieve alkali resistance; durability, flexibility; printing; aluminum nitride-coated phosphor
07/17/2003US20030134143 Tantalum or tungsten target-copper alloy backing plate assembly and production method therefor
07/17/2003US20030134122 For thin films formed via YAG and excimer lasers, without exposure to high temperatures
07/17/2003US20030134089 Polymer arrays from the combinatorial synthesis of novel materials
07/17/2003US20030134054 Isotactic pressing of zirconia/yttria powder; plasma vapor deposition; for annealing of surface films
07/17/2003US20030134040 Method for masking selected regions of a substrate
07/17/2003US20030133124 Process for forming a thin film and apparatus therefor
07/17/2003US20030132524 Permanent adherence of the back end of a wafer to an electrical component or sub-assembly
07/17/2003US20030132491 Highly reliable amorphous high-K gate dielectric ZrOxNy
07/17/2003US20030132123 Methods of forming titanium-based and zirconium-based mixed-metal materials
07/17/2003US20030132108 nondetonable mixtures consisting of oxidizers and fuels; nontoxic, low detonation sensitivity, environmentally friendly; perform effectively and provide maximum throttle control
07/17/2003US20030132107 Shutter assembly having optimized shutter opening shape for thin film uniformity
07/17/2003US20030132106 Controlled magnetron shape for uniformly sputtered thin film
07/17/2003US20030132101 Method and device for forming film
07/17/2003US20030131915 Methods of fabricating high transition temperature SMA, and SMA materials made by the methods
07/17/2003US20030131796 Vapor deposition method and vapor deposition apparatus for forming organic thin films
07/17/2003US20030131794 Motorized chamber lid
07/16/2003EP1327894A1 Filter member manufacturing method, filter member cutting method, filter chip cutting method, and filter chip manufacturing method
07/16/2003EP1327704A1 Thermal barrier coating and process therefor
07/16/2003EP1327699A1 Evaporator boat for a substrate-coating apparatus
07/16/2003EP1327698A2 Thermally-stabilized thermal barrier coating and process therefor
07/16/2003EP1327517A2 Method of metal layer formation and metal foil-based layered product
07/16/2003EP1255874B1 Tumble coater
07/16/2003EP1165257B1 Release layer, method for producing the same and its use
07/16/2003EP1153161B1 Tungsten doped crucible and method for preparing same
07/16/2003EP0991085B1 Corrosion-resisting permanent magnet and method for producing the same
07/16/2003CN2560647Y Rehumidifying mechanism for coating machine
07/16/2003CN2560646Y Column closed molybdenum boat
07/16/2003CN1430789A Method and apparatus for thermally processing wafers
07/16/2003CN1430073A Process and equipment for forming film
07/16/2003CN1429865A Hybrid film, antireflection film, optical product containing the hybrid film and method for recovering defrost performance of the hybrid film
07/15/2003US6594134 Multilayer
07/15/2003US6593150 Methods and apparatus for depositing magnetic films
07/15/2003US6593015 Tool with a hard coating containing an aluminum-nitrogen compound and a boron-nitrogen compound and method of making the same
07/15/2003US6592958 Optical recording medium and sputtering target for fabricating the recording medium
07/15/2003US6592948 Method for masking selected regions of a substrate
07/15/2003US6592839 Tailoring nanocrystalline diamond film properties
07/15/2003US6592831 Vaporization and cracker cell method and apparatus
07/15/2003US6592817 Monitoring an effluent from a chamber
07/15/2003US6592812 Contains magnesium and carbon; heat and low electrical resistance sputtering target; wiring for liquid crystal displays, electrodes, semiconductor integrated circuits
07/15/2003US6592729 In-line sputtering apparatus
07/15/2003US6592728 Dual collimated deposition apparatus and method of use
07/15/2003US6592726 Wear resistant coating layer excellent in bonding strength and with little surface roughness; molten particles (droplets) are not readily produced at the same time atoms are transformed to plasma by arc discharges
07/15/2003US6592725 Giant magnetoresistance head technology; high read sensitivity heads via seed layer processing; Al2O3 layer; Ni-Cr-Fe/Ni-Fe/Co-Fe multilayer structure by sequentially deposition; Pt-Mn antiferromagnetic layer
07/15/2003US6592724 Method for producing NiTiHf alloy films by sputtering
07/15/2003US6591636 Material and method for coating glass forming equipment
07/15/2003CA2271933C Ceramic evaporation boats having improved initial wetting performance and properties
07/10/2003WO2003056603A2 Self-ionized and inductively-coupled plasma for sputtering and resputtering
07/10/2003WO2003056058A1 A method of producing a composite electroconductive material
07/10/2003WO2003056057A2 Method for coating a substrate and coated substrates obtained according to said method
07/10/2003WO2003056056A2 Sputter deposition process for electroluminescent phosphors
07/10/2003WO2003031685A3 Hard material layer
07/10/2003WO2003028428A3 Method and apparatus application of metallic alloy coatings
07/10/2003US20030130130 Vacuum evaporation of magnesium and boron compound
07/10/2003US20030129835 Efficient cleaning by secondary in-situ activation of etch precursor from remote plasma source
07/10/2003US20030129832 Method of forming a wiring film
07/10/2003US20030129780 Method of fabricating substrates and substrates obtained by this method
07/10/2003US20030129440 Method of metal layer formation and metal foil-based layered product
07/10/2003US20030129422 Hybrid film, antireflection film comprising it, optical product, and method for restoring the defogging property of hybrid film
07/10/2003US20030129407 Carbon coatings, method and apparatus for applying them, and articles bearing such coatings
07/10/2003US20030129378 Thermally-stabilized thermal barrier coating and process therefor
07/10/2003US20030129325 Film forming method,multilayer film reflector manufacturing method, and film forming device
07/10/2003US20030129324 Synthesis of films and particles of organic molecules by laser ablation
07/10/2003US20030129316 A thermal-insulating material contains yttria-stabilized zirconia (YSZ) alloyed atleast a third oxide (to increase the lattice energy of thermal barrier coating), and also contain carbon, oxycarbides, carbides and/or a carbon-containing gas
07/10/2003US20030129299 Selective deposition of emissive layer in electroluminescent displays
07/10/2003US20030129117 Synthesis and characterization of a highly stable amorphous silicon hydride as the product of a catalytic hydrogen plasma reaction
07/10/2003US20030129104 Plate shaped substrate; perpendicular magnet
07/10/2003US20030127756 Method for producing antireflection film-coated plastic lens, and antireflection film-coated plastic lens
07/10/2003US20030127744 Low electrical resistance, smoothness, high strength, stress resistance
07/10/2003US20030127606 Ion implanting apparatus and ion implanting method
07/10/2003US20030127322 Sputtering apparatus and magnetron unit
07/10/2003US20030127319 Planar optical devices and methods for their manufacture
07/10/2003US20030127318 Method for sputtering TiNi shape-memory alloys
07/10/2003US20030127053 Apparatus and method for supplying cesium
07/10/2003US20030126945 Cemented carbide tool and method of making
07/10/2003US20030126742 Method of fabrication of ZnO nanowires
07/10/2003CA2469538A1 Sputter deposition process for electroluminescent phosphors
07/09/2003EP1326242A1 Reflecting layer, optical recording medium and sputtering target for forming reflecting layer
07/09/2003EP1326097A2 Process for forming a thin film and apparatus therefor
07/09/2003EP1325969A2 Ion plating method and system for forming a wiring on a semiconductor device
07/09/2003EP1325968A2 A composite material comprising a substrate and a barrier layer applied to the substrate
07/09/2003EP1325315A2 A method for quantifying the texture homogeneity of a polycrystalline material
07/09/2003EP1325169A2 Magnetic transparent conducting oxide film and method of making
07/09/2003EP1325167A2 Sputtertarget
07/09/2003EP1324958A1 Hydrophilic surfaces carrying temporary protective covers
07/09/2003EP1324822A1 Combinatorial systems and methods for coating with organic materials
07/09/2003EP1070155A4 Integrated ion implant scrubber system
07/09/2003EP1017338A4 Method of producing a film coating by matrix assisted pulsed laser deposition
07/09/2003EP0892860B1 Cathodic sputtering device
07/09/2003EP0758408B1 Rectangular vacuum-arc plasma source
07/09/2003CN2559654Y High-speed centrifugal functional material film forming device
07/09/2003CN1429405A Low relative permittivity SiOx film, production method, semiconductor device using the same
07/09/2003CN1428817A Film forming device and film forming method, and cleaning method