Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2003
07/31/2003US20030143340 Method for forming thin film with a gas cluster ion beam
07/31/2003US20030143326 Deposition of thin films using an infrared laser
07/31/2003US20030141788 Thin film, method for manufacturing thin film, and electronic component
07/31/2003US20030141187 Cesium vapor emitter and method of fabrication the same
07/31/2003US20030141184 Carrier position controlling profile; process control; optical coating
07/31/2003US20030141183 Annular cross-section; detachable target holder with screw fitting
07/31/2003US20030141176 Cracker apparatus
07/31/2003US20030140858 Reusable mass-sensor in manufacture of organic light-emitting devices
07/31/2003US20030140856 Apparatus and method for introducing small amounts of refractory elements into a vapor deposition coating
07/31/2003US20030140855 Physical properties of thermal barrier coatings using electron beam-physical vapor deposition
07/31/2003CA2473830A1 Refractrory metal and alloy refining by laser forming and melting
07/31/2003CA2468806A1 Method for improving the adhesion of a coating
07/30/2003EP1331288A2 Corrosion and abrasion resistant decorative coating
07/30/2003EP1331283A1 Tantalum or tungsten target-copper alloy backing plate assembly and production method therefor
07/30/2003EP1331282A2 Method for making decorative articles
07/30/2003EP1330642A1 Method for chlorine plasma modification of silver electrodes
07/30/2003EP1330561A2 Integrated phase separator for ultra high vacuum system
07/30/2003EP1330557A2 Sputter targets
07/30/2003EP1330418A2 Method of making coated articles and coated articles made thereby
07/30/2003EP1255876B1 Condensation coating method
07/30/2003EP1063317B1 Sputtering target, transparent conductive film, and method for producing the same
07/30/2003EP0905274B1 Method and device for applying porous coatings and cathode film of an electrolytic condenser
07/30/2003CN1433486A Coating system for high temperature stainless steel
07/30/2003CN1433247A Transparent conductive film, its production process and electroluminescent element with the film
07/30/2003CN1432858A Electronic circuit
07/30/2003CN1432662A Ornament surface treating method, ornament and chronometer
07/30/2003CN1432661A Metal layer forming process and laminated metal foil-based product
07/30/2003CN1432660A Vaporizer boat for lining coating device
07/30/2003CN1432444A Cutting tool with coated surface
07/30/2003CN1116438C Plasma polymerization enhancement of surface of metal for use in refrigerating and air conditioning
07/29/2003US6600127 Portions of anode and cathode are vaporized and ablated
07/29/2003US6600008 Aliphatic polyester film and gas barrier film
07/29/2003US6599821 Method for fabricating conductive line pattern for semiconductor device
07/29/2003US6599646 Magnetic recording medium
07/29/2003US6599584 For producing packaged beverages
07/29/2003US6599581 Method of fabricating jig for vacuum apparatus
07/29/2003US6599580 Method for improving electrical conductivity of a metal oxide layer on a substrate utilizing high energy beam mixing
07/29/2003US6599573 Vacuum plating, power coating glass sphere with metal
07/29/2003US6599569 Plastic containers with an external gas barrier coating, method and system for coating containers using vapor deposition, method for recycling coated containers, and method for packaging a beverage
07/29/2003US6599492 Onion-like carbon film and its production
07/29/2003US6599405 Recessed sputter target
07/29/2003US6599401 In-plane anisotropic tri-layered magnetic sandwich structure with large magnetoresistance effect
07/29/2003US6599400 Method for the manufacture of coatings and an article
07/29/2003US6599399 Semiconductors; activating electrons; using high density, low pressure plasma
07/29/2003US6599377 Wrought processing of brittle target alloy for sputtering applications
07/29/2003CA2117575C Biaxially oriented polypropylene metallized white film
07/24/2003WO2003060182A1 Method of treating a part in order to alter at least one of the properties thereof
07/24/2003WO2003060181A1 Bioactive device having surface with alloyed layer of calcium phosphate compounds and method of making
07/24/2003WO2003059532A1 High conductivity transparent conductor formed using pulsed energy process
07/24/2003WO2002061167A3 Target/backing plate assemblies
07/24/2003US20030139106 Corrosion and abrasion resistant decorative coating
07/24/2003US20030139039 Doped aluminum oxide dielectrics
07/24/2003US20030138999 Laser irradiation apparatus
07/24/2003US20030138611 Multilayer structure used especially as a material of high relative permittivity
07/24/2003US20030138554 Method for manufacturing electrode for lithium secondary battery
07/24/2003US20030137737 Color shifting carbon-containing interference pigments and foils
07/24/2003US20030137736 Color shifting carbon-containing interference pigments and foils
07/24/2003US20030137018 Article comprising an oxide layer on a GaAs-based semiconductor structure and method of forming same
07/24/2003US20030136671 Magnetron sputter source
07/24/2003US20030136670 Mobile plating system and method
07/24/2003US20030136662 Cylindrical target and its production method
07/24/2003US20030136514 Method of supercritical processing of a workpiece
07/24/2003US20030136470 Grain oriented electromagnetic steel sheet exhibiting extremely small watt loss and method for producing the same
07/24/2003US20030136428 Solution of hydrogen fluoride and nitric acid; then inert gas flow
07/24/2003US20030136343 Apparatus for sealing a vacuum chamber
07/23/2003EP1329912A1 Thin film rare earth permanent magnet, and method for manufacturing the permanent magnet
07/23/2003EP1329745A1 Method of forming optical thin film
07/23/2003EP1329526A1 High purity zirconium or hafnium, sputtering target comprising the high purity zirconium or hafnium and thin film formed using the target, and method for producing high purity zirconium or hafnium and method for producing powder of high purity zirconium or hafnium
07/23/2003EP1328982A2 Device enclosures and devices with integrated battery
07/23/2003EP1328341A1 Combinatorial coating systems and methods
07/23/2003EP1131838A4 Self-oriented bundles of carbon nanotubes and method of making same
07/23/2003CN1432071A Visibly marked parts and method for using same
07/23/2003CN1432070A Method of forming phsical gas phase deposition target contg. aluminium, sputtering film and component of target
07/23/2003CN1431851A Mask and its mfg. method, electroluminance device and its mfg. method and electronic machine
07/23/2003CN1431339A Crucible type evaporator source used for film plating machines in organic electrofluorescence type
07/23/2003CN1115718C Method for forming metal wiring of semiconductor devices
07/23/2003CN1115245C Multilayer material and its mfg. method
07/23/2003CA2416975A1 Corrosion and abrasion resistant decorative coating
07/22/2003US6597117 Plasma coil
07/22/2003US6597029 Nonvolatile semiconductor memory device
07/22/2003US6596635 Method for metallization of a semiconductor substrate
07/22/2003US6596614 Use of membrane properties to reduce residual stress in an interlayer region
07/22/2003US6596547 Methods of preventing reduction of IrOx during PZT formation by metalorganic chemical vapor deposition or other processing
07/22/2003US6596443 Mask for patterning devices
07/22/2003US6596417 Underlayer comprises a material selected from the group consisting of Ga3Pt5, Mn3Pd5, delta Ga3Ni5, InPt2, and Ni5Al3
07/22/2003US6596399 UV absorbing/reflecting silver oxide layer, and method of making same
07/22/2003US6596368 Organic substrate having optical layers deposited by magnetron sputtering and method for preparing it
07/22/2003US6596228 Titanium materials
07/22/2003US6596187 Method of forming a nano-supported sponge catalyst on a substrate for nanotube growth
07/22/2003US6596139 Discontinuous high-modulus fiber metal matrix composite for physical vapor deposition target backing plates and other thermal management applications
07/22/2003US6596138 Sputtering apparatus
07/22/2003US6596135 Sputtering target, transparent conductive film, and method for producing the same
07/22/2003US6596134 Method of fabricating transparent contacts for organic devices
07/22/2003US6596133 Thin film material layers; microelectronics; PVD target is offset from the central axis to provide material to the substrate at an angle; processing efficiency; copper
07/22/2003US6596132 Ion sputtering a hot pressed metal powder composition target fabricated from nickel, titanium, and hafnium; microns-thick thin films
07/22/2003US6596131 Bonding layer for metal or ceramic target
07/22/2003US6596091 Method for sweeping contaminants from a process chamber
07/22/2003US6595370 Particle filter
07/17/2003WO2003058679A2 System and method of processing composite substrate within a high throughput reactor
07/17/2003WO2003058672A1 Method of fabricating a coated process chamber component