Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/2003
08/14/2003US20030150713 Particularly, forming a tungsten oxycarbide coating on the surface of a substrate under a relatively low temperature of about 680 K or less to provide a product, such as machine tools, dies or machine parts
08/14/2003US20030150712 System and method for controlling thin film defects
08/14/2003US20030150559 Apparatus for supercritical processing of a workpiece
08/14/2003US20030150384 Aperture masks for circuit fabrication
08/14/2003US20030150382 Device for fabricating alignment layer
08/14/2003US20030150377 Silicon monoxide vapor deposition material, process for producing the same, raw material for producing the same, and production apparatus
08/14/2003US20030150100 Method for manufacturing disc-shaped optical recording medium and disc-shaped substrate for optical recording medium
08/14/2003DE10224722C1 High strength molded body used in the production of airplanes, vehicles spacecraft and implants in the medical industry is made from a titanium-based alloy
08/14/2003DE10205805C1 Apparatus for coating strips of material in vacuum has magnetrons mounted in housing fitted with screen over its top and inflatable seal between two
08/13/2003EP1335040A2 Method of forming a coating resistant to deposits and coating formed thereby
08/13/2003EP1334778A2 Rod for a coating device, and process for producing the same
08/13/2003EP1333935A1 Coating formation by reactive deposition
08/13/2003CN2565842Y Plane magnetic control sputtering target
08/13/2003CN1436369A Method for making substrates and resulting substrates
08/13/2003CN1436361A 磁控管溅射 Magnetron sputtering
08/13/2003CN1436111A Friction stir welding of metal matrix composites, ferrous alloys, non-ferrous alloys and superalloys using superabrasive tool
08/13/2003CN1436110A Friction stir welding using superabrasive tool
08/13/2003CN1435508A Method for sputtering plastic article with film and plastic article obtained thereby
08/13/2003CN1435507A Corrosion-resistant wear-resistant decoration coating
08/13/2003CN1435276A Photocatalyst titania film and method for mfg. same
08/12/2003US6605321 Method of treating materials by irradiation
08/12/2003US6605317 Organic-metallic complexes in which an organic complex and a labile metal salt are vaporised together or sequentially and the vapour condensed on to a substrate to form a film or layer, electroluminescent films with improved performance.
08/12/2003US6605313 vapor deposition of an anisotropic phosphor composition with an auto-collimating, optical waveguide structure.
08/12/2003US6605312 Depositing ultra-thin film by introducing power output into plasma of plasma chemical vapor deposition or plasma physical vapor deposition in form of a controlled number of power pulses
08/12/2003US6605199 Textured-metastable aluminum alloy sputter targets and method of manufacture
08/12/2003US6605198 Coaters having glow discharges, electrodes, targets, magnets, shields and power sources for filling grooves and coating wafers to form integrated circuit chips or magnetic transducer heads
08/12/2003US6605195 Source of power in electrical communication with the first target and the second target; and a switch for alternately connecting the source of power between the first target and the second target.
08/12/2003US6605160 Where the surface has an original chemical composition that varies with depth and at least a portion of the surface is missing from the substrate
08/07/2003WO2003065766A2 Heating in a vacuum atmosphere in the presence of a plasma
08/07/2003WO2003065132A2 Method and apparatus for process monitoring and control
08/07/2003WO2003064722A1 Copper alloy sputtering target and method for manufacturing the target
08/07/2003WO2003064721A2 Cesium vapor emitter and method of fabricating the same
08/07/2003WO2003064720A1 Method for depositing metal-free carbon layers
08/07/2003WO2003064719A1 Method and arrangement for deposition of a black coating under vacuum
08/07/2003WO2003064085A1 Coated cutting tool member having hard coating layer and method for forming the hard coating layer on cutting tool
08/07/2003US20030148871 Films, which are formed into films in a stable and efficient manner through sputtering or the like, sputtering targets of the sintered products, and transparent electroconductive glass and films formed from the targets and is transparent
08/07/2003US20030148146 Hard layer-coated tool
08/07/2003US20030148145 Hard wear resistant film, process for forming hard film, and target used to form hard film
08/07/2003US20030148140 High temperature corrosion resistant alloy, thermal barrier coating material, and gas turbine using high temperature corrosion resistant alloy
08/07/2003US20030148102 Tetrahedral amorphous carbon film and method of making same
08/07/2003US20030148078 Polyimide film which has undergone surface roughening treatment to produce a surface Ra value of 2 to 10 nm, an intermediate layer 2 formed from one, or two or more elements selected from a group consisting of molybdenum, silicon and
08/07/2003US20030148038 Thin film, method and apparatus for forming the same, and electronic component incorporating the same
08/07/2003US20030148027 Method and apparatus for forming coated units
08/07/2003US20030148021 Manufacturing apparatus and method for manufacturing an organic electroluminescence panel
08/07/2003US20030147084 Apparatus for devices for determining properties of applied layers
08/07/2003US20030146485 Method of etching an object, method of repairing pattern, nitride pattern and semiconductor device
08/07/2003US20030146088 Apparatus and method for forming optical coating using negatively charged ions
08/07/2003US20030146087 Using magnetrons; reducing power sources, erosion; controlling scanning position of magnet; thin film transistor, liquid crystal display
08/07/2003US20030146085 Single piece pod shield for vertical plenum wafer processing machine
08/07/2003US20030146084 Posiitoning in vacuum; magnetron sputtering ferromagnetic material on wafer
08/07/2003US20030146083 Passive bipolar arc control system and method
08/07/2003US20030145792 Thin film, method and apparatus for forming the same, and electronic component incorporating the same
08/07/2003US20030145681 Catalyst on catalyst support; vaporization, condensation
08/07/2003DE19981324C2 Verfahren zur Herstellung eines Sputtertargetmaterials A method for producing a Sputtertargetmaterials
08/06/2003EP1333106A1 Process and installation for depositing a black-colored coating on a substrate
08/06/2003EP1332652A2 Mechanism for prevention of neutron radiation in ion implanter beamline
08/06/2003EP1332512A2 Ion beam deposition targets having an interlocking interface and a replaceable insert
08/06/2003EP1332240A2 Methods of forming sputtering targets
08/06/2003EP1332239A1 Deposition of thin films by laser ablation
08/06/2003EP1332238A1 Metallized film, method for the production thereof, and its use
08/06/2003EP1178873B1 Superhard material article of manufacture
08/06/2003EP1173629B1 Vacuum cathodic arc evaporation process for the preparation of wear resistant coatings
08/06/2003EP1088114B1 A composite material comprising a substrate with a barrier layer
08/06/2003EP0885451B1 Transparent contacts for organic devices
08/06/2003CN1434879A Method of depositing IO ITO thin film on polymer substrate
08/06/2003CN1434878A Robotic manipulation system utilizing patterned granular motion
08/06/2003CN1434271A Base material for strain gauge and making method thereof
08/06/2003CN1117390C System and method for neutralizing ion beam using water vapor
08/06/2003CN1117174C Vacuum evaporation coating method and equipment for organic foamed material
08/05/2003US6603637 Ion beam treatments for magnetic recording heads and magnetic recording media
08/05/2003US6603601 Infrared laser optical element and manufacturing method therefor
08/05/2003US6603159 System and methods for manufacturing and using a mask
08/05/2003US6602793 Pre-clean chamber
08/05/2003US6602588 Superconducting structure including mixed rare earth barium-copper compositions
08/05/2003US6602587 Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges
08/05/2003US6602559 High quality, solvent free atomization or vaporization application of flat, strongly adhering laminate
08/05/2003US6602558 Non-linear optical silica thin film manufacturing method and non-linear optical silica element
08/05/2003US6602549 Indium source reagent composition, and use thereof for deposition of indium-containing films on subtrates and ion implantation of indium-doped shallow junction microelectronic structures
08/05/2003US6602542 Device for cleaning an article
08/05/2003US6602390 Coating a workpiece and operating a cathodic arc discharge
08/05/2003US6602347 Apparatus and method for processing a substrate
07/2003
07/31/2003WO2003063243A1 Thin films, structures having thin films, and methods of forming thin films
07/31/2003WO2003063226A2 Oxide layer on a gaas-based semiconductor structure and method of forming the same
07/31/2003WO2003063200A2 Method for improving the adhesion of a coating
07/31/2003WO2003062491A2 Refractrory metal and alloy refining by laser forming and melting
07/31/2003WO2003062489A1 Motorized chamber lid
07/31/2003WO2003062488A1 High-purity nickel or nickel alloy sputtering target, and its manufacturing method
07/31/2003WO2003062487A1 Target of high-purity nickel or nickel alloy and its producing method
07/31/2003WO2003062486A1 Linear or planar type evaporator for the controllable film thickness profile
07/31/2003WO2003061884A1 Surface coated cutting tool member having hard coating layer exhibiting excellent abrasion resistance in high-speed cutting, and method for forming said hard coating layer on surface of cutting tool
07/31/2003WO2003061859A1 Cleaning process residues on a process chamber component
07/31/2003WO2003061852A1 Method to rough size coated components for easy assembly
07/31/2003WO2003061840A1 Method of pulsed laser assisted surface modification
07/31/2003US20030144150 Substrate structure for growth of highly oriented and/or epitaxial layers thereon
07/31/2003US20030143868 Method and apparatus for ionization film formation
07/31/2003US20030143834 Low relative permittivity siox film, production method, semiconductor device comprising the film
07/31/2003US20030143820 Method for processing semiconductor wafers in an enclosure with a treated interior surface
07/31/2003US20030143438 Buffer architecture for biaxially textured structures and method of fabricating same
07/31/2003US20030143437 Having antibacterial action, anti-pollution, air purification, ultra high hydrophilicity and the like on a substrate
07/31/2003US20030143435 For use as antireflection layer, as a diffusion barrier layer, as a sublayer of an antireflection layer and/or as an upper cover layer
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