Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/2003
08/27/2003EP1171645A4 Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
08/27/2003EP1021265A4 Intermetallic aluminides and silicides sputtering targets, and methods of making same
08/27/2003EP0944480B1 Security element and method for producing same
08/27/2003CN1439062A Surface alloyed high temperature alloys
08/27/2003CN1438826A Preparation of organic luminous device using organic material
08/27/2003CN1438692A Semiconductor wiring formation method and apparatus, device making method and apparatus and wafer
08/27/2003CN1438506A Film wave-filter for optical multiplying device/demultiplying device
08/27/2003CN1438357A Surface treatment source
08/27/2003CN1438356A Multihead ion film-plating method for ceramic product
08/27/2003CN1438355A Method for preparing anisotropic magnetic resistance permalloy film
08/27/2003CN1438076A Water-proof part and ink-spraying-head making method
08/26/2003US6611576 Automated control of metal thickness during film deposition
08/26/2003US6611087 Method and apparatus for simultaneously depositing and observing materials on a target
08/26/2003US6610987 Apparatus and method of ion beam processing
08/26/2003US6610597 Method of fabricating a semiconductor device
08/26/2003US6610428 Controlled conversion of metal oxyfluorides into superconducting oxides
08/26/2003US6610373 Magnetic film-forming device and method
08/26/2003US6610360 Scratch resistance (SR) of a coated article is improved by buffing the coated article after deposition of the layer(s) of the coating. For example, in certain embodiments a diamond-like carbon (DLC) inclusive layer(s) is deposited on a
08/26/2003US6610357 Applying a tension to a metallic foil so as to pull an area of the metallic foil on which a thin film of active material is deposited, from the both sides in the direction of longitude; metallic foil serving as a current collector.
08/26/2003US6610352 Multiple source deposition process
08/26/2003US6610184 Magnet array in conjunction with rotating magnetron for plasma sputtering
08/26/2003US6610181 Method of controlling the formation of metal layers
08/26/2003US6610180 Substrate processing device and method
08/26/2003US6610179 System and method for controlling deposition thickness using a mask with a shadow that varies with respect to a target
08/26/2003US6610141 For use in electrically excited devices such as light emitting devices (LEDs), laser diodes (LDs), field effect transistors (FETs), photodetectors, and transducers
08/26/2003US6609877 Vacuum chamber load lock structure and article transport mechanism
08/21/2003WO2003069612A1 Sputtering target containing zinc sulfide as major component, optical recording medium on which phase change optical disk protective film containing zinc sulfide as major component is formed by using the target, and method for manufacturing the sputtering target
08/21/2003WO2003069381A2 Optical component comprising submicron hollow spaces
08/21/2003WO2003069016A2 In-line deposition processes for circuit fabrication
08/21/2003WO2003069015A2 Aperture masks for circuit fabrication
08/21/2003WO2003069014A1 Aperture masks for circuit fabrication
08/21/2003WO2003069013A2 Plasma processing apparatus
08/21/2003WO2003068868A2 Method of producing plane-parallel structures of silicon suboxide, silicon dioxide and/or silicon carbide, plane-parallel structures obtainable by such methods, and the use thereof
08/21/2003WO2003068503A1 Novel friction and wear-resistant coatings for tools, dies and microelectromechanical systems
08/21/2003WO2003068383A1 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
08/21/2003WO2002084702A3 Sputtering deposition apparatus and method for depositing surface films
08/21/2003WO2002054453A9 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
08/21/2003US20030157742 Concentration of oxygen in the vicinity of the interface between the resin thin film and the metal thin film is higher than a concentration of oxygen in a middle portion of the resin thin film in its thickness direction
08/21/2003US20030157733 Method of molecular-scale pattern imprinting at surfaces
08/21/2003US20030157373 For performing high density recording
08/21/2003US20030157370 Magnetic recording medium and method for manufacturing the same
08/21/2003US20030157347 Methods for replication, replicated articles, and replication tools
08/21/2003US20030157346 Gas Barrier film
08/21/2003US20030157271 Method and apparatus for pulse-position synchronization in miniature structures manufacturing processes
08/21/2003US20030157269 Method and apparatus for precision coating of molecules on the surfaces of materials and devices
08/21/2003US20030157255 Transporting particles of a water repellent material with a gas; discharging transported particles from a nozzle to the substrate to form the water repellent film on the surface of the substrate
08/21/2003US20030157253 Bomb annealing of thin films
08/21/2003US20030157242 Method and apparatus for plasma processing
08/21/2003US20030155533 Ion implanting method and apparatus
08/21/2003US20030155236 Sputter device
08/21/2003US20030155235 Sputtering target producing few particles
08/21/2003US20030155234 Shutter disk and blade alignment sensor
08/21/2003US20030155229 Hafnium silicide target for gate oxide film formation and its production method
08/21/2003US20030155043 Vapor depositing aluminum at a low temperature, forming titanium aluminide and alumina surface covering layer; protective inorganic coatings; aircraft heat exchanger
08/21/2003US20030155000 Removing water, desorption by feeding second polar gas molecules, inert gas, nitrogen, or ammonia; processing semiconductor and microelectronics
08/21/2003DE10214973C1 Contact layer system used as an electrical contact comprises three individual metal or alloy layers arranged on a substrate
08/21/2003CA2475589A1 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
08/21/2003CA2474640A1 Method of producing plane-parallel structures of silicon suboxide, silicon dioxide and/or silicon carbide, plane-parallel structures obtainable by such methods, and the use thereof
08/20/2003EP1337132A1 Using organic materials in making an organic light-emitting device
08/20/2003EP1336985A1 Sputtering cathode, and device and method for coating a substrate with a plurality of layers
08/20/2003EP1336637A1 Gas barrier film
08/20/2003EP1336190A2 Hybrid scanning system and methods for ion implantation
08/20/2003EP1336188A2 Extraction and deceleration of low energy beam with low beam divergence
08/20/2003EP1336069A1 Plastic pipe with a barrier lager
08/20/2003EP1335995A1 Method for producing an evaporation source
08/20/2003EP1335994A2 Physical vapor deposition target assemblies, and methods of forming physical vapor deposition target assemblies
08/20/2003EP1244515B1 Production of material libraries using sputter methods
08/20/2003EP1183405B1 Method for vacuum treatment of workpieces and vacuum treatment facility
08/20/2003EP0874697B1 Permeable solar control film
08/20/2003CN1437659A Physical vapor deposition targets comprising Ti and Zr and using method
08/20/2003CN1437191A Tetrahedral amorphous carbon film and producing method thereof
08/20/2003CN1436605A Coating roller in coating apparatus and producing method thereof
08/20/2003CN1118655C Dual-walled exhaust tube assembly for vacuum pump and restructuring method thereof
08/20/2003CN1118587C Process for producing hydrophobic rutile film by reinforced and magnetically controlled DC sputtering
08/20/2003CN1118586C Electric arc type ion plating device
08/20/2003CN1118349C Surface treatment method utilizing discharge in liquid
08/19/2003US6608378 Formation of metal oxide gate dielectric
08/19/2003US6608353 Thin film transistor having pixel electrode connected to a laminate structure
08/19/2003US6608315 Mechanism for prevention of neutron radiation in ion implanter beamline
08/19/2003US6607869 Substrates having recording, reflective, light interference and protective multilayers used for reverse phase change recording; disks
08/19/2003US6607846 Covering substrates surfaces with platinum, palladium and/or alloys by plating, welding or vapor deposition to improve chemical resistance
08/19/2003US6607790 Plasma-enhanced vapor deposition of halogen and silicon dioxide from tetraethoxysilane and halogen compound
08/19/2003US6607640 Supplying heating or cooling backside inert gas to mounted biased support maintaining pressure thereby improving thickness uniformity and morphology of sputter depositing metal seed layer; semiconductors
08/19/2003US6607612 Magnetic alloy and magnetic recording medium and method for preparation thereof, and target for forming magnetic film and magnetic recording device
08/19/2003US6607598 Device for protecting medical devices during a coating process
08/14/2003WO2003067571A1 Cymbals, strings and components for musical instruments and a method of treating therefor
08/14/2003WO2003066929A2 Textured-metastable aluminum alloy sputter targets
08/14/2003WO2003066928A1 Non-stoichiometric niox ceramic target
08/14/2003WO2003066914A1 High-purity spongy titanium material and its production method
08/14/2003WO2003066237A1 Method and apparatus for forming coated units
08/14/2003US20030153180 Method and system of forming semiconductor wiring, method and system of fabrication semiconductor device, and wafer
08/14/2003US20030153109 Using organic materials in making an organic light-emitting device
08/14/2003US20030152867 Information recording medium and its manufacturing method
08/14/2003US20030152814 Hybrid thermal barrier coating and method of making the same
08/14/2003US20030152797 Depositing platinum-group metal on component, codepositing by physical vapor deposition first and second ceramic coatings with columnar grains so outer coating is mixture, second ceramic increasing resistance to infiltration, diffusing metal
08/14/2003US20030152691 Aperture mask patterns; elongated web of flexible film; integrated circuits
08/14/2003US20030151118 Aperture masks for circuit fabrication
08/14/2003US20030151004 Method of controlling electrostatic lens and ion implantation apparatus
08/14/2003US20030150721 Cathode arc source for generating positive carbon ions from cathode target including means arranged to generate magnetic field having direction substantially normal to front surface of target and zero field strength above target, inside chamber
08/14/2003US20030150720 Plasma processing apparatus
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