Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
09/2003
09/10/2003CN1120899C Method for producing indium oxide/tin oxide sputtering target
09/10/2003CN1120898C Process for preparing La-Ca-Mn-O film with sequencial surface structure
09/10/2003CN1120897C Method for growing single-orientated lead zircotitanate film on silicon chip
09/09/2003US6617594 Method and device for ion implanting
09/09/2003US6617574 Apparatus for in-situ thickness and stoichiometry measurement of thin films
09/09/2003US6617539 Laser heating apparatus
09/09/2003US6617283 Single lanthanum metal oxide epitaxial buffer layer disposed on and in contact with said surface of said substrate, and an electromagnetically active layer disposed on and in contact with said single epitaxial buffer layer.
09/09/2003US6617231 Method for forming a metal extrusion free via
09/09/2003US6617178 Test system for ferroelectric materials and noble metal electrodes in semiconductor capacitors
09/09/2003US6617062 Strain-relieved tunable dielectric thin films
09/09/2003US6617058 Acts to reduce friction and as a wear-protective layer.
09/09/2003US6617057 Pairs of a metal layer and a ceramic metal compound layer; high wear resistance and hardness and low surface roughness.
09/09/2003US6617056 Transparent conductive laminate, its manufacturing method, and display comprising transparent conductive laminate
09/09/2003US6617044 Surface treating process, surface treating apparatus, vapor-depositing material, and rare earth metal-based permanent magnet with surface treated
09/09/2003US6616818 Apparatus and method for coating substrates
09/09/2003US6616816 Substrate processing device and method
09/09/2003US6615547 Lock for vacuum chamber
09/04/2003WO2003073460A1 Faraday shields and plasma wafer processing
09/04/2003WO2003072849A1 Method of making self-cleaning substrates
09/04/2003WO2003072848A1 Method and device for manufacturing semiconductor or insulator/metallic laminar composite cluster
09/04/2003WO2003072847A1 Vacuum deposition of powdered phosphor
09/04/2003WO2003072846A1 A method of depositing a barrier layer
09/04/2003WO2003072355A1 Gas barrier material
09/04/2003WO2003056056A3 Sputter deposition process for electroluminescent phosphors
09/04/2003WO2002016666A3 Sputtering targets
09/04/2003US20030166311 Method for patterning, method for forming film, patterning apparatus, film formation apparatus, electro-optic apparatus and method for manufacturing the same, electronic equipment, and electronic apparatus and method for manufacturing the same
09/04/2003US20030165707 Porous getter devices with reduced particle loss and method for manufacturing same
09/04/2003US20030165694 Radiation transparent overcoatings on glass substrate; heat resistance, discoloration inhibition
09/04/2003US20030165693 Thin film coating having transparent base layer
09/04/2003US20030165639 Sputtering target assembly and sputtering apparatus using the same
09/04/2003US20030165635 Method for selectively removing hydrogen from molecules
09/04/2003US20030164998 Planarizing with an ion beam at least one layer of amorphous material
09/04/2003US20030164290 Method of forming an ITO layer on a heat-sensitive substrate
09/04/2003US20030164289 Methods of making and using freestanding reactive multilayer foils
09/04/2003US20030164287 For uniformly implanting a large amount of particles having low energy into a substrate by sputtering
09/03/2003EP1340836A1 Composite element and method for preparation thereof
09/03/2003EP1340833A1 Hybrid thermal barrier coating and method of making the same
09/03/2003EP1340119A2 Improving the stability of ion beam generated alignment layers by surface modification
09/03/2003EP1340106A2 Protective overcoat for replicated diffraction gratings
09/03/2003EP1339894A2 Hollow cathode target and methods of making same
09/03/2003EP1339893A1 Method for cold process deposition of an antiglare layer
09/03/2003EP1339892A1 Method of making coated cemented carbide cutting tools
09/03/2003EP1339625A1 Throughput enhancement for single wafer reactor
09/03/2003EP1250470B1 Nano-material
09/03/2003EP1144718A4 Indium source reagent compositions
09/03/2003EP1053377B1 Vehicle door latch mechanism
09/03/2003EP0964741B1 Method for improving vacuum in a very high vacuum system
09/03/2003CN2570304Y Automatic arc starting electron gun
09/03/2003CN1440222A Manufacturing system and method, operational method therefor and luminating device
09/03/2003CN1440053A P-ZnO thin film and preparation thereof
09/03/2003CN1439798A Mixed thermal shield coating and its manufacture
09/03/2003CN1439748A Crystal film for components to emit blue light and preparation thereof
09/03/2003CN1439740A Planar magnetic control sputtering cathode with double-faced sputter
09/02/2003US6614117 Method for metallization of a semiconductor substrate and related structure
09/02/2003US6614065 Use of membrane properties to reduce residual stress in an interlayer region
09/02/2003US6614027 Method of controlling electrostatic lens and ion implantation apparatus
09/02/2003US6613448 Magnetoresistance effect film and method of forming same
09/02/2003US6613393 Depositing a wear protection matrix with the aid of a PECVD method, and incorporating optically functional inclusions in the form of particles or intermediate layers with the aid of a PVD process. The chemistry of the inclusion is influenced by
09/02/2003US6613240 Method and apparatus for smoothing thin conductive films by gas cluster ion beam
09/02/2003US6613204 Pretreatment process for a surface texturing process
09/02/2003US6613088 Coated ophthalmic and implantable devices and methods for producing same
08/2003
08/28/2003WO2003071579A1 Sputtering cathode and device and method for coating a substrate with several layers
08/28/2003WO2003071577A2 Channel spark source for generating a stable, focussed electron beam
08/28/2003WO2003071531A1 Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target
08/28/2003WO2003071002A1 Elevated temperature oxidation protection coatings for titanium alloys and methods preparing the same
08/28/2003WO2003071000A1 Method and device for coating a substrate
08/28/2003WO2003070999A1 Piston ring comprising a pvd coating
08/28/2003WO2003070998A1 Method and apparatus for ion beam coating
08/28/2003WO2003070659A1 Sintered object of silicon monoxide and method for producing the same
08/28/2003WO2003070641A1 Piezoelectric body, manufacturing method thereof, piezoelectric element having the piezoelectric body, inject head, and inject type recording device
08/28/2003WO2003023814A3 Flat magnetron sputter apparatus
08/28/2003WO2002103090A3 A method of growing a semiconductor layer
08/28/2003US20030162391 Barrier layer and method of depositing a barrier layer
08/28/2003US20030162314 Fabrication system and a fabrication method of light emitting device
08/28/2003US20030162094 Buried anode lithium thin film battery and process for forming the same
08/28/2003US20030162055 Chemically ordered, cobalt-three platinum alloys for magnetic recording
08/28/2003US20030162048 Bimorphic, compositionally-graded, sputter-deposited, thin film shape memory device
08/28/2003US20030162033 Method of making self-cleaning substrates
08/28/2003US20030161986 Optically functional element and production method and application therefor
08/28/2003US20030161969 Energetic vapor deposition means are addressed through the introduction of a novel means of vapor deposition, namely, an Electron-Assisted Deposition (EAD) process and apparatus. The EAD mode of film growth disclosed is generally achieved by
08/28/2003US20030161944 Vacuum deposition of powdered phosphor
08/28/2003US20030161695 Chromium-containing cemented carbide body having a surface zone of binder enrichment
08/28/2003US20030161601 Thin film coating process and thin film coated optical components
08/28/2003US20030160563 Electroluminescent device with drying film and method for fabricating the same
08/28/2003US20030160329 Dielectric devices having multi-layer oxide artificial lattice and method for fabrication the same
08/28/2003US20030159926 Configurable vacuum system and method
08/28/2003US20030159925 Spattering device
08/28/2003US20030159920 Self-supporting metal thin film; medical equipment; sputtering onto substrate, then removing substrate
08/28/2003US20030159919 Multilayer stacks of magnetic disks; adjusting disk carrier
08/28/2003US20030159782 Modified transfer function deposition baffles and high density plasma ignition therewith in semiconductor processing
08/28/2003US20030159778 Plasma processing apparatus, protecting layer therefor and installation of protecting layer
08/28/2003US20030159711 Detecting the endpoint of a chamber cleaning
08/28/2003DE10205167C1 Inline vacuum deposition device used for treating substrates has a buffer chamber having an inlet side and an outlet side in the region of a discontinuous transport
08/28/2003CA2477258A1 Method and apparatus for ion beam coating
08/27/2003EP1338673A1 Vacuum evaporation system and coating method
08/27/2003EP1338672A1 Piezoelectric thin film and method for preparation thereof, and piezoelectric element having the piezoelectric thin film, ink-jet head using the piezoelectric element, and ink-jet recording device having the ink-jet head
08/27/2003EP1337699A1 Tool and method for in situ vapor phase deposition source material reloading and maintenance
08/27/2003EP1337684A1 Vacuum metalization process for chroming substrates
08/27/2003EP1337683A1 Method for automatic organisation of microstructures or nanostructures and related device obtained
08/27/2003EP1337682A2 Physical vapor deposition targets, and methods of fabricating metallic materials