Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2003
11/05/2003EP1358361A1 Robotic manipulation system utilizing patterned granular motion
11/05/2003EP1198430B1 Hard, scratch-resistant coatings for substrates
11/05/2003EP1115950B1 Doctor rod for a coating device
11/05/2003EP1099227B1 Light colored, electrically conductive coated particles
11/05/2003CN2584614Y Program-control electric pulse type multifunction ion bombardment furnace
11/05/2003CN1453624A Method for forming pattern thin film electric conduction structure on base plate
11/05/2003CN1453392A Prepn of In-Sn oxide target material
11/05/2003CN1453391A Film forming apparatus and method
11/05/2003CN1453390A Prepn of rich-rhenium high-smelting point alloy layer capable of stopping bidirectional diffusion of elements
11/05/2003CN1453389A Mask for vacuum vapour plating and organic electroluminescent display panel produced with the same mask
11/05/2003CN1127129C Method for controllinkg thickness of layers formed by deposition equipment for processing semiconductors
11/05/2003CN1127113C Metal nano particle/medium composite photoelectric film, manufacture and application thereof
11/04/2003US6642484 Glass, ceramic plate with recesses; high temperature infrared radiators
11/04/2003US6641985 Method for making element
11/04/2003US6641940 Low loss dielectric materials for microwave applications
11/04/2003US6641937 Transparent conductive film and process for producing the film
11/04/2003US6641934 Soft magnetic material, magnesium oxide layer and alloy of iron-platinum, cobalt-platinum or iron-palladium; high signal output and resolution; magnetic recording media
11/04/2003US6641921 Metallized film and decorative articles made therewith
11/04/2003US6641887 Optical recording medium
11/04/2003US6641863 Forming by vapor deposition thin film made of the inorganic solid electrolyte on base member being heated so that thin film is allowed to have an ionic conductance higher than that of thin film formed on base member without being heated
11/04/2003US6641767 Methods for replication, replicated articles, and replication tools
11/04/2003US6641704 Mix ratio of the metal elements is different individually for each of the target materials, are disposed in a chamber of a sputtering apparatus.
11/04/2003US6641703 Magnetic multi-layer film manufacturing apparatus
11/04/2003US6641702 Sputtering device
11/04/2003US6641697 Erosion resistant member that may be used in the processing of a substrate in a plasma of a processing gas
11/04/2003US6641674 Movable evaporation device
11/04/2003US6641673 Fluid injector for and method of prolonged delivery and distribution of reagents into plasma
11/04/2003CA2292769C A titanium nitride diffusion barrier for use in non-silicon technologies and metallization method
10/2003
10/30/2003WO2003090319A1 Electrical connectors incorporating low friction coatings and methods for making them
10/30/2003WO2003090272A2 Methods for the formation of thin film layers using short-time thermal processes
10/30/2003WO2003090248A2 Reducing particle generation during sputter deposition
10/30/2003WO2003089679A1 Process of masking cooling holes of a gas turbine component
10/30/2003WO2003065132A3 Method and apparatus for process monitoring and control
10/30/2003WO2003032406A3 A process for large-scale production of cdte/cds thin film solar cells
10/30/2003US20030203638 Thermal physical vapor deposition apparatus with detachable vapor source(s)
10/30/2003US20030203622 Low via resistance system
10/30/2003US20030203219 Plastic article with a film sputter deposited thereon
10/30/2003US20030203173 Artifact with transparent and protective anti-iridescent surface layer and finishing method therefor
10/30/2003US20030203127 Electron beam vapor deposit an ingot of yttria-stabilized zirconia on first article, by heating, melting and evaporating, and heat transfer to deposit on the second article
10/30/2003US20030203123 Plasma enhanced chemical vapor deposition (PECVD)
10/30/2003US20030203108 Coating device and method
10/30/2003US20030203101 Process for forming a patterned thin film conductive structure on a substrate
10/30/2003US20030202248 Photochromic resistant materials for optical devices in plasma environments
10/30/2003US20030201711 Mask for vacuum deposition and organic EL display manufactured by using the same
10/30/2003US20030201397 Method and apparatus for simultaneously depositing and observing materials on a target
10/30/2003US20030201240 Maintenance method and system for plasma processing apparatus
10/30/2003US20030201174 Magnetron sputtering source and chamber therefor
10/30/2003US20030201173 Substrate coated with an MgO-layer
10/30/2003US20030201165 Concurrent sputtering; vacuum deposition; generating glow discharges
10/30/2003US20030201164 Method of making electrically conductive, IR transparent metal oxide films
10/30/2003US20030201163 Application of antistatic/antireflective coating to a video display screen
10/30/2003US20030201162 Monitoring optical emission; determination power spectra
10/29/2003EP1357583A1 Sheet-fed treating device
10/29/2003EP1357577A1 Arc-coating process with rotating cathodes
10/29/2003EP1357201A1 Process to form a composition-gradient ceramic layer by electron-beam PVD
10/29/2003EP1357200A1 Thermal PVD apparatus with detachable vapor source(s)
10/29/2003EP1356507A1 Capping layer for improved silicide formation in narrow semiconductor structures
10/29/2003EP1356501A2 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
10/29/2003EP1356496A1 Apparatus for evaporation of materials for coating of objects
10/29/2003CN2583111Y Selective film-coating device
10/29/2003CN1452771A Reflecting layer, optical recording medium having same and sputtering target for forming reflecting layer
10/29/2003CN1452668A Cylindrical target and method of mfg. same
10/29/2003CN1452438A Method and apparatus for mfg. luminant device
10/29/2003CN1452010A Mask and electroluminescent device and method for mfg. same, and electronic apparatus
10/29/2003CN1125992C Mechanism for imparting water repellency to both sides simultaneously
10/29/2003CN1125719C Diamond coated tools and process for making
10/28/2003US6639233 Apparatus for implanting an ion on a target and method for the same
10/28/2003US6638857 E-beam deposition method and apparatus for providing high purity oxide films
10/28/2003US6638648 First intermediate layer having face-centered cubic structure and containing non-magnetic elements excluding platinum, magnetic recording layer containing cobalt, chromium and platinum having hexagonal close-packed structure
10/28/2003US6638598 Laminates having a buffer layer and cover layer
10/28/2003US6638569 Apparatus and method for coating substrates with vacuum depositable materials
10/28/2003US6638474 method of making cemented carbide tool
10/28/2003US6638403 Plasma processing apparatus with real-time particle filter
10/28/2003US6638402 Ring-type sputtering target
10/23/2003WO2003088445A2 Apparatus and method for arc detection
10/23/2003WO2003088370A2 Hermetic encapsulation of organic electro-optical elements
10/23/2003WO2003088354A2 Method for producing a copy protection for an electronic circuit and corresponding component
10/23/2003WO2003088347A2 Method for connecting substrates and composite element
10/23/2003WO2003088340A2 Method for the production of structured layers on substrates
10/23/2003WO2003088325A1 Gas driven planetary rotation apparatus and methods for forming silicon carbide layers
10/23/2003WO2003088217A1 Vertical magnetic recording medium, method for producing the same and magnetic recorder
10/23/2003WO2003087948A1 Attenuated embedded phase shift photomask blanks
10/23/2003WO2003087426A2 Coating installation
10/23/2003WO2003087424A1 Method for forming housings for electronic components and electronic components that are hermetically encapsulated thereby
10/23/2003WO2003087423A1 Method for coating metal surfaces and substrate having a coated metal surface
10/23/2003WO2003087233A2 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
10/23/2003WO2003086958A2 Method for producing a product having a structured surface
10/23/2003WO2003066929A3 Textured-metastable aluminum alloy sputter targets
10/23/2003WO2003043066A3 Layered structures
10/23/2003WO2003038141A3 Method for producing a uv-absorbing transparent wear protection layer
10/23/2003WO2002097157A3 Modified diamond-like carbon (dlc) layer structure
10/23/2003US20030199144 Mask, method of manufacturing a mask, method of manufacturing an organic electroluminescence device, and organic electroluminescence device
10/23/2003US20030198816 Multilayer; using sputtering target; infrared radiation reflection
10/23/2003US20030198752 Film forming method
10/23/2003US20030198744 Pressurization; vapor deposition; sublimination
10/23/2003US20030198735 Composite device and manufacturing method therefor
10/23/2003US20030197155 Having a reduced amount of hetero-phase precipitate as an impurity; bandpass filters used for a base station receiver in a mobile telecommunication system; controlled heating of the mercury gas independent of the pressure control
10/23/2003US20030196891 Substrate composed of a carbon-containing material is exposed to generated vacuum ultraviolet light
10/23/2003US20030196890 Placing substrate in chamber; providing a deposition shield having a textured surface about substrate; providing isostatically pressed and sintered sputtering target facing substrate; applying electrical power and magnteic field
10/23/2003US20030196604 Padded clamp ring with edge exclusion for deposition of thick AlCu/AlSiCu/Cu metal alloy layers