Patents for B24B 53 - Devices or means for dressing or conditioning abrasive surfaces (5,132)
03/2003
03/13/2003US20030049993 Semiconductor polishing apparatus and method of detecting end point of polishing semiconductor
03/12/2003EP1140425B1 An abrasive machine for machining a surface of a cylindrical work piece
03/11/2003US6531399 Polishing method
03/11/2003US6531037 Removable electrode
03/11/2003US6530827 Apparatus for polishing wafer and method of doing the same
03/11/2003US6530825 Method for the production of glass substrates for magnetic recording mediums
03/06/2003WO2003019638A1 Constant ph polish and scrub
03/06/2003US20030045222 Metal-less bond grinding stone, and electrolytic dressing grinding method and apparatus using the grinding stone
03/06/2003US20030045207 Apparatus and method for enhanced processing of microelectronic workpieces
03/06/2003US20030045206 Chemical mechanical polishing system and process
03/05/2003EP1287949A2 Metal-less bond grinding stone, and electrolytic dressing grinding method and apparatus using the grinding stone
02/2003
02/26/2003EP1285726A2 Centerless grinding method for barshape work centerless grinder
02/25/2003US6524523 Method for forming dresser of chemical mechanical polishing pad
02/20/2003US20030036343 Machining strain removal apparatus
02/20/2003US20030036341 Conditioner for polishing pad and method for manufacturing the same
02/19/2003EP1283761A1 Method for grinding metallic workpieces containing, in particular, nickel
02/18/2003US6520843 High planarity chemical mechanical planarization
02/13/2003US20030032374 Apparatus and method for transferring a torque from a rotating hub frame to a one-piece hub shaft
02/13/2003US20030032372 Substrate polishing apparatus
02/13/2003DE20216054U1 Grinding machine control rotates brush wheel to contact grinding wheel to clean it
02/11/2003US6517424 Chromium and amorphous diamond or chromium nitride, bonding strength
02/11/2003US6517419 Shaping polishing pad for small head chemical mechanical planarization
02/11/2003US6517416 Chemical mechanical polisher including a pad conditioner and a method of manufacturing an integrated circuit using the chemical mechanical polisher
02/11/2003US6517414 Method and apparatus for controlling a pad conditioning process of a chemical-mechanical polishing apparatus
02/06/2003WO2003009966A1 Ultrasonic conditioning device cleaner for chemical mechanical polishing systems
02/06/2003US20030027507 Dressing of grinding tools for gear grinding
02/06/2003US20030027504 Chemical mechanical polish pad conditioning device
02/06/2003US20030027424 Feedforward and feedback control for conditioning of chemical mechanical polishing pad
02/05/2003CN1394718A Method for repairing and maintaining grinding board by using double-board grinding machine
02/04/2003US6514129 Multi-action chemical mechanical planarization device and method
02/04/2003US6514127 Conditioner set for chemical-mechanical polishing station
02/04/2003US6514126 Pad conditioner coupling and end effector for a chemical mechanical planarization system and method therefor
02/04/2003US6514121 Polishing chemical delivery for small head chemical mechanical planarization
01/2003
01/30/2003WO2003008151A1 Fixed abrasive articles with wear indicators
01/30/2003US20030022606 Ultrasonic conditioning device cleaner for chemical mechanical polishing systems
01/28/2003US6511368 Spherical drive assembly for chemical mechanical planarization
01/28/2003US6511365 Lapping machine
01/28/2003US6511362 Polishing apparatus and polishing method
01/23/2003US20030017789 Working method for curved surface of a work and an apparatus thereof
01/23/2003US20030017706 Method and apparatus for cleaning a web-based chemical mechanical planarization system
01/23/2003US20030015289 Method and apparatus for cleaning a web-based chemical mechanical planarization system
01/23/2003US20030015215 Polishing pad conditioner and application thereof
01/21/2003US6509269 Elimination of pad glazing for Al CMP
01/21/2003US6508697 Polishing pad conditioning system
01/16/2003US20030013394 Polishing pad conditioner for semiconductor polishing apparatus and method of monitoring the same
01/16/2003US20030013389 Process for the abrasive machining of surfaces, in particular of semiconductor wafers
01/16/2003US20030013381 Polishing pad conditioning system
01/15/2003EP1275473A2 Tool dressing apparatus and method
01/15/2003CN1391506A Conditioner for polishing pad and method for manufacturing the same
01/15/2003CN1099127C Method of modifying exposed surface of semiconductor wafer
01/14/2003US6506103 ELID centerless grinding apparatus
01/09/2003WO2003002299A2 Carrier head with porose retainer ring
01/08/2003CN2529732Y Angle crushing device
01/07/2003US6503129 Activated slurry CMP system and methods for implementing the same
01/03/2003WO2003000462A1 Arrangement and method for conditioning a polishing pad
01/02/2003US20030004085 Comprises a component for rendering a water-insoluble compound containing a metal atom or its ion separated from a surface to be polished water-soluble
01/02/2003US20030003846 Material for use in carrier and polishing pads
01/02/2003US20030003743 Method and apparatus for cleaning a web-based chemical mechanical planarization system
01/02/2003EP1270148A1 Arrangement and method for conditioning a polishing pad
12/2002
12/31/2002US6500054 Chemical-mechanical polishing pad conditioner
12/27/2002WO2002103778A2 Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing
12/27/2002WO2002102549A1 Feedforward and feedback control for conditioning of chemical mechanical polishing pad
12/27/2002WO2002102548A1 Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life
12/26/2002US20020199082 Method, system and medium for process control for the matching of tools, chambers and/or other semiconductor-related entities
12/26/2002US20020197947 Super abrasive tool and process for producing the same
12/26/2002US20020197944 Method and apparatus for cleaning polishing surface of polisher
12/26/2002US20020197934 Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life
12/26/2002US20020197871 Method of polishing a film
12/26/2002US20020195093 Forming device for bevelling
12/26/2002US20020195086 Cylinder pressure based optimization control for compression ignition engines
12/26/2002US20020194790 Method for fabricating diamond conditioning disc and disc fabricated
12/25/2002CN1096915C Workpiece inspection and handling
12/24/2002US6497611 Method of polishing a magnetic head slider
12/24/2002US6497610 Process for dressing an internal or external gear tool for fine machining of tooth profiles
12/19/2002WO2002087823A3 Apparatus for machining the surface of guide wheels of grinding machines
12/19/2002US20020193902 Integrating tool, module, and fab level control
12/19/2002US20020193899 Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing
12/18/2002EP1266956A1 Composition for washing a polishing pad and method for washing a polishing pad
12/18/2002EP1137514B1 Modular machine for polishing and planing substrates
12/17/2002US6494927 Conditioner and conditioning disk for a CMP pad, and method of fabricating, reworking, and cleaning conditioning disk
12/12/2002US20020188370 Chemical mechanical polishing apparatus and methods with central control of polishing pressure applied by polishing head
12/12/2002US20020187731 In-situ pad and wafer cleaning during chemical mechanical polishing
12/12/2002US20020185223 Apparatus and method for conditioning polishing pad in a chemical mechanical planarization process
12/11/2002CN1095726C 改进的磨削和抛光机床 Improved grinding and polishing machine
12/10/2002US6491568 Profiling methods and apparatus for generation of modified grinding worms
12/05/2002WO2002096600A1 A cmp polisher substrate removal control mechanism and method
12/05/2002US20020183887 Method of machining a female screw and dressing a grinding wheel for female screw machining
12/05/2002US20020182018 Abrasive and boring method using the same
12/04/2002EP1261454A1 Dressing apparatus and polishing apparatus
12/03/2002US6488573 Polishing apparatus, polishing method and method of conditioning polishing pad
11/2002
11/28/2002US20020177320 Method and apparatus for polishing a substrate while washing a polishing pad of the apparatus with at least one free-flowing vertical stream of liquid
11/27/2002EP1260312A1 Improvement in and relating to edge grinding
11/21/2002US20020173254 Chemical Mechanical polishing apparatus
11/21/2002US20020173235 Methods for break-in and conditioning a fixed abrasive polishing pad
11/21/2002US20020173234 Diamond grid CMP pad dresser
11/21/2002US20020173233 Modular controlled platen preparation system and method
11/21/2002US20020173228 Grinder and method of and apparatus for non-contact conditioning of tool
11/20/2002EP1035945A4 Manufacturing a memory disk or semiconductor device using an abrasive polishing system, and polishing pad
11/20/2002CN1380483A Abrasive material and drilling method using said abrasive material
11/19/2002US6482074 Apparatus and method for transferring a torque from a rotating hub frame to a hub shaft
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