| Patents for B24B 53 - Devices or means for dressing or conditioning abrasive surfaces (5,132) |
|---|
| 11/19/2002 | US6481446 Method of cleaning a polishing pad conditioner and apparatus for performing the same |
| 11/12/2002 | US6478661 Apparatus and method for processing micro-V grooves |
| 11/12/2002 | US6477825 Flattening and machining method and apparatus |
| 11/07/2002 | WO2002087823A2 Apparatus for machining the surface of guide wheels of grinding machines |
| 11/07/2002 | WO2001089766A1 Method for grinding metallic workpieces containing, in particular, nickel |
| 11/07/2002 | US20020164939 Quick coupler for mounting a rotational disk |
| 11/07/2002 | US20020164932 Polishing apparatus |
| 11/07/2002 | CA2408434A1 Method for grinding metallic workpieces containing, in particular, nickel |
| 11/06/2002 | EP0790101B1 Shape control method and nc machine using the method |
| 10/31/2002 | US20020160691 Planarization apparatus and method |
| 10/31/2002 | US20020160689 Method of polishing disks |
| 10/31/2002 | US20020160609 Reducing dishing and erosion during polishing and riding thin films on a substrate planarizing for isolation of trenches by using a first and second liquid containing an oxidizing agent, an organic acid, corrosion inhibitor and water |
| 10/31/2002 | US20020158395 Chemical mechanical polishing method and semiconductor device manufacturing method |
| 10/30/2002 | EP1253628A1 Method of producing semiconductor device and processing conditions setting device |
| 10/24/2002 | US20020155797 Retaining ring of a wafer carrier |
| 10/24/2002 | DE10134519A1 Verbessertes Diaphragma für eine chemische mechanische Poliervorrichtung Improved diaphragm for a chemical mechanical polishing apparatus |
| 10/23/2002 | EP1250215A1 System and method for controlled polishing and planarization of semiconductor wafers |
| 10/22/2002 | US6468134 Method and apparatus for slurry distribution |
| 10/17/2002 | US20020151264 Conditioning tool |
| 10/17/2002 | US20020151263 Burr for preparing a homogeneous pulpstone surface |
| 10/17/2002 | DE10214081A1 Verbesserter Grat für die Vorbereitung einer homogenen Schleifsteinoberfläche Improved ridge for the preparation of a homogeneous grinding stone surface |
| 10/17/2002 | DE10118391A1 Method for grinding of gear hobbing tools using rolling machine with roller spindles to support hobbing tools, and grinding tool |
| 10/17/2002 | DE10115801A1 Platform for chemical-mechanical wafer polishing has device with diamond particles in contact with pad to maintain surface roughness, device for cleaning particle residues from pad |
| 10/16/2002 | EP1249481A2 Abrasive and boring method using the same |
| 10/16/2002 | EP1089851B1 Wafer edge polishing method and apparatus |
| 10/16/2002 | EP1009585B1 External abrasive machine |
| 10/10/2002 | WO2002078903A2 Method and apparatus for avoiding particle accumulation during an electrochemical process |
| 10/10/2002 | US20020146970 Polishing apparatus and methods having high processing workload for controlling polishing pressure applied by polishing head |
| 10/10/2002 | US20020146966 Method for optimizing the planarizing length of a polishing pad |
| 10/09/2002 | EP1247616A1 Method and arrangement for conditioning a polishing pad surface |
| 10/09/2002 | EP0898504B1 Abrasive body |
| 10/09/2002 | CN1092094C Abrasive machine for machining surface of cylindrical workpiece |
| 10/08/2002 | US6461229 Abrasive machine for machining a surface of a cylindrical work piece |
| 10/08/2002 | US6461228 Grinding and polishing machines |
| 10/03/2002 | WO2002076674A2 Rigid polishing pad conditioner for chemical mechanical polishing tool |
| 10/03/2002 | WO2002060643A3 Spherical drive assembly for chemical mechanical planarization |
| 10/03/2002 | US20020142706 Method and configuration for conditioning a polishing pad surface |
| 10/03/2002 | US20020139682 Applying a reverse bias that will cause removal of, or reduction in the size of, conductive particles on the work-piece-surface-influencing device; brushes rotating in a different direction during electrodeposition; wafers/circuits |
| 10/02/2002 | CN1091674C Method and device for forming adrasive wheel |
| 09/26/2002 | US20020137441 Calibration device for pad conditioner head of a CMP machine |
| 09/26/2002 | US20020137440 Polishing apparatus |
| 09/26/2002 | US20020137436 System and method for controlled polishing and planarization of semiconductor wafers |
| 09/25/2002 | EP1047526B1 Device for dressing a grindstone to polish the running surface structure of a ski |
| 09/24/2002 | US6454637 Edge instability suppressing device and system |
| 09/19/2002 | US20020132567 Apparatus and system of chemical mechanical polishing |
| 09/19/2002 | US20020132562 Polish apparatus having a dresser and dresser adjusting method |
| 09/19/2002 | US20020132559 Polishing apparatus |
| 09/18/2002 | EP1240977A2 Polishing apparatus |
| 09/12/2002 | WO2002071445A2 Polishing chemical delivery for small head chemical mechanical planarization |
| 09/12/2002 | WO2002053320A3 Wafer support for chemical mechanical planarization |
| 09/12/2002 | US20020127962 Conditioner and conditioning disk for a CMP pad, and method of fabricating, reworking, and cleaning conditioning disk |
| 09/12/2002 | US20020127957 Chemical mechanical polish pad conditioning device |
| 09/12/2002 | US20020127950 Method of detecting and measuring endpoint of polishing processing and its apparatus and method of manufacturing semiconductor device using the same |
| 09/12/2002 | US20020126421 Lapping apparatus, magnetic head and method of manufacturing the same |
| 09/12/2002 | US20020124373 Polishing apparatus |
| 09/10/2002 | US6447376 Conductive grindstone; electrode rotator; pulsed voltage applied between; pressurized mist mixture of water and compressed air; generates uniform, high efficiency sparks |
| 09/10/2002 | US6447374 Chemical mechanical planarization system |
| 09/03/2002 | US6444994 Apparatus and method for processing the components of a neutron lens |
| 09/03/2002 | US6443819 Device for dressing grinding wheels |
| 09/03/2002 | US6443817 Method of finishing a silicon part |
| 09/03/2002 | US6443816 Method and apparatus for cleaning polishing surface of polisher |
| 09/03/2002 | US6443815 Apparatus and methods for controlling pad conditioning head tilt for chemical mechanical polishing |
| 08/29/2002 | WO2002066207A1 Polishing apparatus and dressing method |
| 08/29/2002 | US20020119737 Tool and method for precision grinding of a conical face gear that meshes with a conical involute pinion |
| 08/29/2002 | US20020119733 See attached list (k. yasui et al) |
| 08/29/2002 | US20020119613 Method of cleaning a polishing pad conditioner and apparatus for performing the same |
| 08/29/2002 | US20020119286 Conductive polishing article for electrochemical mechanical polishing |
| 08/28/2002 | EP0906174B1 Workpiece inspection and handling |
| 08/27/2002 | US6440319 Method and apparatus for predicting process characteristics of polyurethane pads |
| 08/27/2002 | US6439989 Polymeric polishing pad having continuously regenerated work surface |
| 08/27/2002 | US6439987 Tool and method for the abrasive machining of a substantially planar surface |
| 08/27/2002 | US6439986 Conditioner for polishing pad and method for manufacturing the same |
| 08/22/2002 | WO2000012264A9 Polishing pad having open area which varies with distance from initial pad surface |
| 08/22/2002 | US20020115381 Eyeglass lens processing apparatus |
| 08/20/2002 | US6435958 Abrasive means and a grinding process |
| 08/20/2002 | US6435952 Apparatus and method for qualifying a chemical mechanical planarization process |
| 08/15/2002 | WO2002016075A3 Cmp apparatus with an oscillating polishing pad rotating in the opposite direction of the wafer |
| 08/15/2002 | US20020111125 Flattening and machining method and apparatus |
| 08/14/2002 | EP1230067A1 Sharpening device for rotating cutting tools and machine employing said device |
| 08/13/2002 | US6432257 Dresser for polishing cloth and method for manufacturing such dresser and polishing apparatus |
| 08/13/2002 | US6431964 Planarization apparatus and method |
| 08/13/2002 | US6431962 Method and apparatus for making a cutting tool having a flute |
| 08/13/2002 | US6431949 Planarization apparatus |
| 08/08/2002 | WO2002060643A2 Spherical drive assembly for chemical mechanical planarization |
| 08/08/2002 | US20020106979 Conditioning wheel for conditioning a semiconductor wafer polishing pad and method of manufacture thereof |
| 08/08/2002 | US20020106971 Method and apparatus for conditioning a polishing pad |
| 08/08/2002 | US20020106829 Conditioning wheel for conditioning a semiconductor wafer polishing pad and method of manufacture thereof |
| 08/07/2002 | CN1362907A Dual CMP pad conditioner |
| 08/06/2002 | US6428403 Polishing apparatus |
| 08/06/2002 | US6428398 Method for wafer polishing and method for polishing-pad dressing |
| 08/06/2002 | US6428397 Wafer edge polishing method and apparatus |
| 07/31/2002 | CN2502844Y Diamond contact roller dressing apparatus for grinder |
| 07/25/2002 | WO2002057051A1 Dressing apparatus and polishing apparatus |
| 07/25/2002 | US20020098779 Method and apparatus for enhanced CMP using metals having reductive properties |
| 07/18/2002 | WO2002055260A1 Centreless grinder comprising a fixed dressing unit and a method for operating said grinder |
| 07/17/2002 | EP1222056A1 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 07/16/2002 | US6419574 Abrasive tool with metal binder phase |
| 07/16/2002 | US6419561 Method and apparatus for making a cutting tool having a plurality of margins |
| 07/16/2002 | US6419553 Methods for break-in and conditioning a fixed abrasive polishing pad |
| 07/16/2002 | US6419443 Glass product machining apparatus |