Patents for B24B 53 - Devices or means for dressing or conditioning abrasive surfaces (5,132)
01/2005
01/06/2005US20050000801 Method and apparatus for electrochemical mechanical processing
01/05/2005EP1493533A1 Centerless grinding machine
01/05/2005EP1222056A4 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
01/05/2005CN2668326Y Grinding wheel thickness dressing device
01/05/2005CN1561280A Method and apparatus for avoiding particle accumulation in electrodeposition
01/05/2005CN1182940C Small diameter chemical machinery polishing system
01/04/2005US6837773 Method and apparatus for controlling a temperature of a polishing pad used in planarizing substrates
12/2004
12/30/2004US20040266327 Conductive polishing article for electrochemical mechanical polishing
12/30/2004US20040266322 Polishing pad, polishing apparatus and method for polishing wafer
12/30/2004DE10324429A1 Verfahren und System zum Steuern des chemisch-mechanischen Polierens mittels eines Sensorsignals eines Polierkissenkonditionierers A method and system for controlling the chemical mechanical polishing by means of a sensor signal of a Polierkissenkonditionierers
12/30/2004DE10322496A1 Device for automatic cleaning and conditioning of polishing cloths comprises a body with bristle tufts and means for attaching it to a polishing machine
12/29/2004CN1557608A Method for assisting on-line trimming diamond grinding wheel based on discharging in air
12/28/2004US6835116 Polishing apparatus
12/23/2004WO2004112091A2 Vacuum-assisted pad conditioning system and method utilizing an apertured conditioning disk
12/23/2004US20040259487 Chemical mechanical polish (CMP) conditioning-disk holder
12/23/2004US20040259486 Polishing apparatus
12/23/2004US20040259477 Pad conditioner control using feedback from a measured polishing pad roughness level
12/23/2004DE10322181A1 Abrichtwerkzeug zum Abrichten einer Schleifschnecke Dressing tool for dressing a grinding worm
12/22/2004EP1489652A2 Method of modifying a surface of a semiconductor wafer
12/16/2004DE10322991A1 Work-piece grinding method e.g. using rotary grinding disc, involves angularly displacing spraying medium to contact point on grinding surface relative to axis of rotation of grinding disc
12/09/2004WO2004106000A1 A method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner
12/09/2004WO2004087375A8 Chip customized polish pads for chemical mechanical planarization (cmp)
12/09/2004US20040248415 Polishing method and polishing liquid
12/09/2004DE19640416B4 Schleifvorrichtung für das Messer von Entschleif- oder Spaltmaschinen Grinder for the diameter of Entschleif- or splitting machines
12/08/2004CN1553842A Dressing tool, dressing device, dressing method, processing device, and semiconductor device producing method
12/07/2004US6827633 Polishing method
12/07/2004US6827072 Dressing wheel and method of making same
12/07/2004US6827071 Wheel dresser for grinding wheel
12/02/2004US20040242130 Grinding apparatus and method for manufacturing magnetic recording medium using the same
12/02/2004US20040242122 Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner
12/02/2004US20040241989 Method of using multiple, different slurries in a CMP polishing process via a pad conditioning system
12/01/2004CN1550289A Method for cleaning a grinding body coated with cubi boron nitride and apparatus for performing said method
11/2004
11/30/2004US6824454 Polishing apparatus
11/30/2004US6824451 Process for the abrasive machining of surfaces, in particular of semiconductor wafers
11/30/2004US6824448 CMP polisher substrate removal control mechanism and method
11/25/2004WO2004069478A3 Grinding machine
11/25/2004US20040235404 Embedding tool designed to embed grains into faceplate for lapping apparatus
11/25/2004US20040235401 Truing tool for truing a grinding worm
11/25/2004US20040235390 Reclaiming virgin test wafers
11/25/2004US20040235301 Method and device for polishing
11/24/2004EP1479478A2 Method for cleaning a grinding body coated with cubi boron nitride inside an apparatus for separating tobacco from a bale and apparatus for performing said method
11/24/2004CN1550034A Constant pH polish and scrub
11/24/2004CN1548271A Trimming disc with grinding grains capable of being regulated individually and its making process
11/23/2004US6821190 Static pad conditioner
11/17/2004EP1478012A1 Polishing method and polishing fluid
11/17/2004EP1478011A1 Method and device for polishing
11/17/2004EP1477256A1 Dressing tool for a grinding worm
11/16/2004US6818029 Forming geometrical protrusions of uniform height and coating with diamond layer
11/16/2004US6817924 Chemical mechanical polishing apparatus, profile control system and conditioning method thereof
11/11/2004US20040224617 Static pad conditioner
11/11/2004US20040224142 Method of polishing a semiconductor device
11/11/2004US20040221874 Cleaning method and polishing apparatus employing such cleaning method
11/04/2004WO2004094106A1 Diamond conditioning of soft chemical mechanical planarization/polishing (cmp) polishing pads
11/04/2004US20040219866 Method and apparatus for forming grooves on a workpiece and for dressing a grindstone used in the groove formation
11/03/2004EP1472018A1 Copper polishing cleaning solution
11/03/2004CN1173804C Grinding bed dresser
10/2004
10/28/2004US20040214511 Visual wear confirmation polishing pad
10/27/2004EP1470894A1 Apparatus for dressing a cup-shaped grinding wheel
10/26/2004US6807960 Tool for dressing pulpstones
10/26/2004US6807701 Method of cleaning abrasive plates of abrasive machine and cleaning device
10/21/2004US20040209552 Centerless grinding apparatus and centerless grinding method
10/21/2004US20040206454 Inline monitoring of pad loading for CuCMP and developing an endpoint technique for cleaning
10/21/2004US20040206453 CMP machine dresser and method for detecting the dislodgement of diamonds from the same
10/21/2004US20040206374 Inline monitoring of pad loading for CuCMP and developing an endpoint technique for cleaning
10/19/2004US6806193 Reducing particle deposits on scouring pads used for chemical mechanical polishing (cmp) of semiconductor wafers, using cleaners comprising mixtures of water, ammonium citrate, surfactants and benzotriazole
10/14/2004WO2004087375A1 Chip customized polish pads for chemical mechanical planarization (cmp)
10/14/2004WO2004077520A3 Wafer polishing and pad conditioning methods
10/14/2004US20040203326 Conditioning mechanism for chemical mechanical polishing
10/14/2004US20040203325 Conditioner disk for use in chemical mechanical polishing
10/14/2004CA2519942A1 Chip customized polish pads for chemical mechanical planarization (cmp)
10/13/2004CN1537324A Polising method and device
10/13/2004CN1170656C Method for grinding non-axial-symmetry and non-ball-surface mirror
10/07/2004WO2004086477A1 Pad conditioners and fabrication methods thereof
10/07/2004US20040198206 Grinding wheel
10/07/2004US20040198200 Pad conditioner of CMP equipment
10/06/2004CN1535197A Fixed abrasive articles with wear indicators
10/06/2004CN1535196A Feed and feedback control of chemical mechanical polishing pad conditioning
10/05/2004US6800020 Web-style pad conditioning system and methods for implementing the same
09/2004
09/30/2004US20040192178 Diamond conditioning of soft chemical mechanical planarization/polishing (CMP) polishing pads
09/30/2004US20040192175 Polishing pad, method of manufacturing glass substrate for use in data recording medium using the pad, and glass substrate for use in data recording medium obtained by using the method
09/30/2004US20040192168 Arrangement and method for conditioning a polishing pad
09/29/2004EP1462217A1 Grinding wheel
09/29/2004CN2644099Y Automatic powered regulating mechanism of grinder for outer race of bearing groove
09/29/2004CN2644098Y Interpolation dresser micromotion device
09/29/2004CN1533595A Polishing method and grinding fluid
09/29/2004CN1532026A Grinding pad finishing device and its producing method
09/29/2004CN1168575C Method for repairing and maintaining grinding board by using double-board grinding machine
09/29/2004CN1168574C Multifunctional grinding wheel truing device and utilizing method thereof
09/23/2004US20040185763 Vitrified bond tool and method of manufacturing the same
09/23/2004DE102004011985A1 Verfahren und Vorrichtung zur Konditionierung einer Oberflächenform eines Schleifsteins sowie eine Schleifmaschine Method and apparatus for conditioning a surface shape of a grindstone and a grinding
09/22/2004EP1459847A2 Corrosion resistant abrasive article and method of making
09/22/2004EP1459844A1 Method and device for truing grinding wheel and grinding device
09/22/2004EP1459358A1 Methods and apparatus for conditioning and temperature control of a processing surface
09/21/2004US6794206 Method of polishing a film
09/21/2004US6793562 Grinder and method of and apparatus for non-contact conditioning of tool
09/16/2004US20040180617 Conditioning disk
09/10/2004WO2004077520A2 Wafer polishing and pad conditioning methods
09/10/2004WO2004028746A3 Brazed diamond tools and methods for making the same
09/09/2004US20040176018 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces
09/09/2004DE19938781B4 Konditionierscheibe zum Konditionieren von CMP-Pads Conditioning disk for conditioning CMP pads
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