Patents for B24B 53 - Devices or means for dressing or conditioning abrasive surfaces (5,132)
12/2003
12/23/2003US6666754 Method and apparatus for determining CMP pad conditioner effectiveness
12/23/2003US6666749 Apparatus and method for enhanced processing of microelectronic workpieces
12/23/2003US6666748 Machining center and method of changing tools thereof
12/16/2003US6663474 Apparatus and system of chemical mechanical polishing
12/11/2003WO2002103778A3 Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing
12/09/2003US6660124 Polishing system and polishing method
12/09/2003US6659849 Platen with debris control for chemical mechanical planarization
12/03/2003CN1460043A Method and apparatus for processing semiconductor wafer using novel final polishing method
11/2003
11/27/2003US20030220053 Apparatus for electrochemical processing
11/27/2003US20030220051 Conditioning disk actuating system
11/27/2003US20030220049 Conditioning disk actuating system
11/27/2003US20030217429 Automated lap washer
11/25/2003US6652708 Methods and apparatus for conditioning and temperature control of a processing surface
11/25/2003US6652357 Methods for controlling retaining ring and wafer head tilt for chemical mechanical polishing
11/20/2003WO2003095145A1 Cleaning head
11/20/2003US20030216112 Cleaning device and method for cleaning polishing cloths used for polishing semiconductor wafers
11/19/2003EP1361933A1 Polishing apparatus and dressing method
11/19/2003CN2586562Y Rubstone correcting disc
11/18/2003US6650408 Method for inspecting a polishing pad in a semiconductor manufacturing process, an apparatus for performing the method, and a polishing device adopting the apparatus
11/18/2003US6648739 Wafer polishing apparatus
11/18/2003US6648731 Polishing pad conditioning apparatus in chemical mechanical polishing apparatus
11/18/2003US6648728 Polishing system
11/13/2003WO2003092944A1 Polishing method and polishing system, and method for fabricating semiconductor device
11/13/2003US20030211816 High-pressure pad cleaning system
11/12/2003EP1361012A1 Method of dressing or profiling a substantially cylindrical grinding worm
11/11/2003US6645053 Polishing apparatus
11/11/2003US6645052 Method and apparatus for controlling CMP pad surface finish
11/11/2003US6645046 Conditioning mechanism in a chemical mechanical polishing apparatus for semiconductor wafers
11/06/2003WO2003090964A1 Polishing system and polishing method
11/06/2003WO2003002299A3 Carrier head with porose retainer ring
11/06/2003US20030207778 Copper polishing cleaning solution
11/06/2003US20030207650 Method for forming a grinding worm for forming a conical face gear that meshes with a conical involute pinion
11/06/2003US20030205239 Chemical mechanical polishing pad pad is divided into regions defined by a size difference of abrasive grains formed on the body surface in each region of the conditioning disk.
11/05/2003CN2584355Y Diamond grinding wheel truing tool
11/05/2003CN1453103A In-situ trimming method for shaping abrasive wheel
11/05/2003CN1126637C External grinding machine
11/04/2003US6640795 Dresser, polishing apparatus and method for producing an article
10/2003
10/30/2003US20030204287 Machining error correction method adapted for numerically controlled machine tool and grinding machine using the same
10/29/2003CN1125704C CMP pad conditioner arrangement and method therefor
10/28/2003US6640155 Chemical mechanical polishing apparatus and methods with central control of polishing pressure applied by polishing head
10/28/2003US6638145 Constant pH polish and scrub
10/28/2003US6638143 Ion exchange materials for chemical mechanical polishing
10/23/2003US20030199238 Polishing apparatus and method for producing semiconductors using the apparatus
10/23/2003US20030198799 Battery separator
10/21/2003US6634934 Method for cleaning polishing tool, polishing method polishing apparatus
10/16/2003WO2003084715A1 Composite conditioning tool
10/16/2003US20030194956 Polishing pad ironing system and methods for implementing the same
10/16/2003US20030194955 Conditioner and conditioning methods for smooth pads
10/15/2003CN2579604Y Pneumatic rotary CBN emery wheel repairing device
10/15/2003CN2579603Y Repairing device for grinder emery wheel
10/15/2003CN1448247A Centerless grinding apparatus and centerless grinding process
10/14/2003US6632127 Chemical mechanical polishing pads comprising silicon substrates bonded to microstructure thin films, used for smoothening dielectrics and semiconductor wafers
10/09/2003WO2003082524A1 Smooth pads for cmp and polishing substrates
10/09/2003WO2003082519A1 Conditioner and conditioning methods for smooth pads
10/09/2003US20030190874 Composite conditioning tool
10/09/2003US20030190873 Chemical-mechanical polishing platform
10/08/2003EP1350599A2 Method for grinding profiles on a workpiece
10/08/2003CN1447734A Small diameter chemical machinery polishing system
10/07/2003US6629884 Corrosion resistant abrasive article and method of making
10/07/2003US6629874 Feature height measurement during CMP
10/02/2003US20030186627 Interchangeable conditioning disk apparatus
10/01/2003EP1347861A2 System and method for polishing and planarization of semiconductor wafers using reduced surface area polishing pads
09/2003
09/30/2003US6626744 Planarization system with multiple polishing pads
09/30/2003US6626743 Method and apparatus for conditioning a polishing pad
09/30/2003US6626739 Polishing method and polishing apparatus
09/25/2003US20030181155 Smooth pads for CMP and polishing substrates
09/24/2003EP1346797A1 Cmp conditioner, method for arranging rigid grains used for cmp conditioner, and method for manufacturing cmp conditioner
09/23/2003US6623344 Wafer polishing apparatus
09/16/2003US6620031 Method for optimizing the planarizing length of a polishing pad
09/16/2003CA2256140C A device for dressing grinding wheels
09/12/2003WO2002060643A9 Spherical drive assembly for chemical mechanical planarization
09/11/2003US20030171081 Polishing pad
09/10/2003CN1441714A Contact-discharge truing/dressing method and device therefor
09/04/2003US20030166383 Polishing apparatus
09/03/2003EP1339527A1 Method and device for producing molds for toothed belts
09/02/2003US6612912 Method for fabricating semiconductor device and processing apparatus for processing semiconductor device
08/2003
08/28/2003WO2003071593A1 Polishing method and polishing fluid
08/28/2003WO2003071592A1 Method and device for polishing
08/28/2003WO2002071445A3 Polishing chemical delivery for small head chemical mechanical planarization
08/28/2003US20030162486 Polishing head and apparatus with an improved pad conditioner for chemical mechanical polishing
08/26/2003US6609997 Method and apparatus for resurfacing anvil blanket of a rotary diecutter for box making machine
08/26/2003US6609962 Dressing apparatus and polishing apparatus
08/21/2003US20030157873 Grinding wheel fixture
08/20/2003EP1336456A1 Dressing roll for grinding wheels
08/20/2003CN2566983Y Automatic high-speed dressing mechanism for grinding machine of processing bearing inner surface groove
08/20/2003CN1437520A Polishing pad
08/19/2003USRE38228 Polishing apparatus
08/19/2003US6607428 Material for use in carrier and polishing pads
08/19/2003US6607427 Dressing apparatus and polishing apparatus
08/19/2003US6607426 Polishing apparatus
08/19/2003US6607423 Method for achieving a desired semiconductor wafer surface profile via selective polishing pad conditioning
08/14/2003US20030153252 Methods for conditioning surfaces of polishing pads after chemical-mechanical polishing, and apparatuses for conditioning surfaces of polishing pads
08/13/2003EP1334802A1 Polisher
08/07/2003US20030148707 Dressing apparatus and polishing apparatus
08/07/2003US20030145843 Dressing wheel and method of making same
08/07/2003US20030145842 Tool for dressing pulpstones
08/05/2003US6602119 Dressing apparatus
08/05/2003US6602115 Tool and method for precision grinding of a conical face gear that meshes with a conical involute pinion
08/05/2003US6602108 Modular controlled platen preparation system and method
08/05/2003US6602029 Cutting tool and method and apparatus for making the same
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