Patents for B24B 53 - Devices or means for dressing or conditioning abrasive surfaces (5,132)
09/2004
09/08/2004EP0852063B1 Method of modifying an exposed surface of a semiconductor wafer
09/07/2004US6786808 Sharpening device for rotating cutting tools and machine employing said device
09/02/2004DE202004010726U1 Werkzeugmaschine zum Schleifen und/oder Hartdrehen von Futterteilen Machine tool for grinding and / or hard turning of chuck parts
09/01/2004CN1164397C Method for grinding metallic workpieces containing, in particular, nickel
08/2004
08/31/2004US6783445 Polishing apparatus
08/31/2004US6783441 Apparatus and method for transferring a torque from a rotating hub frame to a one-piece hub shaft
08/31/2004US6783428 Method for forming grooves on workpiece and for dressing a grindstone used in the groove formation
08/26/2004US20040166785 Polishing pad conditioning
08/26/2004US20040166782 System and method for polishing and planarizing semiconductor wafers using reduced surface area polishing pads and variable partial pad-wafer overlapping techniques
08/26/2004US20040166780 Polishing pad apparatus and methods
08/26/2004US20040163946 Pad assembly for electrochemical mechanical processing
08/25/2004CN1524027A Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life
08/24/2004US6780091 Machining strain removal apparatus
08/24/2004US6780088 Chemical mechanical polishing apparatus and a method of chemical mechanical polishing using the same
08/19/2004WO2004069478A2 Grinding machine
08/19/2004US20040162007 Chemical mechanical polishing atomizing rinse system
08/18/2004EP1447172A1 Surface finishing apparatus and method
08/18/2004CN1520961A Lapping apparatus and lapping method
08/12/2004WO2004067226A2 Apparatus and methods for refinishing a surface in-situ
08/12/2004US20040157530 Lapping apparatus and lapping method
08/10/2004US6773337 Method and apparatus to recondition an ion exchange polish pad
08/10/2004US6773332 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
08/05/2004DE10261306A1 Haltering mit reduzierter Abnutzungs- und Kontaminationsrate für einen Polierkopf einer CMP-Anlage Retaining ring for minimal wear and contamination rate for a polishing head of a CMP tool
08/03/2004US6769975 Super abrasive tool and process for producing the same
08/03/2004US6769972 CMP polishing unit with gear-driven conditioning disk drive transmission
08/03/2004US6769968 Interchangeable conditioning disk apparatus
08/03/2004US6769967 Apparatus and method for refurbishing polishing pads used in chemical-mechanical planarization of semiconductor wafers
08/03/2004US6769964 Abrasive tool having a unitary arbor
07/2004
07/29/2004WO2004062851A1 Cutting tool for soft material
07/29/2004WO2004062850A1 Polishing pad conditioning
07/29/2004US20040147208 Apparatus and methods for refinishing a surface in-situ
07/29/2004US20040147205 Surface planarization
07/29/2004US20040144160 Pad conditioning head offline testing kit
07/29/2004DE19800032B4 Abricht-Schleifverfahren zum Rund-, Plan- und Profilschleifen von Werkstücken und Schleifmaschine hierfür Dressing grinding method for cylindrical, surface and profile grinding of workpieces and grinding this
07/28/2004EP1440758A1 Methods and apparatus for machining a coupling
07/27/2004US6767427 Apparatus and method for conditioning polishing pad in a chemical mechanical planarization process
07/22/2004WO2004060609A1 Modular method for chemical mechanical planarization
07/22/2004US20040142644 Grinder and method of and apparatus for non-contact conditioning of tool
07/22/2004US20040140127 Sharpening means for drilling tools
07/22/2004US20040139956 Wheel dresser for grinding wheel
07/22/2004DE10261465A1 Anordnung zum chemisch-mechanischen Polieren mit einem verbesserten Konditionierwerkzeug An arrangement for chemical mechanical polishing with an improved dressing tool
07/21/2004EP1439031A1 Method and apparatus for dressing polishing cloth
07/21/2004EP0954407B1 Polishing apparatus
07/20/2004US6764389 Conditioning bar assembly having an abrasion member supported on a polycarbonate member
07/20/2004US6764388 High-pressure pad cleaning system
07/15/2004WO2004058451A1 Glass substrate for information recording medium and method for producing same
07/15/2004US20040137739 CMP in-situ conditioning with pad and retaining ring clean
07/15/2004US20040134792 electroplating; ball assemblies comprises interior housing, annular seat, conductive adapter, and coupled conductive contact
07/14/2004CN2625108Y Digital controlled trimming tool for profile of involute and special-shaped abrasive wheel
07/13/2004US6762135 Method of cleaning a polishing pad conditioner
07/13/2004US6761625 Reclaiming virgin test wafers
07/08/2004US20040132390 Methods and apparatus for machining a coupling
07/08/2004US20040132388 System for chemical mechanical polishing comprising an improved pad conditioner
07/08/2004US20040132309 Wafer polishing method and wafer polishing apparatus in semiconductor fabrication equipment
07/06/2004US6758728 Method and apparatus for cleaning polishing surface of polisher
07/01/2004US20040127144 Method and apparatus for controlling CMP pad surface finish
07/01/2004US20040123951 Retaining ring having reduced wear and contamination rate for a polishing head of a CMP tool
06/2004
06/29/2004US6755720 Vitrified bond tool and method of manufacturing the same
06/29/2004US6755718 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
06/24/2004US20040121710 Method and apparatus for conditioning a polishing pad
06/24/2004US20040121708 Pad assembly for electrochemical mechanical processing
06/22/2004US6752708 Pad conditioner for semiconductor substrates
06/22/2004US6752699 Working method for curved surface of a work and an apparatus thereof
06/22/2004US6752698 Method and apparatus for conditioning fixed-abrasive polishing pads
06/22/2004US6752697 Apparatus and method for chemical mechanical polishing of a substrate
06/22/2004US6752692 Cleaning method and polishing apparatus employing such cleaning method
06/22/2004US6752687 Method of polishing disks
06/22/2004CA2255407C V-ribbed belt and grinding wheel for forming the belt
06/17/2004US20040116051 Method and apparatus for conditioning a chemical-mechanical polishing pad
06/17/2004US20040112359 Brazed diamond tools and methods for making the same
06/17/2004DE10255423A1 System und Verfahren zum Schleifen von Glas und zum Abrichten einer Glasschleifscheibe System and method for grinding of glass and glass for dressing a grinding wheel
06/16/2004EP1428623A1 Sharpening means for core drills
06/16/2004CN1505110A Chemical mechanical polishing method and apparatus
06/15/2004US6749494 Conditioning tool
06/10/2004WO2004012904A3 Abrasive tool having a unitary arbor
06/10/2004US20040110453 Polishing pad conditioning method and apparatus
06/10/2004US20040110451 Apparatuses for conditioning surfaces of polishing pads
06/10/2004US20040110448 Size adjustment of corrugated boards in a box making machine
06/10/2004US20040110381 Chemical mechanical polishing method and apparatus
06/09/2004EP1426140A1 DRESSING TOOL, DRESSING DEVICE, DRESSING METHOD, PROCESSING DEVICE, AND SEMICONDUCTOR DEVICE PRODUCING METHOD
06/09/2004EP1425786A1 Constant ph polish and scrub
06/09/2004CN2619755Y Grinding wheel pair trimmer
06/02/2004EP1424165A1 System and method for grinding glass and for the dressing of a glass grinding wheel
06/02/2004CN2618725Y On-line repairing device for formed grinding emery wheel
06/02/2004CN1501851A Method and device for producing molds for toothed belts
06/01/2004US6743080 Method for seasoning a polishing pad
06/01/2004US6743074 Method and system for manufacturing a photocathode
05/2004
05/27/2004US20040102045 Polishing apparatus
05/27/2004DE10252742A1 Sharpening device used for sharpening the abrasive segments of a drill bit is filled with abrasive material and formed as a strand
05/25/2004US6740629 Comprises a component for rendering a water-insoluble compound containing a metal atom or its ion separated from a surface to be polished water-soluble
05/25/2004US6740169 Immersing the conditioning disk which has been used in a cmp process in sulfuric acid in order to dissolve adhesive film and remove abrasive grains; new adhesive layers and abrasive grains are then applied
05/25/2004US6739955 Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies
05/20/2004US20040097176 Methods for conditioning surfaces of polishing pads after chemical-mechanical polishing, and apparatuses for conditioning surfaces of polishing pads
05/20/2004US20040097169 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
05/20/2004US20040097167 Method and device for truing grinding wheel, and grinding device
05/18/2004US6736926 Inline monitoring of pad loading for CuCMP and developing an endpoint technique for cleaning
05/13/2004DE10249358A1 Positioning method for rotary tool, e.g. grinding disc, using measuring probe which comes into contact with positioning disc when tool is correctly positioned
05/13/2004DE10232670B4 Verfahren und Vorrichtung zur Reinigung von Läppscheiben Method and apparatus for cleaning lapping
05/12/2004CN1494984A Sander for polishing cloth and polishing cloth sanding method using said sander
05/11/2004US6734103 Method of polishing a semiconductor device
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