Patents for B24B 53 - Devices or means for dressing or conditioning abrasive surfaces (5,132)
05/2005
05/26/2005US20050112999 Method of truing chamfering grindstone and chamfering device
05/25/2005EP0917931B1 Combined cutting and grinding tool
05/25/2005DE10322181B4 Abrichtwerkzeug zum Abrichten einer Schleifschnecke Dressing tool for dressing a grinding worm
05/24/2005US6897079 Method of detecting and measuring endpoint of polishing processing and its apparatus and method of manufacturing semiconductor device using the same
05/24/2005US6896596 Polishing pad ironing system
05/24/2005US6896583 Method and apparatus for conditioning a polishing pad
05/19/2005US20050107012 Method and apparatus for polishing a substrate while washing a polishing pad of the apparatus with at least one free-flowing vertical stream of liquid
05/18/2005EP1322449B1 Web-style pad conditioning system and methods for implementing the same
05/17/2005US6893336 Polishing pad conditioner and chemical-mechanical polishing apparatus having the same
05/12/2005US20050101227 Materials and methods for low pressure chemical-mechanical planarization
05/12/2005US20050097690 Cleaning apparatus for rotary and orbitally mounted buffing pads
05/11/2005CN2698521Y Cabinet leg arrangement for wheel dresser
05/10/2005US6890245 Byproduct control in linear chemical mechanical planarization system
05/05/2005US20050095960 Polishing apparatus and method for producing semiconductors using the apparatus
05/05/2005US20050095959 Contoured CMP pad dresser and associated methods
05/04/2005CN1611336A Dry processing method for ceramic brick and a dry edging and bevelling machine
05/03/2005US6887138 Chemical mechanical polish (CMP) conditioning-disk holder
04/2005
04/28/2005US20050090185 Method of dressing polishing pad and polishing apparatus
04/27/2005CN1610960A Methods and apparatus for conditioning and temperature control of a processing surface
04/26/2005US6884155 Diamond grid CMP pad dresser
04/26/2005US6884153 Apparatus for electrochemical processing
04/26/2005US6884151 Method and apparatus for forming grooves on a workpiece and for dressing a grindstone used in the groove formation
04/21/2005WO2005035174A1 Diamond tool, synthetic single crystal diamond and method for synthesizing single crystal diamond, and diamond jewelry
04/20/2005EP1524076A1 Apparatus for grinding pieces for chucks.
04/20/2005CN2693414Y Grinding wheel dressing mechanism
04/20/2005CN1607069A Method of dressing polishing pad and polishing apparatus
04/19/2005US6881130 Edge grinding
04/19/2005US6881124 Method of manufacturing magnetic head
04/14/2005WO2005032766A1 Dressing method in vertical duplex-head surface grinding machine
04/14/2005WO2005000523A3 Non glazing dressing wheel
04/14/2005US20050079811 Defect reduction using pad conditioner cleaning
04/14/2005US20050079800 Cleaning tool and method
04/14/2005DE10345335A1 Planar grinding machine has optical device for determining position of its upper part relative to a base frame so that an evaluation unit can calculate a set position prior to commencement of machining
04/13/2005EP1522378A1 Five axis machine tool with continuous grinding wheel dressing device
04/12/2005US6878045 Ultrasonic conditioning device cleaner for chemical mechanical polishing systems
04/07/2005DE10342137A1 Vorrichtung und Verfahren zur Finishbearbeitung von Wellen, insbesondere von Kurbel- und Nockenwellen Apparatus and method for finish machining of shafts, particularly crankshafts and camshafts
04/06/2005CN1196107C Method for polishing magnetic-head floating block
04/05/2005US6875091 Method and apparatus for conditioning a polishing pad with sonic energy
04/05/2005US6875089 Constant pH polish and scrub
04/05/2005US6875086 Surface planarization
03/2005
03/31/2005WO2005002794A3 Cell, system and article for electrochemical mechanical processing (ecmp)
03/31/2005US20050070215 Chemical mechanical polishing apparatus having conditioning cleaning device
03/31/2005US20050070209 Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner
03/30/2005CN1602547A Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing
03/29/2005US6872132 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces
03/29/2005US6872127 Polishing pad conditioning disks for chemical mechanical polisher
03/29/2005US6871378 Automated lap washer
03/24/2005WO2004112091A3 Vacuum-assisted pad conditioning system and method utilizing an apertured conditioning disk
03/24/2005US20050064792 Pad conditioner setup
03/23/2005EP1516700A2 Method of dressing polishing pad and polishing apparatus
03/23/2005CN1193863C Conditioner for polishing pad and method for manufacturing the same
03/22/2005US6869342 Dressing of grinding tools for gear grinding
03/22/2005US6869337 System and method for polishing and planarizing semiconductor wafers using reduced surface area polishing pads and variable partial pad-wafer overlapping techniques
03/17/2005WO2005024287A2 Working surface and system for production thereof
03/16/2005EP1514642A2 Apparatus and method for finishing shafts, especially crank- and camshafts
03/16/2005CN1192857C Contact-discharge truing/dressing method and device therefor
03/15/2005US6866567 Activated slurry CMP system and methods for implementing the same
03/15/2005US6866566 Apparatus and method for conditioning a contact surface of a processing pad used in processing microelectronic workpieces
03/10/2005US20050054276 Method for reducing wear of mechanically interacting surfaces
03/10/2005US20050054267 Polishing method
03/10/2005US20050051266 Rotating pad on support surfaces; for semiconductor
03/09/2005CN2683319Y Pneumatic type dresser for grinding mill
03/09/2005CN1590027A Diamond abrasion wheel reconditioner grinding method
03/09/2005CN1590024A Apparatus and method for preheating
03/08/2005US6863770 Method and apparatus for polishing a substrate while washing a polishing pad of the apparatus with at least one free-flowing vertical stream of liquid
03/03/2005US20050048880 Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion
03/02/2005EP1472018A4 Copper polishing cleaning solution
03/02/2005CN1586817A Multifunction diamond grinding wheel dresser based on auxiliary discharging in gas
03/02/2005CN1586816A Device and method for continuous laser sharpening resin binder grinding wheel
02/2005
02/24/2005WO2005016596A1 In situ activation of a three-dimensional fixed abrasive article
02/22/2005US6857942 Apparatus and method for pre-conditioning a conditioning disc
02/17/2005US20050034746 Method of cleaning abrasive plates of abrasive machine and cleaning device
02/15/2005US6855044 Burr for preparing a homogeneous pulpstone surface
02/15/2005US6855030 Modular method for chemical mechanical planarization
02/10/2005WO2005012592A2 Cvd diamond-coated composite substrate for making same
02/10/2005US20050032467 Dressing tool, dressing device, dressing method, processing device and semiconductor device producing method
02/10/2005US20050032462 In situ activation of a three-dimensional fixed abrasive article
02/10/2005US20050032461 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces
02/10/2005US20050028843 Cleaning apparatus; rotating nozzle for jetting water toward face of abrasive plates; brushes to confing spray
02/09/2005CN1577758A Polishing pad, polishing apparatus and method for polishing wafer
02/08/2005US6852016 End effectors and methods for manufacturing end effectors with contact elements to condition polishing pads used in polishing micro-device workpieces
02/08/2005US6852015 Method and apparatus for grinding workpiece surfaces to super-finish surface with micro oil pockets
02/08/2005US6852004 CMP machine dresser and method for detecting the dislodgement of diamonds from the same
02/03/2005US20050026546 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces
02/03/2005US20050026545 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces
02/03/2005US20050025973 CVD diamond-coated composite substrate containing a carbide-forming material and ceramic phases and method for making same
01/2005
01/27/2005US20050020194 Method and apparatus for polishing a workpiece
01/27/2005DE10329724A1 Machine grinding tool to cut teeth during the manufacture of large gears wheels has co-adjustable dressing tool and grinding wheel
01/26/2005EP1500469A1 Abrasive tool
01/26/2005CN1186170C On-line trimming method for formed grinding wheel
01/20/2005US20050014457 Apparatus and method for conditioning a contact surface of a processing pad used in processing microelectronic workpieces
01/13/2005WO2005002794A2 Cell, system and article for electrochemical mechanical processing (ecmp)
01/13/2005WO2004067226A3 Apparatus and methods for refinishing a surface in-situ
01/13/2005US20050009448 Customized polish pads for chemical mechanical planarization
01/12/2005EP1495838A1 Wafer polishing apparatus and method for manufacturing wafer
01/12/2005CN1562567A Method for finishing grinding wheel based on involute of arc and dresser
01/12/2005CN1562566A Online electrolytic grinding and trimming method by using grinding wheel in metal binding agent type, and equipment
01/11/2005US6840840 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
01/06/2005WO2005000523A2 Non glazing dressing wheel
01/06/2005US20050003739 Grinding machine, in particular centerless cylindrical grinding machine
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