| Patents for B24B 53 - Devices or means for dressing or conditioning abrasive surfaces (5,132) |
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| 07/26/2001 | US20010009844 Conditioner and conditioning disk for a CMP pad, and method of fabricating, reworking, and cleaning conditioning disk |
| 07/25/2001 | EP1117506A1 Cmp polishing head with three chambers and method for using the same |
| 07/24/2001 | US6263605 Pad conditioner coupling and end effector for a chemical mechanical planarization system and method therefor |
| 07/12/2001 | WO2001049453A1 Method and apparatus for conditioning a polishing pad |
| 07/12/2001 | US20010007809 Apparatus for polishing wafer and method of doing the same |
| 07/11/2001 | EP1114695A2 Chemical mechanical planarization system |
| 07/11/2001 | EP1113902A2 Grinding machine, computer software to operate such a machine, and their uses therefor |
| 07/10/2001 | US6258711 Sacrificial deposit to improve damascene pattern planarization in semiconductor wafers |
| 07/10/2001 | US6258177 Apparatus for cleaning the grooves of lapping plates |
| 07/10/2001 | US6257963 Grinding worm for the continuous generating grinding of gear wheels |
| 07/05/2001 | US20010006881 Polishing apparatus |
| 07/05/2001 | US20010006874 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 07/05/2001 | US20010006873 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 07/05/2001 | US20010006872 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 07/05/2001 | US20010006871 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 07/05/2001 | US20010006870 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 07/03/2001 | US6254461 Process of dressing glass disk polishing pads using diamond-coated dressing disks |
| 06/27/2001 | EP1110683A2 Method and apparatus for resurfacing anvil blanket of a rotary diecutter for box making machine |
| 06/27/2001 | EP1110671A2 Dressing, honing and grinding tool |
| 06/21/2001 | US20010004581 Dressing, honing and grinding tool |
| 06/21/2001 | US20010004579 Dressing wheel system |
| 06/19/2001 | US6248003 Method of truing grinding wheel and device used in performing such method |
| 06/14/2001 | WO2001043178A1 Polishing-product discharging device and polishing device |
| 06/14/2001 | WO2001002133A3 Improvement in and relating to edge grinding |
| 06/12/2001 | US6244944 Method and apparatus for supporting and cleaning a polishing pad for chemical-mechanical planarization of microelectronic substrates |
| 06/12/2001 | US6244939 Micro-discharge truing device and fine machining method using the device |
| 06/06/2001 | CN1066660C A method of fine machining of gear-wheels using an internally toothed tool |
| 06/06/2001 | CN1066659C Method for precision machining of gear-wheels and internal toothed tool |
| 06/05/2001 | US6241590 External abrasive machine |
| 06/05/2001 | US6241588 Cavitational polishing pad conditioner |
| 06/05/2001 | US6241587 System for dislodging by-product agglomerations from a polishing pad of a chemical mechanical polishing machine |
| 06/05/2001 | US6241581 Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus |
| 06/05/2001 | US6240592 Wheel detailing apparatus |
| 05/31/2001 | DE10057998A1 Polishing method involves inclining tool at defined angle in direction perpendicular to holding surface and in tool displacement direction, then in direction to reduce elastic deformation |
| 05/30/2001 | EP1103345A2 Cloth cleaning device and polishing machine |
| 05/29/2001 | US6238270 Method for conditioning a polishing pad used in chemical-mechanical planarization of semiconductor wafers |
| 05/25/2001 | WO2001036151A1 Sharpening device for rotating cutting tools and machine employing said device |
| 05/25/2001 | CA2391137A1 Sharpening device for rotating cutting tools and machine employing said device |
| 05/24/2001 | US20010001738 Preconditioning polishing pads for chemical-mechanical polishing |
| 05/23/2001 | EP1100653A1 Rotary dressing tool containing brazed diamond layer |
| 05/23/2001 | CN1296434A Modular machine tool for polishing and planting substrates |
| 05/22/2001 | US6235635 Linear CMP tool design using in-situ slurry distribution and concurrent pad conditioning |
| 05/22/2001 | US6234884 Semiconductor wafer polishing device for removing a surface unevenness of a semiconductor substrate |
| 05/22/2001 | US6234883 Method and apparatus for concurrent pad conditioning and wafer buff in chemical mechanical polishing |
| 05/22/2001 | US6234880 Device and method for profiling grinding worms |
| 05/22/2001 | US6234868 Apparatus and method for conditioning a polishing pad |
| 05/17/2001 | US20010001301 Chemical mechanical polishing conditioner |
| 05/15/2001 | US6231427 Linear polisher and method for semiconductor wafer planarization |
| 05/15/2001 | US6231425 Polishing apparatus and method |
| 05/10/2001 | WO2001032360A1 Closed-loop ultrasonic conditioning control for polishing pads |
| 05/09/2001 | EP1097783A2 Device for quick removal of a tool support |
| 05/08/2001 | US6227954 Polishing apparatus |
| 05/08/2001 | US6227948 Polishing pad reconditioning via polishing pad material as conditioner |
| 05/08/2001 | US6227947 Apparatus and method for chemical mechanical polishing metal on a semiconductor wafer |
| 05/03/2001 | US20010000753 Apparatus and method for chemical/mechanical polishing |
| 05/03/2001 | DE10042613A1 Electrolysis dressing for honing grindstone, involves impressing preset voltage between grinding stone, separated from grindstone processing surface and electrode with simultaneously supply of electroconductive fluid |
| 05/01/2001 | US6224470 Pad cleaning brush for chemical mechanical polishing apparatus and method of making the same |
| 05/01/2001 | US6224469 Combined cutting and grinding tool |
| 05/01/2001 | US6224462 Grinding machine |
| 05/01/2001 | US6224459 Workpiece inspection and handling |
| 04/26/2001 | US20010000502 Grinding and polishing machines |
| 04/26/2001 | US20010000490 Rotating a polishing pad affixed to a platen at a first rotational speed, supplying an abrasive material over a surface of polishing pad, pressing the wafer against pad surface while at the same time rotating wafer at second speed |
| 04/26/2001 | DE10042612A1 Internal grinding method for fuel injection nozzle, involves simultaneous grinding and pressing of non-conductive film provided on bonded surface of grinding wheel during contact with workpiece |
| 04/24/2001 | US6221773 Method for working semiconductor wafer |
| 04/24/2001 | US6220941 Method of post CMP defect stability improvement |
| 04/24/2001 | US6220936 In-site roller dresser |
| 04/19/2001 | WO2001026862A1 Conditioner for polishing pad and method for manufacturing the same |
| 04/17/2001 | US6217430 Pad conditioner cleaning apparatus |
| 04/17/2001 | US6217429 Polishing pad conditioner |
| 04/17/2001 | US6217423 Apparatus and method for mirror surface grinding of magnetic disc substrate |
| 04/17/2001 | US6217422 Light energy cleaning of polishing pads |
| 04/17/2001 | US6217420 Grinding machine spindle flexibly attached to platform |
| 04/12/2001 | WO2000053370A3 Method and apparatus for non-abrasive conditioning of polishing pads |
| 04/11/2001 | EP1089851A1 Wafer edge polishing method and apparatus |
| 04/10/2001 | US6213856 Conditioner and conditioning disk for a CMP pad, and method of fabricating, reworking, and cleaning conditioning disk |
| 04/10/2001 | US6213843 Method for grinding surfaces of workpieces |
| 04/05/2001 | WO2001023139A1 Polishing pad treatment for surface conditioning |
| 04/05/2001 | US20010000165 Methods for in-situ cleaning of abrasive belt/planer surfaces using dry ice and cleaning systems and device related thereto |
| 03/28/2001 | CN2424876Y Grinding wheel dressing pen using diamond thick film as grinding head |
| 03/27/2001 | US6206765 Non-rotational dresser for grinding stones |
| 03/21/2001 | EP1084786A1 Method of dressing an internally or externally toothed tool for finishing gear flanks |
| 03/21/2001 | EP1084009A1 Cmp pad conditioner arrangement and method therefor |
| 03/20/2001 | US6203589 Metal-resis bond grindstone and method for manufacturing the same |
| 03/20/2001 | US6203413 Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies |
| 03/15/2001 | WO2001017724A2 Ultrasonic transducer slurry dispenser |
| 03/15/2001 | DE19942732A1 Abrichtvorrichtung Dressing |
| 03/14/2001 | EP1083028A2 Dressing apparatus |
| 03/13/2001 | US6200207 Dressing apparatus for chemical mechanical polishing pad |
| 03/13/2001 | US6200199 Chemical mechanical polishing conditioner |
| 03/08/2001 | WO2001015865A1 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 03/08/2001 | DE19939258A1 Werkzeug und Verfahren zum abrasiven Bearbeiten einer im wesentlichen ebenen Fläche A method for abrasive machining tool and a substantially flat surface |
| 03/07/2001 | EP1080843A2 Method and apparatus for CNC controlled dressing of the regulating wheel of a centerless grinding machine |
| 03/07/2001 | EP1080840A2 Polishing apparatus, polishing method and method of conditioning polishing pad |
| 03/07/2001 | EP1080839A2 Polishing apparatus and dressing method |
| 03/07/2001 | EP1080836A2 Apparatus and method for processing the components of a neutron lens |
| 03/07/2001 | EP1080834A2 Centerless grinding machine |
| 03/07/2001 | CN1286158A Abrasive tool having metal bound phase |
| 03/06/2001 | US6196900 Ultrasonic transducer slurry dispenser |
| 03/06/2001 | US6196899 Polishing apparatus |
| 03/06/2001 | US6196897 Automatic lapping method and a lapping apparatus using the same |