| Patents for B24B 53 - Devices or means for dressing or conditioning abrasive surfaces (5,132) |
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| 05/11/2004 | US6733370 In-situ pad conditioning apparatus for CMP polisher |
| 05/11/2004 | US6733363 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 05/06/2004 | US20040087255 Method for grinding metallic workpieces containing, in particular, nickel |
| 05/06/2004 | US20040087248 Polishing method and apparatus |
| 05/06/2004 | DE10345155A1 Grindstone dressing method e.g. for shaping rail, involves making grindstone attached to spindle, to abut shaping roll attached to another spindle |
| 05/06/2004 | DE10214792B4 Verfahren zum Schleifen von Profilen an Werkstücken Method for grinding profiles on workpieces |
| 05/04/2004 | US6732009 Machining error correction method adapted for numerically controlled machine tool and grinding machine using the same |
| 05/04/2004 | US6730191 Coaxial dressing for chemical mechanical polishing |
| 05/04/2004 | US6729943 System and method for controlled polishing and planarization of semiconductor wafers |
| 04/29/2004 | US20040082289 Conductive polishing article for electrochemical mechanical polishing |
| 04/29/2004 | US20040082288 Fixed abrasive articles |
| 04/22/2004 | US20040074599 Methods and apparatus for conditioning and temperature control of a processing surface |
| 04/21/2004 | EP1409201A1 Fixed abrasive articles with wear indicators |
| 04/21/2004 | EP1250215B1 System and method for controlled polishing and planarization of semiconductor wafers |
| 04/21/2004 | CN1491147A Method and device for training grniding wheel ,and grinding device |
| 04/20/2004 | US6722950 Method and apparatus for electrodialytic chemical mechanical polishing and deposition |
| 04/20/2004 | US6722948 Pad conditioning monitor |
| 04/20/2004 | US6722947 Lapping machine, lapping method, and method of manufacturing magnetic head |
| 04/15/2004 | US20040072512 Polishing apparatus |
| 04/15/2004 | US20040072510 Cmp conditioner, method for arranging rigid grains used for cmp conditioner, and method for manufacturing cmp conditioner |
| 04/15/2004 | DE10245610A1 Verfahren zum selektiven Entfernen von Metallresten von einer dielektrischen Schicht mittels chemischen mechanischen Polierens A method for the selective removal of metal residues from a dielectric layer by chemical mechanical polishing |
| 04/15/2004 | DE10220513B4 Verfahren zum Abrichten oder Profilieren einer zylindrischen oder im wesentlichen zylindrischen Schleifschnecke A method of dressing or profiling a cylindrical or substantially cylindrical grinding worm |
| 04/13/2004 | US6719619 Quick coupler for mounting a rotational disk |
| 04/08/2004 | WO2004028746A2 Brazed diamond tools and methods for making the same |
| 04/07/2004 | CN2609714Y Abrasive wheel differential compensate dressing apparatus |
| 04/06/2004 | US6716087 Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus |
| 04/01/2004 | US20040063318 Method of selectively removing metal residues from a dielectric layer by chemical mechanical polishing |
| 03/31/2004 | EP1401614A1 Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life |
| 03/31/2004 | EP1200228B1 Improvement in and relating to edge grinding |
| 03/31/2004 | EP1071540B1 Corrosion resistant abrasive article and method of making |
| 03/31/2004 | CN2608221Y Abrasive wheel shaping correction apparatus |
| 03/31/2004 | CN1485180A Chemical mechanical polishing and pad dressing method |
| 03/30/2004 | US6712682 Grinding wheel fixture |
| 03/30/2004 | US6712678 Polishing-product discharging device and polishing device |
| 03/25/2004 | US20040058546 Constant pH polish and scrub |
| 03/24/2004 | EP1399961A2 Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing |
| 03/24/2004 | EP1399295A1 Feedforward and feedback control for conditioning of chemical mechanical polishing pad |
| 03/24/2004 | CN1484567A System and method for polishing and planarizing semiconductor wafers using reduced surface area polishing pads and variable partial pad |
| 03/24/2004 | CN1142844C Glass product machining apparatus |
| 03/23/2004 | US6709981 Method and apparatus for processing a semiconductor wafer using novel final polishing method |
| 03/18/2004 | US20040053567 End effectors and methods for manufacturing end effectors with contact elements to condition polishing pads used in polishing micro-device workpieces |
| 03/17/2004 | EP1084009B1 Cmp pad conditioner arrangement and method therefor |
| 03/17/2004 | CN1482959A CMP Conditioner, method for arranging rigid grains used for CMP conditioner, and method for manufacturing CMP conditioner |
| 03/16/2004 | US6706139 Method and apparatus for cleaning a web-based chemical mechanical planarization system |
| 03/16/2004 | US6705930 System and method for polishing and planarizing semiconductor wafers using reduced surface area polishing pads and variable partial pad-wafer overlapping techniques |
| 03/16/2004 | US6705929 Cloth cleaning device and polishing machine |
| 03/11/2004 | US20040048557 Abrasive cloth dresser and method for dressing an abrasive cloth with the same |
| 03/11/2004 | US20040048551 Centreless cylindrical grinding machine |
| 03/11/2004 | US20040048550 Modular method for chemical mechanical planarization |
| 03/10/2004 | EP1396311A1 Rotary dressing tool containing abrasive inserts |
| 03/09/2004 | US6702654 Conditioning wheel for conditioning a semiconductor wafer polishing pad and method of manufacture thereof |
| 03/09/2004 | US6702646 Method and apparatus for monitoring polishing plate condition |
| 03/04/2004 | WO2002053320A9 Wafer support for chemical mechanical planarization |
| 03/04/2004 | US20040040864 Using rotating, electroconductive superabrasive grindstone; supplying direct current voltage |
| 03/03/2004 | CN2605100Y Arbitrary double circular arc R grinding wheel dressing apparatus for grinding thread track of ball lead screw for lend screw grinding machine |
| 03/03/2004 | CN1479665A Actived slurry chemical mechanical planarization system and method for implenting the same |
| 03/02/2004 | US6699107 Polishing head and apparatus with an improved pad conditioner for chemical mechanical polishing |
| 03/02/2004 | US6699106 Conditioner for polishing pad and method for manufacturing the same |
| 03/02/2004 | US6699105 Method and apparatus for cutting and grinding single crystal SiC |
| 02/26/2004 | US20040038632 Conditioner of chemical-mechanical polishing station |
| 02/26/2004 | US20040038623 Methods and systems for conditioning planarizing pads used in planarizing substrates |
| 02/26/2004 | US20040038534 Apparatus and method for conditioning a polishing pad used for mechanical and/or chemical-mechanical planarization |
| 02/24/2004 | US6695684 Chemical mechanical polishing apparatus having a cleaner for cleaning a conditioning disc and method of conditioning a polishing pad of the apparatus |
| 02/24/2004 | US6695680 Polishing pad conditioner for semiconductor polishing apparatus and method of monitoring the same |
| 02/19/2004 | US20040033772 Corrosion resistant abrasive article and method of making |
| 02/18/2004 | EP1389505A2 Polishing apparatus |
| 02/18/2004 | CN1138612C Wafer edge polishing method and apparatus |
| 02/12/2004 | WO2004012904A2 Abrasive tool having a unitary arbor |
| 02/12/2004 | US20040029497 Method and device for producing molds for toothed belts |
| 02/11/2004 | EP1100653B1 Rotary dressing tool containing brazed diamond layer |
| 02/05/2004 | US20040023610 Polishing article for processing a substrate comprises a fabric layer having a conductive layer disposed thereover. The conductive layer has an exposed surface adapted to polish a substrate. The fabric layer may be woven or non-woven. The |
| 02/05/2004 | US20040023602 Chemical mechanical polishing and pad dressing method |
| 02/05/2004 | US20040023599 Abrasive tool having a unitary arbor |
| 02/05/2004 | US20040023597 Method for seasoning a polishing pad |
| 02/05/2004 | US20040023495 Contacts for electrochemical processing |
| 02/05/2004 | US20040020789 For planarizing a substrate surface |
| 02/05/2004 | DE10234044A1 Device for truing up a grinding disc has separately aligned truing roller held by truing head connected through positioning element to truing slide connected to guide carriage of linear guide unit |
| 02/05/2004 | DE10232670A1 Process and device for cleaning a lapping disc has two parallel plates with an integrated high pressure hose feeding a fluid and with suction removal |
| 02/04/2004 | EP1386695A2 Conductive polishing article for electrochemical mechanical polishing |
| 02/03/2004 | US6687566 Method of machining a female screw and dressing a grinding wheel for female screw machining |
| 02/03/2004 | US6685543 Compensating chemical mechanical wafer polishing apparatus and method |
| 01/29/2004 | US20040018807 Polishing pad conditioner and chemical-mechanical polishing apparatus having the same |
| 01/28/2004 | EP1230067B1 Sharpening device for rotating cutting tools and machine employing said device |
| 01/27/2004 | US6682405 Polishing apparatus having a dresser and dresser adjusting method |
| 01/27/2004 | US6682404 Method for controlling a temperature of a polishing pad used in planarizing substrates |
| 01/22/2004 | WO2004007146A1 Polishing apparatus and method of dressing polishing tool |
| 01/20/2004 | US6679763 Apparatus and method for qualifying a chemical mechanical planarization process |
| 01/15/2004 | US20040009743 Grind method of diamond grinding wheel finisher |
| 01/15/2004 | US20040009742 Polishing pad conditioning disks for chemical mechanical polisher |
| 01/14/2004 | EP1379357A2 Method and apparatus for avoiding particle accumulation during an electrochemical mechanical process |
| 01/14/2004 | CN1134323C Modular machine tool for polishing and planting substrates |
| 01/08/2004 | WO2004002681A1 Method of judging life and quality of abrasive pad etc, method of conditioning abrasive pad, polishing device, semiconductor device, and method of producing the semiconductor device |
| 01/08/2004 | US20040005843 Method for dressing or profiling of an essentially cylindrical grinding worm |
| 01/06/2004 | US6672949 Polishing apparatus |
| 01/06/2004 | US6672945 Polishing apparatus and dressing method |
| 12/31/2003 | CN1132721C Abrasive tool having metal bound phase |
| 12/30/2003 | US6669538 Pad cleaning for a CMP system |
| 12/25/2003 | US20030236058 Centerless grinding apparatus and centerless grinding method |
| 12/24/2003 | WO2003082519B1 Conditioner and conditioning methods for smooth pads |
| 12/23/2003 | US6666755 Belt wiper for a chemical mechanical planarization system |