Patents for B24B 53 - Devices or means for dressing or conditioning abrasive surfaces (5,132)
02/2006
02/28/2006US7004822 Chemical mechanical polishing and pad dressing method
02/23/2006WO2006019839A1 A method and apparatus for conditioning a polishing pad
02/23/2006WO2006019062A1 Rotary diamond dresser
02/23/2006US20060040595 Method and system for chemical mechanical polishing pad cleaning
02/22/2006EP1626839A1 A method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner
02/21/2006US7001254 Apparatus and method for conditioning a contact surface of a processing pad used in processing microelectronic workpieces
02/15/2006CN1735479A Polishing pad conditioning
02/09/2006US20060030244 Substrate polishing apparatus
02/09/2006DE102005030846A1 Verzahnungsschleifmaschine Gear Grinding Machine
02/08/2006CN2756387Y Sand wheel repair device for sharpening pencil sharpener
02/08/2006CN1730240A Regulating method for grinding curvature radius of bearing ring channel by cutting in
02/07/2006US6994612 Methods for conditioning surfaces of polishing pads after chemical-mechanical polishing
02/07/2006US6994611 (CMP); polishing head for holding and applying first or second a wafer to the CMP pad surface; and a chemical dispenser for uniformly applying pad cleaning chemicals appropriate for either copper or oxide wafer surface across the CMP pad surface
02/02/2006US20060025056 End effectors and methods for manufacturing end effectors with contact elements to condition polishing pads used in polishing micro-device workpieces
02/02/2006US20060025050 Gear grinding machine
02/02/2006US20060021857 Conveyer belt-adjusting device for a conveyer unit
02/02/2006US20060021610 Dressing tool for profiling the tip area of a threaded grinding wheel
02/01/2006EP1621277A1 Dressing tool for the tip of a grinding worm
02/01/2006CN1727102A 齿轮磨床 Gear Grinder
02/01/2006CN1240111C Device for eliminating stress by machining
01/2006
01/31/2006US6991528 Polishing article for processing a substrate comprises a fabric layer having a conductive layer disposed thereover. The conductive layer has an exposed surface adapted to polish a substrate. The fabric layer may be woven or non-woven. The
01/26/2006US20060019584 Method and apparatus for conditioning a polishing pad
01/26/2006US20060019583 Method and apparatus for conditioning a polishing pad
01/24/2006US6988942 Conductive polishing article for electrochemical mechanical polishing
01/24/2006US6988933 Truing method and apparatus
01/19/2006WO2006006843A1 Belt cleaning system for a portable belt sander
01/19/2006US20060014474 Gear grinding machine
01/18/2006CN1721114A 齿轮磨床 Gear Grinder
01/17/2006US6986702 Centerless grinding apparatus and centerless grinding method
01/12/2006US20060009129 Feedforward and feedback control for conditioning of chemical mechanical polishing pad
01/12/2006DE19818788B4 Vorrichtung zum nachbearbeitenden Entgraten von Werkstücken, insbesondere von Zahnrädern, mittels Entgraträdern Apparatus for nachbearbeitenden deburring workpieces, in particular of gear wheels, by means of Entgraträdern
01/11/2006CN1720119A Cutting tool for soft material
01/11/2006CN1718371A Polishing pad conditioner and methods of manufacture and recycling
01/05/2006US20060003673 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
01/04/2006EP1610929A1 Chip customized polish pads for chemical mechanical planarization (cmp)
01/03/2006US6982009 Method and device for cleaning abrasive plates on an abrasive machine
01/03/2006US6981909 Method for conditioning superabrasive tools
12/2005
12/29/2005US20050284770 A multilayer pad having a ring-shaped upper polish layer and replaceable conductive layer; attaching to exterior power source; controlling the rate of copper material removal from printed circuits, determining each polishing time in each zone; tools for making semiconductors
12/22/2005US20050282477 Apparatus for conditioning processing pads
12/22/2005US20050282476 Off-line tool for breaking in multiple pad conditioning disks used in a chemical mechanical polishing system
12/22/2005US20050282475 Apparatus and method for breaking in multiple pad conditioning disks for use in a chemical mechanical polishing system
12/21/2005CN2747019Y Grinder correcting pen for electric knife-grinder
12/21/2005CN1711152A Glass substrate for information recording medium and method for producing same
12/20/2005US6976907 Polishing pad conditioning
12/20/2005US6976903 Apparatus for controlling retaining ring and wafer head tilt for chemical mechanical polishing
12/15/2005US20050276979 CVD diamond-coated composite substrate containing a carbide-forming material and ceramic phases and method for making same
12/08/2005WO2005117084A1 Reactive fluid systems for removing deposition materials and methods for using same
12/08/2005US20050272349 Method for conditioning superabrasive tools
12/01/2005US20050266688 Semiconductor device fabrication method
11/2005
11/29/2005US6969307 Polishing pad conditioning and polishing liquid dispersal system
11/29/2005US6969305 Polishing apparatus
11/29/2005US6969298 Grinding machine, in particular centerless cylindrical grinding machine
11/29/2005US6969297 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
11/24/2005US20050261150 Reactive fluid systems for removing deposition materials and methods for using same
11/24/2005US20050260936 Dynamic atomizer on conditioner assemblies using high velocity water
11/24/2005US20050260925 Polishing apparatus
11/24/2005US20050260924 Pad break-in method for chemical mechanical polishing tool which polishes with ceria-based slurry
11/24/2005DE102004020947A1 Verfahren zum Abrichten zylindrischer Schleifschnecken für das kontinuierliche Wälzschleifen von Zahnrädern und Abrichtwerkzeug A method of dressing cylindrical grinding worms for continuous generating grinding of gears and dressing
11/23/2005EP1330336B1 Centreless cylindrical grinding machine
11/23/2005CN2741720Y Mixed grinding wheel finishing tool
11/23/2005CN2741719Y Grinding wheel finishing device for digital control inner ball surface grinder
11/17/2005US20050252501 Sharpening apparatus
11/16/2005EP1594657A2 Grinding machine
11/10/2005WO2005105373A1 Diamond tools
11/10/2005US20050250425 Chemical mechanical polishing equipment and conditioning thereof
11/10/2005US20050250424 Polishing pad, method of manufacturing glass substrate for use in data recording medium using the pad, and glass substrate for use in data recording medium obtained by using the method
11/10/2005DE102004057596A1 Schleifschnecke, Profilierzahnrad und Verfahren zum Profilieren der Schleifschnecke Grinding worm profiling gear and method for profiling the grinding worm
11/09/2005CN1694788A Brazed diamond tools and methods for making the same
11/09/2005CN1694783A Diamond conditioning of soft chemical mechanical planarization/polishing (CMP) polishing pads
11/08/2005US6962524 Conductive polishing article for electrochemical mechanical polishing
11/03/2005US20050245176 Process and dressing tool for the dressing of cylindrical grinding worms for the continuous generation grinding of gears
11/02/2005CN1689760A Shaving technique and shaving tool of cylinder grinding worm for continuous tumbling gear
11/02/2005CN1689742A Worm abrasion wheel, forming gear and forming method of worm abrasion wheel
11/01/2005US6960114 Pad conditioner of CMP equipment
11/01/2005US6959771 Abrasive and boring method using the same
10/2005
10/27/2005US20050239385 Grinding worm, profiling gear and process for the profiling of the grinding worm
10/27/2005US20050239283 Polishing method, polishing apparatus, and method of manufacturing semiconductor device
10/27/2005US20050236368 Method for manufacturing semiconductor device
10/26/2005EP1311368B1 Polishing apparatus and methods controlling the polishing pressure as a function of the overlapping area between the polishing head and the semiconductor substrate
10/25/2005US6958005 Polishing pad conditioning system
10/25/2005US6957998 Polishing apparatus
10/25/2005US6957997 Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner
10/19/2005CN1684794A Abrasive tool having a unitary arbor
10/13/2005WO2005095059A1 Undulated pad conditioner and method of using same
10/13/2005WO2005095056A1 Cmp conditioner
10/13/2005WO2005095055A1 Insulated pad conditioner and method of using same
10/13/2005US20050227596 Polishing apparatus
10/13/2005US20050224368 Polishing system and polishing method
10/12/2005EP1584393A1 Method of dressing a substantially cylindrical grinding worm
10/12/2005EP1583638A1 Polishing pad conditioning
10/11/2005US6953390 Polishing apparatus
10/11/2005US6953382 Methods and apparatuses for conditioning polishing surfaces utilized during CMP processing
10/06/2005US20050221741 Polymeric polishing pad having continuously regenerated work surface
10/06/2005US20050221732 Method for dressing a grinding worm
10/06/2005US20050221731 Polishing pad conditioning system
10/06/2005US20050221730 Polishing pad conditioning and polishing liquid dispersal system
10/06/2005US20050221720 Polishing apparatus
10/05/2005CN2730554Y Polishing-part for polishing substrate
10/05/2005CN2730553Y Polishing-part for electrochemical mechanical polishing
10/04/2005US6951509 Undulated pad conditioner and method of using same
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