| Patents for B24B 53 - Devices or means for dressing or conditioning abrasive surfaces (5,132) |
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| 04/11/2002 | WO2002028593A2 Method and apparatus for making a cutting tool having a flute |
| 04/11/2002 | WO2002028578A2 Cutting tool and method and apparatus for making the same |
| 04/11/2002 | US20020042200 Using multilayer polymer pad |
| 04/09/2002 | US6368198 Diamond grid CMP pad dresser |
| 04/09/2002 | US6368197 Method and apparatus for supporting and cleaning a polishing pad for chemical-mechanical planarization of microelectronic substrates |
| 04/09/2002 | US6368186 Apparatus for mounting a rotational disk |
| 04/04/2002 | WO2002026444A1 Wafer carrier for cmp system |
| 04/04/2002 | US20020039880 Polishing apparatus |
| 04/04/2002 | US20020039877 Method and system for cleaning a chemical mechanical polishing pad |
| 04/02/2002 | US6364752 Method and apparatus for dressing polishing cloth |
| 04/02/2002 | US6364749 CMP polishing pad with hydrophilic surfaces for enhanced wetting |
| 04/02/2002 | US6364742 Chemical-mechanical polishing apparatus |
| 03/28/2002 | WO2002024410A1 Cmp apparatus and methods to control the tilt of the carrier head, the retaining ring and the pad conditioner |
| 03/27/2002 | EP1190455A2 Dual cmp pad conditioner |
| 03/27/2002 | CN1081510C 改进的磨削和抛光机床 Improved grinding and polishing machine |
| 03/26/2002 | US6361423 Chemical mechanical polishing conditioner |
| 03/26/2002 | US6361414 Apparatus and method for conditioning a fixed abrasive polishing pad in a chemical mechanical planarization process |
| 03/26/2002 | US6361413 Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic device substrate assemblies |
| 03/26/2002 | US6361412 Process and rotary point crush truer for dressing grinding wheels with profiled working surfaces |
| 03/26/2002 | US6361411 Method for conditioning polishing surface |
| 03/26/2002 | US6361410 Grinding apparatus for forming grooves on a workpiece and a method for dressing a grindstone used in the apparatus |
| 03/26/2002 | US6361409 Polymeric polishing pad having improved surface layer and method of making same |
| 03/19/2002 | US6358124 Pad conditioner cleaning apparatus |
| 03/19/2002 | CA2245498C Lapping and polishing method and apparatus for planarizing photoresist and metal microstructure layers |
| 03/14/2002 | WO2002020216A1 Grinding of cutting tools with a constant rake angle |
| 03/14/2002 | US20020031979 Method of polishing a magnetic head slider |
| 03/13/2002 | EP0865342B1 Improvements in and relating to grinding machines |
| 03/12/2002 | US6354925 Composite polishing pad |
| 03/12/2002 | US6354923 Apparatus for planarizing microelectronic substrates and conditioning planarizing media |
| 03/12/2002 | US6354921 System for cross stream regassifier for improved chemical mechanical polishing in the manufacture of semiconductors |
| 03/12/2002 | US6354918 Apparatus and method for polishing workpiece |
| 03/12/2002 | US6354910 Apparatus and method for in-situ measurement of polishing pad thickness loss |
| 03/07/2002 | US20020028628 Machining center and method of changing tools thereof |
| 03/06/2002 | EP1184134A2 Machining center with dressing tool |
| 03/06/2002 | CN1080166C Method of and apparatus for polishing wafer |
| 03/05/2002 | US6352595 Method and system for cleaning a chemical mechanical polishing pad |
| 03/05/2002 | US6352470 Method and apparatus for supporting and cleaning a polishing pad for chemical-mechanical planarization of microelectronic substrates |
| 02/28/2002 | WO2002016078A2 Polishing apparatus and methods controlling the polishing pressure as a function of the overlapping area between the polishing head and the semiconductor substrate |
| 02/28/2002 | WO2002016075A2 Cmp apparatus with an oscillating polishing pad rotating in the opposite direction of the wafer |
| 02/28/2002 | US20020025764 Polishing apparatus |
| 02/27/2002 | EP1181134A1 Method and system for cleaning a chemical mechanical polishing pad |
| 02/27/2002 | CN1079717C Apparatus and method for dressing inside diameter saws |
| 02/26/2002 | US6350691 Method and apparatus for planarizing microelectronic substrates and conditioning planarizing media |
| 02/26/2002 | US6350184 Polishing pad conditioning device with cutting elements |
| 02/26/2002 | US6350183 High pressure cleaning |
| 02/21/2002 | WO2002015247A2 Method and apparatus for processing a semiconductor wafer using novel final polishing method |
| 02/21/2002 | US20020022439 Method for conditioning a polishing pad used in chemical-mechanical planarization of semiconductor wafers |
| 02/21/2002 | US20020022437 Working method for curved surface of a work and an apparatus thereof |
| 02/20/2002 | CN1336637A Method for prodn. of glass substrate used as magnetic recording medium |
| 02/19/2002 | US6347982 Method for making a polishing apparatus utilizing brazed diamond technology and titanium nitride |
| 02/19/2002 | US6347981 Method and apparatus for conditioning polishing pads utilizing brazed diamond technology and titanium nitride |
| 02/13/2002 | EP1179391A2 Procedure for creating multi-thread forms on a grindstone, particularly for the micro-scoring of the underside of skis |
| 02/13/2002 | EP1178870A1 Blade sharpening |
| 02/07/2002 | US20020016136 Conditioner for polishing pads |
| 02/06/2002 | CN2475512Y Sheet-shape emery wheel trimmed chip with seamless structure |
| 02/06/2002 | CN1078832C Method and apparatus for electrolytic dressing |
| 02/05/2002 | US6343979 Modular machine for polishing and planing substrates |
| 02/05/2002 | US6343977 Multi-zone conditioner for chemical mechanical polishing system |
| 02/05/2002 | US6343974 Real-time method for profiling and conditioning chemical-mechanical polishing pads |
| 01/31/2002 | US20020013121 Method for the production of glass substrates for magnetic recording mediums |
| 01/30/2002 | CN1078516C Internal abrasive machine |
| 01/29/2002 | US6341999 Glass substrate chamfering method and apparatus |
| 01/29/2002 | US6341997 Method for recycling a polishing pad conditioning disk |
| 01/24/2002 | WO2002006008A1 Contact-discharge truing/dressing method and device therefor |
| 01/24/2002 | US20020009954 Polishing apparatus |
| 01/23/2002 | EP1174215A1 Lapping surface patterning system |
| 01/23/2002 | EP0993350B1 Internal abrasive machine |
| 01/23/2002 | CN1332664A Abrasive machine for machining surface of cylindrical work piece |
| 01/22/2002 | US6340327 Wafer polishing apparatus and process |
| 01/22/2002 | US6340326 System and method for controlled polishing and planarization of semiconductor wafers |
| 01/17/2002 | WO2000060645A3 Dual cmp pad conditioner |
| 01/17/2002 | US20020006768 Polishing method using an abrading plate |
| 01/17/2002 | US20020006767 Ion exchange pad or brush and method of regenerating the same |
| 01/17/2002 | DE10132368A1 Wafer-Poliervorrichtung The wafer polishing apparatus |
| 01/16/2002 | EP1171264A1 Method of conditioning wafer polishing pads |
| 01/16/2002 | EP1171256A1 Process and apparatus for manufacturing endodontic instruments |
| 01/15/2002 | US6338672 Dressing wheel system |
| 01/10/2002 | WO2002002277A2 A conditioning mechanism in a chemical mechanical polishing apparatus for semiconductor wafers |
| 01/10/2002 | US20020004361 Wafer polishing apparatus |
| 01/10/2002 | US20020004306 Coaxial dressing for chemical mechanical polishing |
| 01/09/2002 | EP0921904B1 Apparatus and method for polishing semiconductor devices |
| 01/09/2002 | EP0907461B1 Grinding machine spindle flexibly attached to platform |
| 01/09/2002 | CN1077483C Autmatic lapping method and lapping apparatus using the same |
| 01/08/2002 | US6337281 Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like |
| 01/08/2002 | US6336855 Grindstone for ELID grinding and apparatus for ELID surface grinding |
| 01/08/2002 | US6336851 Substrate belt polisher |
| 01/08/2002 | US6336842 Rotary machining apparatus |
| 01/02/2002 | EP1166966A2 Restoring of glass processing diamond cutters |
| 01/02/2002 | EP1165287A1 Apparatus and process for reconditioning polishing pads |
| 01/01/2002 | US6334810 Chemical mechanical polishing apparatus and method of using the same |
| 12/27/2001 | WO2001098028A1 Polishing pad |
| 12/27/2001 | WO2000062977A9 Method of conditioning wafer polishing pads |
| 12/27/2001 | US20010055937 Cleaning method and polishing apparatus employing such cleaning method |
| 12/25/2001 | US6332826 Polishing apparatus |
| 12/20/2001 | US20010053661 Apparatus and method for ELID grinding a large-diameter workpiece to produce a mirror surface finish |
| 12/20/2001 | US20010053660 Methods for break-in and conditioning a fixed abrasive polishing pad |
| 12/19/2001 | CN1076249C Method and apparatus for shaping polishing pads |
| 12/18/2001 | US6331137 Polishing pad having open area which varies with distance from initial pad surface |
| 12/18/2001 | US6331136 CMP pad conditioner arrangement and method therefor |
| 12/13/2001 | WO1999062671A9 Apparatus for polishing silicon wafers |