| Patents for B24B 53 - Devices or means for dressing or conditioning abrasive surfaces (5,132) |
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| 07/11/2002 | WO2002053322A2 System and method for polishing and planarization of semiconductor wafers using reduced surface area polishing pads |
| 07/11/2002 | WO2002053320A2 Wafer support for chemical mechanical planarization |
| 07/11/2002 | US20020090896 Pad Cleaning for a CMP system |
| 07/11/2002 | DE10163301A1 Surface preparation process for grinding tool involves focusing laser jet, applying it to tool surface for sampling, and removing layer of worked material between particles |
| 07/10/2002 | EP1221356A1 Eyeglass lens processing apparatus |
| 07/09/2002 | US6416878 Abrasive dressing tool and method for manufacturing the tool |
| 07/09/2002 | US6416617 Using a torque detector which detects the rotation torque of polishing platen or substrate holder and adaptively dressing the polishing pad if the rotation torque detected is equal to or smaller than a predetermined value |
| 07/09/2002 | US6416383 Device for dressing a grindstone to polish the running surface structure of a ski |
| 07/04/2002 | WO2002016078A3 Polishing apparatus and methods controlling the polishing pressure as a function of the overlapping area between the polishing head and the semiconductor substrate |
| 07/04/2002 | US20020086623 Dressing apparatus and polishing apparatus |
| 07/04/2002 | US20020086622 Method and apparatus for conditioning a polishing pad with sonic energy |
| 07/04/2002 | US20020086620 Method and apparatus for conditioning a polishing pad with sonic energy |
| 07/03/2002 | EP1066133B1 Polishing apparatus |
| 07/02/2002 | US6413357 Polishing apparatus |
| 07/02/2002 | US6413149 For semiconductor wafers |
| 07/02/2002 | US6413146 Polishing apparatus |
| 06/27/2002 | WO2002049807A1 Cmp conditioner, method for arranging rigid grains used for cmp conditioner, and method for manufacturing cmp conditioner |
| 06/27/2002 | WO2000063963A9 Non-abrasive conditioning for polishing pads |
| 06/27/2002 | US20020081951 Apparatus and method for qualifying a chemical mechanical planarization process |
| 06/27/2002 | US20020081944 Method and apparatus for forming grooves on a workpiece and for dressing a grindstone used in the groove formation |
| 06/27/2002 | US20020080698 System and method for controlling spin speed of media in an optical disc drive |
| 06/27/2002 | US20020078940 Conditioning device for grinding wheels |
| 06/26/2002 | EP1216118A1 Polishing pad treatment for surface conditioning |
| 06/25/2002 | US6409580 Rigid polishing pad conditioner for chemical mechanical polishing tool |
| 06/25/2002 | US6409579 Method and apparatus for conditioning a polish pad at the point of polish and for dispensing slurry at the point of polish |
| 06/25/2002 | US6409577 Method for conditioning a polishing pad used in chemical-mechanical planarization of semiconductor wafers |
| 06/20/2002 | US20020077037 Fixed abrasive articles |
| 06/20/2002 | US20020077035 Ion exchange materials for chemical mechanical polishing |
| 06/20/2002 | US20020076838 Polishing method |
| 06/20/2002 | DE10100870C1 Headless grinding machine operating process involves setting grindstone against fixed correcting unit so that it is constantly forcibly corrected |
| 06/13/2002 | WO2002028593A3 Method and apparatus for making a cutting tool having a flute |
| 06/13/2002 | US20020072314 Diaphragm for chemical mechanical polisher |
| 06/13/2002 | US20020072312 Chemical mechanical polishing apparatus having a cleaner for cleaning a conditioning disc and method of conditioning a polishing pad of the apparatus |
| 06/13/2002 | US20020072300 Method and apparatus for dressing polishing cloth |
| 06/12/2002 | EP1017540B1 An abrasive means and a grinding process |
| 06/12/2002 | CN2494733Y Device for dressing single-point abrasion wheel of grinder |
| 06/11/2002 | US6402883 Polishing pad conditioning surface having integral conditioning points |
| 06/11/2002 | US6402597 Polishing apparatus and method |
| 06/11/2002 | US6402588 Polishing apparatus |
| 06/06/2002 | WO2002043923A1 Cleaning device for cleaning polishing cloths used for polishing semiconductor wafers |
| 06/06/2002 | WO2002043919A1 Method and device for producing molds for toothed belts |
| 06/06/2002 | WO2002028599A3 Method and apparatus for making a cutting tool having a plurality of margins |
| 06/06/2002 | WO2002028578A3 Cutting tool and method and apparatus for making the same |
| 06/06/2002 | WO2001026862A8 Conditioner for polishing pad and method for manufacturing the same |
| 06/06/2002 | DE4416060C2 Abrichteinrichtung an einer Schleifmaschine zum Herstellen verschiedenartiger Innen- und Außenprofile Dresser on a grinding machine for the manufacture of various indoor and outdoor profiles |
| 06/06/2002 | DE10059067A1 Verfahren und Vorrichtung zur Herstellung von Zahnriemenformen und Zahnrädern Method and apparatus for production of timing belts and gears forms |
| 06/05/2002 | CN1352587A Apparatus and process for reconditioning polishing pads |
| 06/05/2002 | CN1351922A Reparing and milling device for chemical-mechanical polishing soft pad and its producing method |
| 06/04/2002 | US6398906 Wafer transfer apparatus and wafer polishing apparatus, and method for manufacturing wafer |
| 06/04/2002 | US6398626 Polishing apparatus |
| 06/04/2002 | US6398625 Apparatus and method of polishing with slurry delivery through a polishing pad |
| 05/30/2002 | US20020065029 Conditioner set for chemical-mechanical polishing station |
| 05/30/2002 | US20020063860 Method for inspecting a polishing pad in a semiconductor manufacturing process, an apparatus for performing the method, and a polishing device adopting the apparatus |
| 05/29/2002 | EP1208943A1 Method and apparatus for dressing a metal bonded grinding wheel |
| 05/29/2002 | EP0750538B1 Threaded grinding wheel, method of dressing, and grinding a workpiece therewith |
| 05/29/2002 | DE10134518A1 Verbessertes Diaphragma für eine chemische mechanische Poliervorrichtung Improved diaphragm for a chemical mechanical polishing apparatus |
| 05/29/2002 | CN2493350Y Shape correction machine for diamond grinding wheel |
| 05/28/2002 | US6394886 Conformal disk holder for CMP pad conditioner |
| 05/23/2002 | WO2001091969A3 Polishing methods and apparatus for semiconductor and integrated circuit manufacture |
| 05/21/2002 | US6390909 Disk for conditioning polishing pads |
| 05/21/2002 | US6390902 Multi-conditioner arrangement of a CMP system |
| 05/21/2002 | US6390895 Wetting abrasive; prepolishing |
| 05/16/2002 | WO2002002277A3 A conditioning mechanism in a chemical mechanical polishing apparatus for semiconductor wafers |
| 05/15/2002 | CN1349446A Method of conditioning wafer polishing pads |
| 05/14/2002 | US6387188 Pad conditioning for copper-based semiconductor wafers |
| 05/14/2002 | US6386963 Conditioning disk for conditioning a polishing pad |
| 05/14/2002 | US6386953 Topological profiling of grinding worms for continuous generating grinding of gear teeth |
| 05/10/2002 | WO2002036305A1 Centreless cylindrical grinding machine |
| 05/09/2002 | US20020055325 Polishing apparatus |
| 05/09/2002 | US20020053358 Method of cleaning abrasive plates of abrasive machine and cleaning device |
| 05/07/2002 | US6383290 Bowling lane dressing application mechanism |
| 05/02/2002 | WO2002035592A1 Polishing device |
| 05/02/2002 | WO2002035587A1 Method of producing semiconductor device and processing conditions setting device |
| 05/02/2002 | WO2002034467A1 Polisher |
| 05/02/2002 | US20020052172 Lapping machine, lapping method, and method of manufacturing magnetic head |
| 05/02/2002 | US20020052166 Polishing system |
| 05/02/2002 | US20020052064 Method and apparatus for processing a semiconductor wafer using novel final polishing method |
| 05/02/2002 | EP1201367A1 Dresser for polishing cloth and manufacturing method therefor |
| 05/02/2002 | EP1201366A1 Dressing device for grinding wheels |
| 05/02/2002 | EP1200228A1 Improvement in and relating to edge grinding |
| 05/02/2002 | EP0921886A4 Apparatus and method for improved precision grinding of face gears |
| 05/01/2002 | CN2488642Y Angle shaper |
| 04/30/2002 | US6379235 Wafer support for chemical mechanical planarization |
| 04/30/2002 | US6379230 Automatic polishing apparatus capable of polishing a substrate with a high planarization |
| 04/30/2002 | US6379229 Polishing apparatus |
| 04/30/2002 | US6379217 Process and device for dressing a grinding worm and for grinding pre-cut toothed workpiece |
| 04/25/2002 | US20020048957 Method of cleaning a polishing pad conditioner and apparatus for performing the same |
| 04/25/2002 | DE10046973A1 Manufacture of chemical vapor deposition diamond product, e.g. cutting tool, involves depositing chemical vapor deposition diamond to desired thickness at mold interface, dissolving mold, and mounting remaining diamond in holder |
| 04/24/2002 | EP1113902A4 Grinding machine, computer software to operate such a machine, and their uses therefor |
| 04/24/2002 | CN1346300A Modular controlled platen preparation system and method |
| 04/18/2002 | WO2002030618A1 Activated slurry cmp system and methods for implementing the same |
| 04/18/2002 | US20020045408 Abrasive machine for machining a surface of a cylindrical work piece |
| 04/17/2002 | EP1197296A2 Pad conditioning disk |
| 04/17/2002 | CN1082868C Grinding and polishing machine tool and method and apparatus for grinding and polishing disk using the same |
| 04/17/2002 | CA2323321A1 Dressing apparatus for grinding wheels |
| 04/16/2002 | US6371838 Polishing pad conditioning device with cutting elements |
| 04/16/2002 | US6371836 Groove cleaning device for chemical-mechanical polishing |
| 04/11/2002 | WO2002028599A2 Method and apparatus for making a cutting tool having a plurality of margins |
| 04/11/2002 | WO2002028598A1 Method for conditioning polishing pads |
| 04/11/2002 | WO2002028596A1 Web-style pad conditioning system and methods for implementing the same |