| Patents for B24B 53 - Devices or means for dressing or conditioning abrasive surfaces (5,132) |
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| 12/11/2001 | US6328637 Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization |
| 12/11/2001 | US6328636 Device and method for machining in which cool air cooling is used |
| 12/06/2001 | WO2001091974A1 Method and apparatus for conditioning a polish pad and for dispensing slurry |
| 12/06/2001 | WO2001091973A1 Method and apparatus for dispensing slurry at the point of polish |
| 12/06/2001 | WO2001091969A2 Polishing methods and apparatus for semiconductor and integrated circuit manufacture |
| 12/06/2001 | US20010049259 Surface treatment |
| 12/04/2001 | US6325709 Rounded surface for the pad conditioner using high temperature brazing |
| 12/04/2001 | US6325698 Cleaning method and polishing apparatus employing such cleaning method |
| 11/29/2001 | US20010046835 Protective coatings for CMP conditioning disk |
| 11/29/2001 | DE10025173A1 Verfahren zum Schleifen von insbesondere Nickel enthaltenden metallischen Werkstücken Method for grinding of particular nickel-containing metal workpieces |
| 11/27/2001 | US6322434 Polishing apparatus including attitude controller for dressing apparatus |
| 11/27/2001 | US6322429 Conditioner assembly and a conditioner back support for a chemical mechanical polishing apparatus |
| 11/27/2001 | US6322427 Conditioning fixed abrasive articles |
| 11/27/2001 | US6322423 Internal abrasive machine |
| 11/22/2001 | US20010044267 Lapping machine |
| 11/22/2001 | DE10025087A1 Milling cutter has support body, planing discs, clamping claws, diamond layer, centering hole for pin fastening |
| 11/20/2001 | US6319105 Polishing apparatus |
| 11/15/2001 | US20010041527 Disk for conditioning polishing pads |
| 11/15/2001 | US20010041520 Polishing pad conditioning apparatus in chemical mechanical polishing apparatus |
| 11/15/2001 | US20010041517 High pressure cleaning |
| 11/13/2001 | US6315651 Easy on/off cover for a pad conditioning assembly |
| 11/08/2001 | US20010039171 In-situ pad conditoning apparatus for CMP polisher |
| 11/07/2001 | EP1151825A2 A diamond grid cmp pad dresser |
| 11/07/2001 | CN1074341C Threaded grinding wheel, method of dressing and grinding workpiece therewith |
| 11/06/2001 | US6312324 Superabrasive tool and method of manufacturing the same |
| 11/06/2001 | US6312319 Polishing media magazine for improved polishing |
| 10/30/2001 | US6309433 Polishing pad conditioner for semiconductor substrate |
| 10/30/2001 | US6309277 System and method for achieving a desired semiconductor wafer surface profile via selective polishing pad conditioning |
| 10/30/2001 | US6308700 Process and manufacturing of a rotary diamond dresser for trueing and dressing of industrial grinding wheels |
| 10/25/2001 | US20010033804 Metal substrate; boron nitride or diamond particle abrasive |
| 10/24/2001 | EP1147856A2 Method and apparatus for cleaning polishing surface of polisher |
| 10/23/2001 | US6306025 Dressing tool for the surface of an abrasive cloth and its production process |
| 10/23/2001 | US6306022 Chemical-mechanical polishing device |
| 10/23/2001 | US6306019 Method and apparatus for conditioning a polishing pad |
| 10/23/2001 | US6306008 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 10/18/2001 | WO2001078124A1 Conditioner and conditioning process for polishing pad of chemical mechanical polishing apparatus |
| 10/18/2001 | US20010031609 Glass product machining apparatus |
| 10/18/2001 | US20010031558 Elimination of pad glazing for al cmp |
| 10/17/2001 | EP1144155A2 Ultrasonic transducer slurry dispenser |
| 10/16/2001 | US6302772 Apparatus and method for dressing a wafer polishing pad |
| 10/16/2001 | US6302771 CMP pad conditioner arrangement and method therefor |
| 10/16/2001 | US6302770 In-situ pad conditioning for CMP polisher |
| 10/16/2001 | US6302764 Process and device for dressing high-speed grinding worms |
| 10/11/2001 | US20010029156 Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus |
| 10/11/2001 | US20010029155 Multi-step conditioning process |
| 10/11/2001 | US20010029154 Method and apparatus for controlling a temperature of a polishing pad used in planarizing substrates |
| 10/11/2001 | DE10106676A1 Waferpoliervorrichtung Wafer polishing apparatus |
| 10/10/2001 | EP1140425A1 An abrasive machine for machining a surface of a cylindrical work piece |
| 10/09/2001 | US6300248 On-chip pad conditioning for chemical mechanical polishing |
| 10/09/2001 | US6300247 Preconditioning polishing pads for chemical-mechanical polishing |
| 10/09/2001 | US6299516 Substrate polishing article |
| 10/09/2001 | US6299511 Chemical mechanical polishing conditioner |
| 10/04/2001 | EP1137514A1 Modular machine for polishing and planing substrates |
| 10/03/2001 | CN2451289Y Dressing device for abrasive disc surface of surface processing equipment |
| 10/02/2001 | US6296717 Regeneration of chemical mechanical polishing pads in-situ |
| 10/02/2001 | US6296547 Method and system for manufacturing a photocathode |
| 09/27/2001 | WO2001017724A3 Ultrasonic transducer slurry dispenser |
| 09/27/2001 | US20010024939 Wafer polishing apparatus |
| 09/27/2001 | US20010024934 Method of grinding an axially asymmetric aspherical mirror |
| 09/27/2001 | EP1144155A3 Ultrasonic transducer slurry dispenser |
| 09/25/2001 | US6293854 Dresser for polishing cloth and manufacturing method therefor |
| 09/25/2001 | US6293853 Conditioner apparatus for chemical mechanical polishing |
| 09/20/2001 | US20010023169 Device for dressing grinding wheels |
| 09/19/2001 | EP1134056A1 Removable electrode |
| 09/18/2001 | US6290584 Workpiece carrier with segmented and floating retaining elements |
| 09/18/2001 | US6290574 Method and device for centering a dressing tool in the thread of a grinding worm |
| 09/13/2001 | US20010021629 Apparatus and method for processing micro-V grooves |
| 09/13/2001 | US20010021627 Method and apparatus for supporting and cleaning a polishing pad for chemical-mechanical planarization of microelectronic substrates |
| 09/13/2001 | US20010021625 Method and apparatus for cleaning polishing surface of polisher |
| 09/13/2001 | US20010020585 Removable electrode |
| 09/12/2001 | CN1312747A Waffer edge polishing method and apparatus |
| 09/12/2001 | CN1312545A Method for polishing magnetic-head floating block |
| 09/11/2001 | US6288648 Apparatus and method for determining a need to change a polishing pad conditioning wheel |
| 09/06/2001 | US20010019938 Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies |
| 09/06/2001 | US20010019937 Method and apparatus for supporting and cleaning a polishing pad for chemical-mechanical planarization of microelectronic substrates |
| 09/06/2001 | DE10007444A1 Process for adjusting grinding wheels having a coating of diamond or cubic boron nitride uses a rotating or fixed tool |
| 09/05/2001 | EP1129817A2 Apparatus and method for processing micro-v grooves |
| 09/05/2001 | EP1128932A1 Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization |
| 09/05/2001 | CN1311079A Method for grinding non-axial-symmetry and non-ball-surface mirror |
| 09/04/2001 | US6283836 Non-abrasive conditioning for polishing pads |
| 09/04/2001 | US6283822 Polishing apparatus |
| 08/30/2001 | US20010017130 Apparatus and method for cutting ingots |
| 08/29/2001 | CN1310657A CMP pad conditioner arrangement and method therefor |
| 08/28/2001 | US6281129 Corrosion-resistant polishing pad conditioner |
| 08/28/2001 | US6280299 Combined slurry dispenser and rinse arm |
| 08/23/2001 | US20010015801 Polishing pad surface condition evaluation method and an apparatus thereof and a method of producing a semiconductor device |
| 08/22/2001 | EP1125688A1 Polishing apparatus and a semiconductor manufacturing method using the same |
| 08/16/2001 | WO2001058644A1 Method and apparatus for controlling a pad conditioning process of a chemical-mechanical polishing apparatus |
| 08/16/2001 | US20010014574 Polishing apparatus |
| 08/14/2001 | US6273798 Pre-conditioning polishing pads for chemical-mechanical polishing |
| 08/14/2001 | US6273797 In-situ automated CMP wedge conditioner |
| 08/14/2001 | US6273795 Method and apparatus of dressing a grinding wheel |
| 08/09/2001 | US20010012751 System and method for polishing and planarizing semiconductor wafers using reduced surface area polishing pads and variable partial pad-wafer overlapping techniques |
| 08/09/2001 | US20010012749 Polishing apparatus |
| 08/08/2001 | EP1122030A2 Abrasive tool |
| 08/07/2001 | US6271140 Coaxial dressing for chemical mechanical polishing |
| 08/07/2001 | US6270396 Conditioning apparatus and conditioning method |
| 08/02/2001 | WO2001054862A1 System and method for controlled polishing and planarization of semiconductor wafers |
| 08/01/2001 | EP1120217A2 Apparatus and method for cutting ingots |
| 07/31/2001 | US6267647 Grinding machines and polishing machines |