Patents for B24B 53 - Devices or means for dressing or conditioning abrasive surfaces (5,132)
08/1998
08/04/1998US5787595 Method and apparatus for controlling flatness of polished semiconductor wafer
07/1998
07/28/1998US5785585 Polish pad conditioner with radial compensation
07/28/1998US5785039 Single-crystalline diamond tip for dresser and dresser employing the same
07/22/1998EP0854010A1 Method for prolonging the operating life of a grinding wheel
07/21/1998US5782675 Apparatus and method for refurbishing fixed-abrasive polishing pads used in chemical-mechanical planarization of semiconductor wafers
07/16/1998WO1998030360A1 Abrasive body
07/16/1998WO1998030357A1 Abrasive body
07/16/1998DE19716560A1 Grinding body especially for glass grinding disc
07/14/1998US5779526 Pad conditioner
07/14/1998US5779522 Chemical-mechanical planarization apparatus
07/14/1998US5779521 Method and apparatus for chemical/mechanical polishing
07/08/1998EP0852063A1 Method of modifying an exposed surface of a semiconductor wafer
07/07/1998US5775983 Apparatus and method for conditioning a chemical mechanical polishing pad
07/02/1998DE19654801A1 Diamond cutting tool for grinding discs
07/01/1998EP0656031B1 Polymeric substrate with polymeric microelements
06/1998
06/16/1998US5766057 Centerless grinding machine
06/11/1998WO1998024591A1 Device for surface work of cutting and grinding tools
06/10/1998DE19650719A1 Vorrichtung zur Oberflächenbearbeitung von Schneid- und Schleifwerkzeugen Device for the surface machining of cutting and grinding tools,
06/04/1998DE19648903A1 Diamond truing and dressing procedure using known diamond dresser
05/1998
05/28/1998DE19648790A1 Tool grinding machine, especially for sharpening and regrinding of drills, end millers, etc.
05/27/1998EP0844048A2 Free form machining tool
05/26/1998US5755979 Application of semiconductor IC fabrication techniques to the manufacturing of a conditioning head for pad conditioning during chemical-mechanical polish
05/20/1998CN2281867Y Vertical grinding wheel cylindrical shaper
05/12/1998US5749772 Method and apparatus for polishing wafer
05/12/1998US5749771 Polishing apparatus for finishing semiconductor wafer at high polishing rate under economical running cost
04/1998
04/28/1998US5743784 Apparatus and method to determine the coefficient of friction of a chemical mechanical polishing pad during a pad conditioning process and to use it to control the process
04/23/1998WO1998016347A1 Semiconductor substrate polishing pad dresser, method of manufacturing the same, and chemicomechanical polishing method using the same dresser
04/22/1998CN2279253Y Angular correction positioner for glazed tile edge finishing
04/21/1998US5741173 Method and apparatus for machining semiconductor material
04/14/1998US5738574 Continuous processing system for chemical mechanical polishing
04/14/1998US5738573 Semiconductor wafer polishing apparatus
04/14/1998US5738572 Grinding machine
04/14/1998US5738569 Threaded grinding wheel, and method of dressing
04/09/1998WO1998014307A1 Superabrasive tool and method of its manufacture
03/1998
03/19/1998WO1998011600A1 Method for working semiconductor wafer
03/18/1998EP0829328A2 Polymeric substrate with polymeric microelements
03/18/1998EP0829327A1 Polishing pad control method and apparatus
03/17/1998US5727992 Method and apparatus for sharpening the surface of a grindstone for a pulp grinder
03/11/1998EP0827436A1 Device for the contoured sharpening of saw teeth
03/11/1998EP0827435A1 Device for the contoured sharpening of saw teeth
03/10/1998US5725417 Method and apparatus for conditioning polishing pads used in mechanical and chemical-mechanical planarization of substrates
03/05/1998WO1998008651A1 Device for conditioning polishing pads utilizing brazed cubic boron nitride technology
02/1998
02/19/1998WO1998006540A1 Apparatus and method for polishing semiconductor devices
02/18/1998CN2274548Y Reformer for sand wheel used on machine
02/17/1998US5718618 Lapping and polishing method and apparatus for planarizing photoresist and metal microstructure layers
02/11/1998EP0823310A1 Machine tool for combined working
02/11/1998EP0823309A1 Method and apparatus for controlling flatness of polished semiconductor wafers
02/10/1998US5716264 Polishing apparatus
01/1998
01/27/1998US5711696 Apparatus for machining a workpiece to non-revolute symmetric and aspherical surface
01/22/1998WO1998002268A1 Apparatus and method for improved precision grinding of face gears
01/07/1998EP0816017A1 Method and apparatus for dressing polishing cloth
01/02/1998DE19624842A1 Method for profiling single or multi=thread polishing screw
12/1997
12/29/1997EP0813933A1 Method of truing grinding wheel and device used in performing such method
12/24/1997WO1997048526A1 Grinding machine spindle flexibly attached to platform
12/24/1997WO1997048525A1 Workpiece inspection and handling
12/24/1997WO1997048522A1 Improvements in and relating to grinding machines
12/23/1997US5700179 Method of manufacturing semiconductor wafers and process of and apparatus for grinding used for the same method of manufacture
12/18/1997WO1997047432A1 Lapping apparatus
12/17/1997EP0812656A2 Dressing device for dressing a polishing pad in a lapping machine
12/17/1997CN1167667A Apparatus and method for shaping polishing pads
12/16/1997US5698455 Method for predicting process characteristics of polyurethane pads
12/03/1997EP0809798A2 Method and apparatus for predicting process characteristics of polyurethane pads
12/03/1997EP0809557A1 Determining the coefficient of friction of a polishing pad
12/02/1997US5692947 Linear polisher and method for semiconductor wafer planarization
11/1997
11/27/1997DE19720624A1 Removing grinding disc using four-step process
11/27/1997DE19619401C1 Method and appliance for profiling grinding worms
11/26/1997EP0808693A1 Method and apparatus for dressing the CBN or diamond ring layer of a grinding wheel
11/26/1997CN1165727A method of and apparatus for polishing wafer
11/25/1997US5690544 Wafer polishing apparatus having physical cleaning means to remove particles from polishing pad
11/19/1997CN2267894Y Drum-wheel type ceramic tile edging machine
11/04/1997US5683290 Apparatus for forming a convex tip on a workpiece
11/04/1997US5683289 CMP polishing pad conditioning apparatus
11/04/1997US5682638 Buffing pad cleaning apparatus
10/1997
10/30/1997WO1997040525A1 Chemical-mechanical planarization apparatus and method
10/30/1997WO1997039856A1 Apparatus for precision grinding face gears
10/29/1997EP0803327A2 Apparatus and method for shaping polishing pads
10/29/1997EP0803326A2 Polishing apparatus
10/28/1997US5681212 Polishing device and correcting method therefor
10/23/1997WO1997038822A1 System for deburring or grinding a workpiece using a robot or manipulator, method of using said system, and use of said system and method
10/14/1997US5676593 Cutter for soft materials and method for making it
10/01/1997EP0602038B1 Method of and apparatus for machining spur and helical gears
09/1997
09/30/1997US5672095 Elimination of pad conditioning in a chemical mechanical polishing process
09/24/1997EP0796702A2 Polishing apparatus
09/16/1997US5667646 Dressing apparatus
09/16/1997US5667433 Keyed end effector for CMP pad conditioner
09/09/1997US5665201 High removal rate chemical-mechanical polishing
09/09/1997US5664987 Methods and apparatus for control of polishing pad conditioning for wafer planarization
09/04/1997WO1997031756A1 Machine tool for combined working
08/1997
08/26/1997US5660579 Method and apparatus for forming a grinding wheel
08/20/1997EP0790101A1 Shape control method and nc machine using the method
08/14/1997WO1997028925A1 Lapping and polishing method and apparatus for planarizing photoresist and metal microstructure layers
08/12/1997US5655954 Polishing apparatus
08/12/1997US5655951 Method for selectively reconditioning a polishing pad used in chemical-mechanical planarization of semiconductor wafers
08/12/1997US5655949 Method of polishing waxers using a vertically stacked planarization machine
08/06/1997EP0787561A1 Polishing apparatus
08/05/1997US5653623 Polishing apparatus with improved exhaust
08/05/1997US5653622 Chemical mechanical polishing system and method for optimization and control of film removal uniformity
08/05/1997US5653300 Method of drilling a subterranean formation
07/1997
07/29/1997US5651725 Apparatus and method for polishing workpiece
07/29/1997US5651721 Method for the precision working of gears with an internally toothed tool, which for dressing remains in the precision working machine
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