Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
04/2004
04/15/2004WO2003005397A3 A novel electrode for use with atmospheric pressure plasma emitter apparatus and method for using the same
04/15/2004US20040071613 Plasma processing apparatus
04/15/2004US20040071267 Dense plasma focus radiation source
04/15/2004US20040071266 Low vapor pressure, low debris solid target for EUV production
04/15/2004US20040070349 Plasma impulse device
04/15/2004US20040070348 Neutral particle beam processing apparatus
04/15/2004US20040070347 Plasma generating apparatus using microwave
04/15/2004US20040070346 Remote plasma generator
04/15/2004US20040069752 Method and apparatus of coordinating operating modes of a plasma cutter and a power supply
04/15/2004US20040069613 Creating a plasma by subliming a potassium fluoride source using a radio frequency antenna; crossed electric and magnetic fields drive the heavier potassium ions toward a collector while confining the lighter fluorine for evacuation
04/15/2004US20040069411 Reducing regulated emissions from the exhaust streams of combustion processes
04/15/2004US20040069229 Plasma processing system
04/15/2004DE19851628B4 Streifenleitungsanordnung mit integrierten Gaszuführungen für mikrowelleninduzierte Plasmaquellen zur Anwendung in der analytischen Atomspektrometrie Stripline device with integrated gas supplies for microwave-induced plasma sources for use in analytical atomic spectrometry
04/14/2004EP1406843A1 Method and apparatus for underwater decomposition of organic content of electrically conductive aqueous waste solutions
04/14/2004EP1406730A1 Adjustable injector assembly for melted powder coating
04/14/2004EP0633821B2 Welding assembly for feeding powdered filler material into a torch
04/14/2004CN1489782A Method and device for plasma CVD
04/14/2004CN1489641A Low Contamination plasma chamber components and method for making same
04/14/2004CN1489500A Treating molten metals by moving electric arc
04/14/2004CN1489426A Constant-pressure radio frequency cold plasma system and spray gun thereof
04/14/2004CN1146024C Plasma etching method for forming hole in maked silicon dioxide
04/13/2004US6720273 Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma out put or adjusting the same upwards
04/13/2004US6720268 Method for anisotropic plasma etching of semiconductors
04/13/2004US6720037 Plasma processing method and apparatus
04/13/2004US6719909 Band gap plasma mass filter
04/13/2004US6719886 Method and apparatus for ionized physical vapor deposition
04/13/2004US6719876 Internal electrode type plasma processing apparatus and plasma processing method
04/13/2004US6719875 Plasma process apparatus
04/13/2004US6719849 Single-substrate-processing apparatus for semiconductor process
04/08/2004WO2004030426A2 Improved deposition shield in a plasma processing system,and methods of manufacture of such shield
04/08/2004WO2004030019A1 Method and arrangement for generating an atmospheric pressure glow discharge plasma (apg)
04/08/2004WO2004029325A1 High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and a plasma reactor for carrying out said method
04/08/2004WO2004028965A1 Method and device for producing carbon nanotubes
04/08/2004WO2004008477A3 Heating jacket for plasma etching reactor, and etching method using same
04/08/2004WO2003015120A9 Capacitive discharge plasma ion source
04/08/2004US20040066128 Ion source, ion implanting device, and manufacturing method of semiconductor devices
04/08/2004US20040065539 Supplying radio frequency to gas plasma; monitoring, controlling energy levels
04/07/2004EP1405330A2 Process chamber components having textured internal surfaces and method of manufacture
04/07/2004EP1404889A1 Method and apparatus for plasma generation
04/07/2004EP1404722A1 Continuous processing apparatus by plasma polymerization with vertical chamber
04/07/2004EP0771469B1 Method of and apparatus for microwave-plasma production
04/07/2004CN1488164A 等离子体装置及等离子体生成方法 Plasma device and method for generating a plasma
04/07/2004CN1488161A Electrode for plasma processes and method for manufacture and use thereof
04/06/2004US6717368 Plasma generator using microwave
04/06/2004US6717096 Dual mode plasma arc torch
04/01/2004WO2004028222A1 A thermal spraying device
04/01/2004WO2004028221A1 Plasma-spraying device
04/01/2004WO2004028220A1 Method and apparatus for generating and maintaining a plasma
04/01/2004WO2004027825A2 Beam plasma source
04/01/2004WO2004027816A2 A method and apparatus for the compensation of edge ring wear in a plasma processing chamber
04/01/2004WO2004026520A2 Torch head for welding torches and gas nozzle, contact nozzle, and insulation nozzle for such a torch head
04/01/2004WO2004008478A3 Cathode for vacuum sputtering treatment machine
04/01/2004WO2004003962A3 Thermal sprayed yttria-containing coating for plasma reactor
04/01/2004WO2002091809A8 Method and device for generating an activated gas curtain for surface treatment
04/01/2004US20040060659 Etching system and etching method
04/01/2004US20040060657 Method and apparatus for an improved deposition shield in a plasma processing system
04/01/2004DE10243406A1 Plasmaquelle Plasma source
03/2004
03/31/2004EP1403902A1 Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG)
03/31/2004EP1403611A1 Double-acting igniter and ignition method using such a detonator
03/31/2004EP1402762A1 Plasma torch
03/31/2004EP1402560A1 Configurable plasma volume etch chamber
03/31/2004EP1401708A1 Plasma-accelerator configuration
03/31/2004CN1486502A 离子源 Ion source
03/31/2004CN1143748C Serial multistage-compression plasma arc generator
03/30/2004US6714833 Performance evaluation method for plasma processing apparatus
03/30/2004US6714624 Discharge source with gas curtain for protecting optics from particles
03/30/2004US6713969 Method and apparatus for determination and control of plasma state
03/30/2004US6713968 Plasma processing apparatus
03/30/2004US6713711 Plasma arc torch quick disconnect
03/30/2004US6713401 Method for manufacturing semiconductor device
03/30/2004US6712927 Chamber having process monitoring window
03/30/2004US6712020 Toroidal plasma source for plasma processing
03/30/2004US6712019 Film forming apparatus having electrically insulated element that introduces power of 20-450MHz
03/30/2004CA2263333C Improved plasma jet system
03/30/2004CA2096368C Plasma sterilizer and method
03/26/2004CA2442642A1 Process for manufacturing an aluminum nitride ain substrate
03/25/2004WO2004026008A1 Plasma surface treating method and apparatus therefor
03/25/2004WO2004025118A2 Ion thruster grids and methods for making
03/25/2004WO2004024976A1 Component protected against corrosion and method for the production thereof and device for carrying out said method
03/25/2004WO2003106729A3 Method of making automotive trim with chromium inclusive coating thereon, and corresponding automotive trim product
03/25/2004WO2003101160A3 Method and apparatus for vhf plasma processing
03/25/2004WO2003077279A3 Device for activating gases in a vacuum, using a hollow cathode discharge
03/25/2004US20040058554 Dry etching method
03/25/2004US20040058359 Erbin as a negative regulator of Ras-Raf-Erk signaling
03/25/2004US20040058089 Floor tile coating method and system
03/25/2004US20040057880 Purification of exhaust gases
03/25/2004US20040055880 Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith
03/25/2004US20040055869 High voltage, alternating current; pulsed direct current; fluid flow of dielectric over electrode
03/25/2004DE10144516B4 Plasmabrenner Plasma torch
03/24/2004EP1401249A2 Plasma source
03/24/2004EP1401014A1 Plasma processing device, and method of cleaning the same
03/24/2004EP1401008A1 Element for coupling electrical energy into a processing chamber and processing system comprising such an element
03/24/2004EP1400981A2 Method of controlling temperature of nonthermal nuclear fusion fuel in nonthermal nuclear fusion reaction
03/24/2004EP1399944A1 Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor
03/24/2004EP1399284A1 Dual mode plasma arc torch for use with a plasma arc treatment system and method of use thereof
03/23/2004US6710524 Plasma source
03/23/2004US6710333 Process for structural modification of surfaces by treatment with an atomic or molecular gaseous medium excited to metastable level
03/23/2004US6709632 Inductively coupled plasma (icp) mass sprectrometry; spray chamber improves the efficiency of introducing a sample fluid into a plasma, improving sensitivity by suppressing proportion of a solvent that reaches a plasma torch
03/23/2004US6709546 Device and method for etching a substrate by using an inductively coupled plasma
03/23/2004US6709522 Material handling system and methods for a multichamber plasma treatment system