Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
04/2003
04/17/2003CA2454269A1 Insulating gate algan/gan hemt
04/16/2003EP1302987A1 Trench-gated vertical MOSFET having gate oxide layer containing cesium and process of forming the same
04/16/2003EP1302978A2 Method of making a self-aligned ferroelectric memory transistor
04/16/2003EP1302977A2 Method for producing group III nitride compound semiconductor
04/16/2003EP1302976A1 Single crystal wafer and solar battery cell
04/16/2003EP1302962A1 Quantum size effect type micro electron gun and flat display unit using it and method for manufacturing the same
04/16/2003EP1302950A2 Electrically conducting organic compound and electronic device
04/16/2003EP1302949A2 Electrically conductive organic compound and electronic device
04/16/2003EP1302810A2 Photosemiconductor device and method for fabricating the same
04/16/2003EP1302772A1 Acceleration switch
04/16/2003EP1301950A1 Method for the production and configuration of organic field-effect transistors (ofet)
04/16/2003EP1166174B1 Active matrix substrate for liquid crystal display and method for making the same
04/16/2003EP0912185B1 Novel pharmaceutical compositions having steroid nitrate ester derivatives useful as anti-inflammatory drugs
04/16/2003CN1411611A Metal-insulator-metal capacitor and method for producing same
04/16/2003CN1411609A Matrix array display devices with light sensing elements
04/16/2003CN1411602A Method to provide reduced constant E-field during erase of EEPROM for reliability improvement
04/16/2003CN1411266A Image sensor and reader
04/16/2003CN1411076A Semiconductor device and mfg. method thereof
04/16/2003CN1411075A 半导体装置 Semiconductor device
04/16/2003CN1411051A Method for mfg. semiconductor device and structure thereof
04/16/2003CN1411042A Threshold valtage regulating method for ultrathin epitaxial silicon metal oxide semiconductor transistor based on insulator
04/16/2003CN1411036A Mathod of manufacturing semi conductor device having composite buffer layer
04/16/2003CN1410804A Electrooptics device, mfg. method and electronic apparatus thereof
04/16/2003CN1106044C Thin film transistor for antistatic circuit and method for fabricating same
04/16/2003CN1106042C Method of forming floating gate in flash memory device
04/16/2003CN1105908C Micromechanical sensor
04/15/2003US6550039 Circuit design method for designing conductive members with a multilayered structure to have antenna sized of proper values
04/15/2003US6549889 Assistance method and apparatus
04/15/2003US6549465 Nonvolatile semiconductor memory well voltage setting circuit without latchup and semiconductor memory device provided with the circuit
04/15/2003US6549463 Fast program to program verify method
04/15/2003US6548903 Semiconductor integrated circuit
04/15/2003US6548890 Press-contact type semiconductor device
04/15/2003US6548882 Power transistor cell
04/15/2003US6548877 Metal oxide semiconductor field effect transistor for reducing resistance between source and drain
04/15/2003US6548876 Semiconductor device of sub-micron or high voltage CMOS structure and method for manufacturing the same
04/15/2003US6548875 Sub-tenth micron misfet with source and drain layers formed over source and drains, sloping away from the gate
04/15/2003US6548874 Higher voltage transistors for sub micron CMOS processes
04/15/2003US6548873 Semiconductor device and manufacturing method of the same
04/15/2003US6548871 Semiconductor device achieving reduced wiring length and reduced wiring delay by forming first layer wiring and gate upper electrode in same wire layer
04/15/2003US6548870 Semiconductor device
04/15/2003US6548867 Semiconductor device having thin film transistor for supplying current to driven element
04/15/2003US6548866 Field effect transistor with reduced narrow channel effect
04/15/2003US6548865 High breakdown voltage MOS type semiconductor apparatus
04/15/2003US6548864 High density MOS technology power device
04/15/2003US6548863 Lateral DMOS transistor integratable in semiconductor power devices
04/15/2003US6548862 Structure of semiconductor device and method for manufacturing the same
04/15/2003US6548861 Memory cell, memory cell arrangement and fabrication method
04/15/2003US6548860 DMOS transistor structure having improved performance
04/15/2003US6548859 MOS semiconductor device and method of manufacturing the same
04/15/2003US6548854 Compound, high-K, gate and capacitor insulator layer
04/15/2003US6548847 Semiconductor integrated circuit device having a first wiring strip exposed through a connecting hole, a transition-metal film in the connecting hole and an aluminum wiring strip thereover, and a transition-metal nitride film between the aluminum wiring strip and the transition-metal film
04/15/2003US6548842 Field-effect transistor for alleviating short-channel effects
04/15/2003US6548840 Monolithic temperature compensation scheme for field effect transistor integrated circuits
04/15/2003US6548839 LDMOS transistor structure using a drain ring with a checkerboard pattern for improved hot carrier reliability
04/15/2003US6548838 Field-effect transistor, bipolar transistor, and methods of fabricating the same
04/15/2003US6548831 For removing an etching stopper layer on an intersection portion of gate line without additional exposure; photoresists
04/15/2003US6548830 Semiconductor device formed of single crystal grains in a grid pattern
04/15/2003US6548829 Thin-film transistor
04/15/2003US6548828 Thin-film transistor and method of manufacturing thin-film transistor with tapered gate of 20 degrees or less
04/15/2003US6548825 Semiconductor device including barrier layer having dispersed particles
04/15/2003US6548424 Process for producing oxide thin films
04/15/2003US6548422 Method and structure for oxide/silicon nitride interface substructure improvements
04/15/2003US6548421 Method for forming a refractory-metal-silicide layer in a semiconductor device
04/15/2003US6548403 Silicon oxide liner for reduced nickel silicide bridging
04/15/2003US6548388 Semiconductor device including gate electrode having damascene structure and method of fabricating the same
04/15/2003US6548380 Semiconductor thin film, semiconductor device employing the same, methods for manufacturing the same and device for manufacturing a semiconductor thin film
04/15/2003US6548370 Method of crystallizing a semiconductor layer by applying laser irradiation that vary in energy to its top and bottom surfaces
04/15/2003US6548366 Method of two-step annealing of ultra-thin silicon dioxide layers for uniform nitrogen profile
04/15/2003US6548364 Self-aligned SiGe HBT BiCMOS on SOI substrate and method of fabricating the same
04/15/2003US6548363 Method to reduce the gate induced drain leakage current in CMOS devices
04/15/2003US6548362 Method of forming MOSFET with buried contact and air-gap gate structure
04/15/2003US6548361 SOI MOSFET and method of fabrication
04/15/2003US6548356 Thin film transistor
04/15/2003US6548354 Process for producing a semiconductor memory device comprising mass-storage memory cells and shielded memory cells for storing reserved information
04/15/2003US6548353 Method of making nonvolatile memory device having reduced capacitance between floating gate and substrate
04/15/2003US6548352 Multi-layered gate for a CMOS imager
04/15/2003US6548342 Method of producing oxide dielectric element, and memory and semiconductor device using the element
04/15/2003US6548341 Process for producing a first electrode and a second electrode, electronic component and electronic memory element
04/15/2003US6548339 Methods of forming memory circuitry, and method of forming dynamic random access memory (DRAM) circuitry
04/15/2003US6548333 Aluminum gallium nitride/gallium nitride high electron mobility transistors having a gate contact on a gallium nitride based cap segment
04/15/2003US6548332 Thermal treatment process for forming thin film transistors without the use of plasma treatment to further improve the output property of the thin film transistor
04/15/2003US6548331 Method for fabricating thin film transistor including crystalline silicon active layer
04/15/2003US6548325 Wafer thickness compensation for interchip planarity
04/15/2003US6546799 Method for compensating the position offset of a capacitive inertial sensor, and capacitive inertial sensor
04/10/2003WO2003030278A2 Composition, method and electronic device
04/10/2003WO2003030268A1 Flash memory cell with entrenched floating gate and method for operating said flash memory cell
04/10/2003WO2003030267A2 Umosfet device and method of making the same
04/10/2003WO2003030266A1 Transistor with an electron and a vertical channel and the production methods thereof
04/10/2003WO2003030265A1 Switching device
04/10/2003WO2003030264A1 Non volatile memory cell structure using multilevel trapping dielectric
04/10/2003WO2003030262A2 Silicon-on-insulator high voltage device structure
04/10/2003WO2003030258A1 Plural semiconductor devices in monolithic flip chip
04/10/2003WO2003030253A2 Salicided gate for virtual ground arrays
04/10/2003WO2003030245A2 Method for assembly of complementary-shaped receptacle site and device microstructures
04/10/2003WO2003030244A1 Method for fabricating a power semiconductor device having a floating island voltage sustaining layer
04/10/2003WO2003030243A1 Incorporation of nitrogen into high k dielectric film
04/10/2003WO2003030242A1 Method of forming dielectric films
04/10/2003WO2003030220A2 Method for fabricating a power semiconductor device having a voltage sustaining layer with a terraced trench facilitating formation of floating islands
04/10/2003WO2003029510A1 Aluminum alloy thin film and wiring circuit having the thin film and target material for forming the tin film
04/10/2003WO2003029431A2 Nanoscaling ordering of hybrid materials using genetically engineered mesoscale virus