Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/1993
12/23/1993WO1993026042A1 Method of manufacturing cmos semiconductor components with local interconnects
12/23/1993WO1993026041A1 Bonded wafer processing
12/23/1993WO1993026040A1 Method and device for stacking substrates which are to be joined by bonding
12/23/1993WO1993026039A1 Using a nanochannel glass mask to form semiconductor devices
12/23/1993WO1993026038A1 Semiconductor wafer processing method and apparatus with heat and gas flow control
12/23/1993WO1993026037A1 Process for forming synapses in neural networks and resistor therefor
12/23/1993WO1993026036A1 Process for producing a quantum wire________________________
12/23/1993WO1993026035A1 Centrifugal wafer carrier cleaning apparatus
12/23/1993WO1993025893A1 Endpoint detection technique using signal slope determinations
12/23/1993WO1993025878A1 Thermal isolation microstructure
12/23/1993WO1993025724A1 Semiconductor wafer processing cvd reactor cleaning method and apparatus
12/23/1993WO1993025723A1 Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten cvd
12/23/1993WO1993025722A1 Methods of chemical vapor deposition (cvd) of films on patterned wafer substrates
12/23/1993WO1993025721A1 Method of nucleating tungsten on titanium nitride by cvd without silane
12/23/1993WO1993025347A1 Wafer polishing method and apparatus
12/23/1993WO1993021365A3 Method for making a discontinuity lattice at the surface of a crystalline substrate
12/23/1993DE4320313A1 Built=in test photodetector structure in CCD image sensor - is inserted into row of imaging detectors and provided with separate exposure control gate to corresp. exposure drain regions.
12/23/1993DE4320060A1 Semiconductor memory cell capacitor prodn. - involves forming multilayer cylindrical storage electrode
12/23/1993DE4320033A1 Metal pattern prodn. in semiconductor device mfr. - using anti-reflection film to avoid photoresist pattern recesses
12/23/1993DE4319788A1 Single crystal growth process for prodn. of silicon single crystal with constant dopant concn. - by melting material in crucible with added impurities, maintaining solid layer and melting from upper portion while drawing
12/23/1993DE4302396A1 Thin film solar cell prodn. for high reliability - using frangible anisotropic layer for thin semiconductor film transfer from prodn. to support substrate e.g of glass, for high quality solar cell mfr.
12/23/1993DE4300806C1 Vertical MOS transistor prodn. - with reduced trench spacing, without parasitic bipolar effects
12/23/1993DE4220158A1 Selective precipitation of aluminium structures from the gas phase - using locally applied thin aluminium@ layers as catalysts in the pptn. process
12/23/1993DE4219935A1 Field effect transistor mfr., e.g. for MESFET or HEMT prodn. - applying mask on gate region active semiconductor layer and forming ohmic contact in second step between semiconductor layer and metallising material
12/23/1993CA2137567A1 Methods of chemical vapor deposition (cvd) of films on patterned wafer substrates
12/23/1993CA2136863A1 Semiconductor wafer processing method and apparatus with heat and gas flow control
12/23/1993CA2136862A1 Method of nucleating tungsten on titanium nitride by cvd without silane
12/23/1993CA2136861A1 Semiconductor wafer processing cvd reactor cleaning method and apparatus
12/22/1993EP0575283A2 Advanced silicon on oxide semiconductor device structure for BICMOS integrated circuits
12/22/1993EP0575282A2 Vertical-base CMOS compatible lateral bipolar transistor
12/22/1993EP0575280A2 CMOS transistor with two-layer inverse-T tungsten gate structure
12/22/1993EP0575278A2 Vertical gate transistor with low temperature epitaxial channel
12/22/1993EP0575247A1 Method of manufacturing a bipolar heterojunction transistor and transistor obtained by this method
12/22/1993EP0575194A1 Semiconductor device having capacitor
12/22/1993EP0575126A1 Plasma reactor head and electrode assembly
12/22/1993EP0575125A1 Method and apparatus for wet chemical processing of semiconductor wafers and other objects
12/22/1993EP0575099A1 Method for making a MOS device
12/22/1993EP0575098A1 Downstream ammonia plasma passivation of GaAs
12/22/1993EP0575062A1 ESD protection of output buffers
12/22/1993EP0574956A1 Metallized circuit substrate comprising nitride type ceramics
12/22/1993EP0574947A1 Light emitting device
12/22/1993EP0574939A1 Resist composition
12/22/1993EP0574935A1 Apparatus made of silica for semiconductor device fabrication
12/22/1993EP0574934A1 Method for forming a patterned polyimide coating film on a substrate
12/22/1993EP0574911A2 Semiconductor device for driving heat generator
12/22/1993EP0574893A2 Method of printed circuit panel manufacture
12/22/1993EP0574861A1 System for continuous fabrication of micro-structures and thin film semiconductor devices on elongate substrates
12/22/1993EP0574859A1 Method of removing particles in a plasma processing chamber
12/22/1993EP0574827A1 Method of doping, semiconductor device, and method of fabricating semiconductor device
12/22/1993EP0574809A1 Organic chlorides, showing a reduced effect upon the destruction of the ozone layer, for use during silicon thermal oxidation and furnace tube cleaning
12/22/1993EP0574797A2 Pressure glass passing-through
12/22/1993EP0574687A2 Method of depositing a planar layer containing aluminium on a substrate with a hole structure in its surface
12/22/1993EP0574671A2 An asymmetric multilayered dielectric material and a flash EEPROM using the same
12/22/1993EP0574662A2 Insulated semiconductor package
12/22/1993EP0554396A4 Rapid-curing adhesive formulation for semiconductor devices
12/22/1993EP0362275B1 Fabrication of a semiconductor base material
12/22/1993CN1079827A Photoenhanced diffusion patterning for organic polymer films
12/22/1993CN1079826A 液晶显示器件 Liquid crystal display device
12/22/1993CN1023266C Redundant means of semiconductor memory device and method thereof
12/21/1993USRE34484 Gold-plated electronic components
12/21/1993US5272744 Reflection mask
12/21/1993US5272671 Semiconductor memory device with redundancy structure and process of repairing same
12/21/1993US5272666 Programmable semiconductor antifuse structure and method of fabricating
12/21/1993US5272645 Channel routing method
12/21/1993US5272586 Technique for improving ESD immunity
12/21/1993US5272502 Double-surface concurrent exposure device
12/21/1993US5272419 Flat visible display device and method of forming a picture
12/21/1993US5272417 Device for plasma process
12/21/1993US5272388 High-yield methods for programming antifuses
12/21/1993US5272373 Internal gettering of oxygen in III-V compound semiconductors
12/21/1993US5272372 High speed non-volatile programmable read only memory device fabricated by using selective doping technology
12/21/1993US5272371 Electrostatic discharge protection structure
12/21/1993US5272368 Complementary low power non-volatile reconfigurable EEcell
12/21/1993US5272367 Fabrication of complementary n-channel and p-channel circuits (ICs) useful in the manufacture of dynamic random access memories (drams)
12/21/1993US5272366 Bipolar transistor/insulated gate transistor hybrid semiconductor device
12/21/1993US5272365 Silicon transistor device with silicon-germanium electron gas hetero structure channel
12/21/1993US5272360 Thin film transistor having enhance stability in electrical characteristics
12/21/1993US5272357 Semiconductor device and electronic device by use of the semiconductor
12/21/1993US5272342 Diffused layer depth measurement apparatus
12/21/1993US5272310 Soldering method
12/21/1993US5272307 Method and apparatus for laser soldering of microelectronic lead-pad assemblies on ceramic substrates
12/21/1993US5272171 Phosphonooxy and carbonate derivatives of taxol
12/21/1993US5272119 Process for contamination removal and minority carrier lifetime improvement in silicon
12/21/1993US5272117 Method for planarizing a layer of material
12/21/1993US5272116 Method for pattern defect correction of a photomask
12/21/1993US5272115 Method of leveling the laminated surface of a semiconductor substrate
12/21/1993US5272114 Method for cleaving a semiconductor crystal body
12/21/1993US5272113 Method for minimizing stress between semiconductor chips having a coefficient of thermal expansion different from that of a mounting substrate
12/21/1993US5272111 Method for manufacturing semiconductor device contact
12/21/1993US5272110 Method of forming wirings
12/21/1993US5272107 Manufacture of silicon carbide (SiC) metal oxide semiconductor (MOS) device
12/21/1993US5272106 Method for the making of an optoelectronic device
12/21/1993US5272105 Method of manufacturing an heteroepitaxial semiconductor structure
12/21/1993US5272104 Bonded wafer process incorporating diamond insulator
12/21/1993US5272103 DRAM having a large dielectric breakdown voltage between an adjacent conductive layer and a capacitor electrode and method of manufacture thereof
12/21/1993US5272102 Method of making semiconductor memory device and memory cells therefor
12/21/1993US5272100 Field effect transistor with T-shaped gate electrode and manufacturing method therefor
12/21/1993US5272099 Fabrication of transistor contacts
12/21/1993US5272098 Vertical and lateral insulated-gate, field-effect transistors, systems and methods
12/21/1993US5272097 Method for fabricating diodes for electrostatic discharge protection and voltage references