Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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02/15/1994 | US5287313 Method of testing data-holding capability of a semiconductor memory device |
02/15/1994 | US5287312 Dynamic random access memory |
02/15/1994 | US5287308 Undershoot resisting input circuit for semi-conductor device |
02/15/1994 | US5287303 SCR type memory apparatus |
02/15/1994 | US5287241 Shunt circuit for electrostatic discharge protection |
02/15/1994 | US5287205 Gradation method for driving liquid crystal device with ramp and select signal |
02/15/1994 | US5287142 Projection exposure apparatus |
02/15/1994 | US5287082 Submicron isolated, released resistor structure |
02/15/1994 | US5287072 Semiconductor device for improving high-frequency characteristics and avoiding chip cracking |
02/15/1994 | US5287064 Bonding point polarity determining apparatus |
02/15/1994 | US5287002 Planar multi-layer metal bonding pad |
02/15/1994 | US5286998 Semiconductor device having two transistors forming a memory cell and a peripheral circuit, wherein the impurity region of the first transistor is not subjected to an etching atmosphere |
02/15/1994 | US5286997 Method for forming an isolated, low resistance epitaxial subcollector for bipolar transistors |
02/15/1994 | US5286996 Triple self-aligned bipolar junction transistor |
02/15/1994 | US5286994 Semiconductor memory trap film assembly having plural laminated gate insulating films |
02/15/1994 | US5286993 One-sided ozone TEOS spacer |
02/15/1994 | US5286989 Solid state imaging device |
02/15/1994 | US5286981 Turn-off power semiconductor component, and also process for producing it |
02/15/1994 | US5286978 Method of removing electric charge accumulated on a semiconductor substrate in ion implantation |
02/15/1994 | US5286963 Projection exposure apparatus and method, a semiconductor device manufacturing system and method, and a semiconductor device manufactured by illuminating an original having a circuit pattern when the original and a wafer are in a focused state |
02/15/1994 | US5286713 Method for manufacturing an oxide superconducting circuit board by printing |
02/15/1994 | US5286681 Method for manufacturing semiconductor device having a self-planarizing film |
02/15/1994 | US5286680 Semiconductor die packages having lead support frame |
02/15/1994 | US5286679 Method for attaching a semiconductor die to a leadframe using a patterned adhesive layer |
02/15/1994 | US5286678 Forming active regions on semiconductor, depositing titanium metal, annealing, forming interconnects |
02/15/1994 | US5286677 Method for etching improved contact openings to peripheral circuit regions of a dram integrated circuit |
02/15/1994 | US5286676 Methods of making integrated circuit barrier structures |
02/15/1994 | US5286675 Blanket tungsten etchback process using disposable spin-on-glass |
02/15/1994 | US5286674 Method for forming a via structure and semiconductor device having the same |
02/15/1994 | US5286673 Method for forming position alignment marks in a manufacturing SOI device |
02/15/1994 | US5286672 Method for forming field oxide regions |
02/15/1994 | US5286671 Etching to raise pattern and improve bonding strength |
02/15/1994 | US5286670 Method of manufacturing a semiconductor device having buried elements with electrical characteristic |
02/15/1994 | US5286669 Solid-state imaging device and method of manufacturing the same |
02/15/1994 | US5286668 Layers of doped and undoped polysilicon, dielectric layer and top electrode layer; etching with phosphoric acid |
02/15/1994 | US5286667 Modified and robust self-aligning contact process |
02/15/1994 | US5286666 Method of producing semiconductor memory device |
02/15/1994 | US5286664 Method for fabricating the LDD-MOSFET |
02/15/1994 | US5286663 Methods for producing thin film transistor having a diode shunt |
02/15/1994 | US5286662 Method for manufacturing field effect transistor |
02/15/1994 | US5286661 Method of forming a bipolar transistor having an emitter overhang |
02/15/1994 | US5286660 Method for doping a semiconductor wafer having a diffusivity enhancement region |
02/15/1994 | US5286659 Method for producing an active matrix substrate |
02/15/1994 | US5286658 Process for producing semiconductor device |
02/15/1994 | US5286657 Single wafer megasonic semiconductor wafer processing system |
02/15/1994 | US5286656 Individualized prepackage AC performance testing of IC dies on a wafer using DC parametric test patterns |
02/15/1994 | US5286655 Method of manufacturing a semiconductor device of an anode short circuit structure |
02/15/1994 | US5286611 Photoresist |
02/15/1994 | US5286610 Illuminating thin region on semiconductor substrate to make it pervious to light and exposing photoresist underneath; selectively removing either region |
02/15/1994 | US5286608 TiOx as an anti-reflection coating for metal lithography |
02/15/1994 | US5286606 Treating ion exchange resin with water, then mineral acid solution, passing surfactant solution through ion exchange resin, mixing surfactant with metal ion free developer |
02/15/1994 | US5286600 Negative photosensitive composition and method for forming a resist pattern by means thereof |
02/15/1994 | US5286599 Novolak polymer and-or poly(p-vinylphenol), organosilicon material, amino polymer and catinic photocatalyst |
02/15/1994 | US5286583 Forming thin film on transparent substrate, covering with photoresist, exposing to light of different intensities, developing, etching exposed thin film, eliminating resist in separate steps for each light intensity |
02/15/1994 | US5286581 Phase-shift mask and method for making |
02/15/1994 | US5286572 Planarizing ladder-type silsequioxane polymer insulation layer |
02/15/1994 | US5286567 Pellicle for photolithographic mask |
02/15/1994 | US5286524 Method for producing CVD diamond film substantially free of thermal stress-induced cracks |
02/15/1994 | US5286523 Chaning positions which are disposed in the direction of gas flow in reaction vessel until optimal surface processing conditions are attained |
02/15/1994 | US5286518 Integrated-circuit processing with progressive intermetal-dielectric deposition |
02/15/1994 | US5286461 Method and apparatus for melt level detection in czochralski crystal growth systems |
02/15/1994 | US5286426 Assembling a lead frame between a pair of molding cavity plates |
02/15/1994 | US5286344 Fluorinated chemical etchant and fluorcarbon additive |
02/15/1994 | US5286343 Method for protecting chip corners in wet chemical etching of wafers |
02/15/1994 | US5286342 Etching, punching |
02/15/1994 | US5286340 Process for controlling silicon etching by atomic hydrogen |
02/15/1994 | US5286337 Reactive ion etching or indium tin oxide |
02/15/1994 | US5286335 Processes for lift-off and deposition of thin film materials |
02/15/1994 | US5286334 Nonselective germanium deposition by UHV/CVD |
02/15/1994 | US5286331 High energy eetchant gas clostered through a nozzle |
02/15/1994 | US5286329 Tape-on-wafer mounting apparatus and method |
02/15/1994 | US5286297 Multi-electrode plasma processing apparatus |
02/15/1994 | US5286296 Multi-chamber wafer process equipment having plural, physically communicating transfer means |
02/15/1994 | US5286007 Heat treatment system |
02/15/1994 | US5285949 Wire-bonding method, wire-bonding apparatus, and semiconductor device produced by the wire-bonding method |
02/15/1994 | US5285943 Tape feeding apparatus |
02/15/1994 | US5285597 Method and arrangement for subdividing semiconductor bars into semiconductor wafers |
02/15/1994 | CA2104087A1 Glass etching composition and method |
02/15/1994 | CA1327078C Floating gate memories |
02/12/1994 | CA2101902A1 Fluid treatment apparatus and method |
02/10/1994 | DE4326052A1 Vertical field effect transistor - has thickness of semiconductor layer selected to be greater than extent of depletion layer during blocking of p=n junction |
02/10/1994 | DE4325706A1 Mfg. electrode or wiring layer on semiconductor device - forming metal oxide film and reducing to produce wiring layer e.g. of copper or silver |
02/10/1994 | DE4325565A1 Conveying lead frame for semiconductor chip - using clamp mechanism to hold lead frame while moving into position w.r.t. heating block |
02/10/1994 | DE4325348A1 Semiconductor device with p=n junction, e.g n=channel transistor - has impurity diffusion region between first impurity region and impurity concentration peak |
02/10/1994 | DE4313797A1 Conductor for bonding in semiconductor chip - has perforated end section through conducting layer for connection to contact bumps on semiconductor chip |
02/10/1994 | DE4239587A1 Semiconductor device formed on module substrate - has resin moulded package with conductors providing respective internal connections at one end and external connections at other |
02/10/1994 | DE4226167A1 Device mounting on substrate by thermo:compression bonding - using electroplated gold@ contact bumps, esp. for chip on chip bonding |
02/10/1994 | DE4225830A1 Positiv arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial Positive working radiation-sensitive mixture and thus produced recording material |
02/09/1994 | EP0582539A1 Chemical pre-treatment and biological destruction of propylene carbonate waste effluent streams to reduce the biological oxygen demand thereof |
02/09/1994 | EP0582538A2 Propylene carbonate recovery process |
02/09/1994 | EP0582486A2 A thin film transistor pair and a process for fabricating the same |
02/09/1994 | EP0582444A1 Ultra pure silicon carbide and high temperature semiconductor processing equipment made therefrom |
02/09/1994 | EP0582387A1 A metallic wiring board and a method for producing the same |
02/09/1994 | EP0582375A1 Solder particle deposition |
02/09/1994 | EP0582353A1 Low stress electrodeposition of gold for X-ray mask fabrication |
02/09/1994 | EP0582308A2 Photomask blank and phase shift photomask |
02/09/1994 | EP0582306A1 Semiconductor device having hollowed conductor |
02/09/1994 | EP0582295A2 Articulating endoscopic surgical apparatus |
02/09/1994 | EP0582262A1 Contacting and packaging of integrated circuit modules |
02/09/1994 | EP0582228A1 Process for forming amorphous silicon hydride film |