Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/1994
02/22/1994US5289019 Insulated gate bipolar transistor
02/22/1994US5289015 Planar fet-seed integrated circuits
02/22/1994US5289014 Semiconductor device having a vertical quantum well via and method for making
02/22/1994US5289013 Phonon and charge carrier separation in quantum wells
02/22/1994US5288952 Multilayer connector
02/22/1994US5288951 Copper-based metallizations for hybrid integrated circuits
02/22/1994US5288950 Flexible wiring board and method of preparing the same
02/22/1994US5288943 Method of providing bends in electrical leads, and articles made thereby
02/22/1994US5288769 Having copper coating; bonding semiconductors
02/22/1994US5288698 Method of positioning lead frame on molding die to seal semiconductor element with resin
02/22/1994US5288684 Photochemical vapor phase reaction apparatus and method of causing a photochemical vapor phase reaction
02/22/1994US5288667 Method of manufacturing a molded semiconductor package having a lead frame and an connecting coupler
02/22/1994US5288666 Heating silicon substrate and formed metal layer; oxidation to form oxide layer; one-step
02/22/1994US5288665 Process for forming low resistance aluminum plug in via electrically connected to overlying patterned metal layer for integrated circuit structures
02/22/1994US5288664 Plugging via-hole in second insulating film by alloying metal films;
02/22/1994US5288663 Method for extending wafer-supporting sheet
02/22/1994US5288662 Low ozone depleting organic chlorides for use during silicon oxidation and furnace tube cleaning
02/22/1994US5288661 Semiconductor device having bonding pad comprising buffer layer
02/22/1994US5288660 Method for forming self-aligned t-shaped transistor electrode
02/22/1994US5288659 Photonic-integrated-circuit fabrication process
02/22/1994US5288658 Process for the formation of an amorphous silicon deposited film with intermittent irradiation of inert gas plasma
02/22/1994US5288657 Aperture pattern delieation producing masking layer followed by epitaxial growth of multilayer within aperture
02/22/1994US5288655 Method of making dynamic random access memory having a reliable contact
02/22/1994US5288654 Method of making a mushroom-shaped gate electrode of semiconductor device
02/22/1994US5288653 Process of fabricating an insulated-gate field effect transistor
02/22/1994US5288652 BICMOS-compatible method for creating a bipolar transistor with laterally graded emitter structure
02/22/1994US5288650 Prenucleation process for simox device fabrication
02/22/1994US5288572 Directing pulsed monochromatic light on exposed region, detecting defracted light
02/22/1994US5288569 Phase-shifting masks for photolithography
02/22/1994US5288568 Optical spacer method for preventing null formation in phase shifted photomasks
02/22/1994US5288567 Stencil mask and charged particle beam exposure method and apparatus using the stencil mask
02/22/1994US5288541 Method for metallizing through holes in thin film substrates, and resulting devices
02/22/1994US5288539 Tab tape with a peeling-prevention structure for the conductive layer
02/22/1994US5288518 Feeding the gas flow of alkoxysilane and fluoroalkoxysilane into a reactor, decomposition to form noncracked thick film
02/22/1994US5288379 Robotic vacuum system; thin film deposition on substrate
02/22/1994US5288368 Electron beam lithography with reduced charging effects
02/22/1994US5288366 Growing one crystal from source material in crucible, extracting portion of the melt remaining, adding high purity source material
02/22/1994US5288365 Controlling molecular beam sources
02/22/1994US5288333 Evaporating cleaning solution below boiling point, supplying vapor to wafer above dew point
02/22/1994US5288332 Flushing, washing, chelation
02/22/1994US5288329 Chemical vapor deposition apparatus of in-line type
02/22/1994US5288199 Transporting device of magnetically floating type
02/22/1994US5288009 Method for degolding or tinning conductive portions of a microelectronic device
02/22/1994US5288008 Method of forming inner lead bonding on a microchip
02/22/1994US5288007 Apparatus and methods for making simultaneous electrical connections
02/22/1994US5288006 Method of bonding tab inner lead and bonding tool
02/22/1994US5287962 Vacuum seal indicator for flexible packaging material
02/22/1994US5287759 Method and apparatus of measuring state of IC lead frame
02/22/1994US5287725 Surface volatile material detector
02/22/1994US5287620 Process of producing multiple-layer glass-ceramic circuit board
02/22/1994US5287619 Method of manufacture multichip module substrate
02/22/1994CA2021585C Integrated mos circuit with adjustable voltage level
02/22/1994CA2008284C Multi-layer ceramic substrate with solder dam on connecting pattern
02/21/1994CA2100516A1 Negative photoresist composition
02/21/1994CA2100392A1 Negative photoresist composition
02/17/1994WO1994003924A1 Chip module
02/17/1994WO1994003923A1 Sealed conductive active alloy feedthroughs
02/17/1994WO1994003922A1 High density power device structure and fabrication process
02/17/1994WO1994003921A2 Planarizing bumps for interconnecting matching arrays of electrodes
02/17/1994WO1994003908A1 Cubic metal oxide thin film epitaxially grown on silicon
02/17/1994WO1994003901A1 Fault-tolerant, high-speed bus system and bus interface for wafer-scale integration
02/17/1994WO1994003899A1 Nonvolatile random access memory
02/17/1994WO1994003898A1 Dram cell assembly
02/17/1994WO1994003837A1 Positive-acting radiation-sensitive mixture and recording material produced therewith
02/17/1994WO1994003284A1 Single-chamber cleaning, rinsing and drying apparatus
02/17/1994WO1993018428A3 Head-mounted display system
02/17/1994DE4308203A1 Plasma etching appts. e.g. for semiconductor wafers - provides high etching selectivity and anisotropy even at wafer edges.
02/17/1994DE4300503C1 Semiconductor structure charge carrier profiling method - using HF pulses for atomic force microscopy scanning system short enough to prevent contact with sample
02/17/1994DE4234715C1 Semiconductor poison determination in quartz glass - by detecting electrical changes in semiconductor after treatment in presence of quartz glass
02/17/1994DE4226497A1 Thin etching silicon substrate - to mfr. IMPATT, beam-lead Schottky battery and PIN diodes
02/17/1994CA2141566A1 Cubic metal oxide thin film epitaxially grown on silicon
02/17/1994CA2141458A1 Chip module
02/17/1994CA2139314A1 Planarizing bumps for interconnecting matching arrays of electrodes
02/16/1994EP0583205A1 Polymeric dyes for antireflective coatings
02/16/1994EP0583163A2 Semiconductor memory device
02/16/1994EP0583119A1 Programmable contact structure and its forming method
02/16/1994EP0583105A1 ESD protection using NPN bipolar transistor
02/16/1994EP0583028A1 A semiconductor device comprising a vertical insulated gate field effect device and a method of manufacturing such a device
02/16/1994EP0583023A1 Trenched DMOS transistor fabrication using six masks
02/16/1994EP0583022A2 A method of manufacturing an insulated gate field effect device
02/16/1994EP0583008A2 Semiconductor integrated circuit device and method of manufacturing the same
02/16/1994EP0583007A1 Temperature sensor calibration device and method
02/16/1994EP0582920A2 Fluid treatment apparatus and method
02/16/1994EP0582881A1 Multilayer electronic component, method of manufacturing the same and method of measuring characteristics thereof
02/16/1994EP0582724A1 Method of CVD deposition of SiO2 layers with local and global planarization on structured silicon substrates
02/16/1994EP0582710A1 Electrically programmable memory cell
02/16/1994EP0582694A1 Semiconductor device with a semiconductor substrate and a ceramic plate as lid
02/16/1994EP0582605A1 Stabilization of the interface between aluminum and titanium nitride
02/16/1994EP0449969B1 Photoresist compositions containing cobalt (iii) compound and redox transfer ligand
02/16/1994EP0335965B1 Phantom esd protection circuit employing e-field crowding
02/16/1994EP0276229B1 Dose measurement and uniformity monitoring system for ion implantation
02/16/1994CN1082254A 半导体器件 Semiconductor devices
02/16/1994CN1082253A Method to make passivated two-electrode circular glass granule
02/15/1994US5287472 Memory system using linear array wafer scale integration architecture
02/15/1994US5287427 Method of making an article comprising an optical component, and article comprising the component
02/15/1994US5287393 Charge transfer device equipped with charge signal detector improved in sensitivity as well as in voltage amplification
02/15/1994US5287361 Process for extending the operating period of a circuit with MOS components exposed to gamma radiation
02/15/1994US5287320 Timing coinciding circuit simultaneously supplying two power supply voltages applied in different timing
02/15/1994US5287319 Nonvolatile semiconductor memory device
02/15/1994US5287318 Semiconductor memory