Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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01/20/1998 | US5710076 Method for fabricating a sub-half micron MOSFET device with global planarization of insulator filled shallow trenches, via the use of a bottom anti-reflective coating |
01/20/1998 | US5710075 Method to increase surface area of a storage node electrode, of an STC structure, for DRAM devices |
01/20/1998 | US5710074 Increased surface area of an STC structure via the use of a storage node electrode comprised of polysilicon mesas and polysilicon sidewall spacers |
01/20/1998 | US5710073 Method for forming interconnections and conductors for high density integrated circuits |
01/20/1998 | US5710072 Method of producing and arrangement containing self-amplifying dynamic MOS transistor memory cells |
01/20/1998 | US5710071 Process for underfilling a flip-chip semiconductor device |
01/20/1998 | US5710068 Low thermal impedance integrated circuit |
01/20/1998 | US5710067 Antireflective layer during photolithograghic processing of semiconductors, plasma enhanced vapor deposition |
01/20/1998 | US5710066 Method of forming fine patterns |
01/20/1998 | US5710065 Method and apparatus for breaking and separating dies from a wafer |
01/20/1998 | US5710062 Plastic molded semiconductor package and method of manufacturing the same |
01/20/1998 | US5710061 Disposable post processing for semiconductor device fabrication |
01/20/1998 | US5710059 Implanting dopants, annealing at high temperature |
01/20/1998 | US5710058 Method of making multi-terminal resonant tunneling transistor |
01/20/1998 | US5710057 SOI fabrication method |
01/20/1998 | US5710055 Method of making PMOSFETs having indium or gallium doped buried channels and n+ polysilicon gates and CMOS devices fabricated therefrom |
01/20/1998 | US5710054 Method of forming a shallow junction by diffusion from a silicon-based spacer |
01/20/1998 | US5710053 Method for manufacturing thin film transistor for a liquid crystal display |
01/20/1998 | US5710052 Scanning spreading resistance probe |
01/20/1998 | US5710051 Method for manufacturing a single electron transistor by using a scanning tunneling microscopy |
01/20/1998 | US5710050 Method for fabricating a semiconductor device |
01/20/1998 | US5709970 Mask having a pattern for detecting illuminance nonuniformity |
01/20/1998 | US5709958 Integrated circuits |
01/20/1998 | US5709928 Multilayered wiring substrate of aluminum nitride having a high dielectric layer and method of manufacture thereof |
01/20/1998 | US5709773 Silicon microstructures and process for their fabrication |
01/20/1998 | US5709772 Non-plasma halogenated gas flow to prevent metal residues |
01/20/1998 | US5709757 For use in manufacturing semiconductor wafers |
01/20/1998 | US5709756 Hydroxylamine, ammonium fluoride, water |
01/20/1998 | US5709755 Semiconductor wafers, polishing, scrubbing with brushes, removal of residues, rinsing with ammonium hydroxide and removal from station |
01/20/1998 | US5709745 Compound semi-conductors and controlled doping thereof |
01/20/1998 | US5709744 Masking methods during semiconductor device fabrication |
01/20/1998 | US5709715 Silicon or silica substrate with a modified surface, process for producing the same, new orthoesters and process for producing the same |
01/20/1998 | US5709593 Apparatus and method for distribution of slurry in a chemical mechanical polishing system |
01/20/1998 | US5709588 Polishing slurry and polishing process using the same |
01/20/1998 | US5709543 Vertical heat treatment apparatus |
01/20/1998 | US5709519 Plasma processing apparatus |
01/20/1998 | US5709336 Method of forming a solderless electrical connection with a wirebond chip |
01/20/1998 | US5709262 Electronic valve for cooling semiconductor processing equipment |
01/20/1998 | US5709230 Triple zone mascara brush |
01/20/1998 | US5709037 Stream drying process |
01/20/1998 | US5709026 Apparatus for metal stamping insertion into a mold cavity |
01/15/1998 | WO1998001908A1 Semiconductor device with special emitter connection |
01/15/1998 | WO1998001907A1 Resin-encapsulated semiconductor device and method of manufacturing the same |
01/15/1998 | WO1998001904A1 Semiconductor memory and method for manufacturing the same |
01/15/1998 | WO1998001902A1 Semiconductor component fixing jig, table for placement of semiconductor component and bonding apparatus |
01/15/1998 | WO1998001901A1 Ic discarding apparatus for flip chip mounting facility |
01/15/1998 | WO1998001900A1 Method for etching layers on semiconductor wafers |
01/15/1998 | WO1998001899A1 Cleaning gas |
01/15/1998 | WO1998001898A1 Rie apparatus |
01/15/1998 | WO1998001897A1 Method of cleaning semiconductor device |
01/15/1998 | WO1998001896A1 Washing apparatus and washing method |
01/15/1998 | WO1998001895A1 Method of production of semiconductor integrated circuit device |
01/15/1998 | WO1998001894A1 Method of manufacturing semiconductor integrated circuit device |
01/15/1998 | WO1998001893A1 Apparatus and method for multi-zone high-density inductively-coupled plasma generation |
01/15/1998 | WO1998001892A1 Methods and apparatus for cleaning, rinsing, and drying wafers |
01/15/1998 | WO1998001891A1 Transport chamber and method for making same |
01/15/1998 | WO1998001890A1 Method and apparatus for contactless treatment of a semiconductor substrate in wafer form |
01/15/1998 | WO1998001887A1 Chamber interfacing o-rings and method for implementing same |
01/15/1998 | WO1998001745A1 Automatic semiconductor wafer sorter/prober with extended optical inspection |
01/15/1998 | WO1998001601A1 Plasma chamber with separate process gas and cleaning gas injection ports |
01/15/1998 | WO1998001599A1 Microwave applicator for an electron cyclotron resonance plasma source |
01/15/1998 | WO1998001598A1 Aluminum or aluminum alloy sputtering target |
01/15/1998 | WO1998001378A1 A wafer transfer system and method of using the same |
01/15/1998 | DE19726869A1 Thin metal plate used as printed wiring for LSI, lead frame of IC |
01/15/1998 | DE19644941C1 High power diode laser |
01/15/1998 | DE19632389C1 Clamping arrangement for component |
01/15/1998 | DE19628393A1 Device for protecting edge of wafer against etching liquid |
01/14/1998 | EP0818829A1 Bipolar transistor and method of fabricating it |
01/14/1998 | EP0818828A1 Power field effect transistor |
01/14/1998 | EP0818826A1 Semiconductor device |
01/14/1998 | EP0818824A2 High-frequency semiconductor device |
01/14/1998 | EP0818821A2 Al/Ti layered interconnection and method of forming the same |
01/14/1998 | EP0818819A1 Improvements in or relating to semiconductor devices |
01/14/1998 | EP0818818A1 Method of separating wafers into individual die |
01/14/1998 | EP0818817A2 Aluminium hole filling using ionized metal adhesion layer |
01/14/1998 | EP0818816A1 Method of forming airbridged metallization for integrated circuit fabrication |
01/14/1998 | EP0818815A1 Fabricating method for semiconductor device |
01/14/1998 | EP0818814A2 Overlay alignment measurement of semiconductor wafers |
01/14/1998 | EP0818813A1 Component system for bonding and method of bonding enabling thermal dilatations |
01/14/1998 | EP0818812A1 Connection construction and method of manufacturing the same |
01/14/1998 | EP0818811A1 Method of making solder bumps |
01/14/1998 | EP0818810A2 Method of fabricating high beta HBT devices |
01/14/1998 | EP0818809A2 Method of washing semiconductor wafers |
01/14/1998 | EP0818808A2 Improvements in or relating to semiconductor devices |
01/14/1998 | EP0818807A2 Dual vertical thermal processing furnace |
01/14/1998 | EP0818806A2 Method and apparatus for transporting and using a semiconductor substrate carrier |
01/14/1998 | EP0818803A2 Electrically floating shield in a plasma reactor |
01/14/1998 | EP0818802A2 Gas injection slit nozzle for a plasma process reactor |
01/14/1998 | EP0818801A2 Plasma treating apparatus |
01/14/1998 | EP0818565A2 Gas supplying apparatus and vapor-phase growth plant |
01/14/1998 | EP0818560A2 Construction of a film on a semiconductor wafer |
01/14/1998 | EP0818559A2 Chamber for constructing a film on a semiconductor wafer |
01/14/1998 | EP0818558A1 Components peripheral to the pedestal in the gas flow path within a chemical vapor deposition chamber |
01/14/1998 | EP0818556A1 A method for providing full-face high density plasma deposition |
01/14/1998 | EP0818272A1 Holding a polishing pad on a platen in a chemical mechanical polishing system |
01/14/1998 | EP0818055A1 Self-alignment technique for semiconductor devices |
01/14/1998 | EP0817973A1 Interface apparatus for automatic test equipment |
01/14/1998 | EP0788612A4 Beamsplitter in single fold optical system and optical variable magnification method and system |
01/14/1998 | EP0783727A4 Microstructures and methods for manufacturing microstructures |
01/14/1998 | EP0764975B1 Process for producing superficial piling-up defects on the backside of semiconductor wafers |