Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/1998
03/03/1998US5723890 MOS type semiconductor device
03/03/1998US5723889 Semiconductor memory device and method for fabricating the same
03/03/1998US5723888 Non-volatile semiconductor memory device
03/03/1998US5723887 Semiconductor memory device and manufacturing method thereof
03/03/1998US5723886 Field effects transistor
03/03/1998US5723885 Semiconductor device including a ferroelectric film and control method thereof
03/03/1998US5723879 Thin film transistor with vertical channel adjacent sidewall of gate electrode and method of making
03/03/1998US5723876 Device and method for programming a logic level within an intergrated circuit using multiple mask layers
03/03/1998US5723875 Chip damage detecting circuit for semiconductor IC
03/03/1998US5723874 For characterizing the dishing occurring in a planarization process
03/03/1998US5723860 Frame-supported pellicle for photomask protection
03/03/1998US5723387 Method and apparatus for forming very small scale Cu interconnect metallurgy on semiconductor substrates
03/03/1998US5723386 Method of manufacturing a semiconductor device capable of rapidly forming minute wirings without etching of the minute wirings
03/03/1998US5723385 Wafer edge seal ring structure
03/03/1998US5723384 Method for manufacturing a capacitor in a semiconductor device using selective tungsten nitride thin film
03/03/1998US5723383 Semiconductor substrate treatment method
03/03/1998US5723382 Method of making a low-resistance contact to silicon having a titanium silicide interface, an amorphous titanium nitride barrier layer and a conductive plug
03/03/1998US5723381 Formation of self-aligned overlapping bitline contacts with sacrificial polysilicon fill-in stud
03/03/1998US5723380 Method of approach to improve metal lithography and via-plug integration
03/03/1998US5723379 Method for fabricating polycrystalline silicon having micro roughness on the surface
03/03/1998US5723378 Fabrication method of semiconductor device using epitaxial growth process
03/03/1998US5723377 Process for manufacturing a semiconductor device including a silicidation step
03/03/1998US5723376 Method of manufacturing SiC semiconductor device having double oxide film formation to reduce film defects
03/03/1998US5723375 Method of making EEPROM transistor for a DRAM
03/03/1998US5723374 Method for forming dielectric spacer to prevent poly stringer in stacked capacitor DRAM technology
03/03/1998US5723373 Method of making porous-Si capacitors for high density drams cell
03/03/1998US5723372 Method and apparatus for forming buried oxide layers within silicon wafers
03/03/1998US5723371 Method for fabricating a thin film transistor having a taper-etched semiconductor film
03/03/1998US5723370 FET and/or bipolar devices formed in thin vertical silicon on insulator (SOI) structures
03/03/1998US5723369 Method of flip chip assembly
03/03/1998US5723368 Fluorination
03/03/1998US5723367 Wiring forming method
03/03/1998US5723364 Method for wire-bonding a covered wire
03/03/1998US5723362 Method of forming interconnection
03/03/1998US5723361 Thin films of ABO3 with excess A-site and B-site modifiers and method of fabricating integrated circuits with same
03/03/1998US5723360 Method of processing an epitaxial wafer of InP or the like
03/03/1998US5723359 Method for concurrently forming thin film resistor and thick film resistor on a hybrid integrated circuit substrate
03/03/1998US5723358 Method of manufacturing amorphous silicon antifuse structures
03/03/1998US5723357 Supplementary implantation method for fabricating twin gate CMOS
03/03/1998US5723356 Fabrication method for semiconductor device
03/03/1998US5723355 Method to incorporate non-volatile memory and logic components into a single sub-0.3 micron fabrication process for embedded non-volatile memory
03/03/1998US5723352 Process to optimize performance and reliability of MOSFET devices
03/03/1998US5723351 Method of making matrix of EPROM memory cell with a tablecloth structure having an improved capacitative ratio
03/03/1998US5723350 Process for fabricating a contactless electrical erasable EPROM memory device
03/03/1998US5723349 Process for manufacturing a high conductivity insulated gate bipolar transistor integrater structure
03/03/1998US5723347 Semi-conductor chip test probe and process for manufacturing the probe
03/03/1998US5723337 Method for measuring and controlling the oxygen concentration in silicon melts and apparatus therefor
03/03/1998US5723258 Acetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the same
03/03/1998US5723257 Si containing high molecular compound and photosensitive resin composition
03/03/1998US5723254 Novolak esterified with o-naphthoquinone diazide
03/03/1998US5723237 Method for determining baking conditions for resist pattern formation through development of unexposed trial resist films
03/03/1998US5723236 Photomasks and a manufacturing method thereof
03/03/1998US5723235 Method of producing photomask and exposing
03/03/1998US5723234 Phase shift photomask and phase shift photomask dry etching method
03/03/1998US5723233 Optical proximity correction method and apparatus
03/03/1998US5723171 Integrated circuit electrode structure and process for fabricating same
03/03/1998US5723156 Mold for molding a semiconductor package
03/03/1998US5723034 Process for forming hydrogenated amorphous silicon film
03/03/1998US5723029 Photo-electric chemical apparatus using carbon cluster electrode
03/03/1998US5723028 Electrodeposition apparatus with virtual anode
03/03/1998US5723019 Cleaning semiconductor substrates with scrubbing, dripping on substrates
03/03/1998US5722879 Variable travel carrier device and method for planarizing semiconductor wafers
03/03/1998US5722707 Clamping structure in air-tightly sealable container
03/03/1998US5722668 Protective collar for vacuum seal in a plasma etch reactor
03/03/1998US5722579 Bottom-surface-metallurgy rework process in ceramic modules
03/03/1998US5722514 Tray installation rack for test handler
03/03/1998US5722467 Filing of assemblies
03/03/1998US5722442 On-site generation of ultra-high-purity buffered-HF for semiconductor processing
03/03/1998US5722441 Electronic device process apparatus
03/03/1998US5722162 Fabrication procedure for a stable post
03/03/1998US5722161 Method of making a packaged semiconductor die including heat sink with locking feature
03/03/1998US5722159 Method for retention of a fragile conductive trace with a protective clamp
02/1998
02/26/1998WO1998008259A1 A BIPOLAR SEMICONDUCTOR DEVICE HAVING SEMICONDUCTOR LAYERS OF SiC AND A METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE OF SiC
02/26/1998WO1998008255A1 Method for manufacturing oxide dielectric device, and memory and semiconductor device usign the device
02/26/1998WO1998008254A1 Integrated circuit with differing gate oxide thickness and process for making same
02/26/1998WO1998008253A1 Dual gate oxide thickness integrated circuit and process for making same
02/26/1998WO1998008252A1 Method for differential fieldox growth
02/26/1998WO1998008251A1 Semiconductor and method for manufacturing the same
02/26/1998WO1998008250A1 Improved integrated circuit structures and methods to facilitate accurate measurement of the ic devices
02/26/1998WO1998008249A1 Method and apparatus for depositing a planarized dielectric layer on a semiconductor substrate
02/26/1998WO1998008248A1 Method and device for washing electronic parts member, or the like
02/26/1998WO1998008247A1 Semiconductor component with foreign atoms introduced by ion implantation and process for producing the same
02/26/1998WO1998008246A1 Semiconductor component with foreign atoms introduced by ion implantation and process for producing the same
02/26/1998WO1998008154A1 Semiconductor circuit secure against outside accesses
02/26/1998WO1998008145A1 Baths for producing microstructures
02/26/1998WO1998008144A1 Process and device for applying a photoresist lacquer on uneven base body surfaces
02/26/1998WO1998008143A1 Method for forming photoresist features having reentrant profiles using a basic agent
02/26/1998WO1998008086A1 New kind of thin films for microsystem technology and microstructuring and their use
02/26/1998WO1997041488A3 Processes for cleaning and stripping photoresist from surfaces of semiconductor wafers
02/26/1998WO1997034171A3 Microlens scanner for microlithography and wide-field confocal microscopy
02/26/1998DE19735990A1 CVD of thin stable zirconium nitride film
02/26/1998DE19734486A1 Photomask test apparatus for integrated circuit manufacture
02/26/1998DE19734059A1 Charged particle shadow projection lithography system
02/26/1998DE19729602A1 Short circuit prevention semiconductor component, e.g. for DRAM
02/26/1998DE19726852A1 Stacked memory cells magnetic RAM
02/26/1998DE19724469A1 Flash memory with increased writing and erasure efficiency
02/26/1998DE19634135A1 Halbleiterschaltung, insbesondere zur Verwendung in einem integrierten Baustein Semiconductor circuit, in particular for use in an integrated module
02/26/1998DE19634122A1 Neuartige Bäder zur Erzeugung von Mikrostrukturen Novel baths for producing microstructures
02/26/1998DE19634120A1 Thin film for microsystem technology and microstructuring
02/26/1998DE19633927A1 Support frame for semiconductor wafer
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