Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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02/26/1998 | DE19633407A1 Vorrichtung und Verfahren zum Auftragen von Fotoresist auf nicht ebene Grundkörperflächen für fotolithografische Verfahren Apparatus and method for applying photoresist on non-planar body surfaces for photolithographic method |
02/25/1998 | EP0825712A2 Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits |
02/25/1998 | EP0825657A2 Method of making an organic thin film transistor and article made by the method |
02/25/1998 | EP0825652A2 Ohmic electrode and method of forming the same |
02/25/1998 | EP0825650A2 DRAM cell with stacked capacitor |
02/25/1998 | EP0825647A2 Chip size package |
02/25/1998 | EP0825646A2 Semiconductor device and method of manufacturing the same |
02/25/1998 | EP0825645A1 Gapfill and planarization process for shallow trench isolation |
02/25/1998 | EP0825644A1 Integrated circuit having a dummy structure and method of making the same |
02/25/1998 | EP0825643A2 Simulation method for predicting properties of manufactured semiconductor devices |
02/25/1998 | EP0825642A2 Plasma process for high photoresist selectivity and improved polymer adhesion |
02/25/1998 | EP0825641A1 Method of manufacturing a transistor with self aligned contacts |
02/25/1998 | EP0825640A2 FET gate insulation and process for manufacturing |
02/25/1998 | EP0825639A2 Silicon wafer and method of manufacturing the same |
02/25/1998 | EP0825638A2 Method of manufacturing fine structures |
02/25/1998 | EP0825637A2 Epitaxial barrel reactor with a cooling system and method of operating it |
02/25/1998 | EP0825614A2 Arrangement and method of measuring the speed of memory unit in an integrated circuit |
02/25/1998 | EP0825491A2 Exposure apparatus of reduced projection scanning type |
02/25/1998 | EP0825279A1 Method and apparatus for purging the back side of a substrate |
02/25/1998 | EP0825278A1 Method for reducing contaminants in plasma chambers |
02/25/1998 | EP0825276A2 Sputter target for eliminating redeposition on the target sidewall |
02/25/1998 | EP0824995A1 Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus |
02/25/1998 | EP0824760A1 Sputtering apparatus with isolated coolant and sputtering target therefor |
02/25/1998 | EP0824721A1 Imaging system and apparatus for ultraviolet lithography |
02/25/1998 | EP0824681A1 Dynamic contaminant extraction measurement for chemical distribution systems |
02/25/1998 | EP0824604A1 Apparatus for reducing arcing during sputtering |
02/25/1998 | EP0771519A4 Integrally bumped electronic package components |
02/25/1998 | EP0740757A4 Chemical refill system for high purity chemicals |
02/25/1998 | EP0707662A4 Ultrasonic enhancement of aluminum step coverage and apparatus |
02/25/1998 | EP0674814A4 Method of forming interface between die and chip carrier. |
02/25/1998 | EP0504434B1 Semiconductor memory unit having redundant structure |
02/25/1998 | CN2275283Y Device for photoetching double face film |
02/25/1998 | CN1174593A Getter pump module and system |
02/25/1998 | CN1174530A Factener driving tool insert |
02/25/1998 | CN1174490A Method for mounting electronic component and device with binder on circuit substrate |
02/25/1998 | CN1174446A Method of holding wafer, method of removing wafer and electrostatic chucking device |
02/25/1998 | CN1174414A 半导体器件 Semiconductor devices |
02/25/1998 | CN1174412A High load resistance type static random access memory cell and method for forming the same |
02/25/1998 | CN1174411A Multilayer stereo integrated circuit |
02/25/1998 | CN1174410A 半导体器件 Semiconductor devices |
02/25/1998 | CN1174409A 半导体器件及其制造方法 Semiconductor device and manufacturing method thereof |
02/25/1998 | CN1174408A Method of forming semiconductor metallization system and structure therefor |
02/25/1998 | CN1174407A Semiconductor memory cell fabrication method |
02/25/1998 | CN1174406A Method for manufacturing semiconductor integrated circuit device |
02/25/1998 | CN1174405A LED display packaging with substrate removal and method of fabrication |
02/25/1998 | CN1174404A Ultrasonic vibration bonding chip mounter |
02/25/1998 | CN1174403A Chip-Size semiconductor package and fabrication method thereof |
02/25/1998 | CN1174402A Charged-beam exposure mask and charged-beam exposure method |
02/25/1998 | CN1174401A Method of using GaN/Al2O3 composite material as substrate in the epitaxial growth of III-V family nitride |
02/25/1998 | CN1174380A Current limiting during block writes of memory circuits |
02/25/1998 | CN1174343A Management device of photoetching film stripping liquid |
02/24/1998 | US5721887 Microcomputer including a circuit for generating a reset signal when the supply voltage is below a threshold level |
02/24/1998 | US5721700 Non-volatile semiconductor memory device in which applied voltage to ferroelectric capacitor is adjusted |
02/24/1998 | US5721698 Read only memory device and manufacturing method |
02/24/1998 | US5721686 Method and apparatus for control and evaluation of pending jobs in a factory |
02/24/1998 | US5721619 Misregistration detecting marks for pattern formed on semiconductor substrate |
02/24/1998 | US5721608 Projection exposure method and apparatus |
02/24/1998 | US5721607 Alignment method and apparatus |
02/24/1998 | US5721601 Display units having two insolating films and a planarizing film and process for producing the same |
02/24/1998 | US5721510 Semiconductor integrated circuit having a substrate back bias voltage generating circuit which is responsive to a power supply detection circuit |
02/24/1998 | US5721498 Block segmentation of configuration lines for fault tolerant programmable logic device |
02/24/1998 | US5721451 Integrated circuit assembly adhesive and method thereof |
02/24/1998 | US5721450 Moisture relief for chip carriers |
02/24/1998 | US5721448 Integrated circuit chip having isolation trenches composed of a dielectric layer with oxidation catalyst material |
02/24/1998 | US5721444 Thin-film transistor having a buried impurity region and method of fabricating the same |
02/24/1998 | US5721443 NMOS field effect transistors and methods of forming NMOS field effect transistors |
02/24/1998 | US5721442 High density flash EPROM |
02/24/1998 | US5721441 High density flash memory cell and method of forming a line of floating gate transistors |
02/24/1998 | US5721440 Memory with EEPROM cell having capacitive effect and method for the reading of such a cell |
02/24/1998 | US5721439 MOS transistor structure for electro-static discharge protection circuitry |
02/24/1998 | US5721422 Electronic devices having an array with shared column conductors |
02/24/1998 | US5721176 Use of oxalyl chloride to form chloride-doped silicon dioxide films of silicon substrates |
02/24/1998 | US5721175 Method of manufacturing a semiconductor device |
02/24/1998 | US5721174 Narrow deep trench isolation process with trench filling by oxidation |
02/24/1998 | US5721173 Method of forming a shallow trench isolation structure |
02/24/1998 | US5721172 Self-aligned polish stop layer hard masking method for forming planarized aperture fill layers |
02/24/1998 | US5721171 Method for forming controllable surface enhanced three dimensional objects |
02/24/1998 | US5721170 Method of making a high-voltage MOS transistor with increased breakdown voltage |
02/24/1998 | US5721169 Multiple storage planes read only memory integrated circuit device and method of manufacture thereof |
02/24/1998 | US5721168 Method for forming a ring-shape capacitor |
02/24/1998 | US5721167 Process for forming a semiconductor device and a static-random-access memory cell |
02/24/1998 | US5721166 Method to increase the resistance of a polysilicon load resistor, in an SRAM cell |
02/24/1998 | US5721165 Method of forming CMOS circuitry |
02/24/1998 | US5721164 Method of manufacturing thin film transistors |
02/24/1998 | US5721163 Method of manufacture of thin film transistor SRAM device with a titanium nitride or silicide gate |
02/24/1998 | US5721161 Method of making high-speed, low-noise millimeterwave HEMT and pseudormorphic HEMT |
02/24/1998 | US5721159 Method for manufacturing and testing a nonvolatile memory device |
02/24/1998 | US5721157 Method for manufacturing a semiconductor device having interconnection layers |
02/24/1998 | US5721156 Method of manufacturing a semiconductor device with a planarized integrated circuit |
02/24/1998 | US5721155 Method for forming a via contact of a semiconductor device |
02/24/1998 | US5721154 Method for fabricating a four fin capacitor structure |
02/24/1998 | US5721153 Forming a storage electrode of a multitude hemispherical polysilicon grains on the whole surface |
02/24/1998 | US5721152 Method of fabricating a stacked capacitor for a DRAM cell by plasma etching |
02/24/1998 | US5721150 Use of silicon for integrated circuit device interconnection by direct writing of patterns therein |
02/24/1998 | US5721148 Method for manufacturing MOS type semiconductor device |
02/24/1998 | US5721147 Methods of forming bipolar junction transistors |
02/24/1998 | US5721146 Method of forming buried contact architecture within a trench |
02/24/1998 | US5721145 Method of making a semiconductor substrate having gettering effect |
02/24/1998 | US5721144 Method of making trimmable modular MOSFETs for high aspect ratio applications |
02/24/1998 | US5721131 Surface modification of polymers with self-assembled monolayers that promote adhesion, outgrowth and differentiation of biological cells |