Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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02/10/1998 | US5716865 Method of making split gate flash EEPROM cell by separating the tunneling region from the channel |
02/10/1998 | US5716864 Method of manufacturing a non-volatile semiconductor memory device with peripheral transistor |
02/10/1998 | US5716863 Method of manufacturing semiconductor device having elements different in gate oxide thickness and resistive elements |
02/10/1998 | US5716862 High performance PMOSFET using split-polysilicon CMOS process incorporating advanced stacked capacitior cells for fabricating multi-megabit DRAMS |
02/10/1998 | US5716861 Insulated-gate field-effect transistor structure and method |
02/10/1998 | US5716859 Method of fabricating a silicon BJT |
02/10/1998 | US5716857 Method for manufacturing a semiconductor device |
02/10/1998 | US5716856 Arrangement and method for detecting sequential processing effects in manufacturing using predetermined sequences within runs |
02/10/1998 | US5716759 Method and apparatus for producing integrated circuit devices |
02/10/1998 | US5716758 Process for forming fine pattern for semiconductor device utilizing multiple interlaced exposure masks |
02/10/1998 | US5716756 Positive or negative working mixtures |
02/10/1998 | US5716753 Adhesion, accuracy |
02/10/1998 | US5716713 Insulated metallized substrate; thermoconductivity |
02/10/1998 | US5716673 Spin-on-glass process with controlled environment |
02/10/1998 | US5716535 Aqueous solution containing ammonium fluoride, hydrogen fluoride and ammonium hydroxide |
02/10/1998 | US5716495 Cleaning method |
02/10/1998 | US5716494 Dry etching method, chemical vapor deposition method, and apparatus for processing semiconductor substrate |
02/10/1998 | US5716486 Method and apparatus for tuning field for plasma processing using corrected electrode |
02/10/1998 | US5716485 Electrode designs for controlling uniformity profiles in plasma processing reactors |
02/10/1998 | US5716484 Contaminant reduction improvements for plasma etch chambers |
02/10/1998 | US5716458 Method of washing and drying an article |
02/10/1998 | US5716453 Prevents primer condensations from forming on wafers; improved photolithography |
02/10/1998 | US5716450 Growing method of gallium nitride related compound semiconductor crystal and gallium nitride related compound semiconductor device |
02/10/1998 | US5716218 Process for manufacturing an interconnect for testing a semiconductor die |
02/10/1998 | US5716207 Heating furnace |
02/10/1998 | US5716133 Shielded heat sensor for measuring temperature |
02/10/1998 | US5715989 Microelectronic wire bonding using friction welding process |
02/10/1998 | US5715929 Charging device for semiconductor processing installations |
02/10/1998 | US5715872 Process and device for the shaping of leads of integrated circuits |
02/10/1998 | US5715851 Wafer cassette and cleaning system adopting the same |
02/10/1998 | US5715612 Method for precision drying surfaces |
02/10/1998 | US5715610 Programmable method and apparatus for cleaning semiconductor elements |
02/10/1998 | US5715593 Method of making plastic-packaged semiconductor integrated circuit |
02/10/1998 | CA2082771C Method for forming interconnect structures for integrated circuits |
02/10/1998 | CA2074848C Method of forming electrodes for trench capacitors |
02/05/1998 | WO1998005123A1 Programmable switch, adjustable capacitance and resonant circuit effected by means of such a switch |
02/05/1998 | WO1998005076A2 Semiconductor component for high voltage |
02/05/1998 | WO1998005074A1 Ferroelectric based memory devices utilizing low curie point ferroelectrics and encapsulation |
02/05/1998 | WO1998005071A1 Method of fabricating an integrated circuit using self-patterned thin films |
02/05/1998 | WO1998005070A1 Static memory cell |
02/05/1998 | WO1998005069A1 Heterolithic voltage controlled oscillator |
02/05/1998 | WO1998005068A1 Method of manufacturing and transferring metallic droplets |
02/05/1998 | WO1998005067A1 Electronic packages containing microsphere spacers |
02/05/1998 | WO1998005066A2 Methods and apparatus for the in-process detection and measurement of thin film layers |
02/05/1998 | WO1998005065A1 Bga mould assembly for encapsulating bga substrates of varying thickness |
02/05/1998 | WO1998005064A1 Self-aligned gate fabrication process for silicon carbide static induction transistors |
02/05/1998 | WO1998005063A1 Silicon epitaxial wafer and method for manufacturing the same |
02/05/1998 | WO1998005062A1 Stratified structure with a ferroelectric layer and process for producing the same |
02/05/1998 | WO1998005061A1 Method for manufacturing semiconductor device |
02/05/1998 | WO1998005060A1 Multizone bake/chill thermal cycling module |
02/05/1998 | WO1998005059A2 Automatic semiconductor part handler |
02/05/1998 | WO1998004997A1 Method and apparatus for identifying characters on a plurality of silicon wafers |
02/05/1998 | WO1998004959A1 Negative photoresist compositions and use thereof |
02/05/1998 | WO1998004892A1 A rapid thermal anneal system and method including improved temperature sensing and monitoring |
02/05/1998 | WO1998004646A1 Chemical mechanical polishing composition and process |
02/05/1998 | WO1998004602A1 Perfluorinated hydrocarbon polymer-filled adhesive formulations and uses therefor |
02/05/1998 | WO1998004366A1 Removal of material by radiation applied at an oblique angle |
02/05/1998 | WO1997048032A3 Programmable metallization cell and method of making |
02/05/1998 | WO1997042654A3 A method of making a monolithic microwave circuit with thick conductors |
02/05/1998 | DE19733416A1 Packaging for semiconductor chip |
02/05/1998 | DE19732625A1 Bipolar transistor packaging for HF device, e.g. DBS converter |
02/05/1998 | DE19732432A1 Titanium nitride film formation by CVD |
02/05/1998 | DE19724222A1 DRAM with novel capacitor cell layout |
02/05/1998 | DE19723937A1 Gallium arsenide metal semiconductor FET for HF communications system |
02/05/1998 | DE19723202A1 Crack resistant semiconductor component production |
02/05/1998 | DE19708766A1 Lithographic mask production without need for SOI wafer |
02/05/1998 | DE19708512A1 Phase shift mask with adhesion promoting layer |
02/05/1998 | DE19703971A1 Field effect transistor for high integration circuit |
02/05/1998 | DE19703223A1 Electrode manufacturing method for semiconductor device |
02/05/1998 | DE19631147A1 Nichtflüchtige Speicherzelle A non-volatile memory cell |
02/05/1998 | DE19631146A1 Nichtflüchtige Speicherzelle A non-volatile memory cell |
02/05/1998 | DE19631046A1 Chip surface bond structure |
02/05/1998 | DE19630984A1 Double poly metal-oxide-nitride-oxide-semiconductor EEPROM |
02/05/1998 | DE19630593A1 Compact, direct mechanical- and electrical bonding of microcircuit to substrate |
02/05/1998 | CA2261753A1 Semiconductor component for high voltage |
02/04/1998 | EP0822741A2 Ultrasonic vibration bonding chip mounter |
02/04/1998 | EP0822737A2 Unit type clip lead terminal, connecting method, connecting board and method of producing such board |
02/04/1998 | EP0822600A1 Lateral gate, vertical drift region transistor |
02/04/1998 | EP0822599A2 Trench capacitor DRAM cell |
02/04/1998 | EP0822598A1 Single-chip contact-less read-only memory (rom) device and the method for fabricating the device |
02/04/1998 | EP0822597A2 Integrated circuit including field effect transisitors |
02/04/1998 | EP0822596A2 Improvements in or relating to integrated circuits |
02/04/1998 | EP0822594A2 MOS transistor for DRAM cell |
02/04/1998 | EP0822593A2 A method of manufacturing an insulated gate field effect transistor |
02/04/1998 | EP0822592A2 A method of forming conductive lines on a semiconductor wafer |
02/04/1998 | EP0822591A1 Insulated gate field effect transistor |
02/04/1998 | EP0822590A2 Method and apparatus for releasing a workpiece from an electrostatic chuck |
02/04/1998 | EP0822589A1 Carrier for a semiconductor wafer and its application |
02/04/1998 | EP0822588A2 Doped silicon substrate |
02/04/1998 | EP0822587A2 Method for making integrated capacitive structures |
02/04/1998 | EP0822586A2 Improvements in or relating to integrated circuits |
02/04/1998 | EP0822585A2 Stress control by fluorination of silica film |
02/04/1998 | EP0822584A2 Method of surface treatment of semiconductor substrates |
02/04/1998 | EP0822583A2 Improvements in or relating to the cleaning of semiconductor devices |
02/04/1998 | EP0822582A2 Method of surface treatment of semiconductor substrates |
02/04/1998 | EP0822581A2 A method of crystallizing a semiconductor film and of manufacturing a thin film transistor |
02/04/1998 | EP0822580A2 High aspect ratio clamp |
02/04/1998 | EP0822579A1 Method of fabricating integrated microstructures of semiconductor material |
02/04/1998 | EP0822578A1 Method of fabricating integrated semiconductor devices comprising a chemoresistive gas microsensor |
02/04/1998 | EP0822572A1 Method and apparatus for plasma treatment of a surface |