| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 01/22/1998 | WO1998002921A1 Transferred flexible integrated circuit |
| 01/22/1998 | WO1998002919A1 Method and mold for manufacturing semiconductor device, semiconductor device, and method for mounting the device |
| 01/22/1998 | WO1998002918A1 Method for fabrication of a non-symmetrical transistor |
| 01/22/1998 | WO1998002917A1 Method for fabrication of a non-symmetrical transistor |
| 01/22/1998 | WO1998002916A1 A METHOD FOR PRODUCING A CHANNEL REGION LAYER IN A SiC-LAYER FOR A VOLTAGE CONTROLLED SEMICONDUCTOR DEVICE |
| 01/22/1998 | WO1998002915A1 Dopant activation of heavily-doped semiconductor by high current densities |
| 01/22/1998 | WO1998002914A1 Semiconductor component with low contact resistance to highly doped regions |
| 01/22/1998 | WO1998002913A2 Method of forming a gate electrode for an igfet |
| 01/22/1998 | WO1998002912A1 Interface apparatus for a semiconductor workpiece processing tool |
| 01/22/1998 | WO1998002911A1 Modular semiconductor workpiece processing tool |
| 01/22/1998 | WO1998002910A1 Automated semiconductor processing systems |
| 01/22/1998 | WO1998002909A1 Electrode semiconductor workpiece holder and processing methods |
| 01/22/1998 | WO1998002908A1 Processing head for semiconductor processing machines |
| 01/22/1998 | WO1998002907A1 Control system for a semiconductor workpiece processing tool |
| 01/22/1998 | WO1998002906A1 Transport apparatus for semiconductor wafers |
| 01/22/1998 | WO1998002905A2 Wafer spin dryer and method of drying a wafer |
| 01/22/1998 | WO1998002904A1 Wafer cleaning apparatus |
| 01/22/1998 | WO1998002903A1 Device for separate removal from a holder or placing into a holder of stackable carriers of electronic components |
| 01/22/1998 | WO1998002900A1 High current ribbon beam ion implanter |
| 01/22/1998 | WO1998002597A1 Sputtering device and liquid-cooled target assembly therefor |
| 01/22/1998 | WO1998002352A1 Two stage valve for smif pods |
| 01/22/1998 | WO1998002284A1 Batch loader arm |
| 01/22/1998 | WO1997047041A3 Programmable, non-volatile memory device, and method of manufacturing such a device |
| 01/22/1998 | WO1997045865A3 A thin-film electronic device and a method of manufacturing such a device |
| 01/22/1998 | DE19729176A1 Herstellungsverfahren für eine Flüssigkristallanzeige mit aktiver Matrix und Struktur der mit diesem Herstellungsverfahren hergestellten Flüssigkristallanzeige Manufacturing method of a liquid crystal active matrix display and structure of the liquid crystal display produced by this production method |
| 01/22/1998 | DE19723062A1 Self-aligned metal wiring manufacture for semiconductor component |
| 01/22/1998 | DE19704999A1 Programming method for non volatile memory, e.g. EEPROM |
| 01/22/1998 | DE19704709A1 Phase-shift mask |
| 01/22/1998 | DE19652839A1 Level sensor for chemical-mechanical polishing device for semiconductor wafer |
| 01/22/1998 | DE19629082A1 Thermisch härtbares einkomponentiges Low viskosity Adhesive-Klebstoffsystem für Verklebungen im Mikrobereich Thermally curable one-component low VISCOSITY Adhesive adhesive system for bonding microscale |
| 01/21/1998 | EP0820104A2 Low light level imager with extended wavelength response employing atomic bonded(fused) semiconductor materials |
| 01/21/1998 | EP0820103A1 Single polysilicon level flash EEPROM cell and manufacturing process therefor |
| 01/21/1998 | EP0820102A2 Read-only semiconductor memory device |
| 01/21/1998 | EP0820101A2 Semiconductor memory device with peripheral region |
| 01/21/1998 | EP0820100A2 Semiconductor device and manufacturing method for the same, basic cell library and manufacturing method for the same, and mask |
| 01/21/1998 | EP0820099A2 Packaged semiconductor device and method of manufacturing the same |
| 01/21/1998 | EP0820097A1 Semiconductor chips with bond pads suitable for improved die testing |
| 01/21/1998 | EP0820096A2 Semiconductor device and method for fabricating the same |
| 01/21/1998 | EP0820095A2 Method of forming an interlayer film |
| 01/21/1998 | EP0820094A2 Passivated P-N junction in mesa semiconductor structure |
| 01/21/1998 | EP0820093A1 Etching organic antireflective coating from a substrate |
| 01/21/1998 | EP0820091A2 Wafer position error detection and correction system |
| 01/21/1998 | EP0820090A2 Dual plane robot |
| 01/21/1998 | EP0820088A2 Non-planar magnet tracking device for magnetron sputtering apparatus |
| 01/21/1998 | EP0820087A2 RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
| 01/21/1998 | EP0820086A1 Plasma uniformity control for an inductive plasma reactor |
| 01/21/1998 | EP0819998A2 Power control device |
| 01/21/1998 | EP0819988A1 Projection exposure apparatus |
| 01/21/1998 | EP0819983A1 Photoresist composition |
| 01/21/1998 | EP0819982A1 Radiation-sensitive composition |
| 01/21/1998 | EP0819933A2 Optical inspection method and apparatus |
| 01/21/1998 | EP0819786A2 Etch process for single crystal silicon |
| 01/21/1998 | EP0819785A1 A method of suppressing convection in a fluid in a cylindrical vessel |
| 01/21/1998 | EP0819782A1 Process of forming a thin film by laser ablation |
| 01/21/1998 | EP0819780A2 Inductively coupled HDP-CVD reactor |
| 01/21/1998 | EP0819779A1 Processes for the scrubbing of noxious substances from an exhaust gas |
| 01/21/1998 | EP0819318A1 A solder bump structure for a microelectronic substrate |
| 01/21/1998 | EP0819314A1 Method and device for controlling the energy of at least one charged species bombarding a body immersed in a plasma |
| 01/21/1998 | EP0819263A1 Method for making a tft active matrix for a projection system screen |
| 01/21/1998 | EP0619918B1 Microwave energized deposition process using a pressure lower than the minimum point pressure of the paschen curve |
| 01/21/1998 | CN1171168A Ballast monitoring for radio frequency power transistors |
| 01/21/1998 | CN1171167A Composite intermediate connecting element of microelectronic device and its production method |
| 01/21/1998 | CN1171166A Forming a planar surface over a substrate by modification topography of the substrate |
| 01/21/1998 | CN1170963A Semiconductor device and fabrication method thereof |
| 01/21/1998 | CN1170962A Metal contact structure of semiconductor device and method of fabricating the same |
| 01/21/1998 | CN1170961A Lid air bridge line |
| 01/21/1998 | CN1170959A Method of forming floating gate in flash memory device |
| 01/21/1998 | CN1170958A Method for manufacturing semiconductor device |
| 01/21/1998 | CN1170957A Method for forming metal wiring of semiconductor devices |
| 01/21/1998 | CN1170956A Method for forming layer of hemispherical grains and for fabricating capacitor of semiconductor device |
| 01/21/1998 | CN1170946A Thick film composition for modifying electrical properties of dielectric layer |
| 01/21/1998 | CN1170934A Method of programming nonvolatile memory |
| 01/21/1998 | CN1170784A Method and apparatus for aiming barrel reactor nozzle |
| 01/21/1998 | CN1170777A Apparatus and method of preventing residual reaction gas from dry etcher |
| 01/21/1998 | CN1170775A Equipment for treating bottom materials |
| 01/21/1998 | CN1170655A Automated wafer lapping system |
| 01/20/1998 | US5710787 Output controller for laser device |
| 01/20/1998 | US5710735 EEPROM and method for fabricating the same |
| 01/20/1998 | US5710624 Aligner and contamination detecting method |
| 01/20/1998 | US5710620 Projection exposure method and apparatus |
| 01/20/1998 | US5710606 LCD TFT having two layer region adjacent base region in which the layers have opposite conductivities and have two density gradients |
| 01/20/1998 | US5710538 Circuit having trim pads formed in scribe channel |
| 01/20/1998 | US5710516 Input logic signal buffer circuits |
| 01/20/1998 | US5710486 Inductively and multi-capacitively coupled plasma reactor |
| 01/20/1998 | US5710462 Semiconductor integrated circuit device having multi-level wiring structure without dot pattern |
| 01/20/1998 | US5710461 SRAM cell fabrication with interlevel dielectric planarization |
| 01/20/1998 | US5710460 Structure for reducing microelectronic short circuits using spin-on glass as part of the interlayer dielectric |
| 01/20/1998 | US5710457 Semiconductor integrated circuit |
| 01/20/1998 | US5710454 Tungsten silicide polycide gate electrode formed through stacked amorphous silicon (SAS) multi-layer structure. |
| 01/20/1998 | US5710453 Transistor structure and method for making same |
| 01/20/1998 | US5710451 High-voltage lateral MOSFET SOI device having a semiconductor linkup region |
| 01/20/1998 | US5710450 Method of forming a transistor |
| 01/20/1998 | US5710443 Merged device with aligned trench fet and buried emitter patterns |
| 01/20/1998 | US5710442 Semiconductor device and method of manufacturing same |
| 01/20/1998 | US5710439 Optoelectronic integrated device having optical elements and electronic elements grown in a monolithic form on a GaAs ssubstrate |
| 01/20/1998 | US5710438 Semiconductor device with a silicide layer |
| 01/20/1998 | US5710407 Rapid thermal processing apparatus for processing semiconductor wafers |
| 01/20/1998 | US5710079 Method and apparatus for forming dielectric films |
| 01/20/1998 | US5710078 Method to improve the contact resistance of bit line metal structures to underlying polycide structures |
| 01/20/1998 | US5710077 Method for the generation of stacking-fault-induced damage on the back of semiconductor wafers |