Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/1998
02/17/1998US5719505 Reduced power PLA
02/17/1998US5719504 Semiconductor device having a scan path
02/17/1998US5719495 Apparatus for semiconductor device fabrication diagnosis and prognosis
02/17/1998US5719446 Multilayer interconnect structure for semiconductor device and method of manufacturing same
02/17/1998US5719442 Resin sealing type semiconductor device
02/17/1998US5719440 Flip chip adaptor package for bare die
02/17/1998US5719438 Method and workpiece for connecting a thin layer to a monolithic electronic module's surface and associated module packaging
02/17/1998US5719433 Semiconductor component with integrated heat sink
02/17/1998US5719432 Semiconductor device including bipolar transistor with improved current concentration characteristics
02/17/1998US5719431 Integrated driver circuit configuration for an inductive load element
02/17/1998US5719430 Formed in a semiconductor substrate
02/17/1998US5719426 Semiconductor device and manufacturing process thereof
02/17/1998US5719425 Multiple implant lightly doped drain (MILDD) field effect transistor
02/17/1998US5719424 Graded LDD implant process for sub-half-micron MOS devices
02/17/1998US5719423 Isolated power transistor
02/17/1998US5719422 Low threshold voltage, high performance junction transistor
02/17/1998US5719421 DMOS transistor with low on-resistance and method of fabrication
02/17/1998US5719419 Capacitor structure for a dynamic random access memory cell
02/17/1998US5719418 In-process semiconductor device
02/17/1998US5719417 Ferroelectric integrated circuit structure
02/17/1998US5719416 Integrated circuit with layered superlattice material compound
02/17/1998US5719415 Hetero-junction bipolar transistor
02/17/1998US5719410 Semiconductor device wiring or electrode
02/17/1998US5719409 Silicon carbide metal-insulator semiconductor field effect transistor
02/17/1998US5719408 Thin film transistor substrate, manufacturing method thereof, liquid crystal display panel and liquid crystal display equipment
02/17/1998US5719403 MeV scanning ions implanter
02/17/1998US5719089 Depositing insulating layer on substrate, depositing polysilicon layer, forming photoresist, forming openings, etching, removing polymer
02/17/1998US5719088 Method of fabricating semiconductor devices with a passivated surface
02/17/1998US5719087 Forming a protective layer of dielectrics material on contactor to provent exposure to ethcing materials
02/17/1998US5719086 Method for isolating elements of semiconductor device
02/17/1998US5719085 Etching and oxidizing forms a birds beak to reduce current leakage
02/17/1998US5719084 Method for the controlled formation of voids in doped glass dielectric films
02/17/1998US5719083 Method of forming a complex film over a substrate having a specifically selected work function
02/17/1998US5719082 Angled implant to improve high current operation of bipolar transistors
02/17/1998US5719081 Fabrication method for a semiconductor device on a semiconductor on insulator substrate using a two stage threshold adjust implant
02/17/1998US5719080 Semiconductor trench capacitor cell having a buried strap
02/17/1998US5719079 Method of making a semiconductor device having high density 4T SRAM in logic with salicide process
02/17/1998US5719078 Method for making a thin film transistor panel used in a liquid crystal display having a completely self-aligned thin film transistor
02/17/1998US5719077 Fixture and method for laser fabrication by in-situ cleaving of semiconductor bars
02/17/1998US5719075 Forming a uniform dielectric on a semiconductive substrate
02/17/1998US5719073 Microstructures and single mask, single-crystal process for fabrication thereof
02/17/1998US5719072 Forming conductive layer, forming insulating films, forming photosensitive film, exposing, developing, etching
02/17/1998US5719071 Method of forming a landing pad sturcture in an integrated circuit
02/17/1998US5719070 Used to connect solder contact to a semiconductor substrate
02/17/1998US5719068 Using a molecular beam of a halogen fluoride which has been activated by exposure to radio frequency radiation and which does not produce plasma
02/17/1998US5719067 Source-drain regions are vertically displaced from each other
02/17/1998US5719066 Method of manufacturing a semiconductor integrated circuit apparatus having a mis-type condenser
02/17/1998US5719065 Method for manufacturing semiconductor device with removable spacers
02/17/1998US5719004 Positive photoresist composition containing a 2,4-dinitro-1-naphthol
02/17/1998US5719003 Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers
02/17/1998US5718813 Enhanced reactive DC sputtering system
02/17/1998US5718800 Self-aligned N+/P+ doped polysilicon plugged contacts to N+/P+ doped polysilicon gates and to N+/P+ doped source/drain regions
02/17/1998US5718796 Vapor phase etching in vessel which also contains an endpoint detector
02/17/1998US5718769 Plasma processing apparatus
02/17/1998US5718763 Resist processing apparatus for a rectangular substrate
02/17/1998US5718762 Method for vapor-phase growth
02/17/1998US5718761 Providing nucleation and non-nucleation surfaces; vapor deposition from reaction mixture of organometallic compounds
02/17/1998US5718618 Lapping and polishing method and apparatus for planarizing photoresist and metal microstructure layers
02/17/1998US5718574 Heat treatment apparatus
02/17/1998US5718552 Procedure and facility for handling and transport of wafers in ultra-clean rooms
02/17/1998US5718546 Vial cap and transducer gauge for wire bonding capillaries
02/17/1998US5718367 Mold transfer apparatus and method
02/17/1998US5718361 Apparatus and method for forming mold for metallic material
02/17/1998US5718029 In a multi-level building
02/12/1998WO1998006140A1 Method of operating a storage cell arrangement
02/12/1998WO1998006139A1 Non-volatile storage cell
02/12/1998WO1998006138A1 Non-volatile storage cell
02/12/1998WO1998006137A1 Selectively doped channel region for increased idsat and method for making same
02/12/1998WO1998006133A2 Process for manufacturing an infrared-emitting luminescent diode
02/12/1998WO1998006132A1 Integrated circuit device manufacture
02/12/1998WO1998006131A1 Semiconductor device and its manufacture
02/12/1998WO1998006130A1 Fully self-aligned high speed low power mosfet fabrication
02/12/1998WO1998006129A1 Side-wall spacer for vertical chromium gate lines
02/12/1998WO1998006128A1 Dry etching method and device used for the same
02/12/1998WO1998006127A1 Aqueous cleaning solution for a semiconductor substrate
02/12/1998WO1998006126A1 Method and device for dry etching
02/12/1998WO1998006103A1 System for optimizing memory repair time using test data
02/12/1998WO1998006101A1 Method of operating a storage cell arrangement
02/12/1998WO1998006008A1 Positive photoresist composition containing a 2,4-dinitro-1-naphthol
02/12/1998WO1998005807A1 CaTiO3 INTERFACIAL TEMPLATE STRUCTURE ON SUPERCONDUCTOR
02/12/1998WO1998005803A1 Surface treatment apparatus, surface treatment method using the apparatus, and surface treatment nozzle used for the apparatus and method
02/12/1998DE19734074A1 Tiny particle detection method on workpiece, e.g. DRAM, VLSI circuit
02/12/1998DE19734047A1 Parasitic metal-insulator-metal structures analysing method for silicon semiconductor device
02/12/1998DE19733874A1 Electronic system for microwave or millimetre wave band communications
02/12/1998DE19733339A1 Film coating unit for flat plates, especially semiconductor wafers
02/12/1998DE19719717A1 Capacitor mfg. method for dynamic random access memory
02/12/1998DE19718700A1 Clock driver circuit for embedded cell array
02/12/1998DE19705342A1 Silicide process for MOS transistor
02/12/1998DE19644821C1 Controllable semiconductor structure for use instead of JFET, MESFET
02/12/1998DE19632094A1 Waferrahmen Wafer frame
02/12/1998DE19631363C1 Wässrige Reinigungslösung für ein Halbleitersubstrat An aqueous cleaning solution for a semiconductor substrate
02/11/1998EP0823736A2 Vertical bipolar transistor and method of manufacturing the same
02/11/1998EP0823733A2 Antifuse element and method for manufacturing the same
02/11/1998EP0823732A1 Film carrier and semiconductor device using same
02/11/1998EP0823731A2 Method of forming a semiconductor metallization system and structure therefor
02/11/1998EP0823730A1 Method of making an isolation layer serving as intermetal dielectric
02/11/1998EP0823728A2 Method of manufacturing a field effect transistor
02/11/1998EP0823727A1 Process for making the extrinsic base of a NPN transistor in a bipolar high frequency technology
02/11/1998EP0823726A1 Process for plasma enhanced anisotropic etching of metals, metal oxides and their mixtures
02/11/1998EP0823725A2 Dry etching post-treatment method and method for manufacturing a semiconductor device