| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 06/11/2002 | US6403982 Semi-insulating silicon carbide without vanadium domination |
| 06/11/2002 | US6403981 Double gate transistor having a silicon/germanium channel region |
| 06/11/2002 | US6403980 Thin film transistor array panel for liquid crystal display |
| 06/11/2002 | US6403978 Test pattern for measuring variations of critical dimensions of wiring patterns formed in the fabrication of semiconductor devices |
| 06/11/2002 | US6403976 Semiconductor crystal, fabrication method thereof, and semiconductor device |
| 06/11/2002 | US6403973 Electron beam exposure method and apparatus and semiconductor device manufactured using the same |
| 06/11/2002 | US6403972 Methods and apparatus for alignment of ion beam systems using beam current sensors |
| 06/11/2002 | US6403971 Beam-adjustment methods and apparatus for charged-particle-beam microlithography |
| 06/11/2002 | US6403957 Nucleic acid reading and analysis system |
| 06/11/2002 | US6403945 Device and method for detecting and distinguishing shelf-forming supports in cassettes and disk-shaped objects deposited thereon |
| 06/11/2002 | US6403933 Thermal conditioning apparatus |
| 06/11/2002 | US6403927 Heat-processing apparatus and method of semiconductor process |
| 06/11/2002 | US6403926 Thermal processing apparatus having a coolant passage |
| 06/11/2002 | US6403925 System and method for thermal processing of a semiconductor substrate |
| 06/11/2002 | US6403924 Apparatus for and method of heat treatment and substrate processing apparatus |
| 06/11/2002 | US6403923 System for controlling the temperature of a reflective substrate during rapid heating |
| 06/11/2002 | US6403905 Reticle stocking and sorting management system |
| 06/11/2002 | US6403895 Wiring substance and semiconductor |
| 06/11/2002 | US6403892 Coated means for connecting a chip and a card |
| 06/11/2002 | US6403881 Electronic component package assembly and method of manufacturing the same |
| 06/11/2002 | US6403823 Ester compounds having alicyclic structure and method for preparing same |
| 06/11/2002 | US6403822 Nucleophilic addition of alicyclic carbonyl and metal enolate of acetate; polycarbon monomers for photoresists; high reactivity and substrate affinity |
| 06/11/2002 | US6403544 Semiconductor wafers or chips; supercritical co2 gas as a dense phase fluid and modifier selected from the group consisting of propylene carbonate, ethylene carbonate, butylene carbonate, propylene glycol methyl ether acetate |
| 06/11/2002 | US6403502 Heat treatment method for a silicon wafer and a silicon wafer heat-treated by the method |
| 06/11/2002 | US6403501 Method of controlling FSG deposition rate in an HDP reactor |
| 06/11/2002 | US6403500 Cross-shaped resist dispensing system and method |
| 06/11/2002 | US6403499 Planarization of non-planar surfaces in device fabrication |
| 06/11/2002 | US6403498 Method and device for treating substrate |
| 06/11/2002 | US6403497 Method of manufacturing semiconductor device by two stage heating of deposited noncrystalline semiconductor |
| 06/11/2002 | US6403496 Method for forming shallow trench isolations |
| 06/11/2002 | US6403495 Forming lower electrode by using gas including chlorine after step of forming hemispherical grained silicon seeds, removing seeds formed on insulation layer pattern through etching process using chlorine gas; increased surface, capacitance |
| 06/11/2002 | US6403494 Method of forming a floating gate self-aligned to STI on EEPROM |
| 06/11/2002 | US6403493 Microelectronic device fabricating methods |
| 06/11/2002 | US6403492 Method of manufacturing semiconductor devices with trench isolation |
| 06/11/2002 | US6403491 Etch method using a dielectric etch chamber with expanded process window |
| 06/11/2002 | US6403490 Method of producing a plasma by capacitive-type discharges with a multipole barrier, and apparatus for implementing such a method |
| 06/11/2002 | US6403488 Selective SAC etch process |
| 06/11/2002 | US6403487 Method of forming separated spacer structures in mixed-mode integrated circuits |
| 06/11/2002 | US6403486 Method for forming a shallow trench isolation |
| 06/11/2002 | US6403485 Method to form a low parasitic capacitance pseudo-SOI CMOS device |
| 06/11/2002 | US6403484 Method to achieve STI planarization |
| 06/11/2002 | US6403483 Shallow trench isolation having an etching stop layer and method for fabricating same |
| 06/11/2002 | US6403482 Self-aligned junction isolation |
| 06/11/2002 | US6403481 Film formation method |
| 06/11/2002 | US6403480 Process for manufacturing semiconductor device |
| 06/11/2002 | US6403479 Process for producing semiconductor and apparatus for production |
| 06/11/2002 | US6403478 Low pre-heat pressure CVD TiN process |
| 06/11/2002 | US6403477 Method for correcting an optical proximity effect in an interconnect pattern by shortening the legs of cutout patterns to avoid linewidth reduction |
| 06/11/2002 | US6403476 Semiconductor chip, semiconductor wafer, semiconductor device and method of manufacturing the semiconductor device |
| 06/11/2002 | US6403475 Fabrication method for semiconductor integrated device |
| 06/11/2002 | US6403474 Forming a dielectric on a substrate; forming an opening in the dielectric layer, depositing a barrier layer to line the barrier layer, covering it with a conductor layer of a metal to fill the channel opening, performing annealing twice |
| 06/11/2002 | US6403473 Process for producing metal-containing layers |
| 06/11/2002 | US6403472 Method of forming resistive contacts on intergrated circuits with mobility spoiling ions including high resistive contacts and low resistivity silicide contacts |
| 06/11/2002 | US6403471 Method of forming a dual damascene structure including smoothing the top part of a via |
| 06/11/2002 | US6403470 Method for fabricating a dual damascene structure |
| 06/11/2002 | US6403469 Method of manufacturing dual damascene structure |
| 06/11/2002 | US6403468 Method for forming embedded metal wiring |
| 06/11/2002 | US6403467 Semiconductor device and method for manufacturing same |
| 06/11/2002 | US6403466 Post-CMP-Cu deposition and CMP to eliminate surface voids |
| 06/11/2002 | US6403465 Method to improve copper barrier properties |
| 06/11/2002 | US6403464 Method to reduce the moisture content in an organic low dielectric constant material |
| 06/11/2002 | US6403462 Method for manufacturing high reliability interconnection having diffusion barrier layer |
| 06/11/2002 | US6403461 Method to reduce capacitance between metal lines |
| 06/11/2002 | US6403460 Method of making a semiconductor chip assembly |
| 06/11/2002 | US6403459 Fabrication process of semiconductor integrated circuit device |
| 06/11/2002 | US6403458 Method for fabricating local interconnect structure for integrated circuit devices, source structures |
| 06/11/2002 | US6403457 Selectively coating bond pads |
| 06/11/2002 | US6403456 T or T/Y gate formation using trim etch processing |
| 06/11/2002 | US6403455 Methods of fabricating a memory device |
| 06/11/2002 | US6403454 Silicon semiconductor devices with δ-doped layers |
| 06/11/2002 | US6403453 Dose control technique for plasma doping in ultra-shallow junction formations |
| 06/11/2002 | US6403452 Ion implantation method and ion implantation equipment |
| 06/11/2002 | US6403451 Methods of fabricating gallium nitride semiconductor layers on substrates including non-gallium nitride posts |
| 06/11/2002 | US6403450 Heat treatment method for semiconductor substrates |
| 06/11/2002 | US6403449 Method of relieving surface tension on a semiconductor wafer |
| 06/11/2002 | US6403447 Reduced substrate capacitance high performance SOI process |
| 06/11/2002 | US6403446 Method for manufacturing semiconductor device |
| 06/11/2002 | US6403445 Enhanced trench isolation structure |
| 06/11/2002 | US6403444 Method for forming storage capacitor having undulated lower electrode for a semiconductor device |
| 06/11/2002 | US6403443 Method for reducing surface humps of doped amorphous silicon layer |
| 06/11/2002 | US6403442 Methods of forming capacitors and resultant capacitor structures |
| 06/11/2002 | US6403441 Method for fabricating storage capacitor using high dielectric constant material |
| 06/11/2002 | US6403440 Method for fabricating a stacked capacitor in a semiconductor configuration, and stacked capacitor fabricated by this method |
| 06/11/2002 | US6403439 Method of preparing for structural analysis a deep trench-type capacitor and method of structural analysis therefor |
| 06/11/2002 | US6403438 Process for manufacturing a resistive structure used in semiconductor integrated circuits |
| 06/11/2002 | US6403437 Method for making hyperfrequency transistor |
| 06/11/2002 | US6403436 Semiconductor device and method of manufacturing the same |
| 06/11/2002 | US6403435 Method for fabricating a semiconductor device having recessed SOI structure |
| 06/11/2002 | US6403434 Process for manufacturing MOS transistors having elevated source and drain regions and a high-k gate dielectric |
| 06/11/2002 | US6403433 Source/drain doping technique for ultra-thin-body SOI MOS transistors |
| 06/11/2002 | US6403432 Borophosphosilicate glass (bpsg), although a phosphosilicate glass psg may be used as well |
| 06/11/2002 | US6403431 Method of forming in an insulating layer a trench that exceeds the photolithographic resolution limits |
| 06/11/2002 | US6403430 Semiconductor structure having more usable substrate area and method for forming same |
| 06/11/2002 | US6403429 Semiconductor processing methods of forming integrated circuitry, forming conductive lines, forming a conductive grid, forming a conductive network, forming an electrical interconnection to a node location, forming an electrical interconnection with a transistor source/drain region, and integrated circuitry |
| 06/11/2002 | US6403428 Method of forming shallow trench isolation |
| 06/11/2002 | US6403427 Field effect transistor having dielectrically isolated sources and drains and method for making same |
| 06/11/2002 | US6403426 Method of manufacturing a semiconductor device |
| 06/11/2002 | US6403425 Dual gate oxide process with reduced thermal distribution of thin-gate channel implant profiles due to thick-gate oxide |
| 06/11/2002 | US6403424 Method for forming self-aligned mask read only memory by dual damascene trenches |
| 06/11/2002 | US6403423 Modified gate processing for optimized definition of array and logic devices on same chip |