Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2002
09/17/2002US6451638 Semiconductor and process for fabricating the same
09/17/2002US6451636 Semiconductor device and display device having laser-annealed semiconductor element
09/17/2002US6451635 Photolithography system and a method for fabricating a thin film transistor array substrate using the same
09/17/2002US6451634 Method of fabricating a multistack 3-dimensional high density semiconductor device
09/17/2002US6451633 Method for manufacturing semiconductor integrated circuit
09/17/2002US6451632 Method for manufacturing thin-film transistor substrate, liquid crystal display unit
09/17/2002US6451631 Thin film crystal growth by laser annealing
09/17/2002US6451630 Source and drain electrodes, and the gate electrode are simultaneously formed, so the number of photolithography processes can be reduced, improving productivity and yield
09/17/2002US6451629 Leadframe alteration to direct compound flow into package
09/17/2002US6451628 Method fabricating a semiconductor device with a decreased mounting area
09/17/2002US6451627 Semiconductor device and process for manufacturing and packaging a semiconductor device
09/17/2002US6451625 Method of fabricating a flip-chip ball-grid-array package with molded underfill
09/17/2002US6451623 Carrier reel, carriage method using the carrier reel, and method for manufacturing electronic device
09/17/2002US6451621 Using scatterometry to measure resist thickness and control implant
09/17/2002US6451620 Method for etching organic film, method for fabricating semiconductor device and pattern formation method
09/17/2002US6451515 Substrate treating method
09/17/2002US6451512 UV-enhanced silylation process to increase etch resistance of ultra thin resists
09/17/2002US6451511 Method for forming-photoresist mask
09/17/2002US6451510 Ammonium perfluoroalkyl sulfonic acid or ammonium, amine or quaternary ammonium salt is used as anionic surfactant
09/17/2002US6451504 Silicon nitride overcoated with silicon oxide photoresist;oxidation
09/17/2002US6451503 Antihalation compositions
09/17/2002US6451496 Cresol or xylenol resin that has been esterified with 1,2-naphthoquinonediazide-4 or 5-sulfonic acid
09/17/2002US6451492 Optical system
09/17/2002US6451489 Phase shift photomask
09/17/2002US6451436 Excellent in resistance to oxygen plasma and etching; reaction product between fine particles of silica and a halogenated silane or a hydrolyzate thereof exhibits a dielectric constant as low as 3;mechanical strength and chemical resistance
09/17/2002US6451391 Laser ablation using a target material with almost or the same composition as that of desired thin film, without requiring o2 gas and substrate heating, transparent electrodes, ferro-electric films in nonvolatile random access memory
09/17/2002US6451390 Plasma enhanced chemical vapor deposition; silicon dioxide film from tetraethyl silicate
09/17/2002US6451388 Method of forming titanium film by chemical vapor deposition
09/17/2002US6451381 Electrically insulating crosslinked thin-film-forming organic resin composition and method for forming thin film therefrom
09/17/2002US6451223 Thinner composition and methods and systems for using the thinner composition
09/17/2002US6451218 Method for the wet chemical pyramidal texture etching of silicon surfaces
09/17/2002US6451217 Mixing hydrogen or ammonia to sulfur fluoride to suppress turbidity on the surfaces of silicon; spraying the mixtures from nozzles having feeding pipes; etch selectivity; quality polishing
09/17/2002US6451214 Etching, shaping, or patterning layers or films with ceric ammonium nitrate in fabrication of semiconductor systems
09/17/2002US6451195 Imersing silicon wafers in electrolytic cells, applying direct current voltages, then stirring the solutions using a magnetic field; protective coatings having uniform thickness
09/17/2002US6451181 Method of forming a semiconductor device barrier layer
09/17/2002US6451179 Coating aluminum multilayers by applying radio frequency power to coils for ionization of targets before metallization; semiconductors; robotics
09/17/2002US6451178 Interference layer system
09/17/2002US6451177 Vault shaped target and magnetron operable in two sputtering modes
09/17/2002US6451160 Plasma generation apparatus with a conductive connection member that electrically connects the power source to the electrode
09/17/2002US6451158 Apparatus for detecting the endpoint of a photoresist stripping process
09/17/2002US6451157 Gas distribution apparatus for semiconductor processing
09/17/2002US6451135 High-purity copper sputtering targets and thin films
09/17/2002US6451127 Conductive paste and semiconductor component having conductive bumps made from the conductive paste
09/17/2002US6451124 Process for the chemical treatment of semiconductor wafers
09/17/2002US6451120 Apparatus and method for batch processing semiconductor substrates in making semiconductor lasers
09/17/2002US6451119 Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition
09/17/2002US6451118 Cluster tool architecture for sulfur trioxide processing
09/17/2002US6451116 Apparatus for electroless plating a contact pad
09/17/2002US6451114 Apparatus for application of chemical process to a workpiece
09/17/2002US6451113 Method and apparatus for growing oriented whisker arrays
09/17/2002US6450868 Carrier head with multi-part flexible membrane
09/17/2002US6450863 Method and apparatus for uniformly planarizing a microelectronic substrate
09/17/2002US6450805 Hot plate cooling method and heat processing apparatus
09/17/2002US6450803 Heat treatment apparatus
09/17/2002US6450757 Conveyor system
09/17/2002US6450755 Dual arm substrate handling robot with a batch loader
09/17/2002US6450750 Multiple loadlock system
09/17/2002US6450682 Method and apparatus for predicting the end of life of a gas scrubber
09/17/2002US6450346 Silicon fixtures for supporting wafers during thermal processing
09/17/2002US6450200 Flow control of process gas in semiconductor manufacturing
09/17/2002US6450181 Heating aqueous solution of oxygen, ammonia and hydrogen peroxide
09/17/2002US6450117 Directing a flow of gas in a substrate processing chamber
09/17/2002US6450116 Apparatus for exposing a substrate to plasma radicals
09/17/2002US6449873 Apparatus and method for dry cleaning of substrates using clusters
09/17/2002US6449871 Semiconductor process chamber having improved gas distributor
09/17/2002US6449844 Heat exchanger apparatus for a semiconductor wafer support and method of fabricating same
09/17/2002US6449838 Method of mounting a semiconductor device to a substrate
09/17/2002US6449837 Method for attaching electronic devices to metallized glass printed circuit
09/17/2002US6449827 Apparatus for gripping microplates
09/17/2002CA2278878C Very large scale immobilized peptide synthesis
09/17/2002CA2231852C Substrate processing apparatus and method
09/16/2002CA2366718A1 Method of and apparatus for measuring lattice-constant, and computer program
09/14/2002CA2375384A1 Method of and apparatus for pulling up crystal
09/14/2002CA2340985A1 Interleaved wordline architecture
09/12/2002WO2002071611A2 Monotonic dynamic-static pseudo-nmos logic circuit and method of forming a logic gate array
09/12/2002WO2002071560A2 Separating of optical integrated modules and structures formed thereby
09/12/2002WO2002071495A1 Relaxed silicon germanium platform for high speed cmos electronics and high speed analog circuits
09/12/2002WO2002071493A2 Relaxed silicon germanium platform for high speed cmos electronics and high speed analog
09/12/2002WO2002071492A1 Bipolar transistor
09/12/2002WO2002071491A1 Relaxed silicon germanium platform for high speed cmos electronics and high speed analog circuits
09/12/2002WO2002071490A1 A modulation doped thyristor and complementary transistor combination for a monolithic optoelectronic integrated circuit
09/12/2002WO2002071489A1 Image sensor and production method therefore
09/12/2002WO2002071488A1 Relaxed silicon germanium platform for high speed cmos electronics and high speed analog circuits
09/12/2002WO2002071483A2 Conductor track arrangement and method for producing a conductor track arrangement
09/12/2002WO2002071482A2 Hollow structure in an integrated circuit and method for producing such a hollow structure in an integrated circuit
09/12/2002WO2002071480A2 Electronic package with improved cap design for reduced interfacial stresses
09/12/2002WO2002071478A1 Thin film transistors and method of manufacture
09/12/2002WO2002071477A1 Single transistor rare earth manganite ferroelectric nonvolatile memory cell
09/12/2002WO2002071476A2 Method of forming conductive interconnections in porous insulating films and associated device
09/12/2002WO2002071475A1 Method for producing thin layers on a specific support and an application thereof
09/12/2002WO2002071474A2 Method for broadening active semiconductor areas
09/12/2002WO2002071473A1 Film thichness measuring monitor wafer
09/12/2002WO2002071472A2 Method and structure of in-situ wafer scale polymer stud grid array contact formation
09/12/2002WO2002071471A2 Traceless flip chip assembly & method
09/12/2002WO2002071470A1 Chip mounting method and apparatus therefor
09/12/2002WO2002071469A1 Electric device producing method
09/12/2002WO2002071468A1 HYBRID LOW-k INTERCONNECT STRUCTURE COMPRISED OF 2 SPIN-ON DIELECTRIC MATERIALS
09/12/2002WO2002071467A1 Low-k interconnect structure comprised of a multilayer of spin-on porous dielectrics
09/12/2002WO2002071465A1 Process for the manufacture of large area arrays of discrete components
09/12/2002WO2002071464A1 System and method for forming film