Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2003
03/26/2003EP1295680A2 Polishing pad for semiconductor wafer
03/26/2003EP1295346A1 Low area metal contacts for photovoltaic devices
03/26/2003EP1295344A2 Direct printing of thin-film conductors using metal-chelate inks
03/26/2003EP1295343A2 Power mosfet and method of making the same
03/26/2003EP1295342A1 Field effect device
03/26/2003EP1295341A2 Mos-transistor integration
03/26/2003EP1295338A2 Leadless semiconductor product packaging apparatus having a window lid and method for packaging
03/26/2003EP1295336A2 System support for semiconductor chips and electronic components and method for producing a system support and electronic components
03/26/2003EP1295334A2 Hermetic high frequency module and method for producing the same
03/26/2003EP1295333A2 Via first dual damascene process ofr copper metallization
03/26/2003EP1295332A2 Highly conformal titanium nitride deposition process for high aspect ratio structures
03/26/2003EP1295331A2 Formation of boride barrier layers using chemisorption techniques
03/26/2003EP1295330A2 Method for etching dual damascene structures in organosilicate glass
03/26/2003EP1295329A2 Method of controlling well leakage for trench isolations of differing depths
03/26/2003EP1295328A2 Flip chip-in-leadframe package and process
03/26/2003EP1295327A1 Thermally induced reflectivity switch for laser thermal processing
03/26/2003EP1295326A1 Silicon bipolar transistor, circuit arrangement and method for production of a silicon bipolar transistor
03/26/2003EP1295325A1 Method and apparatus for forming a silicon wafer with a denuded zone
03/26/2003EP1295324A1 Method and apparatus for forming a silicon wafer with a denuded zone
03/26/2003EP1295323A1 Method and apparatus for forming an epitaxial silicon wafer with a denuded zone
03/26/2003EP1295322A2 Two step chemical mechanical polishing process
03/26/2003EP1295321A1 Planarization process to achieve improved uniformity across semiconductor wafers
03/26/2003EP1295320A2 Process for etching silicon wafers
03/26/2003EP1295319A2 Etch stop layer system for sige devices
03/26/2003EP1295318A2 Crystal structure control of polycrystalline silicon in a single wafer chamber
03/26/2003EP1295316A2 Integrated electronic hardware for wafer processing control and diagnostic
03/26/2003EP1295315A2 Process for the post etch stripping of photoresist with hydrogen
03/26/2003EP1295314A2 Method and apparatus for wafer cleaning
03/26/2003EP1295313A2 Mechanical clamper for heated substrates at die attach
03/26/2003EP1295312A2 Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
03/26/2003EP1295311A1 System for uniformly heating photoresist
03/26/2003EP1295309A2 Switched uniformity control
03/26/2003EP1295139A2 System for calibrating timing of an integrated circuit wafer tester
03/26/2003EP1295110A1 Detection of voids in semiconductor wafer processing
03/26/2003EP1295109A2 Optical inspection method and apparatus with adaptive spatial filter
03/26/2003EP1295078A1 Graphite-based heat sink
03/26/2003EP1294958A1 Wheel-type wafer holder comprising a pressing element
03/26/2003EP1294537A1 Wafer carrier with groove for decoupling retainer ring from wafer
03/26/2003EP1294536A2 Base-pad for a polishing pad
03/26/2003EP1294535A1 Oscillating fixed abrasive cmp system and methods for implementing the same
03/26/2003EP1294534A1 In-situ endpoint detection and process monitoring method and apparatus for chemical mechanical polishing
03/26/2003EP1294520A1 Improved apparatus and method for dispensing solder
03/26/2003EP1280192A4 Device for forming nanostructures on the surface of a semiconductor wafer by means of ion beams
03/26/2003EP1095285B1 Method and device for determining the dependence of a first measured quantity on a second measured quantity
03/26/2003EP1067598B1 Method of packaging semiconductor device using anisotropic conductive adhesive
03/26/2003EP1010111B1 Reusable modules for complex integrated circuit devices
03/26/2003EP0944916B1 Very long and highly stable atomic wires and method for making these wires
03/26/2003EP0931335B1 MULTI LAYERED ELECTRODES COMPOSED OF Pt AND A BASE METAL FOR STORAGE CAPACITORS
03/26/2003EP0907460B1 Method for chemical-mechanical planarization of stop-on-feature semiconductor wafers
03/26/2003EP0800424B1 Ultra-low particle semiconductor cleaner
03/26/2003EP0792519B1 Interconnection elements for microelectronic components
03/26/2003EP0681743B1 Plasma deposition process with substrate temperature control
03/26/2003CN2541852Y Wafer testing tool
03/26/2003CN2541851Y Improved contact structure of semiconductor testing board
03/26/2003CN1406455A Multilayer printed wiring board and method ofr producing multilayer printed wiring board
03/26/2003CN1406452A A method of forming an opening or cavity in a substrate for receiving an electronic component
03/26/2003CN1406393A Semiconductor device and its manufacture method
03/26/2003CN1406392A Exposure mask, method for manufacturing the mask, and exposure method
03/26/2003CN1406383A Device for X-ray lithography
03/26/2003CN1406347A Method of evaluation of reticle image using aerial image simulator
03/26/2003CN1406292A Silicon single crystal wafer and method for producing silicon single crystal
03/26/2003CN1406291A Method and apparatus for growing single crystal
03/26/2003CN1406262A Adhesive polyimide resin and adhesive laminate
03/26/2003CN1406148A Air management system and method for chemical containment and contamination reduction in a semlconductor manufacturing facility
03/26/2003CN1406107A Surface treatment method to improve adhesive force of organic low dielectric constant layer
03/26/2003CN1405903A Single Crystal gallium nitride base board and its growth method and manufacture method
03/26/2003CN1405901A Method for packaging electroluminescence element
03/26/2003CN1405898A 薄膜晶体管及矩阵显示装置 Matrix thin film transistor and a display device
03/26/2003CN1405897A Power semiconducter device with RESURF layer
03/26/2003CN1405896A Semiconductor device and manufacture method thereof
03/26/2003CN1405895A Semiconductor device and manufacture method thereof
03/26/2003CN1405894A Semiconductor device structure and its producing method
03/26/2003CN1405891A Method for manufacturing active picture-element sensor
03/26/2003CN1405887A 半导体器件 Semiconductor devices
03/26/2003CN1405883A Semiconductor device and manufacture method thereof
03/26/2003CN1405881A 半导体装置 Semiconductor device
03/26/2003CN1405880A Semiconductor device manufacture method
03/26/2003CN1405878A Metal-insulator-metal capacitor manufacturing method
03/26/2003CN1405877A Method for forming metal capacitor during inlaying process and its product
03/26/2003CN1405876A Method for forming integrated circuit with MONOS element and mixed signal circuit
03/26/2003CN1405875A Dual-inlaying manufacture process applying silicon oversaturated oxide layer and its structure
03/26/2003CN1405874A Paper base material for receiving base band of chip electronic element and base band using said paper base material
03/26/2003CN1405873A Electronic device measuring device and method
03/26/2003CN1405872A Radiating system of wafer surface measuring machine
03/26/2003CN1405871A Method for assembling integrated circuit elements on glass substrate
03/26/2003CN1405870A Method for assembling integrated circuit in printing mode
03/26/2003CN1405869A Method for packaging substrate on wafer
03/26/2003CN1405868A Composite high-density structured substrate and its forming method
03/26/2003CN1405867A Semiconductor chip, semiconductor device and manufacture method thereof
03/26/2003CN1405866A Transistor with super-short grating characteristic and storage device unit and their producing method
03/26/2003CN1405865A Method for manufacturing film transistor plane indicator
03/26/2003CN1405864A Method for manufacturing metal oxide semicondustor transistor
03/26/2003CN1405863A Method and apparatus for isolating air-tight packing in reaction chamber
03/26/2003CN1405862A Laser annealing device and semiconductor device manufacture method
03/26/2003CN1405861A Laser irradiating device, laser irradiating method, and semiconductor manufacture method
03/26/2003CN1405860A Method for forming metal silicide
03/26/2003CN1405859A Method for repairing low dielectric constant material layer
03/26/2003CN1405858A Method for generating mask data, mask and recording medium and method for manufacturing semiconductor device
03/26/2003CN1405857A Plasma etching device using plasma confining device
03/26/2003CN1405856A Method for etching polycrystalline silicon layer for forming polycrystalline silicon grid
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