Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2003
10/28/2003US6639226 Focused ion beam equipment and focused ion beam processing method using same
10/28/2003US6639225 Six-axis positioning system having a zero-magnetic-field space
10/28/2003US6639223 Gaseous ion source feed for oxygen ion implantation
10/28/2003US6639221 Annular illumination method for charged particle projection optics
10/28/2003US6639201 Spot grid array imaging system
10/28/2003US6639191 Hot plate unit
10/28/2003US6639189 Heating member for combination heating and chilling apparatus, and methods
10/28/2003US6639188 Ceramic heater
10/28/2003US6639177 Method and system for processing one or more microstructures of a multi-material device
10/28/2003US6639084 Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
10/28/2003US6639036 Acid-labile polymer and resist composition
10/28/2003US6639035 Polymer for chemical amplified photoresist compositions
10/28/2003US6639015 Coating liquid for forming a silica-containing film with a low-dielectric constant
10/28/2003US6638899 Solution which comprises salt of hydrofluoric acid with base free from metal ions, water soluble organic solvent, basic substance and water, and which has pH value of from 8.5 to 10.0
10/28/2003US6638895 Method for fabricating high aspect ratio structures in perovskite material
10/28/2003US6638886 Plasma fluorine resistant alumina ceramic material and method of making
10/28/2003US6638880 Substrate holder, a blow inlet for source gas, exhaust outlets for source gas; where direction of flow of source gas relative the substrate is varied with time using valves; barium strontium titanate films
10/28/2003US6638879 Method for forming nitride spacer by using atomic layer deposition
10/28/2003US6638878 Film planarization for low-k polymers used in semiconductor structures
10/28/2003US6638877 Ultra-thin SiO2using N2O as the oxidant
10/28/2003US6638876 Method of forming dielectric films
10/28/2003US6638875 Oxygen free plasma stripping process
10/28/2003US6638874 Methods used in fabricating gates in integrated circuit device structures
10/28/2003US6638873 Semiconductor device producing method
10/28/2003US6638872 Integration of monocrystalline oxide devices with fully depleted CMOS on non-silicon substrates
10/28/2003US6638871 Method for forming openings in low dielectric constant material layer
10/28/2003US6638869 Process for manufacturing reflective TFT-LCD with rough diffuser
10/28/2003US6638868 Method for preventing or reducing anodic Cu corrosion during CMP
10/28/2003US6638867 Method for forming a top interconnection level and bonding pads on an integrated circuit chip
10/28/2003US6638866 Chemical-mechanical polishing (CMP) process for shallow trench isolation
10/28/2003US6638865 Manufacturing method of semiconductor chip with adhesive agent
10/28/2003US6638864 Removal photoresist; applying pressure sensitive adhesive; releasing
10/28/2003US6638863 Electropolishing metal layers on wafers having trenches or vias with dummy structures
10/28/2003US6638862 Radical-assisted sequential CVD
10/28/2003US6638861 Method of eliminating voids in W plugs
10/28/2003US6638860 Method and apparatus for processing substrates and method for manufacturing a semiconductor device
10/28/2003US6638858 Hole metal-filling method
10/28/2003US6638857 E-beam deposition method and apparatus for providing high purity oxide films
10/28/2003US6638856 Method of depositing metal onto a substrate
10/28/2003US6638855 Method of filling contact hole of semiconductor device
10/28/2003US6638854 Semiconductor device and method for manufacturing the same
10/28/2003US6638853 Method for avoiding photoresist resist residue on semioconductor feature sidewalls
10/28/2003US6638851 Overcoating substrate with dielectric; forming patterned masking layer; spinning on polymer
10/28/2003US6638850 Method of fabricating a semiconductor device having a trench-gate structure
10/28/2003US6638849 Method for manufacturing semiconductor devices having copper interconnect and low-K dielectric layer
10/28/2003US6638848 Method of etching insulating film and method of forming interconnection layer
10/28/2003US6638847 Method of forming lead-free bump interconnections
10/28/2003US6638846 Method of growing p-type ZnO based oxide semiconductor layer and method of manufacturing semiconductor light emitting device
10/28/2003US6638845 Semiconductor device and manufacturing method of the same
10/28/2003US6638844 Method of reducing substrate coupling/noise for radio frequency CMOS (RFCMOS) components in semiconductor technology by backside trench and fill
10/28/2003US6638843 Method for forming a silicide gate stack for use in a self-aligned contact etch
10/28/2003US6638842 Methods of fabricating integrated circuitry
10/28/2003US6638841 Method for reducing gate length bias
10/28/2003US6638838 Semiconductor structure including a partially annealed layer and method of forming the same
10/28/2003US6638837 Method for protecting the front side of semiconductor wafers
10/28/2003US6638835 Method for bonding and debonding films using a high-temperature polymer
10/28/2003US6638834 Methods of forming semiconductor constructions
10/28/2003US6638833 Process for the fabrication of integrated devices with reduction of damage from plasma
10/28/2003US6638832 Elimination of narrow device width effects in complementary metal oxide semiconductor (CMOS) devices
10/28/2003US6638830 Method for fabricating a high-density capacitor
10/28/2003US6638829 Semiconductor structure having a metal gate electrode and elevated salicided source/drain regions and a method for manufacture
10/28/2003US6638827 Semiconductor device and method of manufacturing it
10/28/2003US6638826 Power MOS device with buried gate
10/28/2003US6638825 Method for fabricating a high voltage device
10/28/2003US6638824 Metal gate double diffusion MOSFET with improved switching speed and reduced gate tunnel leakage
10/28/2003US6638822 Method for forming the self-aligned buried N+ type to diffusion process in ETOX flash cell
10/28/2003US6638819 Method for fabricating interfacial oxide in a transistor and related structure
10/28/2003US6638818 Method of fabricating a dynamic random access memory with increased capacitance
10/28/2003US6638817 Method for fabricating dram cell array not requiring a device isolation layer between cells
10/28/2003US6638816 Integrated circuit device with MIM capacitance circuit and method of manufacturing the same
10/28/2003US6638815 Formation of self-aligned vertical connector
10/28/2003US6638814 Method for producing an insulation
10/28/2003US6638813 Method of forming a composite spacer to eliminate polysilicon stringers between elements in a pseudo SRAM cell
10/28/2003US6638812 Method for producing a memory cell for a semiconductor memory
10/28/2003US6638811 Method of manufacturing a semiconductor integrated circuit device having a capacitor
10/28/2003US6638810 Tantalum nitride CVD deposition by tantalum oxide densification
10/28/2003US6638809 Methods of forming semiconductor circuit constructions and capacitor constructions
10/28/2003US6638807 Technique for gated lateral bipolar transistors
10/28/2003US6638806 Semiconductor device and method of fabricating the same
10/28/2003US6638805 Method of fabricating a DRAM semiconductor device
10/28/2003US6638804 Method of manufacturing semiconductor device with high and low breakdown transistors
10/28/2003US6638803 Semiconductor device and method for manufacturing the same
10/28/2003US6638802 Forming strained source drain junction field effect transistors
10/28/2003US6638801 Semiconductor device and its manufacturing method
10/28/2003US6638800 Laser processing apparatus and laser processing process
10/28/2003US6638799 Method for manufacturing a semiconductor device having a silicon on insulator substrate
10/28/2003US6638798 Method of fabricating a semiconductor device of high-voltage CMOS structure
10/28/2003US6638797 High performance poly-SiGe thin film transistor and a method of fabricating such a thin film transistor
10/28/2003US6638796 Method of forming a novel top-metal fuse structure
10/28/2003US6638795 Semiconductor device and method of fabricating the same
10/28/2003US6638791 Techniques for maintaining alignment of cut dies during substrate dicing
10/28/2003US6638790 Leadframe and method for manufacturing resin-molded semiconductor device
10/28/2003US6638788 Semiconductor crystal substrate having a thickness up to 150 mu m and a textured structure disposed on a surface
10/28/2003US6638786 Image sensor having large micro-lenses at the peripheral regions
10/28/2003US6638785 Adsorbing device, sucker and mounting device for conductive member, adsorbing method and mounting method for conductive member, and semiconductor device and method of making
10/28/2003US6638782 Manufacturing method for two-dimensional image detectors and two-dimensional image detectors
10/28/2003US6638781 Semiconductor device and method of fabricating the same
10/28/2003US6638779 Fabrication method of semiconductor integrated circuit device and testing method
10/28/2003US6638778 Method for determining, tracking and/or controlling processing based upon silicon characteristics
10/28/2003US6638777 Apparatus for and method of etching
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