Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2003
11/04/2003US6642144 Method of forming memory device having capacitor including layer of high dielectric constant
11/04/2003US6642143 Method of producing semiconductor device
11/04/2003US6642142 Substrate cleaning method and method for producing an electronic device
11/04/2003US6642141 In-situ silicon nitride and silicon based oxide deposition with graded interface for damascene application
11/04/2003US6642140 System for filling openings in semiconductor products
11/04/2003US6642139 Method for forming interconnection structure in an integration circuit
11/04/2003US6642138 Process of making dual damascene structures using a sacrificial polymer
11/04/2003US6642137 Method for manufacturing a package structure of integrated circuits
11/04/2003US6642136 Method of making a low fabrication cost, high performance, high reliability chip scale package
11/04/2003US6642135 Method for forming semiconductor memory device having a fuse
11/04/2003US6642134 Semiconductor processing employing a semiconductor spacer
11/04/2003US6642133 Silicon-on-insulator structure and method of reducing backside drain-induced barrier lowering
11/04/2003US6642132 Cmos of semiconductor device and method for manufacturing the same
11/04/2003US6642131 Method of forming a silicon-containing metal-oxide gate dielectric by depositing a high dielectric constant film on a silicon substrate and diffusing silicon from the substrate into the high dielectric constant film
11/04/2003US6642130 Method for fabricating highly integrated transistor
11/04/2003US6642129 Parallel, individually addressable probes for nanolithography
11/04/2003US6642128 Method for high temperature oxidations to prevent oxide edge peeling
11/04/2003US6642127 Method for dicing a semiconductor wafer
11/04/2003US6642126 Process for manufacturing a semiconductor wafer with passivation layer mask for etching with mechanical removal
11/04/2003US6642125 Integrated circuits having adjacent P-type doped regions having shallow trench isolation structures without liner layers therein therebetween and methods of forming same
11/04/2003US6642124 Semiconductor device and manufacturing method thereof
11/04/2003US6642123 Method of fabricating a silicon wafer including steps of different temperature ramp-up rates and cool-down rates
11/04/2003US6642122 Dual laser anneal for graded halo profile
11/04/2003US6642121 Control of amount and uniformity of oxidation at the interface of an emitter region of a monocrystalline silicon wafer and a polysilicon layer formed by chemical vapor deposition
11/04/2003US6642120 Semiconductor circuit
11/04/2003US6642119 Silicide MOSFET architecture and method of manufacture
11/04/2003US6642118 Method for eliminating polysilicon residue by fully converting the polysilicon into silicon dioxide
11/04/2003US6642117 Method for forming composite dielectric layer
11/04/2003US6642116 Method for fabricating a split gate flash memory cell
11/04/2003US6642115 Double-gate FET with planarized surfaces and self-aligned silicides
11/04/2003US6642114 Semiconductor device and method for fabricating the same
11/04/2003US6642113 Non-volatile memory capable of preventing antenna effect and fabrication thereof
11/04/2003US6642112 Non-oxidizing spacer densification method for manufacturing semiconductor devices
11/04/2003US6642111 Memory device structure and method of fabricating the same
11/04/2003US6642110 Flash memory cell and method of manufacturing the same
11/04/2003US6642109 Method of manufacturing a flash memory cell
11/04/2003US6642108 Fabrication processes for semiconductor non-volatile memory device
11/04/2003US6642107 Non-volatile memory device having self-aligned gate structure and method of manufacturing same
11/04/2003US6642106 Method for increasing core gain in flash memory device using strained silicon
11/04/2003US6642105 Semiconductor device having multi-gate insulating layers and methods of fabricating the same
11/04/2003US6642104 Method of forming floating gate of flash memory
11/04/2003US6642103 Semiconductor device and method of manufacturing the same
11/04/2003US6642102 Barrier material encapsulation of programmable material
11/04/2003US6642101 Semiconductor memory device and method of producing same
11/04/2003US6642100 Semiconductor device with capacitor structure having hydrogen barrier layer and method for the manufacture thereof
11/04/2003US6642099 Method of manufacturing compound semiconductor device
11/04/2003US6642098 DRAM cell having a capacitor structure fabricated partially in a cavity and method for operating same
11/04/2003US6642097 Structure for capacitor-top-plate to bit-line-contact overlay margin
11/04/2003US6642096 Bipolar transistor manufacturing
11/04/2003US6642095 First and second oxynitride layers are formed at a first interface between a SiO2 layer and a gate of p-doped polysilicon and a second interface between the SiO2 layer and a silicon substrate, respectively; improves threshold voltage
11/04/2003US6642094 Complementary transistors having respective gates formed from a metal and a corresponding metal-silicide
11/04/2003US6642093 Method for manufacturing a semiconductor device
11/04/2003US6642092 Thin-film transistors formed on a metal foil substrate
11/04/2003US6642091 Thin-film semiconductor device and apparatus for fabricating thin-film semiconductor device
11/04/2003US6642090 Fin FET devices from bulk semiconductor and method for forming
11/04/2003US6642088 Silicon-controlled rectifier structures on silicon-on insulator with shallow trench isolation
11/04/2003US6642087 Solid state imaging device having a photodiode and a MOSFET and method of manufacturing the same
11/04/2003US6642086 Method for fabricating thin film transistor array substrate for liquid crystal display
11/04/2003US6642085 Thin film transistors on plastic substrates with reflective coatings for radiation protection
11/04/2003US6642083 Semiconductor device and manufacturing method thereof
11/04/2003US6642082 Method for manufacturing a resin-sealed semiconductor device
11/04/2003US6642081 Interlocking conductor method for bonding wafers to produce stacked integrated circuits
11/04/2003US6642079 Process of fabricating flip chip interconnection structure
11/04/2003US6642078 Method for manufacturing diode subassemblies used in rectifier assemblies of engine driven generators
11/04/2003US6642075 Method for manufacturing semiconductor laser device
11/04/2003US6642074 Method for manufacturing thin film transistor array panel for LCD having a quadruple layer by a second photolithography process
11/04/2003US6642073 Semiconductor circuit and method of fabricating the same
11/04/2003US6642072 Light-emitting element, semiconductor light-emitting device, and manufacturing methods therefor
11/04/2003US6642071 Providing a substrate having pixels each of which has a switching device region and a pixel region; etching the first insulating layer and the second insulating layer of pixel region to form openings; forming a conductive layer over pixel
11/04/2003US6642070 Electrically pumped long-wavelength VCSEL and methods of fabrication
11/04/2003US6642066 Integrated process for depositing layer of high-K dielectric with in-situ control of K value and thickness of high-K dielectric layer
11/04/2003US6642063 Apparatus for characterization of microelectronic feature quality
11/04/2003US6641986 Acetylenic diol surfactant solutions and methods of using same
11/04/2003US6641982 Methodology to introduce metal and via openings
11/04/2003US6641981 Exposure method, exposure apparatus, and device manufacturing method
11/04/2003US6641979 Technique of exposing a resist using electron beams having different accelerating voltages
11/04/2003US6641978 Coating substrates with thin films consisting of metals such as bismuth and/or indium, then alloying, etching and stripping to form patterns, used for masking integrated circuits
11/04/2003US6641975 Resist composition and patterning process
11/04/2003US6641974 Copolymer
11/04/2003US6641972 Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same
11/04/2003US6641958 Radiation transparent substrate overcoated with silicides
11/04/2003US6641941 Spraying powder mixture; forming film
11/04/2003US6641938 An offcut angle of from about 6 to about 10 degrees; superior morphological and material properties.
11/04/2003US6641937 Transparent conductive film and process for producing the film
11/04/2003US6641928 Adhesives and electric devices
11/04/2003US6641899 Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same
11/04/2003US6641888 Silicon single crystal, silicon wafer, and epitaxial wafer.
11/04/2003US6641867 Methods for chemical vapor deposition of tungsten on silicon or dielectric
11/04/2003US6641861 Heatsink and fabrication method thereof
11/04/2003US6641705 Apparatus and method for reducing differential sputter rates
11/04/2003US6641703 Magnetic multi-layer film manufacturing apparatus
11/04/2003US6641698 Integrated circuit fabrication dual plasma process with separate introduction of different gases into gas flow
11/04/2003US6641697 Erosion resistant member that may be used in the processing of a substrate in a plasma of a processing gas
11/04/2003US6641678 Methods for cleaning microelectronic structures with aqueous carbon dioxide systems
11/04/2003US6641677 Cleaning and drying a semiconductor structure in a modified conventional gas etch/rinse or dryer vessel. In a first embodiment of the present invention, a semiconductor structure is placed into a first treatment vessel and chemically
11/04/2003US6641675 Osmotic membrane degasifier
11/04/2003US6641662 Method for fabricating ultra thin single-crystal metal oxide wave retarder plates and waveguide polarization mode converter using the same
11/04/2003US6641631 Controlling pH of an aqueous polishing composition having abrasive particles of a metal oxide that provides ions upon dissolution; equilibrium concentration of said ions at said pH, which avoids drift of said pH
11/04/2003US6641470 Apparatus for accurate endpoint detection in supported polishing pads
11/04/2003US6641459 Method for conserving a resource by flow interruption
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