Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2003
10/23/2003US20030199148 Method of reducing the thickness of a silicon substrate
10/23/2003US20030199147 Use of fluoropolymer coating for planarizing and passivating integrated circuit devices
10/23/2003US20030199146 Insulating layer, semiconductor device and methods for fabricating the same
10/23/2003US20030199145 Method for fabricating transistor
10/23/2003US20030199144 Mask, method of manufacturing a mask, method of manufacturing an organic electroluminescence device, and organic electroluminescence device
10/23/2003US20030199143 Method for fabricating non-volatile memory having P-type floating gate
10/23/2003US20030199142 Memory device having buried source/drain region and fabrication thereof
10/23/2003US20030199141 Methods for forming and integrated circuit structures containing enhanced-surface-area conductive layers
10/23/2003US20030199140 Method of manufacturing semiconductor device
10/23/2003US20030199139 Capacitor in semiconductor device having dual dielectric film structure and method for fabricating the same
10/23/2003US20030199138 Method of forming inter-metal dielectric
10/23/2003US20030199137 Capacitor in semiconductor device having dual dielectric film structure and method for fabricating the same
10/23/2003US20030199136 Method for fabricating dram cell transistor having trench isolation structure
10/23/2003US20030199135 Method of forming a capacitor dielectric structure
10/23/2003US20030199134 Process for fabricating RuSixOy-containing adhesion layers
10/23/2003US20030199133 Method for forming a mixed voltage circuit having complementary devices
10/23/2003US20030199132 Method for forming an opening in polymer-based dielectric
10/23/2003US20030199131 Wafer alignment mark for image processing, image processing alignment method and method of manufacturing semiconductor device
10/23/2003US20030199129 Insulated gate field effect transistor and method for forming the same
10/23/2003US20030199127 Method of forming a thin film transistor on a plastic sheet
10/23/2003US20030199126 Method of forming a SiGe-on-insulator substrate using separation by implantation of oxygen
10/23/2003US20030199125 Fabrication method and wafer structure of semiconductor device using low-k film
10/23/2003US20030199123 Clock distribution networks and conductive lines in semiconductor integrated
10/23/2003US20030199122 Method of manufacturing a semiconductor device
10/23/2003US20030199121 Wafer scale thin film package
10/23/2003US20030199120 Semiconductor device and fabrication process therefor
10/23/2003US20030199119 High performance sub-system design and assembly
10/23/2003US20030199118 Wire bonding method for a semiconductor package
10/23/2003US20030199117 Method for fabricating array substrate for x-ray detector
10/23/2003US20030199116 Integrated circuit-integrated flexible shear-stress sensor skin and method of fabricating the same
10/23/2003US20030199115 Method for producing highly accurate frequency and FM of a laser
10/23/2003US20030199114 Electro-optical device, method for fabricating the same, and electronic apparatus
10/23/2003US20030199113 Wavelength-insensitive radiation coupling for multi-quantum well sensor based on intersubband absorption
10/23/2003US20030199112 Copper wiring module control
10/23/2003US20030199109 Wafer-level test structure for edge-emitting semiconductor lasers
10/23/2003US20030199108 Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor
10/23/2003US20030199106 Minimally spaced MRAM structures
10/23/2003US20030199105 Method for making piezoelectric resonator and surface acoustic wave device using hydrogen implant layer splitting
10/23/2003US20030199104 Material combinations for tunnel junction cap layer, tunnel junction hard mask and tunnel junction stack seed layer in MRAM processing
10/23/2003US20030198910 Susceptor pocket profile to improve process performance
10/23/2003US20030198898 Fabricating a MOSFET structure having a source/ drain extension and a source/drain region is disclosed, in which a basic antireflection coating is formed over a semiconductor substrate. A photoresist layer is formed over the basic
10/23/2003US20030198897 Patterning method, patterning apparatus, patterning template, and method for manufacturing the patterning template
10/23/2003US20030198896 Method of fabricating patterns with a dual damascene process
10/23/2003US20030198895 Method of passivating silicon-oxide based low-k materials using a supercritical carbon dioxide passivating solution comprising a silylating agent is disclosed. The silylating agent is preferably an organosilicon compound comprising
10/23/2003US20030198889 Sulfonium salt compounds represented by the following general formula (2) wherein R1 and R2 represent each an alkyl group optionally having oxo, or R1 and R2 may be cyclized together to form an alkylene group optionally having oxo group for
10/23/2003US20030198878 Resist pattern of a resist film is formed by exposing the resist film using a gate electrode forming mask (a Levenson phase shift mask), and developing the resist film. An antireflection film is etched using the resist pattern as an
10/23/2003US20030198877 Chromophore moieties and transparent moieties
10/23/2003US20030198875 Wave guided alternating phase shift mask and fabrication method thereof
10/23/2003US20030198874 Reflection photomasks with a capping layer and methods for manufacturing the same
10/23/2003US20030198873 Photomask and method for qualifying the same with a prototype specification
10/23/2003US20030198872 Method for setting mask pattern and illumination condition
10/23/2003US20030198837 Comprises sapphire substrate with low temperature nucleation layer as buffer; polarization-induced electric fields have minimal effects
10/23/2003US20030198817 Oxidation of organosilicon compound under radio frequency power source; multilayer; liquid crystals between glass substrates
10/23/2003US20030198812 Nanotube films and articles
10/23/2003US20030198791 Semiconductor device, manufacturing method thereof, and semiconductor manufacturing system
10/23/2003US20030198789 Layer forming method, layer forming apparatus, device, manufacturing method for device, and electronic apparatus
10/23/2003US20030198787 Device manufacturing method, device manufactured thereby and lithographic apparatus therefor
10/23/2003US20030198755 Scanning ion beams; filling aperture; process control
10/23/2003US20030198754 Cylinder enclosure with covering; vapor deposition of alumina
10/23/2003US20030198753 Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system
10/23/2003US20030198744 Pressurization; vapor deposition; sublimination
10/23/2003US20030198743 Vapor deposition; process control
10/23/2003US20030198740 Apparatus and method for evenly flowing processing gas onto a semiconductor wafer
10/23/2003US20030198553 Method for aligning a loadport to an overhead hoist transport system
10/23/2003US20030198551 Robots for microelectronic workpiece handling
10/23/2003US20030198547 Apparatus and methods for manipulating semiconductor wafers
10/23/2003US20030198542 Positioning in threaded segment; for semiconductors
10/23/2003US20030198541 Semiconductor wafer processing apparatus
10/23/2003US20030198540 Interbay transfer interface between an automated material handling system and a stocker
10/23/2003US20030198376 Vision system
10/23/2003US20030198113 Memory storage device with heating element
10/23/2003US20030198111 6F2 DRAM array with apparatus for stress testing an isolation gate and method
10/23/2003US20030198109 Semiconductor memory device with series-connected antifuse-components
10/23/2003US20030198107 Method of checking the state of a capacitor fuse in which the voltage applied to the capacitor fuse is the same level as voltage applied to memory cells
10/23/2003US20030198106 Floating trap type nonvolatile memory device and method of fabricating the same
10/23/2003US20030198104 Nonvolatile memory devices and methods of fabricating the same
10/23/2003US20030198103 Non-volatile semiconductor memory device
10/23/2003US20030198102 Non-volatile semiconductor memory device
10/23/2003US20030198096 Semiconductor memory device
10/23/2003US20030198095 Memory device and manufacturing method thereof
10/23/2003US20030198093 Methods of fabricating an mram device using chemical mechanical polishing
10/23/2003US20030198091 Semiconductor device
10/23/2003US20030198087 Low voltage single poly deep sub-micron flash EEPROM
10/23/2003US20030198086 Semiconductor integrated circuit device and a method of manufacturing the same
10/23/2003US20030198085 Semiconductor memory cell and memory array using a breakdown phenomena in an ultra-thin dielectric
10/23/2003US20030198081 Thin film magnetic memory device reducing a charging time of a data line in a data read operation
10/23/2003US20030198077 Semiconductor device and method for driving the same
10/23/2003US20030198073 Bi-level digit line architecture for high density DRAMS
10/23/2003US20030198005 Multilayer; stack of chuck electrode, moderator dielectric plate and covering
10/23/2003US20030198004 Electrostatic chuck
10/23/2003US20030197992 Semiconductor circuit and photocoupler
10/23/2003US20030197984 Magnetoresistive element and magnetic memory device
10/23/2003US20030197946 Projection optical system, fabrication method thereof, exposure apparatus and exposure method
10/23/2003US20030197922 Catadioptric projection system for 157 nm lithography
10/23/2003US20030197914 Lithographic apparatus and device manufacturing method
10/23/2003US20030197906 Optical element, metal mold therefor and optical element producing method
10/23/2003US20030197873 Shape measurement method and apparatus
10/23/2003US20030197872 Scatterometric measurement of undercut multi-layer diffracting signatures
10/23/2003US20030197865 Reticle and optical characteristic measuring method
10/23/2003US20030197859 Measuring variations in intensity of reflective light to determine film thickness
1 ... 4528 4529 4530 4531 4532 4533 4534 4535 4536 4537 4538 4539 4540 4541 4542 4543 4544 4545 4546 4547 4548 ... 6590