Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2003
10/30/2003US20030201434 Metal-oxide-silicon device including nanometer scaled oxide structure to enhance light-emitting efficiency
10/30/2003US20030201433 Semiconductor light receiving device and electronic apparatus incorporating the same
10/30/2003US20030201410 Sensitivity adjusting method for pattern inspection apparatus
10/30/2003US20030201405 System and method for monitoring the topography of a wafer surface during lithographic processing
10/30/2003US20030201397 Method and apparatus for simultaneously depositing and observing materials on a target
10/30/2003US20030201309 Polymer for exterior contactors; bonding semiconductor contact pads
10/30/2003US20030201304 Transport apparatus with a gripper for the transport of substrates
10/30/2003US20030201264 Ceramic susceptor
10/30/2003US20030201248 Method of treating an insulating layer
10/30/2003US20030201240 Maintenance method and system for plasma processing apparatus
10/30/2003US20030201190 Using reverse polarity electrical current to dissolve plating deposits
10/30/2003US20030201184 Electroplating of a metal; seed layer immersion in an electrolyte; controlled trapping of air bubbles by positioning substrate
10/30/2003US20030201174 Magnetron sputtering source and chamber therefor
10/30/2003US20030201168 Apparatus for decomposing perfluorinated compounds and system for processing perfluorinated compounds using the apparatus
10/30/2003US20030201166 method for regulating the electrical power applied to a substrate during an immersion process
10/30/2003US20030201162 Monitoring optical emission; determination power spectra
10/30/2003US20030201121 Method of solving the unlanded phenomenon of the via etch
10/30/2003US20030201069 Tunable focus ring for plasma processing
10/30/2003US20030201068 Apparatus associatable with a deposition chamber to enhance uniformity of properties of material layers formed on semiconductor substrates therein
10/30/2003US20030201067 Method and apparatus for aligning and setting the axis of rotation of spindles of a multi-body system
10/30/2003US20030201066 Method and apparatus for demounting workpieces from adhesive film
10/30/2003US20030201034 Chemisorption layer
10/30/2003US20030201003 Single wafer type cleaning method and apparatus
10/30/2003US20030201001 Wet cleaning device
10/30/2003US20030201000 Spray member and method for using the same
10/30/2003US20030200996 Automatic; supplying solvent; washing, drying; applying vacuum
10/30/2003US20030200988 Vertical packages; applying sound waves; rotation
10/30/2003US20030200987 Ultrasonic cleaning module
10/30/2003US20030200986 Wafer cleaning system
10/30/2003US20030200985 Method and apparatus for removal of surface contaminants from substrates in vacuum applications
10/30/2003US20030200931 Rotating semiconductor processing apparatus
10/30/2003US20030200929 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
10/30/2003US20030200928 Shadow frame with cross beam for semiconductor equipment
10/30/2003US20030200925 Methods for forming phosphorus- and/or boron-containing silica layers on substrates
10/30/2003US20030200924 System and method for real time deposition process control based on resulting product detection
10/30/2003US20030200918 Apparatus for forming coating film and apparatus for curing the coating film
10/30/2003US20030200916 Vapor phase growth method of oxide dielectric film
10/30/2003US20030200808 Ultrasonic wafer blade vibration detection
10/30/2003US20030200735 Fluid media particle isolating system
10/30/2003US20030200673 Cooling device for wafer machine
10/30/2003US20030200654 Silicon substrate; etching aperture, channels; overcoating with dielectrics
10/30/2003US20030200647 Pattern forming method, method of making microdevice, method of making thin-film magnetic head, method of making magnetic head slider, method of making magnetic head apparatus, and method of making magnetic recording and reproducing apparatus
10/30/2003US20030200638 Method for installation of semiconductor fabrication tools
10/30/2003DE10228547C1 Production of a trenched strap contact in a memory cell comprises forming a trench capacitor in a substrate, filling an unfilled region with monocrystalline silicon and further processing
10/30/2003DE10211827C1 Lagerung eines Substrathalterrades mit darin eingebautem/verankertem Substrathalter Supporting a substrate holder wheel with built-in / anchored substrate holder
10/29/2003EP1357604A2 Field-plate mesfet
10/29/2003EP1357603A2 Semiconductor device
10/29/2003EP1357601A2 Power integrated circuit with distributed gate driver
10/29/2003EP1357600A2 Solid-state inductor and method for producing the same
10/29/2003EP1357599A2 Parallel spiral stacked inductor on semiconductor material
10/29/2003EP1357598A1 Semiconductor device and portable electronic device
10/29/2003EP1357593A2 Embedded hermetic cavity formation in low temperature cofired ceramic
10/29/2003EP1357591A2 Method of mounting electrical components on a base plate in a radio frequency terminal unit
10/29/2003EP1357590A2 Method and apparatus for manufacturing electronic devices
10/29/2003EP1357589A1 Workpiece transfer system, transfer method, vacuum chuck, and wafer centering method
10/29/2003EP1357588A1 A substrate within a Ni/Au structure electroplated on electrical contact pads and method for fabricating the same
10/29/2003EP1357587A1 Process for catalytic chemical vapor deposition
10/29/2003EP1357586A2 Vapor phase growth method of oxide dielectric film
10/29/2003EP1357585A2 A method for coating a semiconductor substrate
10/29/2003EP1357584A2 Method of surface treatment of semiconductor substrates
10/29/2003EP1357583A1 Sheet-fed treating device
10/29/2003EP1357582A1 Heat-treating device
10/29/2003EP1357576A2 Highly heat-resistant plasma etching electrode and dry etching device including the same
10/29/2003EP1357433A2 Method of fabricating sub-lithographic sized line and space patterns
10/29/2003EP1357432A2 Driving apparatus
10/29/2003EP1357431A2 System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control
10/29/2003EP1357430A2 Linewidth control using an angular distribution of radiation depending on position in the illumination field
10/29/2003EP1357429A1 Lithographic apparatus and device manufacturing method
10/29/2003EP1357426A2 Method for setting mask pattern and its illumination condition
10/29/2003EP1357385A1 Contact probe, mask and fabrication method thereof
10/29/2003EP1357202A1 Silicon nitride film forming apparatus and film forming method
10/29/2003EP1357197A1 Minute copper balls and a method for their manufacture
10/29/2003EP1357161A2 Aqueous dispersion for chemical mechanical polishing
10/29/2003EP1357154A1 High order silane composition, and method of forming silicon film using the composition
10/29/2003EP1357097A2 Aluminium nitride materials and members used for the production of semiconductors
10/29/2003EP1356897A1 Robot mechanism comprising two arms
10/29/2003EP1356682A1 Monitoring system for hostile environment
10/29/2003EP1356531A1 Method of producing a track on a substrate
10/29/2003EP1356527A1 Bipolar transistor and method for producing the same
10/29/2003EP1356526A1 Single step chemical mechanical polish process to improve the surface roughness in mram technology
10/29/2003EP1356525A1 Charge-coupled device
10/29/2003EP1356524A2 Esd protection devices
10/29/2003EP1356523A2 Display device
10/29/2003EP1356522A2 Back illuminated imager with enhanced uv to near ir sensitivity
10/29/2003EP1356520A2 Microelectronic substrate with integrated devices
10/29/2003EP1356519A2 Integrated core microelectronic package
10/29/2003EP1356518A2 Substrate for an electric component and method for the production thereof
10/29/2003EP1356517A2 Electronic part
10/29/2003EP1356515A1 Molding assembly for wafer scale molding of protective caps
10/29/2003EP1356514A1 Use of infrared radiation in molding of protective caps
10/29/2003EP1356513A1 Molding of protective caps
10/29/2003EP1356511A1 Use of protective caps as masks at a wafer scale
10/29/2003EP1356510A1 Wafer scale molding of protective caps
10/29/2003EP1356509A2 Structural reinforcement of highly porous low k dielectric films by cu diffusion barrier structures
10/29/2003EP1356507A1 Capping layer for improved silicide formation in narrow semiconductor structures
10/29/2003EP1356506A1 Manufacture of trench-gate semiconductor devices
10/29/2003EP1356505A1 Non-volatile memory with source side boron implantation
10/29/2003EP1356504A1 Silicon germanium bipolar transistor
10/29/2003EP1356503A2 Method and system for rotating a semiconductor wafer in processing chambers
10/29/2003EP1356502A1 Ammonium oxalate-containing polishing system and method
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