Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2004
03/25/2004US20040060021 Delay time calculation apparatus and integrated circuit design apparatus
03/25/2004US20040060020 Photolithography process using a mask, selectively modifying transistor gate lengths to improve the speed of critical transistor, reducing static power consumption; making semiconductor chips
03/25/2004US20040059972 System and method for heterogeneous multi-site testing
03/25/2004US20040059928 Semiconductor device including encryption section, semiconductor device including external interface, and content reproduction method
03/25/2004US20040059715 Internet automatic electric data system
03/25/2004US20040059559 Circuit simulation apparatus incorporating diffusion length dependence of transistors and method for creating transistor model
03/25/2004US20040059541 Position detecting method and apparatus
03/25/2004US20040059540 Position detecting device and position detecting method
03/25/2004US20040059456 Correlating an inline parameter to a device operation parameter
03/25/2004US20040059455 Manufacturing method of circuit substrate, circuit substrate and manufacturing device of circuit substrate
03/25/2004US20040059033 Mixture of fluoropolymer and solvent; photopolymerization; coating for semiconductor
03/25/2004US20040058630 Chemical mechanical polishing pad having holes and or grooves
03/25/2004US20040058626 Surface preparation for receiving processing treatments
03/25/2004US20040058621 Endpoint detection with multiple light beams
03/25/2004US20040058620 System and method for metal residue detection and mapping within a multi-step sequence
03/25/2004US20040058614 Method for precise molding and alignment of structures on a substrate using a stretchable mold
03/25/2004US20040058561 Photo-thermal induced diffusion
03/25/2004US20040058560 Fast gas exchange for thermal conductivity modulation
03/25/2004US20040058559 Rapid deposition of borosilicate glass films
03/25/2004US20040058558 Manufacturing method for a semiconductor device
03/25/2004US20040058557 Method of forming and/or modifying a dielectric film on a semiconductor surface
03/25/2004US20040058556 Method of manufacturing a metal oxide semiconductor transistor
03/25/2004US20040058555 Process for the transfer of a thin film comprising an inclusion creation step
03/25/2004US20040058554 Dry etching method
03/25/2004US20040058553 Beam homogenizer and laser irradiation apparatus and method of manufacturing semiconductor device
03/25/2004US20040058552 Method for etching organic insulating film and method for fabricating semiconductor device
03/25/2004US20040058551 Fluorous cleaning solution for lithographic processing
03/25/2004US20040058549 Method for forming shallow trench isolation
03/25/2004US20040058548 Forming method of contact in semiconductor device and manufacturing method of PMOS device using the same
03/25/2004US20040058547 Method and apparatus for forming metal-metal oxide etch stop/barrier for integrated circuit interconnects
03/25/2004US20040058546 Constant pH polish and scrub
03/25/2004US20040058545 Enhancement of eddy current based measurement capabilities
03/25/2004US20040058544 Methods of forming polished material and methods of forming isolation regions
03/25/2004US20040058543 Method of using films having optimized optical properties for chemical mechanical polishing endpoint detection
03/25/2004US20040058541 Sample surface processing method
03/25/2004US20040058540 Position detecting method and apparatus
03/25/2004US20040058538 Dual damamscene process
03/25/2004US20040058537 Method and apparatus for separating sample
03/25/2004US20040058535 Manufacturing method for an electronic device, and the electronic device
03/25/2004US20040058534 Manufacturing method of semiconductor device and semiconductor device
03/25/2004US20040058533 Method for fabricating a pattern and method for manufacturing a semiconductor device
03/25/2004US20040058532 Controlling electromechanical behavior of structures within a microelectromechanical systems device
03/25/2004US20040058531 Method for preventing metal extrusion in a semiconductor structure.
03/25/2004US20040058530 Method of manufacturing the semiconductor device
03/25/2004US20040058529 Method of depositing a layer
03/25/2004US20040058528 Selective dry etching of tantalum and tantalum nitride
03/25/2004US20040058527 Manufacturing method of semiconductor device
03/25/2004US20040058526 Via liner integration to avoid resistance shift and resist mechanical stress
03/25/2004US20040058525 Method of forming plug
03/25/2004US20040058524 Method of manufacturing semiconductor device
03/25/2004US20040058523 Method for forming low dielectric constant damascene structure while employing a carbon doped silicon oxide capping layer
03/25/2004US20040058522 Integrated circuit devices formed through selective etching of an insulation layer to increase the self-aligned contact area adjacent a semiconductor region
03/25/2004US20040058521 Photo-thermal induced diffusion
03/25/2004US20040058520 Support structures for wirebond regions of contact pads over low modulus materials
03/25/2004US20040058519 Method for forming bit line contact
03/25/2004US20040058518 Method of forming organic spacers and using organic spacers to form semiconductor device features
03/25/2004US20040058517 Method of fabricating a gate structure of a field effect transistor using an alpha-carbon mask
03/25/2004US20040058516 Manufacturing method of semiconductor device
03/25/2004US20040058515 Semiconductor device and a fabrication method thereof
03/25/2004US20040058514 Computer controlled de-clip-shadow mask removal machine
03/25/2004US20040058513 Method of implanting a substrate and an ion implanter for performing the method
03/25/2004US20040058512 Optimal spike anneal ambient
03/25/2004US20040058511 Substrate and manufacturing method therefor
03/25/2004US20040058510 Solid material gasification method, thin film formation process and apparatus
03/25/2004US20040058509 Method for producing an integrated semiconductor component
03/25/2004US20040058508 Dual trench isolation using single critical lithographic patterning
03/25/2004US20040058507 Manufacturing method for a shallow trench isolation region with high aspect ratio
03/25/2004US20040058506 Semiconductor device and method of manufacturing a semiconductor device
03/25/2004US20040058505 Method for manufacturing and structure of semiconductor device with polysilicon definition structure
03/25/2004US20040058504 Ultra-high capacitance device based on nanostructures
03/25/2004US20040058503 Method for fabricating semiconductor device
03/25/2004US20040058501 Apparatus and method for adiabatically heating a semiconductor surface
03/25/2004US20040058500 Method for forming silicide film of a semiconductor device
03/25/2004US20040058499 Semiconductor device and manufacturing method of the same
03/25/2004US20040058498 Gate with dual gate dielectric layer and method of fabricating the same
03/25/2004US20040058497 Methods for improving within-wafer uniformity of gate oxide
03/25/2004US20040058496 Method for fabricating semiconductor device
03/25/2004US20040058495 Method of fabricating FLASH memory devices
03/25/2004US20040058494 Split-gate flash memory cell and manufacturing method thereof
03/25/2004US20040058493 Method of fabricating a ferroelectric stacked memory cell
03/25/2004US20040058492 Vapor growth method for metal oxide dielectric film and pzt film
03/25/2004US20040058491 Methods for forming conductive structures and structures regarding same
03/25/2004US20040058490 Semiconductor device and method of manufacturing the same
03/25/2004US20040058489 Method of manufacturing semiconductor device including process for implanting impurities into substrate via MOS transistor gate electrode and gate insulation film
03/25/2004US20040058488 Monitoring system comprising infrared thermopile detetor
03/25/2004US20040058487 Segmented contactor
03/25/2004US20040058486 Semiconductor device and fabricating method thereof
03/25/2004US20040058485 Semiconductor device with mushroom gate
03/25/2004US20040058484 Crystallization apparatus, crystallization method, and phase shifter
03/25/2004US20040058483 Semiconductor device and method of manufacturing thereof
03/25/2004US20040058482 Method for improving a semiconductor substrate having SiGe film and semiconductor device manufactured by using this method
03/25/2004US20040058481 Method of forming self aligned contacts for a power mosfet
03/25/2004US20040058480 Structure and method of forming bitline contacts for a vertical dram array using a line bitline contact mask
03/25/2004US20040058479 Semiconductor device and a method of manufacturing the same
03/25/2004US20040058478 Taped lead frames and methods of making and using the same in semiconductor packaging
03/25/2004US20040058477 Integrated circuit package and manufacturing method therefor
03/25/2004US20040058476 Wafer bonding hermetic encapsulation
03/25/2004US20040058475 Devices and method of mounting
03/25/2004US20040058473 Substrate for an electric component and method for the production thereof
03/25/2004US20040058472 Area array semiconductor package and 3-dimensional stack thereof