| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 03/18/2004 | WO2004023541A1 Pattern formation substrate and method of pattern formation |
| 03/18/2004 | WO2004023540A1 Basic material for patterning and patterning method |
| 03/18/2004 | WO2004023539A1 Polishing agent composition for insulating film for semiconductor integrated circuit and method for manufacturing semiconductor integrated circuit |
| 03/18/2004 | WO2004023538A1 Crystal growing method, crystal growing apparatus, beam splitter, and display |
| 03/18/2004 | WO2004023537A1 Method of laser beam machining and laser beam machining apparatus |
| 03/18/2004 | WO2004023536A1 Formation of lattice-tuning semiconductor substrates |
| 03/18/2004 | WO2004023535A1 Method for producing a semiconductor laser diode |
| 03/18/2004 | WO2004023534A1 Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method |
| 03/18/2004 | WO2004023533A2 Semiconductor component and method of manufacture |
| 03/18/2004 | WO2004023532A2 Charge control members |
| 03/18/2004 | WO2004023531A1 A wafer monitoring system |
| 03/18/2004 | WO2004023530A2 System of transporting and storing containers of semiconductor wafers and transfer mechanism |
| 03/18/2004 | WO2004023529A2 Device and method for thermally treating semiconductor wafers |
| 03/18/2004 | WO2004023528A2 A thinned semiconductor wafer and die and corresponding method |
| 03/18/2004 | WO2004023519A2 High-density nrom-finfet |
| 03/18/2004 | WO2004023392A1 Rfid tag |
| 03/18/2004 | WO2004023350A2 Method for checking an integrated circuit for electrostatic discharge robustness |
| 03/18/2004 | WO2004023211A2 Exposure method, exposure mask, and exposure apparatus |
| 03/18/2004 | WO2004023184A1 Objective with birefringent lenses |
| 03/18/2004 | WO2004023069A1 Measurement and compensation of errors in interferometrs |
| 03/18/2004 | WO2004023046A1 Gas cleaning device for semiconductor processing system |
| 03/18/2004 | WO2004022819A1 Nitrogen sources for molecular beam epitaxy |
| 03/18/2004 | WO2004022815A1 Plated polyester resin article and method for production thereof |
| 03/18/2004 | WO2004022803A1 Metallic material for electronic part, electronic part, electronic equipment, method of working metallic material, process for producing electronic part and electronic optical part |
| 03/18/2004 | WO2004022754A1 CONSTRUCTION OF ANTIBODY USING MRL/lpr MOUSE |
| 03/18/2004 | WO2004022612A1 Photoresists, fluoropolymers and processes for 157 nm microlithography |
| 03/18/2004 | WO2004022595A1 CONSTRUCTION OF ANTIBODY USING MRL/lpr MOUSE |
| 03/18/2004 | WO2004022477A1 Microchip with thermal stress relief means |
| 03/18/2004 | WO2004014964A3 PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY |
| 03/18/2004 | WO2004012240A3 Method for enhancing critical dimension uniformity after etch |
| 03/18/2004 | WO2004010512A9 Heteroatom-containing diamondoid transistors |
| 03/18/2004 | WO2004009862A3 Substrate loading and unloading station with buffer |
| 03/18/2004 | WO2004008489A3 Process for ultra-thin body soi devices that incorporate epi silicon tips and article made thereby |
| 03/18/2004 | WO2004006264A3 Erasable and programmable non-volatile cell |
| 03/18/2004 | WO2004003979A3 Method for the production of a nrom memory cell field |
| 03/18/2004 | WO2003105192A3 Apparatus and method for cassette-less transfer of wafers |
| 03/18/2004 | WO2003104901A3 Cleaning compositions for microelectronic substrates |
| 03/18/2004 | WO2003103040A3 Method of making an soi semiconductor device having enhanced, self-aligned dielectric regions in the bulk silicon substrate |
| 03/18/2004 | WO2003103019A3 Fin fet devices from bulk semiconductor and method for forming |
| 03/18/2004 | WO2003100846A3 Glass material for use at high frequencies |
| 03/18/2004 | WO2003095997A3 Method and apparatus for separating primary and secondary charged particle beams |
| 03/18/2004 | WO2003093524A3 Apparatus and method for regulating the electrical power applied to a substrate during immersion |
| 03/18/2004 | WO2003092062A3 Surface protection sheet and electronic device package |
| 03/18/2004 | WO2003090256A3 Method and apparatus for connecting vertically stacked integrated circuit chips |
| 03/18/2004 | WO2003088324A3 Method and apparatus for wafer cleaning |
| 03/18/2004 | WO2003081646A3 System and method for heating and cooling wafer at accelerated rates |
| 03/18/2004 | WO2003077038A3 Reduced striae extreme ultraviolegt lithographic elements, a method of manufacturing the same and a method of measuring striae |
| 03/18/2004 | WO2003075340A3 Method for obtaining metal to metal contact between a metal surface and a bonding pad. |
| 03/18/2004 | WO2003075099A3 Method and system for overlay measurement |
| 03/18/2004 | WO2003072846A9 A method of depositing a barrier layer |
| 03/18/2004 | WO2003061029A3 Organic compositions |
| 03/18/2004 | WO2003046986A3 Semiconductor device, and means for checking the authenticity |
| 03/18/2004 | WO2003034495A3 Method for packing electronic modules and multiple chip packaging |
| 03/18/2004 | WO2003030252B1 Process for producing interconnects |
| 03/18/2004 | WO2003012831A3 Structure including a monocrystalline perovskite oxide layer |
| 03/18/2004 | WO2003009346A3 Processing system |
| 03/18/2004 | WO2003007363A8 Method and apparatus for removing a carrier part from a carrier with a single operation, and a product removed from a carrier |
| 03/18/2004 | WO2003001583A3 Process for producing silicon on insulator structure having intrinsic gettering by ion implantation |
| 03/18/2004 | WO2002080244A3 Improved process for deposition of semiconductor films |
| 03/18/2004 | US20040054982 Network-based photomask data entry interface and instruction generator for manufacturing photomasks |
| 03/18/2004 | US20040054981 Method of manufacturing electronic device |
| 03/18/2004 | US20040054980 Embossed mask lithography |
| 03/18/2004 | US20040054978 Nanometer scale devices |
| 03/18/2004 | US20040054432 Yield based, in-line defect sampling method |
| 03/18/2004 | US20040054114 Stabilizers to inhibit the polymerization of substituted cyclotetrasiloxane |
| 03/18/2004 | US20040054061 Waterproof, heat resistance, shockproof; undercoating for semiconductor, flip chips |
| 03/18/2004 | US20040053946 Cancer treatment method |
| 03/18/2004 | US20040053800 Process solutions containing surfactants |
| 03/18/2004 | US20040053570 Novel finishing pad design for multidirectional use |
| 03/18/2004 | US20040053559 Polishing apparatus and method of bonding and removing expendable replacement components thereof |
| 03/18/2004 | US20040053558 Working shape prediction method, working requirement determination method, working method, working system, method of manufacturing semiconductor device, computer program, and computer program storage medium |
| 03/18/2004 | US20040053516 Method for producing silicon wafer and silicon wafer |
| 03/18/2004 | US20040053515 Apparatus and method for surface finishing a silicon film |
| 03/18/2004 | US20040053514 Apparatus for cooling a substrate through thermal conduction in the viscous regime |
| 03/18/2004 | US20040053513 Method for production of semiconductor components |
| 03/18/2004 | US20040053511 Line edge roughness reduction |
| 03/18/2004 | US20040053510 System for and method of unlimited voltage multi ported sram cells |
| 03/18/2004 | US20040053508 Etching and cleaning methods and etching and cleaning apparatuses used therefor |
| 03/18/2004 | US20040053506 High temperature anisotropic etching of multi-layer structures |
| 03/18/2004 | US20040053505 Method of etching variable depth features in a crystalline substrate |
| 03/18/2004 | US20040053504 In-situ plasma etch for TERA hard mask materials |
| 03/18/2004 | US20040053503 Selective etching using sonication |
| 03/18/2004 | US20040053502 Semiconductor device and manufacturing method thereof |
| 03/18/2004 | US20040053501 Self aligned vias in dual damascene interconnect, buried mask approach |
| 03/18/2004 | US20040053500 Polishing progress monitoring method and device thereof, polishing device, semiconductor device production method, and semiconductor device |
| 03/18/2004 | US20040053499 Method and composition for polishing a substrate |
| 03/18/2004 | US20040053498 Method and apparatus for forming damascene structure, and damascene structure |
| 03/18/2004 | US20040053497 Large line conductive pads for interconnection of stackable circuitry |
| 03/18/2004 | US20040053496 Method for forming metal films |
| 03/18/2004 | US20040053495 Method of forming barrier layers |
| 03/18/2004 | US20040053494 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer |
| 03/18/2004 | US20040053493 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer |
| 03/18/2004 | US20040053492 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer |
| 03/18/2004 | US20040053491 Method of forming a contact in a semiconductor device |
| 03/18/2004 | US20040053490 Semiconductor device manufacturing method |
| 03/18/2004 | US20040053489 Multilayer wiring substrate, and method of producing same |
| 03/18/2004 | US20040053488 Ball electrode forming method |
| 03/18/2004 | US20040053486 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer |
| 03/18/2004 | US20040053485 Method for forming metal silicide regions in an integrated circuit |
| 03/18/2004 | US20040053484 Method of fabricating a gate structure of a field effect transistor using a hard mask |