Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2004
04/01/2004US20040060970 Under bump metallurgy for Lead-Tin bump over copper pad
04/01/2004US20040060949 Photoresist applying device and applying method therefor
04/01/2004US20040060920 Ceramic heater
04/01/2004US20040060919 Semiconductor production device ceramic plate
04/01/2004US20040060917 Advanced rapid thermal processing (RTP) using a linearly-moving heating assembly with an axisymmetric and radially-tunable thermal radiation profile
04/01/2004US20040060915 Discharge electrode for a wire bonding apparatus
04/01/2004US20040060910 High speed, laser-based marking method and system for producing machine readable marks on workpieces and semiconductor devices with reduced subsurface damage produced thereby
04/01/2004US20040060906 Method for chemical-mechanical jet etching of semiconductor structures
04/01/2004US20040060900 Apparatuses and methods for treating a silicon film
04/01/2004US20040060899 Apparatuses and methods for treating a silicon film
04/01/2004US20040060824 Chemical treatment, plating, and residue elimination method
04/01/2004US20040060814 Electrochemical mechanical planarization
04/01/2004US20040060731 Patterned electrically conductive polymers
04/01/2004US20040060724 Current-carrying electronic component and method of manufacturing same
04/01/2004US20040060666 Electronic component component mounting equipment and component mounting method
04/01/2004US20040060663 Offset measuring mechanism and offset measuring method in a bonding apparatus
04/01/2004US20040060662 Inductively coupled plasma processing apparatus having internal linear antenna for large area processing
04/01/2004US20040060660 Control of plasma density with broadband RF sensor
04/01/2004US20040060659 Etching system and etching method
04/01/2004US20040060658 Method and apparatus for an improved baffle plate in a plasma processing system
04/01/2004US20040060657 Method and apparatus for an improved deposition shield in a plasma processing system
04/01/2004US20040060656 Method and apparatus for an improved bellows shield in a plasma processing system
04/01/2004US20040060645 Forming folded-stack packaged device using progressive folding tool
04/01/2004US20040060617 Doping the liner with a passivating agent plasma (e.g., N2 or Cl2) to form a barrier prior to annealing to prevent diffusion of impurities such as silicon and fluorine
04/01/2004US20040060592 Semiconductor device and its manufacturing method
04/01/2004US20040060583 Composition for eliminating thermosetting resin
04/01/2004US20040060582 Substrate processing apparatus
04/01/2004US20040060581 Vertical proximity processor
04/01/2004US20040060580 Meniscus, vacuum, IPA vapor, drying manifold
04/01/2004US20040060579 Cleaning solution and method for cleaning ceramic parts using the same
04/01/2004US20040060575 Drip manifold for uniform chemical delivery
04/01/2004US20040060574 Substrate processing method and substrate processing apparatus
04/01/2004US20040060573 Proximity head for drying a substrate; and a cleaning system for cleaning wafers
04/01/2004US20040060519 Quartz to quartz seal using expanded PTFE gasket material
04/01/2004US20040060518 Apparatus for inverted multi-wafer MOCVD fabrication
04/01/2004US20040060516 Method and apparatus for an improved optical window deposition shield in a plasma processing system
04/01/2004US20040060515 Semiconductor manufacturing apparatus and manufacturing method of thin film semiconductor device
04/01/2004US20040060514 Gas distribution showerhead
04/01/2004US20040060513 Processing method and processing apparatus
04/01/2004US20040060506 Excimer laser crystallization of amorphous silicon film
04/01/2004US20040060505 Substrate processing apparatus and substrate processing method
04/01/2004US20040060504 Semiconductor thin film and process for production thereof
04/01/2004US20040060502 Slurry for chemical mechanical polishing comprising bulk solution, plurality of particles and self-assembling adsorption additive of zwitterionic, anionic, nonionic, or cationic surfactant; semiconductors
04/01/2004US20040060472 Selective polishing with slurries containing polyelectrolytes
04/01/2004US20040060195 Methods and systems for processing a substrate using a dynamic Liquid meniscus
04/01/2004US20040060190 Wafer spin drying apparatus with a plurality of supply nozzles and methods for using the same
04/01/2004US20040060187 End effector alignment tool for substrate handling system
04/01/2004US20040060186 Laser alignment tool
04/01/2004US20040060174 Method for producing wiring substrate
04/01/2004US20040060172 Electrostatic gripper and process for producing it
04/01/2004US20040060164 High-performance substrate for magnetic isolator
04/01/2004DE69530812T2 Integrierte Halbleiterschaltung A semiconductor integrated circuit
04/01/2004DE19714544B4 Verfahren zum Anbringen eines Trockenelektrolytkondensators auf einer Leiterplatine und Anordnung des Kondensators und der Platine A method for attaching a solid electrolytic capacitor on a printed circuit board and arrangement of the capacitor and the circuit board
04/01/2004DE10343217A1 Chipbinder Chip Binder
04/01/2004DE10332855A1 Verfahren zum Bilden einer Mikrostruktur auf einem Substrat unter Verwendung einer Resiststruktur, und Restistoberflächenbehandlungsmittel A method of forming a microstructure on a substrate using a resist pattern, and Restistoberflächenbehandlungsmittel
04/01/2004DE10328347A1 Substratlade- und Substratentladevorrichtung Substrate loading and Substratentladevorrichtung
04/01/2004DE10327928A1 Halbleiterbauelement mit reduzierter Gateüberlappungskapazitanz und Verfahren zur Herstellung des Halbleiterbauelements A semiconductor device with reduced Gateüberlappungskapazitanz and method of manufacturing the semiconductor device
04/01/2004DE10260688A1 Verfahren zum Erzeugen einer flachen Isolierungskerbe A process for producing a flat insulation notch
04/01/2004DE10255846A1 Production of a trench capacitor for a semiconductor memory cell comprises providing a trench in a substrate, providing a capacitor dielectric and an electrically conducting filling in trench regions, and further processing
04/01/2004DE10244862A1 Verfahren zur Herstellung eines elektronischen Bauelements mit einer Praseodymoxid-Schicht A process for producing an electronic component with a praseodymium oxide layer
04/01/2004DE10243981A1 Elektronische Baueinheit, insbesondere Regler für Generatoren in Kraftfahrzeugen The electronic package, in particular regulator for generators in motor vehicles
04/01/2004DE10243757A1 Semiconductor chip manufacturing method, e.g. for LED manufacture, by matching thermal expansion coefficient to carrier to radiation profile and pulse length of laser beam used to separate from substrate
04/01/2004DE10243406A1 Plasmaquelle Plasma source
04/01/2004DE10243380A1 Verfahren zur Herstellung einer integrierten Halbleiterschaltung A process for producing a semiconductor integrated circuit
04/01/2004DE10242629A1 Production of a semiconductor structure used in electronic devices comprises preparing a semiconductor structure having a trench, filling the trench with a filling, planarizing the filling, and sinking the filling in the trench
04/01/2004DE10242402A1 Vorrichtung und Verfahren für das Verbinden von Objekten Device and method for connecting objects
04/01/2004DE10241397A1 Halbleiterelement mit T-förmiger Gate-Struktur mit Seitenwandabstandselementen, die in-situ hergestellt sind, und ein Verfahren zur Herstellung des Halbleiterelements Semiconductor element having a T-shaped gate structure with sidewall spacers, which are prepared in-situ, and a method for manufacturing the semiconductor element
04/01/2004DE10241396A1 Halbleiterelement mit T-förmiger Gate-Struktur und ein Verfahren zur Herstellung des Halbleiterelements Semiconductor element having a T-shaped gate structure and a method for manufacturing the semiconductor element
04/01/2004DE10241390B3 Process for structuring a flat substrate made from glassy material for electrically contacting microelectronic or micromechanical components comprises preparing a semiconductor flat substrate, reducing its thickness, and further processing
04/01/2004DE10236896A1 Vorrichtung und Verfahren zum thermischen Behandeln von Halbleiterwafern Device and method for the thermal treatment of semiconductor wafers
04/01/2004DE10234952B3 Production of a semiconductor structure used as a trench capacitor comprises preparing a semiconductor substrate, and forming a trench in the substrate
04/01/2004DE10223203B4 Elektronisches Bauelement-Modul und Verfahren zu dessen Herstellung The electronic component module and method for its production
04/01/2004CA2499208A1 Controlling electromechanical behavior of structures within a microelectromechanical systems device
03/2004
03/31/2004EP1403984A2 Laser light source device and surface inspection apparatus employing the same
03/31/2004EP1403932A1 Nitride semiconductor device
03/31/2004EP1403931A2 Method for growing a silicon film, method for manufacturing a solar cell, semiconductor substrate, and solar cell
03/31/2004EP1403930A2 Semiconductor device and method of manufacturing the same
03/31/2004EP1403929A1 Semiconductor layer and forming method therefor, and semiconductor device and production method therefor
03/31/2004EP1403928A2 Nanometer-scale semiconductor devices and method of making
03/31/2004EP1403927A1 High voltage transistor integrated with non-volatile memory cells
03/31/2004EP1403925A2 Dielectric material for electronic devices
03/31/2004EP1403924A2 Fuse arrangement and semiconductor memory device
03/31/2004EP1403921A2 Electronic device with stacked semiconductor chips and associated manufacturing process
03/31/2004EP1403919A2 Magnetic memory device and method of manufacturing the same
03/31/2004EP1403918A1 A semiconductor device, its preparation
03/31/2004EP1403917A1 Process for manufacturing semiconductor wafers incorporating differentiated isolating structures
03/31/2004EP1403916A2 Production process for producing semiconductor devices, semiconductor devices produced thereby, and test system for carrying out yield-rate test in production of such semiconductor devices
03/31/2004EP1403915A2 Method for fabricating a MOS transistor
03/31/2004EP1403914A2 Method of making a semiconductor device having trenches
03/31/2004EP1403913A1 Substrate treating device and substrate treating method, substrate flattening method
03/31/2004EP1403912A1 Method of producing iii nitride compound semiconductor
03/31/2004EP1403911A2 Thin film device and its fabrication method
03/31/2004EP1403910A2 Semiconductor device having a nitride-based hetero-structure and method of manufacturing the same
03/31/2004EP1403909A1 Process for manufactoring integrated resistive elements with silicidation protection
03/31/2004EP1403908A2 Oled lamp
03/31/2004EP1403907A1 Regeneration process of etching solution, etching process, and etching system
03/31/2004EP1403898A2 Electron beam source, electron-optical apparatus comprising an electron beam source and method of operating an electron beam source
03/31/2004EP1403878A2 Flash eprom intergrated circuit architecture
03/31/2004EP1403876A1 Ferroelectric memory with wide operating voltage and multi-bit storage per cell
03/31/2004EP1403875A2 Magnetoresistive element and magnetic memory allowing high density