| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/25/2004 | CA2168871C Crystalline multilayer structure and manufacturing method thereof |
| 05/21/2004 | WO2004042836A1 Thin film multilayer body, electronic device using such thin film multilayer body, actuator, and method for manufacturing actuator |
| 05/21/2004 | WO2004042830A1 Nanostructure, electronic device having such nanostructure and method of preparing nanostructure |
| 05/21/2004 | WO2004042825A1 Semiconductor devices and methods of manufacture thereof |
| 05/21/2004 | WO2004042821A1 Semiconductor memory |
| 05/21/2004 | WO2004042819A1 Device comprising circuit elements connected by bonding bump structure |
| 05/21/2004 | WO2004042817A1 Method and structure to enhance temperature/humidity/bias performance of semiconductor devices by surface modification |
| 05/21/2004 | WO2004042816A2 Monolithic bridge capacitor |
| 05/21/2004 | WO2004042815A1 Forming a copper diffusion barrier |
| 05/21/2004 | WO2004042814A1 Film carrier tape for mounting electronic component |
| 05/21/2004 | WO2004042813A1 Method of etching a silicon-containing dielectric material |
| 05/21/2004 | WO2004042812A1 Polishing composition and rinsing composition |
| 05/21/2004 | WO2004042811A1 Cleaning composition and method of cleaning therewith |
| 05/21/2004 | WO2004042810A1 Method for cleaning microstructure |
| 05/21/2004 | WO2004042809A1 Method of forming a nickel silicide region in a doped silicon-containing semiconductor area |
| 05/21/2004 | WO2004042808A1 Nitrogen oxidation of etched mos gate structure |
| 05/21/2004 | WO2004042807A1 Light irradiator |
| 05/21/2004 | WO2004042806A1 Light irradiator and light irradiating method |
| 05/21/2004 | WO2004042805A1 Phase transition method of amorphous material using cap layer |
| 05/21/2004 | WO2004042804A2 Capacitor fabrication methods and capacitor structures including niobium oxide |
| 05/21/2004 | WO2004042803A1 Method and apparatus for detecting endpoint |
| 05/21/2004 | WO2004042802A2 A method of rapidly thermally annealing multilayer wafers with an edge |
| 05/21/2004 | WO2004042800A2 Semiconductor arrangement |
| 05/21/2004 | WO2004042798A2 Apparatus and method for treating objects with radicals generated from plasma |
| 05/21/2004 | WO2004042797A2 Sacrificial compositions, methods of use thereof, and methods of decomposition thereof |
| 05/21/2004 | WO2004042795A2 Method of preparing whole semiconductor wafer for analysis |
| 05/21/2004 | WO2004042794A2 Removal of particle contamination on patterned slilicon/silicon dioxide using supercritical carbon dioxide/chemical formulations |
| 05/21/2004 | WO2004042791A2 Method and apparatus for monitoring integrated circuit fabrication |
| 05/21/2004 | WO2004042789A2 Wafer container cleaning system |
| 05/21/2004 | WO2004042785A2 Functional bimorph composite nanotapes and methods of fabrication |
| 05/21/2004 | WO2004042784A2 Stabilized semiconductor nanocrystals |
| 05/21/2004 | WO2004042783A2 Hafnium nitride buffer layers for growth of gan on silicon |
| 05/21/2004 | WO2004042781A2 Thin film transistor array panel |
| 05/21/2004 | WO2004042780A2 Flexible semiconductor device and method of manufacturing the same |
| 05/21/2004 | WO2004042779A2 Method of detaching a thin film at moderate temperature after co-implantation |
| 05/21/2004 | WO2004042771A2 Method of etching a silicon-containing dielectric material |
| 05/21/2004 | WO2004042736A2 Using isolated p-well transistor arrangements to avoid leakage caused by word line/bit line shorts |
| 05/21/2004 | WO2004042475A1 Resist composition |
| 05/21/2004 | WO2004042320A1 Planar and wafer level packaging of semiconductor lasers and photo detectors for transmitter optical sub-assemblies |
| 05/21/2004 | WO2004042112A1 Cvd method using metal carbonyl gas |
| 05/21/2004 | WO2004041989A1 Semiconductor surface treatment and mixture used therein |
| 05/21/2004 | WO2004041972A2 Gas layer formation materials |
| 05/21/2004 | WO2004041965A1 Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal |
| 05/21/2004 | WO2004041881A1 Polymeric compound for photoresist and resin composition for photoresist |
| 05/21/2004 | WO2004041712A2 Method of making a nanoscale electronic device |
| 05/21/2004 | WO2004041678A1 Container for clean room |
| 05/21/2004 | WO2004041658A2 Substrate process tank with acoustical source transmission and method of processing substrates |
| 05/21/2004 | WO2004041479A1 Polishing apparatus |
| 05/21/2004 | WO2004041454A2 Substrate processing apparatus and method |
| 05/21/2004 | WO2004032160A9 Methods and systems for processing a substrate using a dynamic liquid meniscus |
| 05/21/2004 | WO2004027844A3 Method for the production of a composite sicoi-type substrate comprising an epitaxy stage |
| 05/21/2004 | WO2004027839A3 Electrostatic chuck having a low level of particle generation and method of fabricating same |
| 05/21/2004 | WO2004015754A3 Method for oxidation of a layer and corresponding holder device for a substrate |
| 05/21/2004 | WO2004010470A3 Method to overcome instability of ultra-shallow semiconductor junctions |
| 05/21/2004 | WO2004006419A3 Monitoring apparatus and method for improving the accuracy and repeatability of electrochemical capacitance voltage (ecv) measurements |
| 05/21/2004 | WO2004001904A8 Stabilized wire bonded electrical connections and method of making same |
| 05/21/2004 | WO2003107453A3 Material for a functional layer of an organic electronic component, method for the production thereof, and use thereof |
| 05/21/2004 | WO2003105189B1 Strained-semiconductor-on-insulator device structures |
| 05/21/2004 | WO2003100829A3 Forming a multi segment integrated circuit with isolated substrates |
| 05/21/2004 | WO2003100824A3 Ferroelectric capacitor and method of manufacturing the same |
| 05/21/2004 | WO2003096356A3 Reflective x-ray microscope and inspection system for examining objects with wavelengths of≤ 100nm |
| 05/21/2004 | WO2003095701A8 Volatile copper(ii) complexes for deposition of copper films by atomic layer deposition |
| 05/21/2004 | WO2003085455A3 Photoresist compositions comprising acetals and ketals as solvents |
| 05/21/2004 | WO2003079439A3 Chip stack with intermediate cavity |
| 05/21/2004 | WO2003054972A8 Variable capacitor and its manufacturing method |
| 05/21/2004 | WO2003044850A8 Apparatus for molding a semiconductor wafer and process therefor |
| 05/21/2004 | WO2003023821A3 Hermetic seal |
| 05/21/2004 | WO2003005439A3 Method of manufacturing a semiconductor device comprising mos-transistors having gate oxides of different thicknesses |
| 05/21/2004 | WO2002099164A3 Electroless-plating solution and semiconductor device |
| 05/21/2004 | WO2002075793B1 System and method of providing mask defect printability analysis |
| 05/21/2004 | WO2002067327A3 Pixel current driver for organic light emitting diode displays |
| 05/20/2004 | US20040098689 Rapid chip management system |
| 05/20/2004 | US20040098684 Method for correcting crosstalk |
| 05/20/2004 | US20040098681 Characteristic evaluation apparatus for insulated gate type transistors |
| 05/20/2004 | US20040098216 Method and apparatus for monitoring integrated circuit fabrication |
| 05/20/2004 | US20040098161 Method and systme for managing semiconductor manufacturing equipment |
| 05/20/2004 | US20040098160 Method, system, and computer program product for improved trajectory planning and execution |
| 05/20/2004 | US20040098145 Hybrid cascade model-based predictive control system |
| 05/20/2004 | US20040097651 Unsaturated compounds containing silane, electron donor and electron acceptor functionality |
| 05/20/2004 | US20040097389 Forming film of cleaning solution; applying sound waves |
| 05/20/2004 | US20040097368 Preparation of a multimetal oxide material |
| 05/20/2004 | US20040097359 Firing, annealing, controlling temperature; substrate overcoated with conductor |
| 05/20/2004 | US20040097174 Method for polishing semiconductor wafer and polishing pad for the same |
| 05/20/2004 | US20040097169 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 05/20/2004 | US20040097161 Method of creating an electroluminescent device |
| 05/20/2004 | US20040097103 Laser annealing device and thin-film transistor manufacturing method |
| 05/20/2004 | US20040097102 Annealed wafer and manufacturing method thereof |
| 05/20/2004 | US20040097100 Semiconductor integrated circuit device and production method thereof |
| 05/20/2004 | US20040097099 Method of forming a semiconductor device with a substantially uniform density low-k dielectric layer |
| 05/20/2004 | US20040097098 Method for fabricating a semiconductor device |
| 05/20/2004 | US20040097097 Method for coating a semiconductor substrate with a mixture containing an adhesion promoter |
| 05/20/2004 | US20040097096 Method for fabricating semiconductor structures and devices on vicinal substrates using a low temperature, low pressure, alkaline earth metal-rich process |
| 05/20/2004 | US20040097095 Method for fabricating circuit module |
| 05/20/2004 | US20040097094 Package of semiconductor device and its manufacturing method |
| 05/20/2004 | US20040097092 Method of plasma etching high-K dielectric materials with high selectivity to underlying layers |
| 05/20/2004 | US20040097091 Gas for removing deposit and removal method using same |
| 05/20/2004 | US20040097090 Silicon etching method |
| 05/20/2004 | US20040097089 Device and control method for micro wave plasma processing |
| 05/20/2004 | US20040097088 Conductor treating single-wafer type treating device and method for semi-conductor treating |
| 05/20/2004 | US20040097087 Chamber structure in inductive coupling plasma etching apparatus |