Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2008
08/13/2008CN100411163C Semiconductor device of chip on film
08/13/2008CN100411161C Semiconductor device and method of manufacturing same
08/13/2008CN100411160C Heat radiation structure of semiconductor device, and manufacturing method thereof
08/13/2008CN100411159C Semiconductor parts and method for manufacturing integrate circuit chip
08/13/2008CN100411156C Resin-sealed semiconductor device and method of manufacturing the same
08/13/2008CN100411155C Laminated electronic part and its manufacturing method
08/13/2008CN100411154C 电路装置及其制造方法 Circuit device and manufacturing method thereof
08/13/2008CN100411153C Method for producing film tranistor array and its driving circuit
08/13/2008CN100411152C Three dimensional structure formed by using an adhesive silicon wafer process
08/13/2008CN100411151C Method for manufacturing flash memory device
08/13/2008CN100411150C Method for manufacturing non-volatile memory body
08/13/2008CN100411149C Method and apparatus for operating a string of charge trapping memory cells
08/13/2008CN100411148C Method of manufacturing memory device charge storing structure and memory device
08/13/2008CN100411147C Semiconductor device and a method of manufacturing the same
08/13/2008CN100411146C Method for fabricating strained-silicon CMOS transistors
08/13/2008CN100411145C Nonvolatile memory unit, manufacturing method, and opertion method
08/13/2008CN100411144C Nonvolatile memory and manufacturing method
08/13/2008CN100411143C Technique for preparing dual-gate oxygen on CMOS in high voltage compatible to standard technique of CMOS
08/13/2008CN100411142C CMOS image sensor pixel with smile structure under transfer gate
08/13/2008CN100411141C Electrical isolating method for silicon carboride device
08/13/2008CN100411140C Semiconductor device and method for fabricating the same
08/13/2008CN100411139C Special semiconductor circuit and resource configuration method for semiconductor circuit driver
08/13/2008CN100411138C Dicing/die boding sheet
08/13/2008CN100411137C Semiconductor device and method of manufacturing the same
08/13/2008CN100411136C Method of forming copper contact in semiconductor component
08/13/2008CN100411135C Method for producing a spiral inductance on a substrate, and a device fabricated according to such a method
08/13/2008CN100411134C Method for producing a high quality thin layer by common injection and thermally anneal
08/13/2008CN100411133C Substrate-placing platform, substrate processing device and production method of substrate-placing platform
08/13/2008CN100411132C Silicon wafer prealigning device
08/13/2008CN100411131C Controlled airflow stock shelf
08/13/2008CN100411130C Substrate processing apparatus and substrate transfer method therefor
08/13/2008CN100411129C Liquid processing apparatus
08/13/2008CN100411128C Test probe and manufacturing method for test probe
08/13/2008CN100411127C Semiconductor device and manufacturing method of the same
08/13/2008CN100411126C System and a method for fluid filling wafer level packages
08/13/2008CN100411125C Method for preparing packages of semiconductor, and cutting unit
08/13/2008CN100411124C CSP packaging technique
08/13/2008CN100411123C Semiconductor buried base plate structure and its manufacturing method
08/13/2008CN100411122C Optical device manufacturing method
08/13/2008CN100411121C Radiating pack structure and production thereof
08/13/2008CN100411120C Method of manufacturing a semiconductor device by using a matrix frame
08/13/2008CN100411119C Semiconductor device and method for fabricating the same
08/13/2008CN100411118C High pressure wafer-less auto clean for etch applications
08/13/2008CN100411117C Improvement of atomic layer deposition method and apparatus thereof
08/13/2008CN100411116C Dielectric film forming method
08/13/2008CN100411115C Manufacturing method of semiconductor device
08/13/2008CN100411114C Plasma treatment apparatus and light detection method of a plasma treatment
08/13/2008CN100411113C Etching method, method of manufacturing semiconductor device, and semiconductor device
08/13/2008CN100411112C Method and apparatus for monitoring a material processing system
08/13/2008CN100411111C Alxgayin1-x-yn substrate, cleaning method of alxgayin1-x-yn substrate, ain substrate, and cleaning method of AlN substrate
08/13/2008CN100411110C Slurry composition for chemical-mechanical polishing capable of compensating nanotopography effect and method for planarizing surface of semiconductor device using same
08/13/2008CN100411109C Method for polishing material layer on a semiconductor wafer
08/13/2008CN100411108C Apparatus for processing substrate and method for the same
08/13/2008CN100411107C Precision polysilicon resistor process
08/13/2008CN100411106C Method and device for plasma etching using periodic modulation of gas chemistry
08/13/2008CN100411105C Wafer back surface treating method and semiconductor manufacturing method
08/13/2008CN100411104C Electrode material, solar cell and process for producing solar cell
08/13/2008CN100411103C Method for making T-type grating of transistor circuit with high electron mobility
08/13/2008CN100411102C Vaporizer for CVD, solution voporizing CVD device and voporization method for CVD
08/13/2008CN100411101C Semiconductor device and method for preventing damage to anti-reflective structure during removing an overlying photoresist layer
08/13/2008CN100411100C Method of forming the film pattern, and method of manufacturing active matrix substrate
08/13/2008CN100411099C Base plate treater and treating method
08/13/2008CN100411098C Manufacturing device and manufacturing method
08/13/2008CN100411097C Device producing method, electro-optical device
08/13/2008CN100411096C Temperature control system and substrate processing apparatus
08/13/2008CN100411095C Chamber for vacuum processing device and device having the chamber
08/13/2008CN100411094C Heat treatment prior to bonding two wafers
08/13/2008CN100411093C Positioning apparatus and method of controlling positioning apparatus
08/13/2008CN100411092C Method for reducing idle time of machine and producing system using the same method
08/13/2008CN100411091C Apparatus and method for reducing electrical noise in a thermally controlled chuck
08/13/2008CN100411090C Electronic part mounting apparatus
08/13/2008CN100411089C Method for manufacturing semiconductor device
08/13/2008CN100411088C Apparatus using hybrid coupled plasma
08/13/2008CN100411087C Dried air supply device
08/13/2008CN100411086C Manufacturing method of thin film element, thin film transistor circuit board, active matrix display device
08/13/2008CN100411058C Mram configuration having selection transistors with a large channel width
08/13/2008CN100410950C Semiconductor integrated circuit and design method thereof
08/13/2008CN100410811C Photoresist removing method and apparatus thereof
08/13/2008CN100410810C Plus photoresist composition and resist pattern forming method
08/13/2008CN100410808C Negative photoresists for short wavelength imaging
08/13/2008CN100410788C Dot structure
08/13/2008CN100410785C Matrix display device and method for manufacturing the same, and heat pressing connection head
08/13/2008CN100410752C Liquid crystal display unit and method for manufacturing the same
08/13/2008CN100410750C Carrying and inverting platform
08/13/2008CN100410724C Manufacturing method of making comb-teeth electrode pair
08/13/2008CN100410718C Sample observation method
08/13/2008CN100410676C Test pattern for reliability measurement of copper interconnection line having moisture window and method for manufacturing the same
08/13/2008CN100410421C Duo-step plasma cleaning of chamber residues
08/13/2008CN100410420C Low dielectric constant interlayer dielectric film and method of forming the same
08/13/2008CN100410359C Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility
08/13/2008CN100410357C Cleaning composition for semiconductor components and process for manufacturing semiconductor device
08/13/2008CN100410154C Thin-plate supporting container
08/13/2008CN100410152C Lid unit for thin-plate supporting container
08/13/2008CN100410017C Chemical mechanical polishing pad, production method thereof, and chemical mechanical polishing process
08/13/2008CN100410016C Polishing pad, method for manufacturing the same, polishing system and method
08/13/2008CN100409952C Apparatus and method for applying a material to an object
08/12/2008US7412671 Apparatus and method for verifying an integrated circuit pattern
08/12/2008US7412670 Method and apparatus for optimizing distributed multiplexed bus interconnects
08/12/2008US7412639 System and method for testing circuitry on a wafer
08/12/2008US7412299 Process for determining the temperature of a semiconductor wafer in a rapid heating unit
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