| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 08/14/2008 | US20080191247 Nonvolatile memory transistor having poly-silicon fin, stacked nonvolatile memory device having the transistor, method of fabricating the transistor, and method of fabricating the device |
| 08/14/2008 | US20080191246 Method to Improve Writer Leakage in a SiGe Bipolar Device |
| 08/14/2008 | US20080191245 Bipolar Junction Transistor Having A High Germanium Concentration In A Silicon-Germanium Layer And A Method For Forming The Bipolar Junction Transistor |
| 08/14/2008 | US20080191244 Methods of fabricating integrated circuit devices including strained channel regions and related devices |
| 08/14/2008 | US20080191243 Semiconductor structure and method of forming the structure |
| 08/14/2008 | US20080191242 Method For Manufacturing An Electro-Mechanical Component And An Electro-Mechanical Component, Such As A Strained Si Fin-Fet |
| 08/14/2008 | US20080191239 Multilayer structure and fabrication thereof |
| 08/14/2008 | US20080191237 Submounts for semiconductor light emitting devices and methods of forming packaged light emitting devices including dispensed encapsulants |
| 08/14/2008 | US20080191236 Cooling Device for a Light-Emitting Semiconductor Device and a Method of Manufacturing Such a Cooling Device |
| 08/14/2008 | US20080191231 Led Package, Method Of Fabricating The Same, And Backlight Unit Having The Same |
| 08/14/2008 | US20080191225 Methods of forming packaged semiconductor light emitting devices having front contacts by compression molding |
| 08/14/2008 | US20080191223 CLEAVED FACET (Ga,Al,In)N EDGE-EMITTING LASER DIODES GROWN ON SEMIPOLAR BULK GALLIUM NITRIDE SUBSTRATES |
| 08/14/2008 | US20080191222 Ac Light Emitting Diode and Method for Fabricating the Same |
| 08/14/2008 | US20080191220 Roll-to-roll fabricated light sheet and encapsulated semiconductor circuit devices |
| 08/14/2008 | US20080191218 Low-Dielectric Constant Cryptocrystal Layers And Nanostructures |
| 08/14/2008 | US20080191217 Process for forming an interface between silicon carbide and silicon oxide with low density of states |
| 08/14/2008 | US20080191214 Thin Film Transistor Substrate, Liquid Crystal Display Device Provided With Such Thin Film Transistor Substrate and Method for Manufacturing Thin Film Transistor Substrate |
| 08/14/2008 | US20080191213 Thin film transistor, thin film transistor substrate including the same and method of manufacturing the same |
| 08/14/2008 | US20080191212 Thin film transistor array panel and manufacturing methd thereof |
| 08/14/2008 | US20080191211 Thin film transistor array substrate, method of manufacturing the same, and display device |
| 08/14/2008 | US20080191206 Semiconductor device and method of fabricating the same |
| 08/14/2008 | US20080191204 Thin film transistors and methods of manufacturing the same |
| 08/14/2008 | US20080191203 Method for Producing Gan Film, Semiconductor Device, Method for Generating Thin Film of Nitride of Group III Element and Semiconductor Device Having Thin Film of Nitride of Group III Element |
| 08/14/2008 | US20080191196 Nanowire heterostructures |
| 08/14/2008 | US20080191193 In situ modification of group iv nanoparticles using gas phase nanoparticle reactors |
| 08/14/2008 | US20080191153 System For Delivery Of Reagents From Solid Sources Thereof |
| 08/14/2008 | US20080191121 Focused laser beam processing |
| 08/14/2008 | US20080190902 Wafer dividing method and laser beam processing machine |
| 08/14/2008 | US20080190892 Plasma etching method, plasma etching apparatus, control program and computer-readable storage medium |
| 08/14/2008 | US20080190761 Technique and apparatus for depositing thin layers of semiconductors for solar cell fabrication |
| 08/14/2008 | US20080190658 Multilayer printed wiring board |
| 08/14/2008 | US20080190560 Microwave Plasma Processing Apparatus |
| 08/14/2008 | US20080190558 Wafer processing apparatus and method |
| 08/14/2008 | US20080190557 Apparatus for real-time dynamic chemical analysis |
| 08/14/2008 | US20080190556 Methods of and apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a wafer |
| 08/14/2008 | US20080190212 Test Apparatus |
| 08/14/2008 | US20080189975 Substrate processing apparatus and substrate processing method |
| 08/14/2008 | US20080189943 Multilayered printed circuit board and manufacturing method thereof |
| 08/14/2008 | US20080189941 Method of Manufacture of Electronic or Functional Devices |
| 08/14/2008 | DE19964382B4 Verwendung einer Beschichtungszusammensetzung zur Herstellung einer nicht reflektierenden Beschichtung und Verfahren zur Herstellung der Beschichtungszusammensetzung Use of a coating composition for producing a non-reflective coating and methods for making the coating composition |
| 08/14/2008 | DE19910886B4 Verfahren zur Herstellung einer flachen Grabenisolation für elektrisch aktive Bauelemente A process for producing a flat grave insulation for electrically active components |
| 08/14/2008 | DE112006002594T5 Behälter für dünne Platten und Bearbeitungseinrichtung für Behälter für dünne Platten Container for thin plates and processing device for containers for thin plates |
| 08/14/2008 | DE112006002590T5 Formspeicherbauelement Shape memory device |
| 08/14/2008 | DE112006002529T5 Dreipunkt-Sicht-Ausrichtsystem mit einer einzigen Kamera für ein Vorrichtungs-Handhabungsgerät Three-point vision alignment system with a single camera for a device handling apparatus |
| 08/14/2008 | DE112006002505T5 Verfahren zur Herstellung eines Halbleiters eines Nitrids der Gruppe 3-5 und Verfahren zur Herstellung einer lichtemittierenden Vorrichtung A process for the production of a semiconductor of a nitride of the Group 3-5 and method of manufacturing a light emitting device |
| 08/14/2008 | DE112004002634B4 Integrierte Schaltung, Verfahren zur Herstellung einer integrierten Schaltung und Verfahren zur Herstellung flacher Grabenisolationsstrukturen Integrated circuit A method of manufacturing an integrated circuit and method for manufacturing flat grave isolation structures |
| 08/14/2008 | DE10392314B4 Verfahren zur Herstellung einer integrierten Schaltung mit einem Ausbilden einer Hartmaskenerweiterung für eine Speicherwortleitung A method of fabricating an integrated circuit with a forming a hard mask extension for a memory word line |
| 08/14/2008 | DE10361384B4 Strukturübertragung bei der Bauelementeherstellung Pattern transfer in the device fabrication |
| 08/14/2008 | DE10355683B4 Vakuumschleusenanordnung, Verfahren zum Transportieren eines Objekts mit der Vakuumschleusenanordnung und Verwendung der Vakuumschleusenanordnung zum Beschichten und Reinigen von Objekten The vacuum lock arrangement, method for transporting an object with the vacuum lock arrangement and use of the vacuum lock arrangement for coating and cleaning objects |
| 08/14/2008 | DE10355679B4 Substratträger, Vorrichtung und Verfahren zum Handhaben des Substratträgers und Verwendung in Beschichtungsprozessen Substrate carrier, apparatus and method for handling the substrate support and use in coating processes |
| 08/14/2008 | DE10345990B4 Verfahren zum Erzeugen einer Oxidschicht A method of generating an oxide layer |
| 08/14/2008 | DE10338480B4 Halbleitervorrichtung mit dielektrischer Trennung und Verfahren zur Herstellung derselben A semiconductor device with dielectric isolation, and methods of manufacturing the same |
| 08/14/2008 | DE10234710B4 System zum Trocknen von Halbleitersubstraten The system for drying semiconductor substrates |
| 08/14/2008 | DE10234392B4 Halbleiterbauelement mit Gate-Elektrodenstruktur und Herstellungsverfahren hierfür A semiconductor device comprising gate electrode structure and manufacturing method thereof |
| 08/14/2008 | DE10208751B4 Ein Verfahren zur Herstellung eines Halbleiterelements mit vergrößerten Metallsilizidbereichen A method of manufacturing a semiconductor element with enlarged Metallsilizidbereichen |
| 08/14/2008 | DE102008007655A1 Mehrbit-Phasenänderungs-Zufallszugriffsspeicher und Verfahren zum Bilden derselben Multi-bit phase change random access memory and method of forming same |
| 08/14/2008 | DE102008007603A1 Method for manufacturing semiconductor devices with which chips are structured, tested and isolated on wafer, involves processing fractured wafer and damaged chip with edge portion and breakage outline with limited fragment |
| 08/14/2008 | DE102008007237A1 Halbleiter-Bildeinheit mit einer Die-Aufnahmebohrung und Verfahren zu deren Herstellung Solid-state imaging unit having a die receiving bore and processes for their preparation |
| 08/14/2008 | DE102008006525A1 Schaltungslayout für unterschiedliche Leistungsanforderungen und entsprechendes Verfahren Circuit layout for different performance requirements and corresponding method |
| 08/14/2008 | DE102008005905A1 Hochspannungs-Zweigate-CMOS-Schaltanordnung und Verfahren Two high-voltage gate CMOS circuitry and methods |
| 08/14/2008 | DE102008004800A1 Elektrische Prüfeinrichtung zur Prüfung von elektrischen Prüflingen Electrical test equipment for testing of electrical devices under test |
| 08/14/2008 | DE102008004792A1 Elektrische Prüfeinrichtung zur Prüfung von elektrischen Prüflingen Electrical test equipment for testing of electrical devices under test |
| 08/14/2008 | DE102008004441A1 Mechano-chemisches Polierverfahren für GaAs-Wafer Mechano-chemical polishing process for GaAs wafers |
| 08/14/2008 | DE102008003854A1 Halbleitervorrichtung und Verfahren zum Steuern ihrer Muster Semiconductor device and method for controlling their pattern |
| 08/14/2008 | DE102007049135A1 Prozessüberwachung und Materialcharakterisierung mittels optischer Emissionsspektroskopie Process monitoring and materials characterization using optical emission spectroscopy |
| 08/14/2008 | DE102007037654A1 Halbleiterbauelement Semiconductor device |
| 08/14/2008 | DE102007016897A1 Verbesserter Verspannungsübertragungsmechanismus in einem Zwischenschichtdielektrikum unter Anwendung einer zusätzlichen Verspannungsschicht über einer Doppelverspannungsbeschichtung in einem Halbleiterbauelement Improved stress transfer mechanism in an interlayer dielectric using an additional strain layer on a double stress coating in a semiconductor device |
| 08/14/2008 | DE102007006525A1 Verfahren und Vorrichtung zur Detektierung von Defekten Method and apparatus for detection of defects |
| 08/14/2008 | DE102007006151A1 Verfahren zur Verringerung und Homogenisierung der Dicke einer Halbleiterschicht, die sich auf der Oberfläche eines elektrisch isolierenden Materials befindet A process for the reduction and homogenization of the thickness of a semiconductor layer which is located on the surface of an electrically insulating material |
| 08/14/2008 | DE102007004884A1 Verfahren zur Herstellung einer Metallschicht über einem strukturierten Dielektrikum durch stromlose Abscheidung unter Anwendung einer selektiv vorgesehenen Aktivierungsschicht A process for producing a metal layer over a patterned dielectric by electroless deposition using a selectively provided for activation layer |
| 08/14/2008 | DE102007004883A1 Verfahren zur Reduzierung durch Ätzen hervorgerufener Prozessungleichmäßigkeiten durch Weglassen der Abscheidung einer Endpunkterkennungsschicht während der Strukturierung verspannter Deckschichten in einem Halbleiterbauelement A method of reducing, by etching process non induced by omitting the deposition of an endpoint detection layer during the patterning of stressed surface layers in a semiconductor device |
| 08/14/2008 | DE102007004867A1 Erhöhen der Zuverlässigkeit von kupferbasierten Metallisierungsstrukturen in einem Mikrostrukturbauelement durch Anwenden von Aluminiumnitrid Increasing the reliability of copper-based metallization in a microstructure device by applying aluminum nitride |
| 08/14/2008 | DE102007004862A1 Verfahren zur Herstellung von Si-Ge enthaltenden Drain/Source-Gebieten in Transistoren mit geringerem Si/Ge-Verlust Process for the preparation of Si-Ge-containing drain / source regions in transistors with a lower Si / Ge-loss |
| 08/14/2008 | DE102007004861A1 Transistor mit eingebettetem Si/Ge-Material auf einem verspannten Halbleiter-auf-Isolator-Substrat Transistor with embedded Si / Ge material on a strained semiconductor-on-insulator substrate |
| 08/14/2008 | DE102007004860A1 Verfahren zur Herstellung einer Kupfer-basierten Metallisierungsschicht mit einer leitenden Deckschicht durch ein verbessertes Integrationsschema A process for preparing a copper-based metallization layer with a conductive outer layer by an improved integration scheme |
| 08/14/2008 | DE102007004859A1 Method for manufacturing silicon on insulator device used in thermal sensing applications involves forming metal silicide in transistors and doped regions |
| 08/14/2008 | DE102006007093B4 Verfahren zur Herstellung einer haftfähigen Schicht auf einem Halbleiterkörper A process for producing an adhesive layer on a semiconductor body |
| 08/14/2008 | DE102006007053B4 Optimierte dielektrische Isolationsstrukturen und Verfahren zu deren Herstellung Optimized dielectric isolation structures and processes for their preparation |
| 08/14/2008 | DE102005030338B4 Verfahren zum Herstellen eines Flüssigkristalldisplays unter Verwendung eines Femotsekundenlaser-Dünnfilm-Ätzverfahrens A method of manufacturing a liquid crystal display using a thin film etching method Femotsekundenlaser |
| 08/14/2008 | DE102004062585B4 Verfahren zur Ausbildung eines ultradünnen Films und zur Herstellung von Halbleitereinrichtungen, die einen derartigen Film enthalten A method of forming an ultra-thin film and for the production of semiconductor devices comprising such a film |
| 08/14/2008 | DE102004048332B4 Verfahren zur Herstellung einer Halbleiteranordnung, Halbleiteranordnung und Hochfrequenzschaltung A process for producing a semiconductor device, semiconductor device and high-frequency circuit |
| 08/14/2008 | DE102004034448B4 Verfahren zum Messen einer Schichtdicke einer Schicht auf einem Siliziumsubstrat und Satz von mindestens zwei Halbleiterprodukten Method for measuring a layer thickness of a layer on a silicon substrate, and set of at least two semiconductor products |
| 08/14/2008 | DE10130601B4 Substanz und Verfahren zur Herstellung einer porösen Schicht unter Verwendung der Substanz Substance and method for producing a porous layer using the substance |
| 08/14/2008 | DE10066334B4 Halbleitereinrichtung und Verfahren zur Herstellung der Halbleitereinrichtung A semiconductor device and method of manufacturing the semiconductor device |
| 08/14/2008 | CA2677312A1 Electronic semiconductor device based on copper nickel and gallium-tin-zinc-copper-titanium p and n-type oxides, their applications and corresponding manufacture process |
| 08/14/2008 | CA2674086A1 Nonflammable compositions comprising fluorinated compounds and use of these compositions |
| 08/13/2008 | EP1956876A1 Ceramic substrate, electronic device, and process for producing ceramic substrate |
| 08/13/2008 | EP1956873A2 Electronic device and method of manufacturing the same |
| 08/13/2008 | EP1956656A2 Thin film transistor array panel and method for manufacturing the same |
| 08/13/2008 | EP1956655A2 Display device and method of manufacturing the same |
| 08/13/2008 | EP1956648A1 Semiconductor device |
| 08/13/2008 | EP1956647A1 Switch device with connecting device and corresponding production method |
| 08/13/2008 | EP1956646A1 Resin-sealed molding apparatus with sealing means, and method of dismounting constituent part of die assembly fitted therein |
| 08/13/2008 | EP1956645A1 Shower plate and plasma treatment apparatus using shower plate |
| 08/13/2008 | EP1956644A1 Semiconductor surface treatment agent |
| 08/13/2008 | EP1956643A1 Method for reducing and homogenising the thickness of a semiconductor layer on the surface of an electrically insulating material |
| 08/13/2008 | EP1956642A1 Polishing agent for silicon oxide, liquid additive, and method of polishing |
| 08/13/2008 | EP1956641A1 Method for grinding surface of semiconductor wafer and method for manufacturing semiconductor wafer |
| 08/13/2008 | EP1956640A1 Laser processing method |
| 08/13/2008 | EP1956639A1 Method for manufacturing semiconductor substrate |