Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2008
08/20/2008CN101245448A Method for manufacturing thin membrane silicon electrooptical device with single-chamber plasma case
08/20/2008CN101245445A Solid source container with inlet plenum
08/20/2008CN101244945A Components for substrate processing apparatus and manufacturing method thereof
08/20/2008CN101244767A IC full-automatic method for testing brede and full-automatic holding tray type machine for testing brede
08/20/2008CN101244613A Method for protecting crystal plate front side structure and executing crystal plate cutting
08/20/2008CN101244545A Polishing pad, use thereof and method for manufacturing the same
08/20/2008CN101244536A Substrate polishing method, semiconductor device and fabrication method therefor
08/20/2008CN101244535A Polishing article
08/20/2008CN101244534A Bearing film used for fixing polished workpiece and its manufacturing method
08/20/2008CN101244533A Method of ultra-flation chemico-mechanical polishing technique and semiconductor component manufactured by using the method
08/20/2008CN101244303A Miniature solid or hollow silicon needle, silicon needle array and preparing method thereof
08/20/2008CN100413386C Method of mounting wafer on printed wiring substrate
08/20/2008CN100413385C Film bearing band for arranging electronic parts and printing screen mask for coating welding retardant
08/20/2008CN100413382C Plasma generation device, plasma control method, and substrate manufacturing method
08/20/2008CN100413193C Voltage booster circuit, power supply circuit, and liquid crystal driver
08/20/2008CN100413112C Imaging device in a projection exposure facility
08/20/2008CN100413105C Boron phosphide-based semiconductor light-emitting device
08/20/2008CN100413098C Method for manufacturing high-efficiency silicon solar cell via phosphorus boron synchronous diffusion
08/20/2008CN100413097C Process for preparing Cu-In-Ga-Se or Cu-In-Ga-S film solar battery obsorbing layer
08/20/2008CN100413096C Semiconductor photodetector and its production method
08/20/2008CN100413092C Thin film device supply body and method of fabricating the same and transfer method
08/20/2008CN100413091C Organic semiconductor element, production method therefor and organic semiconductor device
08/20/2008CN100413090C Method and structure for providing tuned leakage current in CMOS integrated circuit
08/20/2008CN100413088C 半导体装置 Semiconductor device
08/20/2008CN100413087C A method for making a semiconductor device having a high-k gate dielectric
08/20/2008CN100413077C Film transistor array face-board
08/20/2008CN100413076C SRAM cell and semiconductor member
08/20/2008CN100413075C Memory device
08/20/2008CN100413074C Set of integrated capacitor arrangements, especially integrated grid capacitors
08/20/2008CN100413072C Semiconductor integrated circuit device
08/20/2008CN100413071C Light-emitting diode lamp using AC power supply and its manufacturing method
08/20/2008CN100413070C Module with a built-in component, electronic device with the same, and manufacturing method of module with a built-in component
08/20/2008CN100413068C Semiconductor device for fingerprint recognition
08/20/2008CN100413067C Chip encapsulation structure and its crystal encapsulation forming method
08/20/2008CN100413066C Jointing welding plate of low-k dielectric material and method for making semiconductor device
08/20/2008CN100413065C Circuit device with at least partial packaging and method for forming the same
08/20/2008CN100413058C Interposer and interposer producing method
08/20/2008CN100413056C 电路装置及其制造方法 Circuit device and manufacturing method thereof
08/20/2008CN100413055C Method for making conpacitor device of integrated circuit and structure thereof
08/20/2008CN100413054C Method for producing DRAM structure by oxide isolation material, and produced structure thereof
08/20/2008CN100413053C CMOS image sensor and method for fabricating the same
08/20/2008CN100413052C CMOS image sensor and a method for fabricating the same
08/20/2008CN100413051C Method of manufacturing semiconductor device, semiconductor device, stacked semiconductor device
08/20/2008CN100413050C Method of manufacturing multi-level contacts by sizing of contact sizes in integrated circuits
08/20/2008CN100413049C STI channel filling method
08/20/2008CN100413048C Case base and wafer detection device
08/20/2008CN100413047C Substrate processing apparatus
08/20/2008CN100413046C Missing die detection
08/20/2008CN100413045C Anisotropically conductive connector, probe material member, wafer inspection apparatus, and wafer inspection method
08/20/2008CN100413044C Filling paste structure and process for WL-CSP
08/20/2008CN100413043C Manufacture method of semiconductor device
08/20/2008CN100413042C Packaging method for optical sensing semiconductor assembly
08/20/2008CN100413041C Semiconductor element producing method
08/20/2008CN100413040C Method for forming polycrystalline silicon thin film transistor
08/20/2008CN100413039C Method for forming a gate in a FinFET device and thinning a fin in a channel region of the FinFET device
08/20/2008CN100413038C Method for forming structures in finFET devices
08/20/2008CN100413037C Methods and apparatus for electrical, mechanical and/or chemical removal of conductive material from a microelectronic substrate
08/20/2008CN100413036C Silicon nitride film producing method and apparatus for producing silicon nitride film
08/20/2008CN100413035C Plasma etching method
08/20/2008CN100413034C Polysilicon etching technology capable of preventing device from plasma damage
08/20/2008CN100413033C Polishing cloth and method of manufacturing semiconductor device
08/20/2008CN100413032C Conductive polishing article for electrochemical mechanical polishing
08/20/2008CN100413031C Preparing technology of metal grid/high K-grid medium and preparation method of bimetal grid CMOS
08/20/2008CN100413030C Projection producing process and its structure
08/20/2008CN100413029C Method of manufacturing circuit device
08/20/2008CN100413028C A method of manufacturing a semiconductor wafer
08/20/2008CN100413027C Device manufacturing method
08/20/2008CN100413026C Photomask, light spot detector and detecting method
08/20/2008CN100413025C Capacitor constructions, rugged silicon-containing surfaces, and methods of forming rugged silicon-containing surfaces
08/20/2008CN100413024C Substrate holding structure and substrate processing apparatus
08/20/2008CN100413023C Single workpiece processing chamber
08/20/2008CN100413022C Method and system for manufacturing electronic device
08/20/2008CN100413021C Plasma reaction chamber temperature control system on-line fault detecting device and method
08/20/2008CN100413020C Continuous heat treatment furnace
08/20/2008CN100413019C Substrate treating apparatus
08/20/2008CN100413018C Method and system for treating identity of semiconductor device
08/20/2008CN100413017C Substrate support
08/20/2008CN100413016C Multicrystalline silicon film manufacturing method
08/20/2008CN100412995C Constrained sintering method for asymmetrical configurational dielectric layer
08/20/2008CN100412986C Strong media memory and operation method thereof
08/20/2008CN100412985C Semiconductor memory device
08/20/2008CN100412931C EL Display device
08/20/2008CN100412899C Method for producing radio frequency to discriminate electronic label
08/20/2008CN100412891C Package structure and method of radio-frequency identifying volume label jointed with microassembly
08/20/2008CN100412697C Method for manufacturing substrate for discrete track recording media and method for manufacturing discrete track recording media
08/20/2008CN100412696C Band workpiece transporter
08/20/2008CN100412695C Method for manufacturing offset printing apparatus and device
08/20/2008CN100412668C Thin film transistor device for liquid crystal display, and manufacturing method thereof
08/20/2008CN100412665C Liquid crystal display device and manufacturing method thereof
08/20/2008CN100412632C Manufacturing method of array substrate of semi-reflection semi-penetration liquid crystal display
08/20/2008CN100412607C Microelectromechanical system and method for fabricating the same
08/20/2008CN100412561C Electromigration test apparatus and an electromigration test method
08/20/2008CN100412557C Method of predicting lifetime of MISFET with high-k grid dielectric layer
08/20/2008CN100412504C Pattern inspection method and apparatus, and pattern alignment method
08/20/2008CN100412500C Detecting needle alignment proving circuit and proving method in semiconductor device
08/20/2008CN100412489C Wafer boat with arcuate wafer support arms
08/20/2008CN100412486C Substrate drying apparatus and substrate drying method
08/20/2008CN100412153C Process for reducing dishing and erosion during chemical mechanical planarization
08/20/2008CN100412152C CMP systems and methods utilizing amine-containing polymers
08/20/2008CN100411961C Hermetically sealed container for large-sized precision sheet (semi-) product
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