H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2011
12/20/2011	US8080767 Thermal processing apparatus and thermal processing method for object to be processed
12/20/2011	US8080505 Slurry composition and method for chemical mechanical polishing of copper integrated with tungsten based barrier metals
12/20/2011	US8080485 Localized temperature control during rapid thermal anneal
12/20/2011	US8080484 Method for manufacturing group III nitride semiconductor layer, method for manufacturing group III nitride semiconductor light-emitting device, and group III nitride semiconductor light-emitting device, and lamp
12/20/2011	US8080483 Double gyroid structure nanoporous films and nanowire networks
12/20/2011	US8080482 Methods for preparing a semiconductor structure for use in backside illumination applications
12/20/2011	US8080481 Method of manufacturing a nanowire device
12/20/2011	US8080480 Method of forming fine patterns and manufacturing semiconductor light emitting device using the same
12/20/2011	US8080479 Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator
12/20/2011	US8080478 Method of producing mask
12/20/2011	US8080477 Film formation apparatus and method for using same
12/20/2011	US8080476 Polishing composition and polishing process
12/20/2011	US8080475 Removal chemistry for selectively etching metal hard mask
12/20/2011	US8080474 Method for making electrode
12/20/2011	US8080473 Method for metallizing a pattern in a dielectric film
12/20/2011	US8080472 Metal line having a MoxSiy/Mo diffusion barrier of semiconductor device and method for forming the same
12/20/2011	US8080471 MRAM cell structure
12/20/2011	US8080470 Wiring structure and semiconductor device, and their fabrication methods
12/20/2011	US8080469 Method for increasing the area of non-polar and semi-polar nitride substrates
12/20/2011	US8080468 Methods for fabricating passivated silicon nanowires and devices thus obtained
12/20/2011	US8080467 Silicon-based visible and near-infrared optoelectric devices
12/20/2011	US8080466 Method for growth of nitrogen face (N-face) polarity compound nitride semiconductor device with integrated processing system
12/20/2011	US8080465 Semiconductor wafer structure with balanced reflectance and absorption characteristics for rapid thermal anneal uniformity
12/20/2011	US8080464 Methods for processing silicon on insulator wafers
12/20/2011	US8080463 Semiconductor device manufacturing method and silicon oxide film forming method
12/20/2011	US8080462 Mark structure for coarse wafer alignment and method for manufacturing such a mark structure
12/20/2011	US8080461 Method of making a thin film resistor
12/20/2011	US8080460 Methods of forming diodes
12/20/2011	US8080459 Self aligned contact in a semiconductor device and method of fabricating the same
12/20/2011	US8080458 Semiconductor device and manufacturing method thereof
12/20/2011	US8080457 Fabrication method of power semiconductor structure with low gate charge
12/20/2011	US8080456 Robust top-down silicon nanowire structure using a conformal nitride
12/20/2011	US8080455 Method for fabricating semiconductor device with increased breakdown voltage
12/20/2011	US8080454 Method of fabricating CMOS transistor
12/20/2011	US8080453 Gate stack having nitride layer
12/20/2011	US8080452 Effecting selectivity of silicon or silicon-germanium deposition on a silicon or silicon-germanium substrate by doping
12/20/2011	US8080451 Fabricating semiconductor structures
12/20/2011	US8080450 Method of manufacturing semiconductor thin film
12/20/2011	US8080449 Method for manufacturing thin-film transistors
12/20/2011	US8080448 Semiconductor device with nested rows of contacts
12/20/2011	US8080447 Method of manufacturing semiconductor device including exposing a dicing line on a wafer
12/20/2011	US8080445 Semiconductor device and method of forming WLP with semiconductor die embedded within penetrable encapsulant between TSV interposers
12/20/2011	US8080444 Method for forming a packaged semiconductor device having a ground plane
12/20/2011	US8080443 Method of making pillars using photoresist spacer mask
12/20/2011	US8080442 Vertical system integration
12/20/2011	US8080440 Resistor random access memory cell with L-shaped electrode
12/20/2011	US8080439 Method of making a vertical phase change memory (PCM) and a PCM device
12/20/2011	US8080438 Organic semiconductor film forming method, organic semiconductor film and organic thin film transistor
12/20/2011	US8080436 Light emitting device and method of manufacturing the light emitting device
12/20/2011	US8080435 Organic electroluminescence element and manufacturing method thereof
12/20/2011	US8080434 Nondestructive testing method for oxide semiconductor layer and method for making oxide semiconductor layer
12/20/2011	US8080433 Method for detaching layers with low magnetic permeability
12/20/2011	US8080432 High performance MTJ element for STT-RAM and method for making the same
12/20/2011	US8080429 Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor device
12/20/2011	US8080364 Pattern formation method
12/20/2011	US8080362 Positive resist composition
12/20/2011	US8080192 Volume-based dispensing control method
12/20/2011	US8080126 Plasma processing apparatus
12/20/2011	US8080125 Gas-permeable plasma electrode, method for production of the gas-permeable plasma electrode, and a parallel-plate reactor
12/20/2011	US8080107 Showerhead electrode assembly for plasma processing apparatuses
12/20/2011	US8079894 Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion
12/20/2011	US8079256 Gas sensor and method for its production
12/20/2011	US8079142 Printed circuit board manufacturing method
12/20/2011	CA2530065C Semiconductor device including mosfet having band-engineered superlattice
12/20/2011	CA2461338C Low viscosity precursor compositions and methods for the deposition of conductive electronic features
12/15/2011	WO2011156787A2 Pillar structure for memory device and method
12/15/2011	WO2011156749A2 Graphene deposition
12/15/2011	WO2011156705A2 Selective formation of metallic films on metallic surfaces
12/15/2011	WO2011156695A1 Air gap isolation between the bit lines of a non-volatile memory and methods of manufacturing the same
12/15/2011	WO2011156657A2 High productivity thin film deposition method and system
12/15/2011	WO2011156650A2 Low resistivity tungsten pvd with enhanced ionization and rf power coupling
12/15/2011	WO2011156560A1 Solar cell silicon wafer process
12/15/2011	WO2011156534A2 Multiple frequency power for plasma chamber electrode
12/15/2011	WO2011156454A2 Crystallization of multi-layered amorphous films
12/15/2011	WO2011156371A1 Multi-wafer rotating disc reactor with inertial planetary drive
12/15/2011	WO2011156349A2 Methods for forming interconnect structures
12/15/2011	WO2011156293A2 Apparatus and methods for radio frequency switching
12/15/2011	WO2011156292A2 Devices for methodologies for debonding and handling semiconductor wafers
12/15/2011	WO2011156289A2 Devices and methodologies related to cmos rf
12/15/2011	WO2011156253A1 Method of selectively etching an insulation stack for a metal interconnect
12/15/2011	WO2011156228A2 Coating adhesives onto dicing before grinding and micro-fabricated wafers
12/15/2011	WO2011156141A2 Window assembly for use in substrate processing systems
12/15/2011	WO2011156069A2 Memory arrays
12/15/2011	WO2011156028A2 Porous and non-porous nanostructures
12/15/2011	WO2011156019A2 Group iv metal or semiconductor nanowire fabric
12/15/2011	WO2011155987A1 Heated annulus chuck
12/15/2011	WO2011155986A1 Heated electrostatic chuck including mechanical clamp capability at high temperature
12/15/2011	WO2011155985A2 Ozone plenum as uv shutter or tunable uv filter for cleaning semiconductor substrates
12/15/2011	WO2011155928A1 Three-dimensional integrated circuit
12/15/2011	WO2011155808A2 Apparatus and method for printing process simulation
12/15/2011	WO2011155683A1 Method for active phase correction using negative index metamaterials, exposure imaging device and system using same, and method for improving the resolution of the exposure imaging device using the negative index metamaterials
12/15/2011	WO2011155638A1 Method of redistributing functional element
12/15/2011	WO2011155622A1 Circuit synthesizing device, method, and program
12/15/2011	WO2011155615A1 Low-temperature-sinterable bonding material, and bonding method using the bonding material
12/15/2011	WO2011155582A1 Stamper for microstructure transfer and microstructure transfer device
12/15/2011	WO2011155548A1 Ultrasonic cleaning apparatus and ultrasonic cleaning method
12/15/2011	WO2011155541A1 Semiconductor device, and manufacturing method for same
12/15/2011	WO2011155529A1 Measurement member, stage device, exposure apparatus, exposure method, and method for manufacturing device
12/15/2011	WO2011155499A1 Method for producing article having fine recessed and projected structure on surface, mold release treatment method for mold, and active energy ray-curable resin composition for mold surface release treatment
12/15/2011	WO2011155496A1 Epitaxial substrate and method for producing epitaxial substrate

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