| Patents for H01J 27 - Ion beam tubes (3,716) |
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| 03/14/2002 | WO2001027964A3 Electron impact ion source |
| 03/14/2002 | US20020029746 Operation method of ion source and ion beam irradiation apparatus |
| 03/13/2002 | EP1185857A2 Method and apparatus for enhancing yield of secondary ions |
| 03/12/2002 | US6356026 Ion implant source with multiple indirectly-heated electron sources |
| 03/12/2002 | US6355933 Ion source and method for using same |
| 03/07/2002 | WO2002019376A2 System and method for removing contaminant particles relative to an ion beam |
| 03/07/2002 | WO2002019366A2 Cold cathode ion beam deposition apparatus with segregated gas flow |
| 03/06/2002 | EP1183709A1 Linearly extended device for large-surface microwave treatment and for large surface plasma production |
| 03/05/2002 | US6352626 Sputter ion source for boron and other targets |
| 02/21/2002 | WO2001067502A3 Method and apparatus for milling copper interconnects in a charged particle beam system |
| 02/20/2002 | EP1180783A2 Magnet for generating a magnetic field in an ion source |
| 02/19/2002 | US6348764 Indirect hot cathode (IHC) ion source |
| 02/13/2002 | EP1179217A1 Secondary electron spectroscopy method and system |
| 02/12/2002 | US6346770 Discharge device having cathode with micro hollow array |
| 02/12/2002 | US6346768 Low energy ion gun having multiple multi-aperture electrode grids with specific spacing requirements |
| 02/07/2002 | US20020014407 For reducing the surface roughness (smoothing) and improving the thickness uniformity of, top silicon film of silicon-on-insulator wafer or similar thin-film electronic or photonic workpiecies |
| 02/06/2002 | EP1178517A1 An ion beam apparatus |
| 02/06/2002 | EP1178513A2 Ionization chamber |
| 02/05/2002 | USRE37537 Method and apparatus for altering material |
| 01/31/2002 | WO2000019481A9 Low contamination high density plasma processing chamber and methods for processing a semiconductor substrate |
| 01/24/2002 | DE10014034C2 Plasma-Beschleuniger-Anordnung Plasma accelerator configuration |
| 01/22/2002 | US6340812 Two-dimensional image detector with electrodes on counter substrate |
| 01/17/2002 | WO2002005315A2 System and method for improving thin films by gas cluster ion be am processing |
| 01/16/2002 | EP1171901A1 Multi-column fib for nanofabrication applications |
| 01/08/2002 | US6337540 High brightness point ion sources using liquid ionic compounds |
| 01/03/2002 | US20020000523 Ion implantation with improved ion source life expectancy |
| 01/02/2002 | EP0702843B1 Device for high energy ion implantation of the low or medium current kind and method for its use |
| 12/27/2001 | US20010054699 Decaborane ion source |
| 12/27/2001 | US20010054384 Vaporiser for generating feed gas for an arc chamber |
| 12/20/2001 | WO2000019481A3 Low contamination high density plasma processing chamber and methods for processing a semiconductor substrate |
| 12/20/2001 | US20010052574 MOS-based image sensor and method of forming black-level signal therefor |
| 12/20/2001 | EP1145273A3 Low contamination high density plasma etch chambers and methods for making the same |
| 12/18/2001 | US6331713 Movable ion source assembly |
| 12/13/2001 | WO2001004611A3 Method and apparatus for enhancing yield of secondary ions |
| 12/12/2001 | EP1161309A1 A method for a repetitive ion beam processing with a by carbon containing ion beam |
| 11/29/2001 | WO2001091523A2 Extreme ultraviolet source based on colliding neutral beams |
| 11/28/2001 | CN1324093A Ion source operation method, and ion beam radiation device |
| 11/27/2001 | US6322672 Method and apparatus for milling copper interconnects in a charged particle beam system |
| 11/22/2001 | WO2001088947A1 Control system for indirectly heated cathode ion source |
| 11/22/2001 | WO2001088946A1 Cathode assembly for indirectly heated cathode ion source |
| 11/22/2001 | US20010043040 Cathode assembly for indirectly heated cathode ion source |
| 11/22/2001 | US20010042836 Control system for indirectly heated cathode ion source |
| 11/21/2001 | EP1062679B1 Plasma etching installation |
| 11/20/2001 | US6320321 Ion beam processing apparatus for processing work piece with ion beam being neutralized uniformly |
| 11/08/2001 | US20010037817 Arc chamber for an ion implantation system |
| 10/25/2001 | US20010032939 Multi-column FIB for nanofabrication applications |
| 10/24/2001 | EP1147544A2 Rf plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls |
| 10/24/2001 | CN1319247A Low contaminatino, high density plasma etch chamber and method for making the same |
| 10/18/2001 | DE10115937A1 Verdampfer zum Erzeugen von Speisegas für eine Lichtbogenkammer Evaporator for generating feed gas for an arc chamber |
| 10/17/2001 | EP1145273A2 Low contamination high density plasma etch chambers and methods for making the same |
| 10/11/2001 | US20010027917 Ion milling chromium on a quartz substrate without causing defects in the quartz by moving the ion beam initially in a pattern that produces an uneven surface, followed by milling step where beam moves in a pattern of overlapping pixels |
| 10/11/2001 | DE10112817A1 Ion extraction apparatus for ion implantation system has electrode manipulator with actuators for adjusting slit width and moving electrode |
| 10/11/2001 | DE10015415A1 Generation of high intensity ion beam and or short wave electromagnetic emissions using laser |
| 10/09/2001 | US6300720 Plasma gun and methods for the use thereof |
| 10/09/2001 | US6300636 Ion source head |
| 10/09/2001 | US6298806 Device for exciting a gas by a surface wave plasma |
| 10/04/2001 | WO2001022465A8 Plasma source of linear ion beam |
| 10/04/2001 | DE10014034A1 Plasma-Beschleuniger-Anordnung Plasma accelerator configuration |
| 09/27/2001 | WO2001072093A2 Plasma accelerator arrangement |
| 09/25/2001 | US6294862 Multi-cusp ion source |
| 09/25/2001 | US6294780 Pulsed ion source for ion trap mass spectrometer |
| 09/20/2001 | WO2001069645A1 Spatter ion pump |
| 09/20/2001 | WO2001068938A1 Method and apparatus for repairing lithography masks using a charged particle beam system |
| 09/19/2001 | EP0799491B1 Radio frequency ion source |
| 09/18/2001 | US6291939 Ion source device |
| 09/13/2001 | WO2001067502A2 Method and apparatus for milling copper interconnects in a charged particle beam system |
| 09/13/2001 | WO2001067482A1 Hollow cathode sputter ion source for generating high-intensity ion beams |
| 09/13/2001 | DE10010706A1 Hollow cathode sputter ion source for generating high intensity ion beams has electromagnet, externally heated cathode, cooled anti-cathode, cooled anode for Penning plasma |
| 09/12/2001 | EP1132946A1 Ion beam processing apparatus |
| 09/12/2001 | CN1312578A Ion source and operation method thereof |
| 09/11/2001 | US6288403 Decaborane ionizer |
| 09/04/2001 | US6285025 Source of fast neutral molecules |
| 08/30/2001 | US20010017353 Ion source and operation method thereof |
| 08/29/2001 | EP1128414A1 Modulated power for ionized metal plasma deposition |
| 08/16/2001 | WO2001059805A1 Multi-column fib for nanofabrication applications |
| 08/16/2001 | EP1123641A1 Gas-filled particle accelerator with a pulsed plasma source |
| 07/10/2001 | US6259210 Power control apparatus for an ION source having an indirectly heated cathode |
| 07/10/2001 | US6259091 Apparatus for reduction of selected ion intensities in confined ion beams |
| 06/28/2001 | US20010005119 Ion beam processing apparatus for processing work piece with ion beam being neutralized uniformly |
| 06/14/2001 | WO2001043160A1 Ionizer for gas cluster ion beam formation |
| 06/14/2001 | WO2001043157A1 Ion implantation ion source, system and method |
| 06/13/2001 | EP1105908A1 Ion beam generation apparatus |
| 06/12/2001 | US6246162 Ion optics |
| 06/12/2001 | US6246059 Ion-beam source with virtual anode |
| 06/07/2001 | WO2001041181A1 Gas cluster ion beam smoother apparatus |
| 06/05/2001 | US6242749 Ion-beam source with uniform distribution of ion-current density on the surface of an object being treated |
| 05/29/2001 | US6239440 Arc chamber for an ion implantation system |
| 05/29/2001 | US6238526 Ion-beam source with channeling sputterable targets and a method for channeled sputtering |
| 05/22/2001 | US6236163 Multiple-beam ion-beam assembly |
| 05/22/2001 | US6236054 Ion source for generating ions of a gas or vapor |
| 05/17/2001 | US20010001185 Plasma processing apparatus and method of cleaning the apparatus |
| 05/16/2001 | EP1099235A1 Ion source |
| 05/10/2001 | DE19949978A1 Elektronenstoßionenquelle Electron impact ion source |
| 05/01/2001 | US6225747 Charged-particle source, control system and process using gating to extract the charged particle beam |
| 04/19/2001 | WO2001027964A2 Electron impact ion source |
| 04/18/2001 | EP1093149A2 Decaborane ion source |
| 04/17/2001 | CA2162748C Ion generating source for use in an ion implanter |
| 04/12/2001 | DE10049536A1 Ion source arrangement has ion source movable relative to chamber along fixed curve essentially in horizontal plane to enable access to inner wall of chamber |
| 04/10/2001 | US6215125 Method to operate GEF4 gas in hot cathode discharge ion sources |
| 04/10/2001 | CA2124344C Corona discharge ionisation source |